Reflection masks Preparation thereof

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CPC
G03F1/24

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/24Reflection masks Preparation thereof

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method of critical dimension control by oxygen and nitrogen plasma...
- Patent number 12,339,579
- Issue date Jun 24, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV lithography and substrate equipped wi...
- Patent number 12,339,580
- Issue date Jun 24, 2025
- AGC Inc.
- Yusuke Ono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Target supply system, extreme ultraviolet light generation apparatu...
- Patent number 12,332,575
- Issue date Jun 17, 2025
- Gigaphoton Inc.
- Fumio Iwamoto
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Device and method for determining placements of pattern elements of...
- Patent number 12,321,091
- Issue date Jun 3, 2025
- Carl Zeiss SMT GmbH
- Carola Blaesing-Bangert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, and method for manufacturin...
- Patent number 12,313,968
- Issue date May 27, 2025
- Hoya Corporation
- Masanori Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 12,306,530
- Issue date May 20, 2025
- AGC Inc.
- Takuma Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV lithography, reflective mask for EUV...
- Patent number 12,298,660
- Issue date May 13, 2025
- AGC Inc.
- Hirotomo Kawahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle demounting method, and pellicle demounting device
- Patent number 12,271,109
- Issue date Apr 8, 2025
- Mitsui Chemicals, Inc.
- Akira Ishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for an EUV lithography mask and a method of manufacturing...
- Patent number 12,265,323
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Ang Chao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, and method for manufacturing reflective mask
- Patent number 12,265,321
- Issue date Apr 1, 2025
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV mask blank and method of making EUV mask blank
- Patent number 12,265,322
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ping-Hsun Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing extreme ultraviolet (EUV) photomask and met...
- Patent number 12,259,647
- Issue date Mar 25, 2025
- Samsung Electronics Co., Ltd.
- Jongkeun Oh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask and method for forming the same
- Patent number 12,253,796
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV lithography and substrate with conduc...
- Patent number 12,235,575
- Issue date Feb 25, 2025
- AGC Inc.
- Yusuke Ono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV photomask and manufacturing method of the same
- Patent number 12,235,573
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Feng Yuan Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 12,235,574
- Issue date Feb 25, 2025
- AGC Inc.
- Yuya Nagata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask and method for manufacturing...
- Patent number 12,228,852
- Issue date Feb 18, 2025
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, and manufacturing method
- Patent number 12,228,853
- Issue date Feb 18, 2025
- AGC Inc.
- Takeshi Okato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask and method of manufacturing the same
- Patent number 12,222,639
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 12,222,640
- Issue date Feb 11, 2025
- AGC Inc.
- Shunya Taki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV lithography, mask blank for EUV litho...
- Patent number 12,216,397
- Issue date Feb 4, 2025
- AGC Inc.
- Daijiro Akagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 12,216,398
- Issue date Feb 4, 2025
- AGC Inc.
- Hiroyoshi Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electroconductive-film-coated substrate and reflective mask blank
- Patent number 12,210,279
- Issue date Jan 28, 2025
- AGC Inc.
- Sotaro Nakamura
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
EUV photo masks and manufacturing method thereof
- Patent number 12,210,280
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 12,204,240
- Issue date Jan 21, 2025
- AGC Inc.
- Daijiro Akagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning device and method of use thereof
- Patent number 12,197,120
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Marie-Claire Van Lare
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and reticle protection with atomic layer deposition (ALD)
- Patent number 12,197,125
- Issue date Jan 14, 2025
- Nano-Master, Inc.
- Birol Kuyel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 12,181,790
- Issue date Dec 31, 2024
- Shin-Etsu Chemical Co., Ltd.
- Shohei Mimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask and method of manufacturing the same
- Patent number 12,181,791
- Issue date Dec 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflection mode photomask
- Patent number 12,176,211
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Lang Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK
- Publication number 20250199393
- Publication date Jun 19, 2025
- TEKSCEND PHOTOMASK CORP.
- Yuto YAMAGATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...
- Publication number 20250189882
- Publication date Jun 12, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tzu-Ang CHAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20250172864
- Publication date May 29, 2025
- AGC Inc.
- Takeshi OKATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND MANUFACTURING METHOD THEREOF
- Publication number 20250172862
- Publication date May 29, 2025
- Shin-Etsu Chemical Co., Ltd.
- Taiga OGOSE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20250172863
- Publication date May 29, 2025
- AGC Inc.
- Takeshi OKATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV PHOTOMASK AND MANUFACTURING METHOD OF THE SAME
- Publication number 20250164870
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- FENG YUAN HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND REPAIR METHOD THE...
- Publication number 20250155790
- Publication date May 15, 2025
- Samsung Electronics Co., Ltd.
- Jimin LIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, METHOD FOR MANUFACTURING...
- Publication number 20250155793
- Publication date May 15, 2025
- AGC Inc.
- Ryosuke SEI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20250155792
- Publication date May 15, 2025
- AGC Inc.
- YUYA NAGATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Extreme Ultraviolet Lithography Mask
- Publication number 20250155791
- Publication date May 15, 2025
- IMEC vzw
- Nick Pellens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE WITH CONDUC...
- Publication number 20250147406
- Publication date May 8, 2025
- AGC Inc.
- Yusuke Ono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME
- Publication number 20250147405
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTION-TYPE MASK BLANK, METHOD FOR PRODUCING REFLECTION-TYPE MA...
- Publication number 20250147407
- Publication date May 8, 2025
- AGC Inc.
- Hiroaki ITO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE PHOTOMASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE...
- Publication number 20250138411
- Publication date May 1, 2025
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
PELLICLE ASSEMBLY MOUNTING FOR LITHOGRAPHY MASK
- Publication number 20250138409
- Publication date May 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Kun-Lung HSIEH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE PHOTOMASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE...
- Publication number 20250138410
- Publication date May 1, 2025
- Shin-Etsu Chemical Co., Ltd.
- Taiga OGOSE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF REPAIRING EXTREME ULTRAVIOLET PHOTOMASKS
- Publication number 20250130490
- Publication date Apr 24, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ying-Hui HSIEH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY WITH ABSORB...
- Publication number 20250123551
- Publication date Apr 17, 2025
- S&S TECH Co., Ltd.
- Chul-Kyu YANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY MASK HAVING HIGH EXTINCTION COEFFICIENT ABSORBER AND RE...
- Publication number 20250123552
- Publication date Apr 17, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Pei-Cheng HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTROCONDUCTIVE-FILM-COATED SUBSTRATE AND REFLECTIVE MASK BLANK
- Publication number 20250116920
- Publication date Apr 10, 2025
- AGC Inc.
- Sotaro NAKAMURA
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK
- Publication number 20250102898
- Publication date Mar 27, 2025
- Shin-Etsu Chemical Co., Ltd.
- Keisuke SAKURAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV LITHOGRAPHY MASKS AND METHODS
- Publication number 20250093762
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Lee-Feng CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK
- Publication number 20250093764
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung SHIH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY...
- Publication number 20250093763
- Publication date Mar 20, 2025
- Samsung Electronics Co., Ltd.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Extreme Ultraviolet (EUV) Mask and Method of Fabrication Thereof
- Publication number 20250085622
- Publication date Mar 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Lang CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE EQUIPPED WI...
- Publication number 20250076748
- Publication date Mar 6, 2025
- AGC Inc.
- Yusuke ONO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK ASSEMBLY AND SEMICONDUCTOR CHIP MANUFACTURED USING THE SAME
- Publication number 20250068050
- Publication date Feb 27, 2025
- Samsung Electronics Co., Ltd.
- Munja Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask and Reticle Protection with Atomic Layer Deposition (ALD)
- Publication number 20250068054
- Publication date Feb 27, 2025
- Nano-Master, Inc.
- Birol Kuyel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK
- Publication number 20250060658
- Publication date Feb 20, 2025
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK
- Publication number 20250060659
- Publication date Feb 20, 2025
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Reflection masks Preparation thereof

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method of critical dimension control by oxygen and nitrogen plasma...

Reflective mask blank for EUV lithography and substrate equipped wi...

Target supply system, extreme ultraviolet light generation apparatu...

Device and method for determining placements of pattern elements of...

Reflective mask blank, reflective mask, and method for manufacturin...

Reflective mask blank, reflective mask, method of manufacturing ref...

Reflective mask blank for EUV lithography, reflective mask for EUV...

Pellicle demounting method, and pellicle demounting device

Pellicle for an EUV lithography mask and a method of manufacturing...

Reflective mask blank, and method for manufacturing reflective mask

EUV mask blank and method of making EUV mask blank

Method of manufacturing extreme ultraviolet (EUV) photomask and met...

Extreme ultraviolet mask and method for forming the same

Reflective mask blank for EUV lithography and substrate with conduc...

EUV photomask and manufacturing method of the same

Reflective mask blank, reflective mask, method of manufacturing ref...

Reflective mask blank, reflective mask and method for manufacturing...

Reflective mask blank, reflective mask, and manufacturing method

Extreme ultraviolet mask and method of manufacturing the same

Reflective mask blank, reflective mask, method of manufacturing ref...

Reflective mask blank for EUV lithography, mask blank for EUV litho...

Reflective mask blank and reflective mask

Electroconductive-film-coated substrate and reflective mask blank

EUV photo masks and manufacturing method thereof

Reflective mask blank, reflective mask, method of manufacturing ref...

Patterning device and method of use thereof

Mask and reticle protection with atomic layer deposition (ALD)

Reflective mask blank and reflective mask

Extreme ultraviolet mask and method of manufacturing the same

Reflection mode photomask

Patents Applicationslast 30 patents

REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK

PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

REFLECTIVE MASK BLANK AND MANUFACTURING METHOD THEREOF

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

EUV PHOTOMASK AND MANUFACTURING METHOD OF THE SAME

PHOTOMASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND REPAIR METHOD THE...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, METHOD FOR MANUFACTURING...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

Extreme Ultraviolet Lithography Mask

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE WITH CONDUC...

EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME

REFLECTION-TYPE MASK BLANK, METHOD FOR PRODUCING REFLECTION-TYPE MA...

REFLECTIVE PHOTOMASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE...

PELLICLE ASSEMBLY MOUNTING FOR LITHOGRAPHY MASK

REFLECTIVE PHOTOMASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE...

METHODS OF REPAIRING EXTREME ULTRAVIOLET PHOTOMASKS

PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY WITH ABSORB...

LITHOGRAPHY MASK HAVING HIGH EXTINCTION COEFFICIENT ABSORBER AND RE...

ELECTROCONDUCTIVE-FILM-COATED SUBSTRATE AND REFLECTIVE MASK BLANK

REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK

EUV LITHOGRAPHY MASKS AND METHODS

EXTREME ULTRAVIOLET MASK

PHOTOMASK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY...

Extreme Ultraviolet (EUV) Mask and Method of Fabrication Thereof

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE EQUIPPED WI...

PHOTOMASK ASSEMBLY AND SEMICONDUCTOR CHIP MANUFACTURED USING THE SAME

Mask and Reticle Protection with Atomic Layer Deposition (ALD)

REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK

REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK