Reflective illumination

Industry

CPC
G03F7/702

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/702Reflective illumination

Industries

Patents Grantslast 30 patents

Information Patent Grant
System and method for parallel two-photon lithography using a metal...
- Patent number 12,130,407
- Issue date Oct 29, 2024
- Lawrence Livermore National Security, LLC
- Xiaoxing Xia
- G02 - OPTICS
Information Patent Grant
Optical system and lithography apparatus
- Patent number 12,130,557
- Issue date Oct 29, 2024
- Carl Zeiss SMT GmbH
- Matthias Manger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask structure for deposition device, deposition device, and operat...
- Patent number 12,123,087
- Issue date Oct 22, 2024
- United Semiconductor Japan Co., Ltd.
- Satoshi Inagaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
EUV lithography apparatus
- Patent number 12,119,129
- Issue date Oct 15, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng Hung Tsai
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Thermo-mechanical actuator
- Patent number 12,117,739
- Issue date Oct 15, 2024
- ASML Netherlands B.V.
- Bas Jansen
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Method for producing a mirror of a microlithographic projection exp...
- Patent number 12,117,731
- Issue date Oct 15, 2024
- Carl Zeiss SMT GmbH
- Christoph Zaczek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image stabilization for digital lithography
- Patent number 12,117,732
- Issue date Oct 15, 2024
- Applied Materials, Inc.
- Thomas L. Laidig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror for an illumination optical unit of a projection exposure ap...
- Patent number 12,111,578
- Issue date Oct 8, 2024
- Carl Zeiss SMT GmbH
- Christof Jalics
- G02 - OPTICS
Information Patent Grant
Image-forming optical system, exposure apparatus, and device produc...
- Patent number 12,105,428
- Issue date Oct 1, 2024
- Nikon Corporation
- Hideki Komatsuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for correcting a telecentricity error of an imagi...
- Patent number 12,105,427
- Issue date Oct 1, 2024
- Carl Zeiss SMT GmbH
- Susanne Toepfer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system with an aperture stop
- Patent number 12,105,429
- Issue date Oct 1, 2024
- Carl Zeiss SMT GmbH
- Tanja Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actuator unit for positioning an optical element
- Patent number 12,099,307
- Issue date Sep 24, 2024
- ASML Netherlands B.V.
- Sjoerd Martijn Huiberts
- G02 - OPTICS
Information Patent Grant
Laser system for source material conditioning in an EUV light source
- Patent number 12,085,862
- Issue date Sep 10, 2024
- ASML Netherlands B.V.
- Matthew Ryan Graham
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Phase-shift reticle for use in photolithography
- Patent number 12,078,921
- Issue date Sep 3, 2024
- Entegris, Inc.
- Tse-An Yeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Magnification adjustable projection system using deformable lens pl...
- Patent number 12,078,936
- Issue date Sep 3, 2024
- Corning Incorporated
- Robert Dennis Grejda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask inspection method and apparatus thereof
- Patent number 12,072,621
- Issue date Aug 27, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Chih-Wei Wen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sensitivity improvement of optical and SEM defection inspection
- Patent number 12,066,763
- Issue date Aug 20, 2024
- KLA Corporation
- Kaushik Sah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preparing holographic pattern-expressing organogel using...
- Patent number 12,038,719
- Issue date Jul 16, 2024
- UNIST (ULSAN NATIONAL INSTITUTE OF SCIENCE AND TECHNOLOGY)
- Jiseok Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming organic film, patterning process, and polymer
- Patent number 12,032,293
- Issue date Jul 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical element having a coating for influencing heating radiation...
- Patent number 12,025,818
- Issue date Jul 2, 2024
- Carl Zeiss SMT GmbH
- Boris Bittner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Reduction or elimination of pattern placement error in metrology me...
- Patent number 12,013,634
- Issue date Jun 18, 2024
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithography apparatus, patterning system, and method of patterning...
- Patent number 11,994,804
- Issue date May 28, 2024
- Applied Materials, Inc.
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of modeling a mask having patterns with arbitrary angles
- Patent number 11,994,796
- Issue date May 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Jen Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wavefront optimization for tuning scanner based on performance matc...
- Patent number 11,977,334
- Issue date May 7, 2024
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Laser interference fringe control for higher EUV light source and E...
- Patent number 11,960,210
- Issue date Apr 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chansyun David Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet lithography device and method of operating extr...
- Patent number 11,960,212
- Issue date Apr 16, 2024
- Samsung Electronics Co., Ltd.
- Hoduk Cho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle processing system
- Patent number 11,940,724
- Issue date Mar 26, 2024
- Applied Materials, Inc.
- Sanjay Bhat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical objective for operation in EUV spectral region
- Patent number 11,934,105
- Issue date Mar 19, 2024
- Nikon Corporation
- Daniel Gene Smith
- G02 - OPTICS
Information Patent Grant
Light source apparatus, optical apparatus, exposure apparatus, devi...
- Patent number 11,934,104
- Issue date Mar 19, 2024
- Nikon Corporation
- Hideki Komatsuda
- G02 - OPTICS
Information Patent Grant
Photolithography mask and photolithography system comprising said p...
- Patent number 11,934,091
- Issue date Mar 19, 2024
- TECHNOLOGIES DIGITHO INC.
- Richard Beaudry
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MEASURING DEVICE AND METHOD FOR INSPECTING PHOTOMASKS INTENDED FOR...
- Publication number 20240353768
- Publication date Oct 24, 2024
- Carl Zeiss SMT GMBH
- Lutz Brekerbohm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL METHOD AND APPARATUS FOR QUICKLY REALIZING PRECISE CALIBRAT...
- Publication number 20240345488
- Publication date Oct 17, 2024
- Institute of Microelectronics, Chinese Academy of Sciences
- Dandan Han
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE DEVICE
- Publication number 20240345486
- Publication date Oct 17, 2024
- Nikon Corporation
- Masaki KATO
- G02 - OPTICS
Information Patent Application
EXPOSURE APPARATUS
- Publication number 20240329545
- Publication date Oct 3, 2024
- Ushio Denki Kabushiki Kaisha
- Naoya SOHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR PRODUCING AT LEAST ONE HOLLOW STRUCTURE, M...
- Publication number 20240329285
- Publication date Oct 3, 2024
- Carl Zeiss SMT GMBH
- Tobias ULLSPERGER
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD FOR CALIBRATING A MANIPULABLE OPTICAL MODULE
- Publication number 20240319614
- Publication date Sep 26, 2024
- Carl Zeiss SMT GMBH
- Matthias Manger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE SYSTEM, METHOD OF FORMING ALIGNMENT FILM, METHOD OF MANUFA...
- Publication number 20240319542
- Publication date Sep 26, 2024
- FUJIFILM CORPORATION
- Masao MORI
- G02 - OPTICS
Information Patent Application
METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPT...
- Publication number 20240302756
- Publication date Sep 12, 2024
- Carl Zeiss SMT GMBH
- Dirk EHM
- G02 - OPTICS
Information Patent Application
LITHOGRAPHIC APPARATUS, TEMPERATURE SENSOR, AND FIBER BRAGG GRATING...
- Publication number 20240302753
- Publication date Sep 12, 2024
- ASML Holding N.V.
- Mahesh Upendra AJGAONKAR
- G01 - MEASURING TESTING
Information Patent Application
EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING...
- Publication number 20240295824
- Publication date Sep 5, 2024
- Gigaphoton Inc.
- Tomoyoshi TOIDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD, EXPOSURE DEVICE, AND METHOD OF FORMING OPTICALLY-A...
- Publication number 20240288678
- Publication date Aug 29, 2024
- FUJIFILM CORPORATION
- Hirotoshi ANDO
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD
- Publication number 20240288777
- Publication date Aug 29, 2024
- Carl Zeiss SMT GMBH
- Stefan Krone
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM, PROJECTION EXPOSURE SYSTEM AND METHOD
- Publication number 20240288784
- Publication date Aug 29, 2024
- Carl Zeiss SMT GMBH
- Martin Martin von Hodenberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIGITAL LITHOGRAPHY EXPOSURE UNIT BOUNDARY SMOOTHING
- Publication number 20240280911
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- CHI-MING TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEFORMABLE MIRROR SYSTEM
- Publication number 20240280909
- Publication date Aug 22, 2024
- ASML NETHERLANDS B.V.
- Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD
- Publication number 20240280916
- Publication date Aug 22, 2024
- Carl Zeiss SMT GMBH
- Stefan Krone
- G02 - OPTICS
Information Patent Application
INSPECTION SYSTEM FOR RETICLE PARTICLE DETECTION USING A STRUCTURAL...
- Publication number 20240272058
- Publication date Aug 15, 2024
- ASML NETHERLANDS B.V.
- Michal Emanuel PAWLOWSKI
- G01 - MEASURING TESTING
Information Patent Application
PATTERN EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURI...
- Publication number 20240255855
- Publication date Aug 1, 2024
- Nikon Corporation
- Masaki KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL COMPONENT GROUP, IN PARTICULAR FOR USE IN AN ILLUMINATION D...
- Publication number 20240255856
- Publication date Aug 1, 2024
- Carl Zeiss SMT GMBH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING A POSITION OF A MIRROR
- Publication number 20240255319
- Publication date Aug 1, 2024
- Carl Zeiss SMT GMBH
- Michael Patra
- G01 - MEASURING TESTING
Information Patent Application
PATTERN EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND EXPOSU...
- Publication number 20240248409
- Publication date Jul 25, 2024
- Nikon Corporation
- Masaki KATO
- G02 - OPTICS
Information Patent Application
METHOD OF MANUFACTURING INTEGRATED CIRCUIT
- Publication number 20240248406
- Publication date Jul 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chansyun David YANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI-MIRROR ARRAY
- Publication number 20240248408
- Publication date Jul 25, 2024
- Carl Zeiss SMT GMBH
- Moritz Becker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM TO INTRODUCE BRIGHT FIELD IMAGING AT STITCHING AR...
- Publication number 20240248387
- Publication date Jul 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sheng-Min WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR NANOSCALE DATA RECORDING
- Publication number 20240248407
- Publication date Jul 25, 2024
- Franklin Mark Schellenberg
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithographic Method for Imprinting Three-Dimensional Microstructure...
- Publication number 20240248395
- Publication date Jul 25, 2024
- JOANNEUM RESEARCH FORSCHUNGSGESELLSCHAFT MBH
- Ladislav KUNA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
EUV ILLUMINATION DEVICE AND METHOD FOR OPERATING A MICROLITHOGRAPHI...
- Publication number 20240248410
- Publication date Jul 25, 2024
- Carl Zeiss SMT GMBH
- Michael Patra
- G02 - OPTICS
Information Patent Application
LITHOGRAPHING APPARATUS AND LITHOGRAPHING SYSTEM
- Publication number 20240241449
- Publication date Jul 18, 2024
- WESTLAKE UNIVERSITY
- Xijun LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK, LITHOGRAPHING APPARATUS AND METHOD FOR MANUFACTURING MASK
- Publication number 20240231218
- Publication date Jul 11, 2024
- WESTLAKE UNIVERSITY
- Xijun LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET EXPOSURE APPARATUS INCLUDING A MASK STAGE
- Publication number 20240219848
- Publication date Jul 4, 2024
- Samsung Electronics Co., Ltd.
- Sanghwan LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Reflective illumination

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

System and method for parallel two-photon lithography using a metal...

Optical system and lithography apparatus

Mask structure for deposition device, deposition device, and operat...

EUV lithography apparatus

Thermo-mechanical actuator

Method for producing a mirror of a microlithographic projection exp...

Image stabilization for digital lithography

Mirror for an illumination optical unit of a projection exposure ap...

Image-forming optical system, exposure apparatus, and device produc...

Method and device for correcting a telecentricity error of an imagi...

Optical system with an aperture stop

Actuator unit for positioning an optical element

Laser system for source material conditioning in an EUV light source

Phase-shift reticle for use in photolithography

Magnification adjustable projection system using deformable lens pl...

Photomask inspection method and apparatus thereof

Sensitivity improvement of optical and SEM defection inspection

Method for preparing holographic pattern-expressing organogel using...

Composition for forming organic film, patterning process, and polymer

Optical element having a coating for influencing heating radiation...

Reduction or elimination of pattern placement error in metrology me...

Lithography apparatus, patterning system, and method of patterning...

Method of modeling a mask having patterns with arbitrary angles

Wavefront optimization for tuning scanner based on performance matc...

Laser interference fringe control for higher EUV light source and E...

Extreme ultraviolet lithography device and method of operating extr...

Reticle processing system

Optical objective for operation in EUV spectral region

Light source apparatus, optical apparatus, exposure apparatus, devi...

Photolithography mask and photolithography system comprising said p...

Patents Applicationslast 30 patents

MEASURING DEVICE AND METHOD FOR INSPECTING PHOTOMASKS INTENDED FOR...

OPTICAL METHOD AND APPARATUS FOR QUICKLY REALIZING PRECISE CALIBRAT...

EXPOSURE DEVICE

EXPOSURE APPARATUS

METHOD AND APPARATUS FOR PRODUCING AT LEAST ONE HOLLOW STRUCTURE, M...

METHOD FOR CALIBRATING A MANIPULABLE OPTICAL MODULE

EXPOSURE SYSTEM, METHOD OF FORMING ALIGNMENT FILM, METHOD OF MANUFA...

METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPT...

LITHOGRAPHIC APPARATUS, TEMPERATURE SENSOR, AND FIBER BRAGG GRATING...

EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING...

EXPOSURE METHOD, EXPOSURE DEVICE, AND METHOD OF FORMING OPTICALLY-A...

OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD

OPTICAL SYSTEM, PROJECTION EXPOSURE SYSTEM AND METHOD

DIGITAL LITHOGRAPHY EXPOSURE UNIT BOUNDARY SMOOTHING

DEFORMABLE MIRROR SYSTEM

OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD

INSPECTION SYSTEM FOR RETICLE PARTICLE DETECTION USING A STRUCTURAL...

PATTERN EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURI...

OPTICAL COMPONENT GROUP, IN PARTICULAR FOR USE IN AN ILLUMINATION D...

METHOD FOR DETERMINING A POSITION OF A MIRROR

PATTERN EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND EXPOSU...

METHOD OF MANUFACTURING INTEGRATED CIRCUIT

MULTI-MIRROR ARRAY

METHOD AND SYSTEM TO INTRODUCE BRIGHT FIELD IMAGING AT STITCHING AR...

METHOD AND SYSTEM FOR NANOSCALE DATA RECORDING

Lithographic Method for Imprinting Three-Dimensional Microstructure...

EUV ILLUMINATION DEVICE AND METHOD FOR OPERATING A MICROLITHOGRAPHI...

LITHOGRAPHING APPARATUS AND LITHOGRAPHING SYSTEM

MASK, LITHOGRAPHING APPARATUS AND METHOD FOR MANUFACTURING MASK

EXTREME ULTRAVIOLET EXPOSURE APPARATUS INCLUDING A MASK STAGE