Reflective illumination

Industry

CPC
G03F7/702

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/702Reflective illumination

Industries

Patents Grantslast 30 patents

Information Patent Grant
Optical imaging arrangement with a piezoelectric device
- Patent number 11,656,453
- Issue date May 23, 2023
- Carl Zeiss SMT GmbH
- Yim-Bun Patrick Kwan
- G02 - OPTICS
Information Patent Grant
Method of modeling a mask by taking into account of mask pattern ed...
- Patent number 11,645,443
- Issue date May 9, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Jen Lai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Exposure method, exposure apparatus, article manufacturing method,...
- Patent number 11,640,119
- Issue date May 2, 2023
- Canon Kabushiki Kaisha
- Tetsuya Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microscopic system for testing structures and defects on EUV lithog...
- Patent number 11,615,897
- Issue date Mar 28, 2023
- RI Research Institute GmbH
- Rainer Lebert
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Photomask inspection method and apparatus thereof
- Patent number 11,614,684
- Issue date Mar 28, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Chih-Wei Wen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluid handling structure and lithographic apparatus
- Patent number 11,614,689
- Issue date Mar 28, 2023
- ASML Netherlands B.V.
- Erik Henricus Egidius Catharina Eummelen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dynamic generation of layout adaptive packaging
- Patent number 11,599,032
- Issue date Mar 7, 2023
- Applied Materials, Inc.
- Uwe Hollerbach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laser interference fringe control for higher EUV light source and E...
- Patent number 11,592,749
- Issue date Feb 28, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chansyun David Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask and manufacturing method of semiconductor device
- Patent number 11,586,107
- Issue date Feb 21, 2023
- Powerchip Semiconductor Manufacturing Corporation
- Yi-Kai Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wavefront optimization for tuning scanner based on performance matc...
- Patent number 11,586,114
- Issue date Feb 21, 2023
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of reducing effects of lens heating and/or cooling in a lith...
- Patent number 11,573,496
- Issue date Feb 7, 2023
- ASML Netherlands B.V.
- Nick Kant
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Maskless photolithography devices, methods, and systems
- Patent number 11,567,411
- Issue date Jan 31, 2023
- NANOPATH, INC.
- Kevin Donahue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
UV lithography system
- Patent number 11,561,476
- Issue date Jan 24, 2023
- Kenneth Carlisle Johnson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determining subset of components of an optical characteristic of pa...
- Patent number 11,561,478
- Issue date Jan 24, 2023
- ASML Netherlands B.V.
- Johannes Jacobus Matheus Baselmans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection system and lithographic apparatus comprising said projec...
- Patent number 11,550,227
- Issue date Jan 10, 2023
- ASML Netherlands B.V.
- Marinus Engelbertus Cornelis Mutsaers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 11,543,755
- Issue date Jan 3, 2023
- Canon Kabushiki Kaisha
- Takehiro Toyoda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Tunable illuminator for lithography systems
- Patent number 11,543,753
- Issue date Jan 3, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ken-Hsien Hsieh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduction or elimination of pattern placement error in metrology me...
- Patent number 11,537,043
- Issue date Dec 27, 2022
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Control apparatus and control method, exposure apparatus and exposu...
- Patent number 11,537,051
- Issue date Dec 27, 2022
- Nikon Corporation
- Satoshi Yashiki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV lithography system with diffraction optics
- Patent number 11,520,235
- Issue date Dec 6, 2022
- Kenneth Carlisle Johnson
- G02 - OPTICS
Information Patent Grant
Optical element driving mechanism
- Patent number 11,520,244
- Issue date Dec 6, 2022
- TDK TAIWAN CORP.
- Fu-Yuan Wu
- G11 - INFORMATION STORAGE
Information Patent Grant
Non-telecentric light guide elements
- Patent number 11,520,236
- Issue date Dec 6, 2022
- Waymo LLC
- James Dunphy
- G02 - OPTICS
Information Patent Grant
Prism-mask for angled patterning applications
- Patent number 11,506,982
- Issue date Nov 22, 2022
- Intel Corporation
- Vahidreza Parichehreh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic method and lithographic apparatus
- Patent number 11,493,851
- Issue date Nov 8, 2022
- ASML Netherlands B.V.
- Hakki Ergün Cekli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of and apparatus for in-situ repair of reflective optic
- Patent number 11,474,440
- Issue date Oct 18, 2022
- ASML Netherlands B.V.
- Alexander I. Ershov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image-forming optical system, exposure apparatus, and device produc...
- Patent number 11,467,501
- Issue date Oct 11, 2022
- Nikon Corporation
- Hideki Komatsuda
- G02 - OPTICS
Information Patent Grant
Method for adusting a first element of a lithography apparatus towa...
- Patent number 11,460,780
- Issue date Oct 4, 2022
- Carl Zeiss SMT GmbH
- Boaz Pnini
- G02 - OPTICS
Information Patent Grant
Optical patterning systems and methods
- Patent number 11,448,965
- Issue date Sep 20, 2022
- Board of Regents, The University of Texas System
- Yuebing Zheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical system, exposure apparatus, and article manufa...
- Patent number 11,448,969
- Issue date Sep 20, 2022
- Canon Kabushiki Kaisha
- Michio Kono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source supply system for lithographic tools
- Patent number 11,435,669
- Issue date Sep 6, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hung Liao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
WAVEFRONT OPTIMIZATION FOR TUNING SCANNER BASED ON PERFORMANCE MATC...
- Publication number 20230161264
- Publication date May 25, 2023
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DYNAMIC GENERATION OF LAYOUT ADAPTIVE PACKAGING
- Publication number 20230161274
- Publication date May 25, 2023
- Applied Materials, Inc.
- Uwe HOLLERBACH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mask Synthesis Integrating Mask Fabrication Effects and Wafer Litho...
- Publication number 20230152683
- Publication date May 18, 2023
- Synopsys, Inc.
- Peng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGE STABILIZATION FOR DIGITAL LITHOGRAPHY
- Publication number 20230152712
- Publication date May 18, 2023
- Thomas L. LAIDIG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICES USING MOIRÉ PATTERNS
- Publication number 20230152715
- Publication date May 18, 2023
- Samsung Electronics Co., Ltd.
- Woohyeok Jeong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV COLLECTOR
- Publication number 20230146235
- Publication date May 11, 2023
- Carl Zeiss SMT GMBH
- Valentin Jonatan Bolsinger
- G02 - OPTICS
Information Patent Application
A PROJECTION OBJECTIVE INCLUDING AN OPTICAL DEVICE
- Publication number 20230142187
- Publication date May 11, 2023
- Carl Zeiss SMT GMBH
- Johannes Lippert
- G02 - OPTICS
Information Patent Application
METHOD FOR MEASURING A SUBSTRATE FOR SEMICONDUCTOR LITHOGRAPHY
- Publication number 20230136478
- Publication date May 4, 2023
- Carl Zeiss SMT GMBH
- Sven Martin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIFUNCTIONAL LITHOGRAPHY DEVICE
- Publication number 20230129163
- Publication date Apr 27, 2023
- The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Xiangang Luo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR REPRODUCING A TARGET WAVEFRONT OF AN IMAGING OPTICAL PRO...
- Publication number 20230130187
- Publication date Apr 27, 2023
- Carl Zeiss SMT GMBH
- Lukas Fischer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM WITH AN APERTURE STOP
- Publication number 20230123115
- Publication date Apr 20, 2023
- Carl Zeiss SMT GMBH
- Tanja Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Correction and compensation method in semiconductor manufacturing p...
- Publication number 20230123680
- Publication date Apr 20, 2023
- United Semiconductor (Xiamen) Co., Ltd.
- XIONGWU HE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK FABRICATION EFFECTS IN THREE-DIMENSIONAL MASK SIMULATIONS USIN...
- Publication number 20230104510
- Publication date Apr 6, 2023
- Synopsys, Inc.
- Peng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...
- Publication number 20230099105
- Publication date Mar 30, 2023
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Non-Telecentric Light Guide Elements
- Publication number 20230099679
- Publication date Mar 30, 2023
- WAYMO LLC
- James Dunphy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY SYSTEM INCLUDING SELECTIVE LIGHT ARRAY
- Publication number 20230092166
- Publication date Mar 23, 2023
- HONEYWELL FEDERAL MANUFACTURING & TECHNOLOGIES, LLC
- Barbara Diane Young
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MIRROR, IN PARTICULAR FOR MICROLITHOGRAPHY
- Publication number 20230088791
- Publication date Mar 23, 2023
- Carl Zeiss SMT GMBH
- Jan HORN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METHODS OF TUNING A MODEL FOR A LITHOGRAPHIC PROCESS AND ASSOCIATED...
- Publication number 20230084130
- Publication date Mar 16, 2023
- ASML NETHERLANDS B.V.
- Mhamed AKHSSAY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK CORNER ROUNDING EFFECTS IN THREE-DIMENSIONAL MASK SIMULATIONS...
- Publication number 20230079453
- Publication date Mar 16, 2023
- Synopsys, Inc.
- Peng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MAGNIFICATION ADJUSTABLE PROJECTION SYSTEM USING DEFORMABLE LENS PL...
- Publication number 20230077090
- Publication date Mar 9, 2023
- Corning Incorporated
- Robert Dennis Grejda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COLLECTOR MIRROR AND APPARATUS FOR CREATING EXTREME ULTRAVIOLET LIG...
- Publication number 20230071131
- Publication date Mar 9, 2023
- Samsung Electronics Co., Ltd.
- Hoseok SONG
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
An Optical Effect Device
- Publication number 20230073096
- Publication date Mar 9, 2023
- CCL SECURE PTY LTD
- Karlo Ivan Jolic
- B42 - BOOKBINDING ALBUMS FILES SPECIAL PRINTED MATTER
Information Patent Application
DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS
- Publication number 20230051439
- Publication date Feb 16, 2023
- Carl Zeiss SMT GMBH
- Oliver Herbst
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR CORRECTING A TELECENTRICITY ERROR OF AN IMAGI...
- Publication number 20230050291
- Publication date Feb 16, 2023
- Carl Zeiss SMT GMBH
- Susanne Toepfer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS
- Publication number 20230047921
- Publication date Feb 16, 2023
- Carl Zeiss SMT GMBH
- Michel Aliman
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
DATA INSPECTION FOR DIGITAL LITHOGRAPHY FOR HVM USING OFFLINE AND I...
- Publication number 20230042334
- Publication date Feb 9, 2023
- Applied Materials, Inc.
- Chung-Shin KANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGE-FORMING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE PRODUC...
- Publication number 20230024028
- Publication date Jan 26, 2023
- Nikon Corporation
- Hideki Komatsuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD, DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS
- Publication number 20230028288
- Publication date Jan 26, 2023
- Carl Zeiss SMT GMBH
- Sönke RHEIN
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
UV Lithography System
- Publication number 20230011685
- Publication date Jan 12, 2023
- Kenneth Carlisle Johnson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROSCOPIC SYSTEM FOR TESTING STRUCTURES AND DEFECTS ON EUV LITHOG...
- Publication number 20220392660
- Publication date Dec 8, 2022
- RI Research Instruments GmbH
- Rainer LEBERT
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Reflective illumination

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Optical imaging arrangement with a piezoelectric device

Method of modeling a mask by taking into account of mask pattern ed...

Exposure method, exposure apparatus, article manufacturing method,...

Microscopic system for testing structures and defects on EUV lithog...

Photomask inspection method and apparatus thereof

Fluid handling structure and lithographic apparatus

Dynamic generation of layout adaptive packaging

Laser interference fringe control for higher EUV light source and E...

Phase shift mask and manufacturing method of semiconductor device

Wavefront optimization for tuning scanner based on performance matc...

Method of reducing effects of lens heating and/or cooling in a lith...

Maskless photolithography devices, methods, and systems

UV lithography system

Determining subset of components of an optical characteristic of pa...

Projection system and lithographic apparatus comprising said projec...

Method of manufacturing semiconductor device

Tunable illuminator for lithography systems

Reduction or elimination of pattern placement error in metrology me...

Control apparatus and control method, exposure apparatus and exposu...

EUV lithography system with diffraction optics

Optical element driving mechanism

Non-telecentric light guide elements

Prism-mask for angled patterning applications

Lithographic method and lithographic apparatus

Method of and apparatus for in-situ repair of reflective optic

Image-forming optical system, exposure apparatus, and device produc...

Method for adusting a first element of a lithography apparatus towa...

Optical patterning systems and methods

Illumination optical system, exposure apparatus, and article manufa...

Radiation source supply system for lithographic tools

Patents Applicationslast 30 patents

WAVEFRONT OPTIMIZATION FOR TUNING SCANNER BASED ON PERFORMANCE MATC...

DYNAMIC GENERATION OF LAYOUT ADAPTIVE PACKAGING

Mask Synthesis Integrating Mask Fabrication Effects and Wafer Litho...

IMAGE STABILIZATION FOR DIGITAL LITHOGRAPHY

METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICES USING MOIRÉ PATTERNS

EUV COLLECTOR

A PROJECTION OBJECTIVE INCLUDING AN OPTICAL DEVICE

METHOD FOR MEASURING A SUBSTRATE FOR SEMICONDUCTOR LITHOGRAPHY

MULTIFUNCTIONAL LITHOGRAPHY DEVICE

METHOD FOR REPRODUCING A TARGET WAVEFRONT OF AN IMAGING OPTICAL PRO...

OPTICAL SYSTEM WITH AN APERTURE STOP

Correction and compensation method in semiconductor manufacturing p...

MASK FABRICATION EFFECTS IN THREE-DIMENSIONAL MASK SIMULATIONS USIN...

REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...

Non-Telecentric Light Guide Elements

PHOTOLITHOGRAPHY SYSTEM INCLUDING SELECTIVE LIGHT ARRAY

MIRROR, IN PARTICULAR FOR MICROLITHOGRAPHY

METHODS OF TUNING A MODEL FOR A LITHOGRAPHIC PROCESS AND ASSOCIATED...

MASK CORNER ROUNDING EFFECTS IN THREE-DIMENSIONAL MASK SIMULATIONS...

MAGNIFICATION ADJUSTABLE PROJECTION SYSTEM USING DEFORMABLE LENS PL...

COLLECTOR MIRROR AND APPARATUS FOR CREATING EXTREME ULTRAVIOLET LIG...

An Optical Effect Device

DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS

METHOD AND DEVICE FOR CORRECTING A TELECENTRICITY ERROR OF AN IMAGI...

DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS

DATA INSPECTION FOR DIGITAL LITHOGRAPHY FOR HVM USING OFFLINE AND I...

IMAGE-FORMING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE PRODUC...

METHOD, DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS

UV Lithography System

MICROSCOPIC SYSTEM FOR TESTING STRUCTURES AND DEFECTS ON EUV LITHOG...