Reduction or decomposition of gaseous compounds

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CPC
H01L21/0262

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/0262Reduction or decomposition of gaseous compounds

Industries

Patents Grantslast 30 patents

Information Patent Grant
Template-assisted synthesis of 2D nanosheets using nanoparticle tem...
- Patent number 11,964,879
- Issue date Apr 23, 2024
- Nanoco 2D Materials Limited
- Steven Daniels
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Cluster tools, systems, and methods having one or more pressure sta...
- Patent number 11,965,241
- Issue date Apr 23, 2024
- Applied Materials, Inc.
- Saurabh Chopra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate structures in transistor devices and methods of forming same
- Patent number 11,967,504
- Issue date Apr 23, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsin-Yi Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing GaN layered substrate
- Patent number 11,967,530
- Issue date Apr 23, 2024
- Shin-Etsu Chemical Co., Ltd.
- Sumio Sekiyama
- B32 - LAYERED PRODUCTS
Information Patent Grant
Method for manufacturing a semiconductor substrate and device by bo...
- Patent number 11,961,765
- Issue date Apr 16, 2024
- Mitsubishi Electric Corporation
- Shuichi Hiza
- C30 - CRYSTAL GROWTH
Information Patent Grant
SiC epitaxial wafer, production method therefor, and defect identif...
- Patent number 11,961,736
- Issue date Apr 16, 2024
- Resonac Corporation
- Ling Guo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor structure and manufacturing method
- Patent number 11,961,737
- Issue date Apr 16, 2024
- Semiconductor Manufacturing International (Shanghai) Corporation
- Zhenyu Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor apparatuses and methods involving diamond and GaN-bas...
- Patent number 11,961,837
- Issue date Apr 16, 2024
- The Board of Trustees of the Leland Stanford Junior University
- Srabanti Chowdhury
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitride semiconductor with multiple nitride regions of different im...
- Patent number 11,955,520
- Issue date Apr 9, 2024
- Kabushiki Kaisha Toshiba
- Toshiki Hikosaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vapor phase epitaxy method
- Patent number 11,955,334
- Issue date Apr 9, 2024
- Azur Space Solar Power GmbH
- Gregor Keller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Laminate of aluminum nitride single-crystal substrate
- Patent number 11,952,677
- Issue date Apr 9, 2024
- Tokuyama Corporation
- Masao Ariyuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer deposition of III-V compounds to form V-NAND devices
- Patent number 11,956,977
- Issue date Apr 9, 2024
- ASM IP Holding B.V.
- Tom E. Blomberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturable large area gallium and nitrogen containin...
- Patent number 11,949,212
- Issue date Apr 2, 2024
- KYOCERA SLD Laser, Inc.
- Melvin McLaurin
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method for preparating SiC ohmic contact with low specific contact...
- Patent number 11,948,983
- Issue date Apr 2, 2024
- Xidian University
- Yanfei Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing single-crystal semiconductor layer, struct...
- Patent number 11,948,795
- Issue date Apr 2, 2024
- IUCF-HYU (Industry-University Cooperation Foundation Hanyang University)
- Myung Mo Sung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective methods for fabricating devices and structures
- Patent number 11,948,796
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Yi-Chiau Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High thermal conductivity boron arsenide for thermal management, el...
- Patent number 11,948,858
- Issue date Apr 2, 2024
- The Regents of the University of California
- Yongjie Hu
- C30 - CRYSTAL GROWTH
Information Patent Grant
Gate-all-around field-effect transistor device
- Patent number 11,948,973
- Issue date Apr 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuo-Cheng Chiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit device
- Patent number 11,948,942
- Issue date Apr 2, 2024
- Samsung Electronics Co., Ltd.
- Minhee Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for growing a semiconductor wafer and associated manufact...
- Patent number 11,946,158
- Issue date Apr 2, 2024
- STMicroelectronics S.r.l.
- Ruggero Anzalone
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing device
- Patent number 11,946,136
- Issue date Apr 2, 2024
- ASM IP Holding B.V.
- Jereld Lee Winkler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Epitaxial layers with discontinued aluminium content for III-nitrid...
- Patent number 11,942,521
- Issue date Mar 26, 2024
- INNOSCIENCE (SUZHOU) SEMICONDUCTOR CO., LTD.
- Peng-Yi Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor film
- Patent number 11,942,520
- Issue date Mar 26, 2024
- NGK Insulators, Ltd.
- Morimichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing nitride semiconductor device
- Patent number 11,935,744
- Issue date Mar 19, 2024
- Sumitomo Electric Industries, Ltd.
- Isao Makabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Room temperature method for the production of electrotechnical thin...
- Patent number 11,935,976
- Issue date Mar 19, 2024
- DYNAMIC SOLAR SYSTEMS AG
- Patrick Linder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
TMD inverted nanowire integration
- Patent number 11,935,956
- Issue date Mar 19, 2024
- Intel Corporation
- Kevin P. O'Brien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal-insensitive epitaxy formation
- Patent number 11,935,951
- Issue date Mar 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor epitaxial wafer and method of producing semiconductor...
- Patent number 11,935,745
- Issue date Mar 19, 2024
- Sumco Corporation
- Ryosuke Okuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Group-III nitride devices and systems on IBAD-textured substrates
- Patent number RE49869
- Issue date Mar 12, 2024
- iBeam Materials, Inc.
- Vladimir Matias
Information Patent Grant
Methods for conditioning a processing reactor
- Patent number 11,926,892
- Issue date Mar 12, 2024
- GlobalWafers Co., Ltd.
- Gang Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
OXIDE SEMICONDUCTOR FILM AND FILM-FORMING METHOD THE SAME, SEMICOND...
- Publication number 20240136179
- Publication date Apr 25, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takahiro SAKATSUME
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TRANSISTOR AND MANUFACTURING METHOD THEREOF
- Publication number 20240138247
- Publication date Apr 25, 2024
- HUIZHOU CHINA STAR OPTOELECTRONICS DISPLAY CO., LTD.
- Lixuan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Diamond-Capped Gallium Oxide Transistor
- Publication number 20240136180
- Publication date Apr 25, 2024
- The Government of the United States of America, as represented by the Secreta...
- Marko J. Tadjer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOUND SEMICONDUCTOR LAYERED STRUCTURE AND PROCESS FOR PREPARING...
- Publication number 20240128080
- Publication date Apr 18, 2024
- Umicore
- Markus LEITGEB
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PRODUCING RAW MATERIAL SOLUTION, METHOD OF FILM-FORMING A...
- Publication number 20240124974
- Publication date Apr 18, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takenori WATABE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Particle Reduction in Physical Vapor Deposition of Amorphous Silicon
- Publication number 20240128075
- Publication date Apr 18, 2024
- Peijiao FANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SETUP METHOD FOR ADJUSTING THE TEMPERATURE CONDITIONS OF AN EPITAXY...
- Publication number 20240120240
- Publication date Apr 11, 2024
- SOITEC
- YoungPil Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS FOR MANUFACTURING SEMICONDUCTOR WAFERS CONTAINING A GAS-PHA...
- Publication number 20240117523
- Publication date Apr 11, 2024
- Siltronic AG
- Thomas Stettner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20240120403
- Publication date Apr 11, 2024
- Samsung Electronics Co., Ltd.
- Jeeeun YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADDITIVE PROCESS FOR CIRCULAR PRINTING
- Publication number 20240109247
- Publication date Apr 4, 2024
- TEXAS INSTRUMENTS INCORPORATED
- Daniel Lee Revier
- B22 - CASTING POWDER METALLURGY
Information Patent Application
NITRIDE SEMICONDUCTOR EPITAXIAL SUBSTRATE, METHOD FOR PRODUCING SAM...
- Publication number 20240112909
- Publication date Apr 4, 2024
- Panasonic Intellectual Property Management Co., Ltd.
- Hisayoshi MATSUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNOLOGIES FOR TRANSISTORS WITH A THIN-FILM FERROELECTRIC
- Publication number 20240113220
- Publication date Apr 4, 2024
- Intel Corporation
- Arnab Sen Gupta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSISTORS WITH CHANNELS FORMED OF LOW-DIMENSIONAL MATERIALS AND M...
- Publication number 20240105515
- Publication date Mar 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chao-Ching Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONDUCTIVE C-PLANE GaN SUBSTRATE
- Publication number 20240105449
- Publication date Mar 28, 2024
- MITSUBISHI CHEMICAL CORPORATION
- Yutaka MIKAWA
- C30 - CRYSTAL GROWTH
Information Patent Application
GROUP III-V SEMICONDUCTOR DEVICE AND METHOD OF FABRICATION OF SAME...
- Publication number 20240105450
- Publication date Mar 28, 2024
- TEXAS INSTRUMENTS INCORPORATED
- Yoganand Saripalli
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR STRUCTURE AND METHOD OF FORMING THE SAME
- Publication number 20240096979
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wang-Chun HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NITRIDE SEMICONDUCTOR WITH MULTIPLE NITRIDE REGIONS OF DIFFERENT IM...
- Publication number 20240096969
- Publication date Mar 21, 2024
- Kabushiki Kaisha Toshiba
- Toshiki HIKOSAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, PROCESSING METHOD, AND NON-TRANSITO...
- Publication number 20240096615
- Publication date Mar 21, 2024
- Kokusai Electric Corporation
- Akinori TANAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF SELECTIVELY FORMING PHOSPHOROUS-DOPED EPITAXIAL MATERIAL...
- Publication number 20240096619
- Publication date Mar 21, 2024
- ASM IP HOLDING, B.V.
- Brendan Timothy Padraig Marozas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING A STRAINED STRUCTURE AND STRUCTURE FORMED
- Publication number 20240097034
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsung-Lin LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING K-PHASE GALLIUM OXIDE MATERIALS
- Publication number 20240096618
- Publication date Mar 21, 2024
- Northwestern University
- Manijeh Razeghi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A SI-COMPRISING EPITAXIAL LAYER SELECTIVELY ON A...
- Publication number 20240087888
- Publication date Mar 14, 2024
- ASM IP HOLDING, B.V.
- Rami Khazaka
- C30 - CRYSTAL GROWTH
Information Patent Application
FILM FORMING APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR...
- Publication number 20240084456
- Publication date Mar 14, 2024
- KIOXIA Corporation
- Kazuhiro KATONO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EPITAXIAL FIN STRUCTURES OF FINFET HAVING AN EPITAXIAL BUFFER REGIO...
- Publication number 20240088266
- Publication date Mar 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsueh-Chang Sung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ROUGH BUFFER LAYER FOR GROUP III-V DEVICES ON SILICON
- Publication number 20240088285
- Publication date Mar 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuei-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NITRIDE SEMICONDUCTOR SUBSTRATE AND MANUFACTURING METHOD THEREFOR
- Publication number 20240079412
- Publication date Mar 7, 2024
- Shin-Etsu Handotai Co., Ltd.
- Ippei KUBONO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING SEMICONDUCTOR...
- Publication number 20240079232
- Publication date Mar 7, 2024
- ENKRIS SEMICONDUCTOR, INC.
- Liyang ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR DEPOSITING SILICON ONTO SUBSTRATES
- Publication number 20240079231
- Publication date Mar 7, 2024
- ASM IP HOLDING B.V.
- John Tolle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTURE
- Publication number 20240079486
- Publication date Mar 7, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Wei-Ting CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD, ASSEMBLY AND SYSTEM FOR GAS INJECTION AND CONTROL
- Publication number 20240071804
- Publication date Feb 29, 2024
- ASM IP HOLDING B.V.
- Peipei Gao
- H01 - BASIC ELECTRIC ELEMENTS

Reduction or decomposition of gaseous compounds

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Template-assisted synthesis of 2D nanosheets using nanoparticle tem...

Cluster tools, systems, and methods having one or more pressure sta...

Gate structures in transistor devices and methods of forming same

Method for producing GaN layered substrate

Method for manufacturing a semiconductor substrate and device by bo...

SiC epitaxial wafer, production method therefor, and defect identif...

Semiconductor structure and manufacturing method

Semiconductor apparatuses and methods involving diamond and GaN-bas...

Nitride semiconductor with multiple nitride regions of different im...

Vapor phase epitaxy method

Laminate of aluminum nitride single-crystal substrate

Atomic layer deposition of III-V compounds to form V-NAND devices

Method for manufacturable large area gallium and nitrogen containin...

Method for preparating SiC ohmic contact with low specific contact...

Method for manufacturing single-crystal semiconductor layer, struct...

Selective methods for fabricating devices and structures

High thermal conductivity boron arsenide for thermal management, el...

Gate-all-around field-effect transistor device

Integrated circuit device

Apparatus for growing a semiconductor wafer and associated manufact...

Semiconductor processing device

Epitaxial layers with discontinued aluminium content for III-nitrid...

Semiconductor film

Method for manufacturing nitride semiconductor device

Room temperature method for the production of electrotechnical thin...

TMD inverted nanowire integration

Metal-insensitive epitaxy formation

Semiconductor epitaxial wafer and method of producing semiconductor...

Group-III nitride devices and systems on IBAD-textured substrates

Methods for conditioning a processing reactor

Patents Applicationslast 30 patents

OXIDE SEMICONDUCTOR FILM AND FILM-FORMING METHOD THE SAME, SEMICOND...

TRANSISTOR AND MANUFACTURING METHOD THEREOF

Diamond-Capped Gallium Oxide Transistor

COMPOUND SEMICONDUCTOR LAYERED STRUCTURE AND PROCESS FOR PREPARING...

METHOD OF PRODUCING RAW MATERIAL SOLUTION, METHOD OF FILM-FORMING A...

Particle Reduction in Physical Vapor Deposition of Amorphous Silicon

SETUP METHOD FOR ADJUSTING THE TEMPERATURE CONDITIONS OF AN EPITAXY...

PROCESS FOR MANUFACTURING SEMICONDUCTOR WAFERS CONTAINING A GAS-PHA...

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

ADDITIVE PROCESS FOR CIRCULAR PRINTING

NITRIDE SEMICONDUCTOR EPITAXIAL SUBSTRATE, METHOD FOR PRODUCING SAM...

TECHNOLOGIES FOR TRANSISTORS WITH A THIN-FILM FERROELECTRIC

TRANSISTORS WITH CHANNELS FORMED OF LOW-DIMENSIONAL MATERIALS AND M...

CONDUCTIVE C-PLANE GaN SUBSTRATE

GROUP III-V SEMICONDUCTOR DEVICE AND METHOD OF FABRICATION OF SAME...

SEMICONDUCTOR STRUCTURE AND METHOD OF FORMING THE SAME

NITRIDE SEMICONDUCTOR WITH MULTIPLE NITRIDE REGIONS OF DIFFERENT IM...

SUBSTRATE PROCESSING APPARATUS, PROCESSING METHOD, AND NON-TRANSITO...

METHOD OF SELECTIVELY FORMING PHOSPHOROUS-DOPED EPITAXIAL MATERIAL...

METHOD FOR FABRICATING A STRAINED STRUCTURE AND STRUCTURE FORMED

METHODS FOR FORMING K-PHASE GALLIUM OXIDE MATERIALS

METHOD OF FORMING A SI-COMPRISING EPITAXIAL LAYER SELECTIVELY ON A...

FILM FORMING APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR...

EPITAXIAL FIN STRUCTURES OF FINFET HAVING AN EPITAXIAL BUFFER REGIO...

ROUGH BUFFER LAYER FOR GROUP III-V DEVICES ON SILICON

NITRIDE SEMICONDUCTOR SUBSTRATE AND MANUFACTURING METHOD THEREFOR

SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING SEMICONDUCTOR...

METHOD AND DEVICE FOR DEPOSITING SILICON ONTO SUBSTRATES

SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTURE

METHOD, ASSEMBLY AND SYSTEM FOR GAS INJECTION AND CONTROL