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Y10S148/137

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YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S148/00Metal treatment

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Y10S148/137Resists

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Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing member pattern and method of manufacturing...
- Patent number 6,653,232
- Issue date Nov 25, 2003
- Canon Kabushiki Kaisha
- Yoshimi Uda
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 6,518,196
- Issue date Feb 11, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Tetsuya Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and structure to reduce latch-up using edge implants
- Patent number 6,232,639
- Issue date May 15, 2001
- International Business Machines Corporation
- Faye D. Baker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and structure to reduce latch-up using edge implants
- Patent number 6,033,949
- Issue date Mar 7, 2000
- International Business Machines Corporation
- Faye D. Baker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing a semiconductor wafer for controlling drive cu...
- Patent number 5,943,550
- Issue date Aug 24, 1999
- Advanced Micro Devices, Inc.
- H. Jim Fulford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and structure to reduce latch-up using edge implants
- Patent number 5,861,330
- Issue date Jan 19, 1999
- International Business Machines Corporation
- Faye D. Baker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor IC device fabricating method
- Patent number 5,837,423
- Issue date Nov 17, 1998
- Hitachi, Ltd.
- Yoshihiko Okamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal layout pattern for improved passivation layer coverage
- Patent number 5,663,599
- Issue date Sep 2, 1997
- United Microelectronics Corporation
- Water Lur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor IC device fabricating method
- Patent number 5,641,715
- Issue date Jun 24, 1997
- Hitachi, Ltd.
- Yoshihiko Okamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to solve holes in passivation by metal layout
- Patent number 5,494,853
- Issue date Feb 27, 1996
- United Microelectronics Corporation
- Water Lur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
C-MOS thin film transistor device manufacturing method
- Patent number 5,316,960
- Issue date May 31, 1994
- Ricoh Company, Ltd.
- Hirofumi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making thin film transistors
- Patent number 5,306,653
- Issue date Apr 26, 1994
- Goldstar Co., Ltd.
- Chang W. Hur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for the vapor deposition of polysilanes photoresists
- Patent number 5,173,452
- Issue date Dec 22, 1992
- David M. Dobuzinsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming a fine pattern by using a patterned resist layer
- Patent number 5,171,718
- Issue date Dec 15, 1992
- Sony Corporation
- Akira Ishibashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of etching isolation and alignment mark regions using a sing...
- Patent number 5,157,003
- Issue date Oct 20, 1992
- Kabushiki Kaisha Toshiba
- Hitoshi Tsuji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thin coatings for use in semiconductor integrated circuits and proc...
- Patent number 5,106,786
- Issue date Apr 21, 1992
- AT&T Bell Laboratories
- Michael F. Brady
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 5,093,283
- Issue date Mar 3, 1992
- U.S. Philips Corporation
- Colin M. Rowe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for improving photoresist on wafers by applying fluid layer...
- Patent number 5,066,616
- Issue date Nov 19, 1991
- Hewlett-Packard Company
- William G. Gordon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithographic processes using thin coatings of refractory metal...
- Patent number 5,066,615
- Issue date Nov 19, 1991
- AT&T Bell Laboratories
- Michael F. Brady
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a passivation film
- Patent number 5,013,689
- Issue date May 7, 1991
- Mitsubishi Denki Kabushiki Kaisha
- Isamu Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Production of electronic coatings by spin coating a partially fluor...
- Patent number 4,997,869
- Issue date Mar 5, 1991
- Ethyl Corporation
- Allan A. Eisenbraun
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Making a semiconductor device with ammonia treatment of photoresist
- Patent number 4,985,374
- Issue date Jan 15, 1991
- Kabushiki Kaisha Toshiba
- Hitoshi Tsuji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of producing integrated semiconductor structures comprising...
- Patent number 4,980,317
- Issue date Dec 25, 1990
- International Business Machines Corporation
- Otto Koblinger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photolithographic method for manufacturing semiconductor wiring pat...
- Patent number 4,952,528
- Issue date Aug 28, 1990
- Kabushiki Kaisha Toshiba
- Masahiro Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for patterning photo resist film
- Patent number 4,900,696
- Issue date Feb 13, 1990
- Kabushiki Kaisha Toshiba
- Yasushi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Flame ashing process for stripping photoresist
- Patent number 4,845,053
- Issue date Jul 4, 1989
- John Zajac
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for forming sub-micrometer patterns using silylation of res...
- Patent number 4,803,181
- Issue date Feb 7, 1989
- International Business Machines Corporation
- Peter L. Buchmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process
- Patent number 4,771,017
- Issue date Sep 13, 1988
- Spire Corporation
- Stephen P. Tobin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for making self-aligning thin film transistors
- Patent number 4,767,723
- Issue date Aug 30, 1988
- International Business Machines Corporation
- William D. Hinsberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Micro fabrication process for semiconductor structure using coheren...
- Patent number 4,748,132
- Issue date May 31, 1988
- Hitachi, Ltd.
- Tadashi Fukuzawa
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
Method of manufacturing member pattern and method of manufacturing...
- Publication number 20030027417
- Publication date Feb 6, 2003
- Yoshimi Uda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor device
- Publication number 20020160619
- Publication date Oct 31, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Tetsuya Yamada
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method of manufacturing member pattern and method of manufacturing...

Method of manufacturing semiconductor device

Method and structure to reduce latch-up using edge implants

Method and structure to reduce latch-up using edge implants

Method of processing a semiconductor wafer for controlling drive cu...

Method and structure to reduce latch-up using edge implants

Semiconductor IC device fabricating method

Metal layout pattern for improved passivation layer coverage

Semiconductor IC device fabricating method

Method to solve holes in passivation by metal layout

C-MOS thin film transistor device manufacturing method

Method of making thin film transistors

Process for the vapor deposition of polysilanes photoresists

Method for forming a fine pattern by using a patterned resist layer

Method of etching isolation and alignment mark regions using a sing...

Thin coatings for use in semiconductor integrated circuits and proc...

Method of manufacturing a semiconductor device

Method for improving photoresist on wafers by applying fluid layer...

Photolithographic processes using thin coatings of refractory metal...

Method of forming a passivation film

Production of electronic coatings by spin coating a partially fluor...

Making a semiconductor device with ammonia treatment of photoresist

Method of producing integrated semiconductor structures comprising...

Photolithographic method for manufacturing semiconductor wiring pat...

Method for patterning photo resist film

Flame ashing process for stripping photoresist

Process for forming sub-micrometer patterns using silylation of res...

Patterning process

Process for making self-aligning thin film transistors

Micro fabrication process for semiconductor structure using coheren...

Patents Applicationslast 30 patents

Method of manufacturing member pattern and method of manufacturing...

Method of manufacturing semiconductor device