Reflective illumination

Industry

CPC
G03F7/702

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/702Reflective illumination

Industries

Patents Grantslast 30 patents

Information Patent Grant
Grating structure, manufacturing method thereof and display device
- Patent number 11,828,959
- Issue date Nov 28, 2023
- BOE Technology Group Co., Ltd.
- Wusheng Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure a...
- Patent number 11,809,085
- Issue date Nov 7, 2023
- Carl Zeiss SMT GmbH
- Hans Michael Stiepan
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Radiation source supply system for lithographic tools
- Patent number 11,809,084
- Issue date Nov 7, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hung Liao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology system for examining objects with EUV measurement light
- Patent number 11,796,926
- Issue date Oct 24, 2023
- Carl Zeiss SMT GmbH
- Renzo Capelli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of determining scattering of radiation by structures of fin...
- Patent number 11,789,371
- Issue date Oct 17, 2023
- ASML Netherlands B.V.
- Yu Cao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Facet mirror for an illumination optical unit of a projection expos...
- Patent number 11,789,367
- Issue date Oct 17, 2023
- Carl Zeiss SMT GmbH
- Willi Anderl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology device and detection apparatus therefor
- Patent number 11,782,351
- Issue date Oct 10, 2023
- ASML Netherlands B.V.
- Nitesh Pandey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of controlling a position of a first object relative to a se...
- Patent number 11,774,865
- Issue date Oct 3, 2023
- ASML Netherlands B.V.
- Thijs Adriaan Cornelis Van Keulen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spin-on compositions comprising an inorganic oxide component and an...
- Patent number 11,767,398
- Issue date Sep 26, 2023
- Merck Patent GmbH
- M. Dalil Rahman
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method for producing an aperture array for a microlens array
- Patent number 11,762,128
- Issue date Sep 19, 2023
- HELLA GMBH & CO. KGAA
- William Castellon Rivera
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus for semiconductor lithography having...
- Patent number 11,754,934
- Issue date Sep 12, 2023
- Carl Zeiss SMT GmbH
- Peter Nieland
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determining the combination of patterns to be applied to a substrat...
- Patent number 11,747,738
- Issue date Sep 5, 2023
- ASML Netherlands B.V.
- Coen Adrianus Verschuren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, exposure method, and method for manufacturing s...
- Patent number 11,747,737
- Issue date Sep 5, 2023
- Canon Kabushiki Kaisha
- Kazuhiro Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for performing a manufacturing process and associated appara...
- Patent number 11,733,606
- Issue date Aug 22, 2023
- ASML Netherlands B.V.
- Thomas Theeuwes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Collector mirror and apparatus for creating extreme ultraviolet lig...
- Patent number 11,698,590
- Issue date Jul 11, 2023
- Samsung Electronics Co., Ltd.
- Hoseok Song
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method and apparatus for illuminating image points
- Patent number 11,681,228
- Issue date Jun 20, 2023
- EV Group E. Thallner GmbH
- Bernhard Thallner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-referencing and self-calibrating interference pattern overlay...
- Patent number 11,675,277
- Issue date Jun 13, 2023
- KLA Corporation
- Dongyue Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, exposure apparatus, and method of fabricating three-dime...
- Patent number 11,662,659
- Issue date May 30, 2023
- Samsung Electronics Co., Ltd.
- Donghwan Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sub-field control of a lithographic process and associated apparatus
- Patent number 11,662,666
- Issue date May 30, 2023
- ASML Netherlands B.V.
- Rowin Meijerink
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical imaging arrangement with a piezoelectric device
- Patent number 11,656,453
- Issue date May 23, 2023
- Carl Zeiss SMT GmbH
- Yim-Bun Patrick Kwan
- G02 - OPTICS
Information Patent Grant
Method of modeling a mask by taking into account of mask pattern ed...
- Patent number 11,645,443
- Issue date May 9, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Jen Lai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Exposure method, exposure apparatus, article manufacturing method,...
- Patent number 11,640,119
- Issue date May 2, 2023
- Canon Kabushiki Kaisha
- Tetsuya Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microscopic system for testing structures and defects on EUV lithog...
- Patent number 11,615,897
- Issue date Mar 28, 2023
- RI Research Institute GmbH
- Rainer Lebert
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Photomask inspection method and apparatus thereof
- Patent number 11,614,684
- Issue date Mar 28, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Chih-Wei Wen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluid handling structure and lithographic apparatus
- Patent number 11,614,689
- Issue date Mar 28, 2023
- ASML Netherlands B.V.
- Erik Henricus Egidius Catharina Eummelen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dynamic generation of layout adaptive packaging
- Patent number 11,599,032
- Issue date Mar 7, 2023
- Applied Materials, Inc.
- Uwe Hollerbach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laser interference fringe control for higher EUV light source and E...
- Patent number 11,592,749
- Issue date Feb 28, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chansyun David Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask and manufacturing method of semiconductor device
- Patent number 11,586,107
- Issue date Feb 21, 2023
- Powerchip Semiconductor Manufacturing Corporation
- Yi-Kai Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wavefront optimization for tuning scanner based on performance matc...
- Patent number 11,586,114
- Issue date Feb 21, 2023
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of reducing effects of lens heating and/or cooling in a lith...
- Patent number 11,573,496
- Issue date Feb 7, 2023
- ASML Netherlands B.V.
- Nick Kant
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
EXTREME ULTRAVIOLET LITHOGRAPHY DEVICE AND METHOD OF OPERATING EXTR...
- Publication number 20230393484
- Publication date Dec 7, 2023
- Samsung Electronics Co., Ltd.
- Hoduk CHO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ASSEMBLY, METHOD FOR DEFORMING AN OPTICAL ELEMENT, AND PROJ...
- Publication number 20230393485
- Publication date Dec 7, 2023
- Carl Zeiss SMT GMBH
- Tim Hoffmann
- G02 - OPTICS
Information Patent Application
LITHOGRAPHY SYSTEM AND METHODS
- Publication number 20230375940
- Publication date Nov 23, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shang-Chieh Chien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD
- Publication number 20230367227
- Publication date Nov 16, 2023
- Carl Zeiss SMT GMBH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE DEVICE AND PROJECTION EXPOSURE METHOD
- Publication number 20230359126
- Publication date Nov 9, 2023
- V TECHNOLOGY CO., LTD.
- Yoshiyuki ENOMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE FOR POSITIONING AND HOLDING AT LEAST ONE OPTICAL ELEMENT, ME...
- Publication number 20230350311
- Publication date Nov 2, 2023
- Carl Zeiss SMT GMBH
- Thomas GROEZINGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR HEATING AN OPTICAL ELEMENT IN A MICROLITHO-GRAPHIC PROJE...
- Publication number 20230350312
- Publication date Nov 2, 2023
- Carl Zeiss SMT GMBH
- Dirk Hellweg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT FOR REFLECTING RADIATION, AND OPTICAL ASSEMBLY
- Publication number 20230350307
- Publication date Nov 2, 2023
- Carl Zeiss SMT GMBH
- Stefan Xalter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM, AND METHOD FOR OPERATING AN OPTICAL SYSTEM
- Publication number 20230324648
- Publication date Oct 12, 2023
- Carl Zeiss SMT GMBH
- Andre Dirauf
- G02 - OPTICS
Information Patent Application
FILTER ASSEMBLY, IN PARTICULAR FOR A CONTROL LOOP FOR CONTROLLING T...
- Publication number 20230324649
- Publication date Oct 12, 2023
- Carl Zeiss SMT GMBH
- Thomas Gorius
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
METHODS TO IMPROVE PROCESS WINDOW AND RESOLUTION FOR DIGITAL LITHOG...
- Publication number 20230314953
- Publication date Oct 5, 2023
- Applied Materials, Inc.
- Chi-Ming TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR, OPTICAL SYSTEM AND METHOD FOR OPERATING AN OPTICAL SYSTEM
- Publication number 20230305290
- Publication date Sep 28, 2023
- Carl Zeiss SMT GMBH
- Hartmut Enkisch
- G02 - OPTICS
Information Patent Application
SUB-FIELD CONTROL OF A LITHOGRAPHIC PROCESS AND ASSOCIATED APPARATUS
- Publication number 20230288817
- Publication date Sep 14, 2023
- ASML NETHERLANDS B.V.
- Rowin MEIJERINK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE AND METHOD FOR REGULATING AND CONTROLLING INCIDENT ANGLE OF...
- Publication number 20230280658
- Publication date Sep 7, 2023
- TSINGHUA UNIVERSITY
- Leijie WANG
- G01 - MEASURING TESTING
Information Patent Application
A METHOD AND APPARATUS FOR CALCULATING A SPATIAL MAP ASSOCIATED WIT...
- Publication number 20230273527
- Publication date Aug 31, 2023
- ASML NETHERLANDS B.V.
- Mauritius Gerardus Elisabeth SCHNEIDERS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SPECTROMETRIC METROLOGY SYSTEMS BASED ON MULTIMODE INTERFERENCE AND...
- Publication number 20230273531
- Publication date Aug 31, 2023
- ASML Holding N.V.
- Mohamed SWILLAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MODELING A MASK BY TAKING INTO ACCOUNT OF MASK PATTERN ED...
- Publication number 20230274063
- Publication date Aug 31, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- Chien-Jen Lai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTICAL ELEMENT, IN PARTICULAR FOR REFLECTING EUV RADIATION, OPTICA...
- Publication number 20230266673
- Publication date Aug 24, 2023
- Carl Zeiss SMT GMBH
- Vitaliy SHKLOVER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST, METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND MET...
- Publication number 20230259024
- Publication date Aug 17, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jui-Hsiung LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LASER INTERFERENCE FRINGE CONTROL FOR HIGHER EUV LIGHT SOURCE AND E...
- Publication number 20230236511
- Publication date Jul 27, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chansyun David YANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR MEASURING ACTUATORS IN A PROJECTION EXPOSURE...
- Publication number 20230228798
- Publication date Jul 20, 2023
- Carl Zeiss SMT GMBH
- Markus Raab
- G01 - MEASURING TESTING
Information Patent Application
ADAPTIVE OPTICAL ELEMENT FOR MICROLITHOGRAPHY
- Publication number 20230229091
- Publication date Jul 20, 2023
- Carl Zeiss SMT GMBH
- Matthias Manger
- G01 - MEASURING TESTING
Information Patent Application
ADAPTIVE OPTICAL ELEMENT FOR MICROLITHOGRAPHY
- Publication number 20230229092
- Publication date Jul 20, 2023
- Carl Zeiss SMT GMBH
- Matthias Manger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR THERMO-MECHANICAL CONTROL OF A HEAT SENSITIVE ELEMENT AN...
- Publication number 20230229090
- Publication date Jul 20, 2023
- ASML NETHERLANDS B.V.
- Victor Sebastiaan Dolk
- G02 - OPTICS
Information Patent Application
PROGRAMMABLE NANOLITHOGRAPHY MASK
- Publication number 20230221650
- Publication date Jul 13, 2023
- Massachusetts Institute of Technology
- Aik Jun Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIGITAL MICROMIRROR DEVICE FOR AN ILLUMINATION OPTICAL COMPONENT OF...
- Publication number 20230221649
- Publication date Jul 13, 2023
- Carl Zeiss SMT GMBH
- Michael Patra
- G02 - OPTICS
Information Patent Application
LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, ILLUMINATION SWITCHES AN...
- Publication number 20230213868
- Publication date Jul 6, 2023
- ASML Holding N.V.
- Mohamed SWILLAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV LITHOGRAPHY APPARATUS
- Publication number 20230215594
- Publication date Jul 6, 2023
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY , LTD.
- Cheng Hung TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM, IN PARTICULAR LITHOGRAPHY SYSTEM
- Publication number 20230194994
- Publication date Jun 22, 2023
- Carl Zeiss SMT GMBH
- Tanja Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ASSEMBLY, METHOD FOR CONTROLLING AN OPTICAL ASSEMBLY, AND P...
- Publication number 20230176486
- Publication date Jun 8, 2023
- Carl Zeiss SMT GMBH
- Markus Raab
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Reflective illumination

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Grating structure, manufacturing method thereof and display device

Mirror, in particular for a microlithographic projection exposure a...

Radiation source supply system for lithographic tools

Metrology system for examining objects with EUV measurement light

Methods of determining scattering of radiation by structures of fin...

Facet mirror for an illumination optical unit of a projection expos...

Metrology device and detection apparatus therefor

Method of controlling a position of a first object relative to a se...

Spin-on compositions comprising an inorganic oxide component and an...

Method for producing an aperture array for a microlens array

Projection exposure apparatus for semiconductor lithography having...

Determining the combination of patterns to be applied to a substrat...

Exposure apparatus, exposure method, and method for manufacturing s...

Method for performing a manufacturing process and associated appara...

Collector mirror and apparatus for creating extreme ultraviolet lig...

Method and apparatus for illuminating image points

Self-referencing and self-calibrating interference pattern overlay...

Photomask, exposure apparatus, and method of fabricating three-dime...

Sub-field control of a lithographic process and associated apparatus

Optical imaging arrangement with a piezoelectric device

Method of modeling a mask by taking into account of mask pattern ed...

Exposure method, exposure apparatus, article manufacturing method,...

Microscopic system for testing structures and defects on EUV lithog...

Photomask inspection method and apparatus thereof

Fluid handling structure and lithographic apparatus

Dynamic generation of layout adaptive packaging

Laser interference fringe control for higher EUV light source and E...

Phase shift mask and manufacturing method of semiconductor device

Wavefront optimization for tuning scanner based on performance matc...

Method of reducing effects of lens heating and/or cooling in a lith...

Patents Applicationslast 30 patents

EXTREME ULTRAVIOLET LITHOGRAPHY DEVICE AND METHOD OF OPERATING EXTR...

OPTICAL ASSEMBLY, METHOD FOR DEFORMING AN OPTICAL ELEMENT, AND PROJ...

LITHOGRAPHY SYSTEM AND METHODS

OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD

PROJECTION EXPOSURE DEVICE AND PROJECTION EXPOSURE METHOD

DEVICE FOR POSITIONING AND HOLDING AT LEAST ONE OPTICAL ELEMENT, ME...

METHOD FOR HEATING AN OPTICAL ELEMENT IN A MICROLITHO-GRAPHIC PROJE...

OPTICAL ELEMENT FOR REFLECTING RADIATION, AND OPTICAL ASSEMBLY

OPTICAL SYSTEM, AND METHOD FOR OPERATING AN OPTICAL SYSTEM

FILTER ASSEMBLY, IN PARTICULAR FOR A CONTROL LOOP FOR CONTROLLING T...

METHODS TO IMPROVE PROCESS WINDOW AND RESOLUTION FOR DIGITAL LITHOG...

MIRROR, OPTICAL SYSTEM AND METHOD FOR OPERATING AN OPTICAL SYSTEM

SUB-FIELD CONTROL OF A LITHOGRAPHIC PROCESS AND ASSOCIATED APPARATUS

DEVICE AND METHOD FOR REGULATING AND CONTROLLING INCIDENT ANGLE OF...

A METHOD AND APPARATUS FOR CALCULATING A SPATIAL MAP ASSOCIATED WIT...

SPECTROMETRIC METROLOGY SYSTEMS BASED ON MULTIMODE INTERFERENCE AND...

METHOD OF MODELING A MASK BY TAKING INTO ACCOUNT OF MASK PATTERN ED...

OPTICAL ELEMENT, IN PARTICULAR FOR REFLECTING EUV RADIATION, OPTICA...

PHOTORESIST, METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND MET...

LASER INTERFERENCE FRINGE CONTROL FOR HIGHER EUV LIGHT SOURCE AND E...

METHOD AND DEVICE FOR MEASURING ACTUATORS IN A PROJECTION EXPOSURE...

ADAPTIVE OPTICAL ELEMENT FOR MICROLITHOGRAPHY

ADAPTIVE OPTICAL ELEMENT FOR MICROLITHOGRAPHY

METHOD FOR THERMO-MECHANICAL CONTROL OF A HEAT SENSITIVE ELEMENT AN...

PROGRAMMABLE NANOLITHOGRAPHY MASK

DIGITAL MICROMIRROR DEVICE FOR AN ILLUMINATION OPTICAL COMPONENT OF...

LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, ILLUMINATION SWITCHES AN...

EUV LITHOGRAPHY APPARATUS

OPTICAL SYSTEM, IN PARTICULAR LITHOGRAPHY SYSTEM

OPTICAL ASSEMBLY, METHOD FOR CONTROLLING AN OPTICAL ASSEMBLY, AND P...