Reduction or decomposition of gaseous compounds

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H01L21/0262

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/0262Reduction or decomposition of gaseous compounds

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Manufacturing method of RF components
- Patent number 12,261,059
- Issue date Mar 25, 2025
- STMicroelectronics (Tours) SAS
- Patrick Hauttecoeur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a FinFET with merged epitaxial source/drain...
- Patent number 12,255,255
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei-Min Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for real-time quality control of a film in a sp...
- Patent number 12,255,110
- Issue date Mar 18, 2025
- Samsung Electronics Co., Ltd.
- Gaurav Kumar
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for producing non-contiguous metal oxide semiconductors, of...
- Patent number 12,255,066
- Issue date Mar 18, 2025
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Pierre-Vincent Guenery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hydrogen recycle system and hydrogen recycle method
- Patent number 12,246,963
- Issue date Mar 11, 2025
- National University Corporation Tokai National Higher Education and Research...
- Shinji Kambara
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Integrated circuit device
- Patent number 12,249,606
- Issue date Mar 11, 2025
- Samsung Electronics Co., Ltd.
- Minhee Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming p-type nitride semiconductor layer
- Patent number 12,249,628
- Issue date Mar 11, 2025
- Kyoto University
- Katsuhiro Kishimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and material deposition systems for forming semiconductor l...
- Patent number 12,249,506
- Issue date Mar 11, 2025
- SILANNA UV TECHNOLOGIES PTE LTD
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dynamic laser-assisted etching
- Patent number 12,243,745
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Han-Yu Tang
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Gas curtain for semiconductor manufacturing system
- Patent number 12,243,750
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kent Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure of a fin field effect transistor (FinFET) comprising epit...
- Patent number 12,237,403
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Yang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organoaminosilane precursors and methods for depositing films compr...
- Patent number 12,230,496
- Issue date Feb 18, 2025
- VERSUM MATERIALS US, LLC
- Mark Leonard O'Neill
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Word line structure of three-dimensional memory device
- Patent number 12,232,320
- Issue date Feb 18, 2025
- Yangtze Memory Technologies Co., Ltd.
- Qiang Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a beta-Ga2O3-based single crystal film by f...
- Patent number 12,230,500
- Issue date Feb 18, 2025
- Tamura Corporation
- Quang Tu Thieu
- C30 - CRYSTAL GROWTH
Information Patent Grant
Contact architecture for capacitance reduction and satisfactory con...
- Patent number 12,224,326
- Issue date Feb 11, 2025
- Intel Corporation
- Rishabh Mehandru
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method of forming a semiconductor layer
- Patent number 12,224,175
- Issue date Feb 11, 2025
- Infineon Technologies AG
- Olaf Fiedler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 12,217,959
- Issue date Feb 4, 2025
- Kokusai Electric Corporation
- Kimihiko Nakatani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High purity polysilocarb derived silicon carbide powder
- Patent number 12,215,031
- Issue date Feb 4, 2025
- Pallidus, Inc.
- Andrew R. Hopkins
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Hybrid channel semiconductor device and method
- Patent number 12,211,900
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Pei-Yu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three-dimensional semiconductor memory device
- Patent number 12,213,315
- Issue date Jan 28, 2025
- Samsung Electronics Co., Ltd.
- Byungjin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate-all-around transistor with strained channels
- Patent number 12,211,897
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-En Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanoscale thin film structure and implementing method thereof
- Patent number 12,205,986
- Issue date Jan 21, 2025
- KOREA ADVANCED NANO FAB CENTER
- Dong Hwan Jun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support with multiple embedded electrodes
- Patent number 12,198,966
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Philip Allan Kraus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing a composite structure comprising a thin layer...
- Patent number 12,198,983
- Issue date Jan 14, 2025
- Soitec
- Ionut Radu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon channel tempering
- Patent number 12,199,190
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Mao-Lin Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing oxide crystal thin film
- Patent number 12,195,844
- Issue date Jan 14, 2025
- FLOSFIA INC.
- Masaya Oda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 12,188,149
- Issue date Jan 7, 2025
- Sumitomo Electric Device Innovations, Inc.
- Kohei Miyashita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
SiC epitaxial wafer and method of manufacturing SiC epitaxial wafer...
- Patent number 12,188,152
- Issue date Jan 7, 2025
- Resonac Corporation
- Kensho Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming engineered wafers
- Patent number 12,191,192
- Issue date Jan 7, 2025
- Bing Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stacked structure including two-dimensional material and method of...
- Patent number 12,183,783
- Issue date Dec 31, 2024
- Samsung Electronics Co., Ltd.
- Alum Jung
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PROCESS FOR SYNTHESIS OF MONOLAYER TRANSITION METAL DICHALOCOGENIDE
- Publication number 20250105006
- Publication date Mar 27, 2025
- INDIAN INSTITUTE OF SCIENCE EDUCATION AND RESEARCH, PUNE (IISER PUNE)
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POLYCRYSTALLINE SILICON CARBIDE (SIC) SUBSTRATE WITH HIGH RESISTIVI...
- Publication number 20250105004
- Publication date Mar 27, 2025
- STMicroelectronics International N.V.
- C30 - CRYSTAL GROWTH
Information Patent Application
SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...
- Publication number 20250105007
- Publication date Mar 27, 2025
- Kokusai Electric Corporation
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHOWERHEAD FOR PROCESS TOOL
- Publication number 20250092521
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Anthony Dip
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN OXIDE NANORIBBON ACETONE GAS SENSOR, PREPARATION METHOD THEREOF...
- Publication number 20250095986
- Publication date Mar 20, 2025
- Yangtze Delta Region Institute (Huzhou), University of Electronic Science and...
- Weiwu CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PREPARING GALLIUM NITRIDE (GAN) SINGLE-CRYSTAL SUBSTRATE...
- Publication number 20250092572
- Publication date Mar 20, 2025
- Peking University
- Xinqiang WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF
- Publication number 20250098250
- Publication date Mar 20, 2025
- WINBOND ELECTRONICS CORP.
- Noriaki Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DEPOSITING EPITAXIAL MATERIAL, STRUCTURE FORMED USING THE...
- Publication number 20250084534
- Publication date Mar 13, 2025
- ASM IP HOLDING B.V.
- Amir Kajbafvala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20250089322
- Publication date Mar 13, 2025
- Kabushiki Kaisha Toshiba
- Mitsuhiro KUSHIBE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING SEMICONDUCTOR STRUCTURES, SEMICONDUCTOR PROCESSI...
- Publication number 20250079167
- Publication date Mar 6, 2025
- ASM IP HOLDING B.V.
- Ernesto Suarez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20250081629
- Publication date Mar 6, 2025
- Semiconductor Energy Laboratory Co., Ltd.
- Ryota HODO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING DEVICE
- Publication number 20250079171
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Tatsuya MIYAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DEPOSITING GERMANIUM FILMS BY ATOMIC LAYER DEPOSITION
- Publication number 20250059646
- Publication date Feb 20, 2025
- Micron Technology, Inc.
- Jean-Sebastien Materne Lehn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20250063771
- Publication date Feb 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Chieh Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR SUBSTRATE
- Publication number 20250062120
- Publication date Feb 20, 2025
- Kyocera Corporation
- Takehiro NISHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REDUCING STACKING FAULTS IN SILICON CARBIDE, AND STRUCTU...
- Publication number 20250051962
- Publication date Feb 13, 2025
- KWANSEI GAKUIN EDUCATIONAL FOUNDATION
- Tadaaki KANEKO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SURFACE-WATER-ASSISTED DEPOSITION OF PATTERNED FILMS OF ALIGNED NAN...
- Publication number 20250054755
- Publication date Feb 13, 2025
- Wisconsin Alumni Research Foundation
- Michael Scott Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED EPITAXY AND PRECLEAN SYSTEM
- Publication number 20250046596
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REFLECTORS, SEMICONDUCTOR PROCESSING SYSTEMS HAVING REFLECTORS, AND...
- Publication number 20250034714
- Publication date Jan 30, 2025
- ASM IP HOLDING B.V.
- Wentao Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LIFT FRAMES FOR CENTRAL HEATING, AND RELATED PROCESSING CHAMBERS AN...
- Publication number 20250038040
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Ala MORADIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD, SYSTEM AND APPARATUS FOR FORMING METAL OXIDE LAYERS
- Publication number 20250034701
- Publication date Jan 30, 2025
- ASM IP HOLDING B.V.
- Bo Yin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR CHEMICAL PRECURSOR WITH GAS PASSAGES
- Publication number 20250027199
- Publication date Jan 23, 2025
- Applied Materials, Inc.
- David Marquardt
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...
- Publication number 20250022708
- Publication date Jan 16, 2025
- Kokusai Electric Corporation
- Takuya JODA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TRANSISTORS WITH IMPROVED THERMAL STABILITY
- Publication number 20250022934
- Publication date Jan 16, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- Kuo-Chang Chiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOVEL BUFFER LAYER STRUCTURE TO IMPROVE GAN SEMICONDUCTORS
- Publication number 20250015143
- Publication date Jan 9, 2025
- GLOBALWAFERS CO., LTD.
- Jia-Zhe Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE WITH ß-GALLIUM OXIDE FILM AND PRODUCTION METHOD THEREFOR
- Publication number 20250015144
- Publication date Jan 9, 2025
- NATIONAL UNIVERSITY CORPORATION TOKAI NATIONAL HIGHER EDUCATION AND RESEARCH...
- Masaru HORI
- C30 - CRYSTAL GROWTH
Information Patent Application
Interfacial Layer for Anneal Capping Layer
- Publication number 20250006507
- Publication date Jan 2, 2025
- Applied Materials, Inc.
- Yi ZHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSISTORS WITH ANTIMONY AND PHOSPHORUS DOPED EPITAXIAL SOURCE/DRA...
- Publication number 20250006790
- Publication date Jan 2, 2025
- Intel Corporation
- Anand Murthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING APPARATUS AND FILM FORMING METHOD, AND OXIDE SEMICONDU...
- Publication number 20240425982
- Publication date Dec 26, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takahiro SAKATSUME
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE BOTTOM SEED LAYER FORMATION FOR BOTTOM-UP EPITAXY
- Publication number 20240429313
- Publication date Dec 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Cheng Shiau
- H01 - BASIC ELECTRIC ELEMENTS

Reduction or decomposition of gaseous compounds

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Manufacturing method of RF components

Method of manufacturing a FinFET with merged epitaxial source/drain...

Methods and systems for real-time quality control of a film in a sp...

Method for producing non-contiguous metal oxide semiconductors, of...

Hydrogen recycle system and hydrogen recycle method

Integrated circuit device

Method of forming p-type nitride semiconductor layer

Methods and material deposition systems for forming semiconductor l...

Dynamic laser-assisted etching

Gas curtain for semiconductor manufacturing system

Structure of a fin field effect transistor (FinFET) comprising epit...

Organoaminosilane precursors and methods for depositing films compr...

Word line structure of three-dimensional memory device

Method of manufacturing a beta-Ga2O3-based single crystal film by f...

Contact architecture for capacitance reduction and satisfactory con...

Apparatus and method of forming a semiconductor layer

Method of manufacturing semiconductor device, substrate processing...

High purity polysilocarb derived silicon carbide powder

Hybrid channel semiconductor device and method

Three-dimensional semiconductor memory device

Gate-all-around transistor with strained channels

Nanoscale thin film structure and implementing method thereof

Substrate support with multiple embedded electrodes

Method for producing a composite structure comprising a thin layer...

Silicon channel tempering

Method of manufacturing oxide crystal thin film

Method of manufacturing semiconductor device

SiC epitaxial wafer and method of manufacturing SiC epitaxial wafer...

Method of forming engineered wafers

Stacked structure including two-dimensional material and method of...

Patents Applicationslast 30 patents

PROCESS FOR SYNTHESIS OF MONOLAYER TRANSITION METAL DICHALOCOGENIDE

POLYCRYSTALLINE SILICON CARBIDE (SIC) SUBSTRATE WITH HIGH RESISTIVI...

SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...

SHOWERHEAD FOR PROCESS TOOL

TIN OXIDE NANORIBBON ACETONE GAS SENSOR, PREPARATION METHOD THEREOF...

METHOD FOR PREPARING GALLIUM NITRIDE (GAN) SINGLE-CRYSTAL SUBSTRATE...

SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF

METHOD OF DEPOSITING EPITAXIAL MATERIAL, STRUCTURE FORMED USING THE...

WAFER AND METHOD FOR MANUFACTURING THE SAME

METHODS OF FORMING SEMICONDUCTOR STRUCTURES, SEMICONDUCTOR PROCESSI...

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING DEVICE

METHODS FOR DEPOSITING GERMANIUM FILMS BY ATOMIC LAYER DEPOSITION

METHOD OF FABRICATING SEMICONDUCTOR DEVICE

SEMICONDUCTOR SUBSTRATE

METHOD FOR REDUCING STACKING FAULTS IN SILICON CARBIDE, AND STRUCTU...

SURFACE-WATER-ASSISTED DEPOSITION OF PATTERNED FILMS OF ALIGNED NAN...

INTEGRATED EPITAXY AND PRECLEAN SYSTEM

REFLECTORS, SEMICONDUCTOR PROCESSING SYSTEMS HAVING REFLECTORS, AND...

LIFT FRAMES FOR CENTRAL HEATING, AND RELATED PROCESSING CHAMBERS AN...

METHOD, SYSTEM AND APPARATUS FOR FORMING METAL OXIDE LAYERS

SEMICONDUCTOR CHEMICAL PRECURSOR WITH GAS PASSAGES

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...

TRANSISTORS WITH IMPROVED THERMAL STABILITY

NOVEL BUFFER LAYER STRUCTURE TO IMPROVE GAN SEMICONDUCTORS

SUBSTRATE WITH ß-GALLIUM OXIDE FILM AND PRODUCTION METHOD THEREFOR

Interfacial Layer for Anneal Capping Layer

TRANSISTORS WITH ANTIMONY AND PHOSPHORUS DOPED EPITAXIAL SOURCE/DRA...

FILM FORMING APPARATUS AND FILM FORMING METHOD, AND OXIDE SEMICONDU...

SELECTIVE BOTTOM SEED LAYER FORMATION FOR BOTTOM-UP EPITAXY