Reduction or decomposition of gaseous compounds

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H01L21/0262

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/0262Reduction or decomposition of gaseous compounds

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device, semiconductor wafer, memory device, and elect...
- Patent number 12,274,064
- Issue date Apr 8, 2025
- Semiconductor Energy Laboratory Co., Ltd.
- Hajime Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming semiconductor devices in a layer of epitaxial si...
- Patent number 12,272,738
- Issue date Apr 8, 2025
- Infineon Technologies AG
- Hans-Joachim Schulze
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitride semiconductor component and process for its production
- Patent number 12,272,761
- Issue date Apr 8, 2025
- Azur Space Solar Power GmbH
- Armin Dadgar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heterostructure semiconductor, chemiresistive gas sensor made there...
- Patent number 12,265,046
- Issue date Apr 1, 2025
- Indian Institute of Science
- Neha Sakhuja
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing boron containing silicon germanium layers
- Patent number 12,266,524
- Issue date Apr 1, 2025
- ASM IP Holding B.V.
- Lucas Petersen Barbosa Lima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of single crystal semiconductors using planar vapor liqui...
- Patent number 12,266,526
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Martin Christopher Holland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitride semiconductor including multi-portion nitride region
- Patent number 12,266,698
- Issue date Apr 1, 2025
- Kabushiki Kaisha Toshiba
- Toshiki Hikosaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 12,266,687
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Che-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoactive, inorganic ligand-capped inorganic nanocrystals
- Patent number 12,265,328
- Issue date Apr 1, 2025
- The University of Chicago
- Dmitri V. Talapin
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Semiconductor device with source/drain contact formed using bottom-...
- Patent number 12,266,688
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sung-Li Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of RF components
- Patent number 12,261,059
- Issue date Mar 25, 2025
- STMicroelectronics (Tours) SAS
- Patrick Hauttecoeur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a FinFET with merged epitaxial source/drain...
- Patent number 12,255,255
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei-Min Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for real-time quality control of a film in a sp...
- Patent number 12,255,110
- Issue date Mar 18, 2025
- Samsung Electronics Co., Ltd.
- Gaurav Kumar
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for producing non-contiguous metal oxide semiconductors, of...
- Patent number 12,255,066
- Issue date Mar 18, 2025
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Pierre-Vincent Guenery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hydrogen recycle system and hydrogen recycle method
- Patent number 12,246,963
- Issue date Mar 11, 2025
- National University Corporation Tokai National Higher Education and Research...
- Shinji Kambara
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Integrated circuit device
- Patent number 12,249,606
- Issue date Mar 11, 2025
- Samsung Electronics Co., Ltd.
- Minhee Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming p-type nitride semiconductor layer
- Patent number 12,249,628
- Issue date Mar 11, 2025
- Kyoto University
- Katsuhiro Kishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and material deposition systems for forming semiconductor l...
- Patent number 12,249,506
- Issue date Mar 11, 2025
- SILANNA UV TECHNOLOGIES PTE LTD
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dynamic laser-assisted etching
- Patent number 12,243,745
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Han-Yu Tang
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Gas curtain for semiconductor manufacturing system
- Patent number 12,243,750
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kent Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure of a fin field effect transistor (FinFET) comprising epit...
- Patent number 12,237,403
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Yang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organoaminosilane precursors and methods for depositing films compr...
- Patent number 12,230,496
- Issue date Feb 18, 2025
- VERSUM MATERIALS US, LLC
- Mark Leonard O'Neill
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Word line structure of three-dimensional memory device
- Patent number 12,232,320
- Issue date Feb 18, 2025
- Yangtze Memory Technologies Co., Ltd.
- Qiang Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a beta-Ga2O3-based single crystal film by f...
- Patent number 12,230,500
- Issue date Feb 18, 2025
- Tamura Corporation
- Quang Tu Thieu
- C30 - CRYSTAL GROWTH
Information Patent Grant
Contact architecture for capacitance reduction and satisfactory con...
- Patent number 12,224,326
- Issue date Feb 11, 2025
- Intel Corporation
- Rishabh Mehandru
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method of forming a semiconductor layer
- Patent number 12,224,175
- Issue date Feb 11, 2025
- Infineon Technologies AG
- Olaf Fiedler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 12,217,959
- Issue date Feb 4, 2025
- Kokusai Electric Corporation
- Kimihiko Nakatani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High purity polysilocarb derived silicon carbide powder
- Patent number 12,215,031
- Issue date Feb 4, 2025
- Pallidus, Inc.
- Andrew R. Hopkins
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Three-dimensional semiconductor memory device
- Patent number 12,213,315
- Issue date Jan 28, 2025
- Samsung Electronics Co., Ltd.
- Byungjin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid channel semiconductor device and method
- Patent number 12,211,900
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Pei-Yu Wang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE INCLUDING TWO-DIMENSIONAL MATERIAL AND METHOD...
- Publication number 20250120130
- Publication date Apr 10, 2025
- Samsung Electronics Co., Ltd.
- Minsu SEOL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM TRANSISTOR, METHOD FOR MANUFACTURING THE SAME, AND SEMICO...
- Publication number 20250120178
- Publication date Apr 10, 2025
- Semiconductor Energy Laboratory Co., Ltd.
- Toshikazu Kondo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
2D Material Stack Formation
- Publication number 20250118553
- Publication date Apr 10, 2025
- IMEC vzw
- Pierre Morin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SiC EPITAXIAL WAFER AND METHOD OF MANUFACTURING SiC EPITAXIAL WAFER
- Publication number 20250109526
- Publication date Apr 3, 2025
- Resonac Corporation
- Kensho TANAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EPITAXIAL REGIONS IN SEMICONDUCTOR DEVICES
- Publication number 20250113517
- Publication date Apr 3, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shao-An WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS FOR SYNTHESIS OF MONOLAYER TRANSITION METAL DICHALOCOGENIDE
- Publication number 20250105006
- Publication date Mar 27, 2025
- INDIAN INSTITUTE OF SCIENCE EDUCATION AND RESEARCH, PUNE (IISER PUNE)
- Gokul M. A
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POLYCRYSTALLINE SILICON CARBIDE (SIC) SUBSTRATE WITH HIGH RESISTIVI...
- Publication number 20250105004
- Publication date Mar 27, 2025
- STMicroelectronics International N.V.
- Björn MAGNUSSON LINDGREN
- C30 - CRYSTAL GROWTH
Information Patent Application
SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...
- Publication number 20250105007
- Publication date Mar 27, 2025
- Kokusai Electric Corporation
- Yugo ORIHASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHOWERHEAD FOR PROCESS TOOL
- Publication number 20250092521
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Anthony Dip
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN OXIDE NANORIBBON ACETONE GAS SENSOR, PREPARATION METHOD THEREOF...
- Publication number 20250095986
- Publication date Mar 20, 2025
- Yangtze Delta Region Institute (Huzhou), University of Electronic Science and...
- Weiwu CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PREPARING GALLIUM NITRIDE (GAN) SINGLE-CRYSTAL SUBSTRATE...
- Publication number 20250092572
- Publication date Mar 20, 2025
- Peking University
- Xinqiang WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF
- Publication number 20250098250
- Publication date Mar 20, 2025
- WINBOND ELECTRONICS CORP.
- Noriaki Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DEPOSITING EPITAXIAL MATERIAL, STRUCTURE FORMED USING THE...
- Publication number 20250084534
- Publication date Mar 13, 2025
- ASM IP HOLDING B.V.
- Amir Kajbafvala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20250089322
- Publication date Mar 13, 2025
- Kabushiki Kaisha Toshiba
- Mitsuhiro KUSHIBE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20250081629
- Publication date Mar 6, 2025
- Semiconductor Energy Laboratory Co., Ltd.
- Ryota HODO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING SEMICONDUCTOR STRUCTURES, SEMICONDUCTOR PROCESSI...
- Publication number 20250079167
- Publication date Mar 6, 2025
- ASM IP HOLDING B.V.
- Ernesto Suarez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING DEVICE
- Publication number 20250079171
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Tatsuya MIYAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DEPOSITING GERMANIUM FILMS BY ATOMIC LAYER DEPOSITION
- Publication number 20250059646
- Publication date Feb 20, 2025
- Micron Technology, Inc.
- Jean-Sebastien Materne Lehn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20250063771
- Publication date Feb 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Chieh Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR SUBSTRATE
- Publication number 20250062120
- Publication date Feb 20, 2025
- Kyocera Corporation
- Takehiro NISHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REDUCING STACKING FAULTS IN SILICON CARBIDE, AND STRUCTU...
- Publication number 20250051962
- Publication date Feb 13, 2025
- KWANSEI GAKUIN EDUCATIONAL FOUNDATION
- Tadaaki KANEKO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SURFACE-WATER-ASSISTED DEPOSITION OF PATTERNED FILMS OF ALIGNED NAN...
- Publication number 20250054755
- Publication date Feb 13, 2025
- Wisconsin Alumni Research Foundation
- Michael Scott Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED EPITAXY AND PRECLEAN SYSTEM
- Publication number 20250046596
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REFLECTORS, SEMICONDUCTOR PROCESSING SYSTEMS HAVING REFLECTORS, AND...
- Publication number 20250034714
- Publication date Jan 30, 2025
- ASM IP HOLDING B.V.
- Wentao Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LIFT FRAMES FOR CENTRAL HEATING, AND RELATED PROCESSING CHAMBERS AN...
- Publication number 20250038040
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Ala MORADIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD, SYSTEM AND APPARATUS FOR FORMING METAL OXIDE LAYERS
- Publication number 20250034701
- Publication date Jan 30, 2025
- ASM IP HOLDING B.V.
- Bo Yin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR CHEMICAL PRECURSOR WITH GAS PASSAGES
- Publication number 20250027199
- Publication date Jan 23, 2025
- Applied Materials, Inc.
- David Marquardt
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...
- Publication number 20250022708
- Publication date Jan 16, 2025
- Kokusai Electric Corporation
- Takuya JODA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TRANSISTORS WITH IMPROVED THERMAL STABILITY
- Publication number 20250022934
- Publication date Jan 16, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- Kuo-Chang Chiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOVEL BUFFER LAYER STRUCTURE TO IMPROVE GAN SEMICONDUCTORS
- Publication number 20250015143
- Publication date Jan 9, 2025
- GLOBALWAFERS CO., LTD.
- Jia-Zhe Liu
- H01 - BASIC ELECTRIC ELEMENTS

Reduction or decomposition of gaseous compounds

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor device, semiconductor wafer, memory device, and elect...

Methods of forming semiconductor devices in a layer of epitaxial si...

Nitride semiconductor component and process for its production

Heterostructure semiconductor, chemiresistive gas sensor made there...

Method for depositing boron containing silicon germanium layers

Formation of single crystal semiconductors using planar vapor liqui...

Nitride semiconductor including multi-portion nitride region

Semiconductor device and method

Photoactive, inorganic ligand-capped inorganic nanocrystals

Semiconductor device with source/drain contact formed using bottom-...

Manufacturing method of RF components

Method of manufacturing a FinFET with merged epitaxial source/drain...

Methods and systems for real-time quality control of a film in a sp...

Method for producing non-contiguous metal oxide semiconductors, of...

Hydrogen recycle system and hydrogen recycle method

Integrated circuit device

Method of forming p-type nitride semiconductor layer

Methods and material deposition systems for forming semiconductor l...

Dynamic laser-assisted etching

Gas curtain for semiconductor manufacturing system

Structure of a fin field effect transistor (FinFET) comprising epit...

Organoaminosilane precursors and methods for depositing films compr...

Word line structure of three-dimensional memory device

Method of manufacturing a beta-Ga2O3-based single crystal film by f...

Contact architecture for capacitance reduction and satisfactory con...

Apparatus and method of forming a semiconductor layer

Method of manufacturing semiconductor device, substrate processing...

High purity polysilocarb derived silicon carbide powder

Three-dimensional semiconductor memory device

Hybrid channel semiconductor device and method

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE INCLUDING TWO-DIMENSIONAL MATERIAL AND METHOD...

THIN FILM TRANSISTOR, METHOD FOR MANUFACTURING THE SAME, AND SEMICO...

2D Material Stack Formation

SiC EPITAXIAL WAFER AND METHOD OF MANUFACTURING SiC EPITAXIAL WAFER

EPITAXIAL REGIONS IN SEMICONDUCTOR DEVICES

PROCESS FOR SYNTHESIS OF MONOLAYER TRANSITION METAL DICHALOCOGENIDE

POLYCRYSTALLINE SILICON CARBIDE (SIC) SUBSTRATE WITH HIGH RESISTIVI...

SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...

SHOWERHEAD FOR PROCESS TOOL

TIN OXIDE NANORIBBON ACETONE GAS SENSOR, PREPARATION METHOD THEREOF...

METHOD FOR PREPARING GALLIUM NITRIDE (GAN) SINGLE-CRYSTAL SUBSTRATE...

SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF

METHOD OF DEPOSITING EPITAXIAL MATERIAL, STRUCTURE FORMED USING THE...

WAFER AND METHOD FOR MANUFACTURING THE SAME

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

METHODS OF FORMING SEMICONDUCTOR STRUCTURES, SEMICONDUCTOR PROCESSI...

SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING DEVICE

METHODS FOR DEPOSITING GERMANIUM FILMS BY ATOMIC LAYER DEPOSITION

METHOD OF FABRICATING SEMICONDUCTOR DEVICE

SEMICONDUCTOR SUBSTRATE

METHOD FOR REDUCING STACKING FAULTS IN SILICON CARBIDE, AND STRUCTU...

SURFACE-WATER-ASSISTED DEPOSITION OF PATTERNED FILMS OF ALIGNED NAN...

INTEGRATED EPITAXY AND PRECLEAN SYSTEM

REFLECTORS, SEMICONDUCTOR PROCESSING SYSTEMS HAVING REFLECTORS, AND...

LIFT FRAMES FOR CENTRAL HEATING, AND RELATED PROCESSING CHAMBERS AN...

METHOD, SYSTEM AND APPARATUS FOR FORMING METAL OXIDE LAYERS

SEMICONDUCTOR CHEMICAL PRECURSOR WITH GAS PASSAGES

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...

TRANSISTORS WITH IMPROVED THERMAL STABILITY

NOVEL BUFFER LAYER STRUCTURE TO IMPROVE GAN SEMICONDUCTORS