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G03F1/24
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PHYSICS
G03
Photography
G03F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES
G03F1/00
Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof
Current Industry
G03F1/24
Reflection masks Preparation thereof
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Patents Grants
last 30 patents
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Patent Grant
Task completion in a tracking device environment
Patent number
11,968,321
Issue date
Apr 23, 2024
Tile, Inc.
Felipe Knorr Kuhn
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Method of critical dimension control by oxygen and nitrogen plasma...
Patent number
11,960,201
Issue date
Apr 16, 2024
Taiwan Semiconductor Manufacturing Co., Ltd
Pei-Cheng Hsu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Reflective mask blank for EUV lithography, reflective mask for EUV...
Patent number
11,953,822
Issue date
Apr 9, 2024
AGC Inc.
Hirotomo Kawahara
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Phase shift blankmask and photomask for EUV lithography
Patent number
11,940,725
Issue date
Mar 26, 2024
S&S TECH CO., LTD.
Cheol Shin
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method of annealing reflective photomask by using laser
Patent number
11,934,092
Issue date
Mar 19, 2024
Samsung Electronics Co., Ltd.
Hakseung Han
B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Reflective mask blank for EUV lithography and substrate with conduc...
Patent number
11,934,093
Issue date
Mar 19, 2024
AGC Inc.
Yusuke Ono
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Phase shift blankmask and photomask for EUV lithography
Patent number
11,927,880
Issue date
Mar 12, 2024
S&S TECH Co., Ltd.
Yong-Dae Kim
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Extreme ultraviolet (EUV) photomask and method of manufacturing sem...
Patent number
11,927,879
Issue date
Mar 12, 2024
Samsung Electronics Co., Ltd.
Moosong Lee
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Reflective mask blank, reflective mask, and method for manufacturin...
Patent number
11,914,281
Issue date
Feb 27, 2024
Hoya Corporation
Yohei Ikebe
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
System of measuring image of pattern in scanning type EUV mask
Patent number
11,914,282
Issue date
Feb 27, 2024
Samsung Electronics Co., Ltd.
Donggun Lee
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
Patent number
11,914,284
Issue date
Feb 27, 2024
AGC Inc.
Daijiro Akagi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Reflective mask blank and reflective mask
Patent number
11,914,283
Issue date
Feb 27, 2024
AGC Inc.
Hiroyoshi Tanabe
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Reflective photomask blank and reflective photomask
Patent number
11,906,896
Issue date
Feb 20, 2024
TOPPAN PHOTOMASK CO., LTD.
Toru Komizo
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for extreme ultraviolet lithography mask treatment
Patent number
11,906,897
Issue date
Feb 20, 2024
Taiwan Semiconductor Manufacturing Co., Ltd
Pei-Cheng Hsu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Reflective film coated substrate, mask blank, reflective mask, and...
Patent number
11,899,356
Issue date
Feb 13, 2024
Hoya Corporation
Kazuhiro Hamamoto
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Reflective mask blank, reflective mask and method of manufacturing...
Patent number
11,892,768
Issue date
Feb 6, 2024
Hoya Corporation
Mizuki Kataoka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
EUV photo masks and manufacturing method thereof
Patent number
11,886,109
Issue date
Jan 30, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Yun-Yue Lin
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Flows of optimization for patterning processes
Patent number
11,886,124
Issue date
Jan 30, 2024
ASML Netherlands B.V.
Duan-Fu Stephen Hsu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Reflective mask blank, reflective mask and method of manufacturing...
Patent number
11,880,130
Issue date
Jan 23, 2024
Hoya Corporation
Yohei Ikebe
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Extreme ultraviolet mask absorber materials
Patent number
11,860,533
Issue date
Jan 2, 2024
Applied Materials, Inc.
Shuwei Liu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Multi-chamber substrate processing platform
Patent number
11,860,528
Issue date
Jan 2, 2024
Applied Materials, Inc.
Ribhu Gautam
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Pellicle for an EUV lithography mask and a method of manufacturing...
Patent number
11,860,534
Issue date
Jan 2, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Tzu-Ang Chao
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Substrate with multilayer reflection film for EUV mask blank, manuf...
Patent number
11,860,529
Issue date
Jan 2, 2024
Shin-Etsu Chemical Co., Ltd.
Yukio Inazuki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Mask defect prevention
Patent number
11,860,530
Issue date
Jan 2, 2024
Taiwan Semiconductor Manufacturing Co., Ltd
Chi-Ta Lu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for manufacturing reflective mask blank, reflective mask bla...
Patent number
11,852,964
Issue date
Dec 26, 2023
Hoya Corporation
Tsutomu Shoki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Extreme ultraviolet mask with tantalum base alloy absorber
Patent number
11,852,965
Issue date
Dec 26, 2023
Taiwan Semiconductor Manufacturing Co., Ltd
Pei-Cheng Hsu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Lithography mask with a black border regions and method of fabricat...
Patent number
11,852,966
Issue date
Dec 26, 2023
Taiwan Semiconductor Manufacturing Co., Ltd
Chin-Hsiang Lin
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Apparatus and method for measuring phase of extreme ultraviolet (EU...
Patent number
11,852,583
Issue date
Dec 26, 2023
Samsung Electronics Co., Ltd.
Jongju Park
G01 - MEASURING TESTING
Information
Patent Grant
EUV photomask
Patent number
11,846,881
Issue date
Dec 19, 2023
Taiwan Semiconductor Manufacturing Company, Ltd
Ching-Huang Chen
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Extreme ultraviolet mask and method for forming the same
Patent number
11,846,880
Issue date
Dec 19, 2023
Taiwan Semiconductor Manufacturing Co., Ltd
Yun-Yue Lin
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, R...
Publication number
20240134265
Publication date
Apr 25, 2024
HOYA CORPORATION
Teiichiro UMEZAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF
Publication number
20240134266
Publication date
Apr 25, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Yun-Yue LIN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTION TYPE MASK BLANK AND METHOD FOR MANUFACTURING SAME
Publication number
20240134267
Publication date
Apr 25, 2024
AGC Inc.
Wataru NISHIDA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY
Publication number
20240126162
Publication date
Apr 18, 2024
S&S TECH CO., LTD.
Yong-Dae KIM
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
EXTREME ULTRAVIOLET (EUV) MASK AND MANUFACTURING METHOD THEREOF
Publication number
20240126161
Publication date
Apr 18, 2024
Samsung Electronics Co., Ltd.
Sungwoo JANG
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK
Publication number
20240126160
Publication date
Apr 18, 2024
TOPPAN PHOTOMASK CO., LTD.
Ayumi GODA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK
Publication number
20240118604
Publication date
Apr 11, 2024
TOPPAN PHOTOMASK CO., LTD.
Ryohei GORAI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHODS AND APPARATUS FOR RUTHENIUM OXIDE REDUCTION ON EXTREME ULTR...
Publication number
20240118603
Publication date
Apr 11, 2024
APPLIED MATERALS, INC.
Banqiu WU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
Publication number
20240103354
Publication date
Mar 28, 2024
HOYA CORPORATION
Yohei IKEBE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD FOR MANUFACTURING...
Publication number
20240103355
Publication date
Mar 28, 2024
HOYA CORPORATION
Yohei IKEBE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MASK BLANK AND REFLECTIVE MASK
Publication number
20240094621
Publication date
Mar 21, 2024
HOYA CORPORATION
Kazutake TANIGUCHI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
Publication number
20240094622
Publication date
Mar 21, 2024
AGC Inc.
YUYA NAGATA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...
Publication number
20240094629
Publication date
Mar 21, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Tzu-Ang CHAO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THE...
Publication number
20240094626
Publication date
Mar 21, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Pei-Cheng HSU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
REFLECTIVE MASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE MASK
Publication number
20240077797
Publication date
Mar 7, 2024
Shin-Etsu Chemical Co., Ltd.
Takuro KOSAKA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
EUVL PRECISION COMPONENT WITH SPECIFIC THERMAL EXPANSION BEHAVIOR
Publication number
20240077798
Publication date
Mar 7, 2024
SCHOTT AG
Florian Kanal
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK
Publication number
20240077796
Publication date
Mar 7, 2024
TOPPAN PHOTOMASK CO., LTD.
Hideaki NAKANO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
HOMOGENOUS SILICA-TITANIA GLASS
Publication number
20240069429
Publication date
Feb 29, 2024
Corning Incorporated
Michael John Campion
C03 - GLASS MINERAL OR SLAG WOOL
Information
Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, REFLECTIVE MASK MANUFACTURI...
Publication number
20240069428
Publication date
Feb 29, 2024
HOYA CORPORATION
Yohei IKEBE
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
EXPOSURE MASK, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING...
Publication number
20240069430
Publication date
Feb 29, 2024
KIOXIA Corporation
Naoki SATO
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF
Publication number
20240053669
Publication date
Feb 15, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Wen-Chang HSUEH
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK
Publication number
20240053670
Publication date
Feb 15, 2024
TOPPAN PHOTOMASK CO., LTD.
Yuto YAMAGATA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTION TYPE MASK BLANK AND PRODUCTION METHOD THEREFOR, AND REFL...
Publication number
20240053671
Publication date
Feb 15, 2024
AGC Inc.
Ryusuke OISHI
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
PHOTOMASK AND METHOD OF MANUFACTURING THE SAME
Publication number
20240053668
Publication date
Feb 15, 2024
Taiwan Semiconductor Manufacturing company Ltd.
CHUN-LANG CHEN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
EXTREME ULTRAVIOLET MASK WITH DIFFUSION BARRIER LAYER
Publication number
20240045318
Publication date
Feb 8, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Hsin-Chang LEE
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, MASK BLANK FOR EUV LITHO...
Publication number
20240045319
Publication date
Feb 8, 2024
AGC Inc.
Daijiro AKAGI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
Publication number
20240045320
Publication date
Feb 8, 2024
AGC Inc.
Takuma KATO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MASK AND METHOD FOR FORMING THE SAME
Publication number
20240045317
Publication date
Feb 8, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Hsin-Chang LEE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
Publication number
20240036458
Publication date
Feb 1, 2024
HOYA CORPORATION
Yohei IKEBE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK AND MANUFACTURING METHOD THE...
Publication number
20240036457
Publication date
Feb 1, 2024
HOYA CORPORATION
Yohei IKEBE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY