Reflection masks Preparation thereof

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CPC
G03F1/24

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/24Reflection masks Preparation thereof

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Reflective mask blank, reflective mask and method for manufacturing...
- Patent number 12,228,852
- Issue date Feb 18, 2025
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, and manufacturing method
- Patent number 12,228,853
- Issue date Feb 18, 2025
- AGC Inc.
- Takeshi Okato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask and method of manufacturing the same
- Patent number 12,222,639
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 12,222,640
- Issue date Feb 11, 2025
- AGC Inc.
- Shunya Taki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV lithography, mask blank for EUV litho...
- Patent number 12,216,397
- Issue date Feb 4, 2025
- AGC Inc.
- Daijiro Akagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 12,216,398
- Issue date Feb 4, 2025
- AGC Inc.
- Hiroyoshi Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electroconductive-film-coated substrate and reflective mask blank
- Patent number 12,210,279
- Issue date Jan 28, 2025
- AGC Inc.
- Sotaro Nakamura
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
EUV photo masks and manufacturing method thereof
- Patent number 12,210,280
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 12,204,240
- Issue date Jan 21, 2025
- AGC Inc.
- Daijiro Akagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning device and method of use thereof
- Patent number 12,197,120
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Marie-Claire Van Lare
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and reticle protection with atomic layer deposition (ALD)
- Patent number 12,197,125
- Issue date Jan 14, 2025
- Nano-Master, Inc.
- Birol Kuyel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 12,181,790
- Issue date Dec 31, 2024
- Shin-Etsu Chemical Co., Ltd.
- Shohei Mimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask and method of manufacturing the same
- Patent number 12,181,791
- Issue date Dec 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflection mode photomask
- Patent number 12,176,211
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Lang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet light reflective structure including nano-latti...
- Patent number 12,164,221
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Benny Ku
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask with tantalum base alloy absorber
- Patent number 12,153,337
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV photo masks and manufacturing method thereof
- Patent number 12,147,154
- Issue date Nov 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask repairing method and system thereof
- Patent number 12,140,858
- Issue date Nov 12, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Hao-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 12,135,496
- Issue date Nov 5, 2024
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask with reduced wafer neighboring effect
- Patent number 12,130,548
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wen-Chang Hsueh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate with film for reflective mask blank, reflective mask blan...
- Patent number 12,124,162
- Issue date Oct 22, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask defect prevention
- Patent number 12,124,163
- Issue date Oct 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Ta Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 12,124,164
- Issue date Oct 22, 2024
- AGC Inc.
- Daijiro Akagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask and manufacturing method the...
- Patent number 12,111,566
- Issue date Oct 8, 2024
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective photomask blank and reflective photomask
- Patent number 12,111,565
- Issue date Oct 8, 2024
- TOPPAN INC.
- Ayumi Goda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with multilayer reflective film, reflective mask blank, r...
- Patent number 12,105,411
- Issue date Oct 1, 2024
- Hoya Corporation
- Kota Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 12,105,412
- Issue date Oct 1, 2024
- AGC Inc.
- Daijiro Akagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 12,105,413
- Issue date Oct 1, 2024
- Hoya Corporation
- Yohei Ikebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for forming extreme ultraviolet mask comprising magnetic ma...
- Patent number 12,092,952
- Issue date Sep 17, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kevin Tanady
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device manufacturing method and extreme ultraviolet m...
- Patent number 12,092,961
- Issue date Sep 17, 2024
- Samsung Electronics Co., Ltd.
- Sang Chul Yeo
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK
- Publication number 20250060658
- Publication date Feb 20, 2025
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK
- Publication number 20250060659
- Publication date Feb 20, 2025
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LIGHT REFLECTIVE STRUCTURE INCLUDING NANO-LATTI...
- Publication number 20250053076
- Publication date Feb 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Benny KU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PUPIL FILTER WITH SPATIALLY-VARYING TRANSMISSION
- Publication number 20250044679
- Publication date Feb 6, 2025
- KLA Corporation
- Alexander Pokrovskiy
- G01 - MEASURING TESTING
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK BLANK MANUFACTURING METHOD,...
- Publication number 20250036020
- Publication date Jan 30, 2025
- AGC Inc.
- Wataru NISHIDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV RETICLE WITH EMBEDDED PROCESS ASSISTANCE LAYER AND METHOD OF MA...
- Publication number 20250036019
- Publication date Jan 30, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sheng-Min WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE MEMBRANE
- Publication number 20250004362
- Publication date Jan 2, 2025
- ASML NETHERLANDS B.V.
- Franciscus Theodorus AGRICOLA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20250004360
- Publication date Jan 2, 2025
- AGC Inc.
- Daijiro AKAGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND MANUFACTURING METHOD TH...
- Publication number 20240427226
- Publication date Dec 26, 2024
- AGC Inc.
- Takeshi Okato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240427227
- Publication date Dec 26, 2024
- AGC Inc.
- Daijiro AKAGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND MANUFACTURING METHOD TH...
- Publication number 20240419063
- Publication date Dec 19, 2024
- AGC Inc.
- Takeshi OKATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTILAYER REFLECTIVE FILM-ATTACHED SUBSTRATE, REFLECTIVE MASK BLAN...
- Publication number 20240411220
- Publication date Dec 12, 2024
- HOYA CORPORATION
- Masanori NAKAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE PHOTOMASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE...
- Publication number 20240411219
- Publication date Dec 12, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keisuke SAKURAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, MA...
- Publication number 20240402589
- Publication date Dec 5, 2024
- HOYA CORPORATION
- Hideaki NARAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ML REFLECTIVITY MODIFICATION
- Publication number 20240402591
- Publication date Dec 5, 2024
- Carl Zeiss SMS Ltd.
- Vladimir Dmitriev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR FORMING EXTREME ULTRAVIOLET MASK COMPRISING MAGNETIC MA...
- Publication number 20240393674
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kevin TANADY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240393675
- Publication date Nov 28, 2024
- HOYA CORPORATION
- Yohei IKEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK DEFECT PREVENTION
- Publication number 20240385507
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Ta Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240385517
- Publication date Nov 21, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF
- Publication number 20240385506
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsin-Chang LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV Lithography Mask With A Porous Reflective Multilayer Structure
- Publication number 20240377720
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK REPAIRING METHOD AND SYSTEM THEREOF
- Publication number 20240377721
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- HAO-MING CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH MULTILAYER REFLECTIVE FILM REFLECTIVE MASK BLANK, RE...
- Publication number 20240377719
- Publication date Nov 14, 2024
- HOYA CORPORATION
- Teiichiro UMEZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK AND METHOD OF FORMING THE SAME
- Publication number 20240377722
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Chiang Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE PELLICLE CAPABLE OF ADJUSTING ATMOSPHERIC PRESSURE AT HIGH...
- Publication number 20240353750
- Publication date Oct 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yoshihiro KUBOTA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, AND MANUFACTURING METHOD OF REFLECTIVE MASK
- Publication number 20240337916
- Publication date Oct 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF MAKING A SEMICONDUCTOR DEVICE
- Publication number 20240337917
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Cheng HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF
- Publication number 20240337918
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hung-Yi TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY
- Publication number 20240329516
- Publication date Oct 3, 2024
- S&S TECH Co., Ltd.
- Min-Kwang PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD OF MANUFACTURING...
- Publication number 20240319577
- Publication date Sep 26, 2024
- HOYA CORPORATION
- Hitoshi MAEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Reflection masks Preparation thereof

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Reflective mask blank, reflective mask and method for manufacturing...

Reflective mask blank, reflective mask, and manufacturing method

Extreme ultraviolet mask and method of manufacturing the same

Reflective mask blank, reflective mask, method of manufacturing ref...

Reflective mask blank for EUV lithography, mask blank for EUV litho...

Reflective mask blank and reflective mask

Electroconductive-film-coated substrate and reflective mask blank

EUV photo masks and manufacturing method thereof

Reflective mask blank, reflective mask, method of manufacturing ref...

Patterning device and method of use thereof

Mask and reticle protection with atomic layer deposition (ALD)

Reflective mask blank and reflective mask

Extreme ultraviolet mask and method of manufacturing the same

Reflection mode photomask

Extreme ultraviolet light reflective structure including nano-latti...

Extreme ultraviolet mask with tantalum base alloy absorber

EUV photo masks and manufacturing method thereof

Photomask repairing method and system thereof

Reflective mask blank and reflective mask

Extreme ultraviolet mask with reduced wafer neighboring effect

Substrate with film for reflective mask blank, reflective mask blan...

Mask defect prevention

Reflective mask blank and reflective mask

Reflective mask blank, reflective mask and manufacturing method the...

Reflective photomask blank and reflective photomask

Substrate with multilayer reflective film, reflective mask blank, r...

Reflective mask blank, reflective mask, method of manufacturing ref...

Reflective mask blank, reflective mask, method of manufacturing ref...

Methods for forming extreme ultraviolet mask comprising magnetic ma...

Semiconductor device manufacturing method and extreme ultraviolet m...

Patents Applicationslast 30 patents

REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK

REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK

EXTREME ULTRAVIOLET LIGHT REFLECTIVE STRUCTURE INCLUDING NANO-LATTI...

PUPIL FILTER WITH SPATIALLY-VARYING TRANSMISSION

REFLECTIVE MASK BLANK, REFLECTIVE MASK BLANK MANUFACTURING METHOD,...

EUV RETICLE WITH EMBEDDED PROCESS ASSISTANCE LAYER AND METHOD OF MA...

PELLICLE MEMBRANE

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND MANUFACTURING METHOD TH...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND MANUFACTURING METHOD TH...

MULTILAYER REFLECTIVE FILM-ATTACHED SUBSTRATE, REFLECTIVE MASK BLAN...

REFLECTIVE PHOTOMASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE...

MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, MA...

ML REFLECTIVITY MODIFICATION

METHODS FOR FORMING EXTREME ULTRAVIOLET MASK COMPRISING MAGNETIC MA...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

MASK DEFECT PREVENTION

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF

EUV Lithography Mask With A Porous Reflective Multilayer Structure

PHOTOMASK REPAIRING METHOD AND SYSTEM THEREOF

SUBSTRATE WITH MULTILAYER REFLECTIVE FILM REFLECTIVE MASK BLANK, RE...

MASK AND METHOD OF FORMING THE SAME

EXPOSURE PELLICLE CAPABLE OF ADJUSTING ATMOSPHERIC PRESSURE AT HIGH...

REFLECTIVE MASK BLANK, AND MANUFACTURING METHOD OF REFLECTIVE MASK

METHODS OF MAKING A SEMICONDUCTOR DEVICE

EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF

PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD OF MANUFACTURING...