Scanning exposure

Industry

CPC
G03F7/70358

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70358Scanning exposure

Industries

Patents Grantslast 30 patents

Information Patent Grant
Substrate stage and substrate processing system using the same
- Patent number 12,111,582
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Huan Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing photo masks
- Patent number 12,038,693
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Advanced-packaging high-volume-mode digital-lithography-tool
- Patent number 12,032,284
- Issue date Jul 9, 2024
- Applied Materials, Inc.
- Shih-Hao Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 11,809,087
- Issue date Nov 7, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kai-Chieh Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and method of manufacturing article
- Patent number 11,762,299
- Issue date Sep 19, 2023
- Canon Kabushiki Kaisha
- Keiji Emoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate stage, substrate processing system using the same, and me...
- Patent number 11,747,741
- Issue date Sep 5, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Huan Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing photo masks
- Patent number 11,687,006
- Issue date Jun 27, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for illuminating image points
- Patent number 11,681,228
- Issue date Jun 20, 2023
- EV Group E. Thallner GmbH
- Bernhard Thallner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method
- Patent number 11,644,755
- Issue date May 9, 2023
- ASML Netherland B.V.
- Bearrach Moest
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Control apparatus, exposure apparatus, and method of manufacturing...
- Patent number 11,630,398
- Issue date Apr 18, 2023
- Canon Kabushiki Kaisha
- Takashi Kurihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method and lithographic apparatus
- Patent number 11,493,851
- Issue date Nov 8, 2022
- ASML Netherlands B.V.
- Hakki Ergün Cekli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for illumination adjustment
- Patent number 11,429,029
- Issue date Aug 30, 2022
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Particle removal device and method
- Patent number 11,392,041
- Issue date Jul 19, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Hsuan Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device manufacturing method and computer program
- Patent number 11,372,339
- Issue date Jun 28, 2022
- ASML Netherlands B.V.
- Giovanni Luca Gattobigio
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for configuring spatial dimensions of a beam d...
- Patent number 11,366,396
- Issue date Jun 21, 2022
- ASML Netherlands B.V.
- Daan Maurits Slotboom
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Control method for a scanning exposure apparatus
- Patent number 11,360,395
- Issue date Jun 14, 2022
- ASML Netherlands B.V.
- Valerio Altini
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing photo masks
- Patent number 11,327,405
- Issue date May 10, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic apparatus, an operating method and device manufacturin...
- Patent number 11,243,477
- Issue date Feb 8, 2022
- ASML Netherlands B.V.
- Gudrun Ghilaine Agnes De Gersem
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask
- Patent number 11,221,559
- Issue date Jan 11, 2022
- Toppan Printing Co., Ltd.
- Akihito Okumura
- G02 - OPTICS
Information Patent Grant
Exposure apparatus, and article manufacturing method
- Patent number 11,215,930
- Issue date Jan 4, 2022
- Canon Kabushiki Kaisha
- Michio Kono
- G02 - OPTICS
Information Patent Grant
Performance optimized scanning sequence for eBeam metrology and ins...
- Patent number 11,209,737
- Issue date Dec 28, 2021
- KLA Corporation
- Henning Stoschus
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Exposure method, exposure apparatus, method of manufacturing articl...
- Patent number 11,194,257
- Issue date Dec 7, 2021
- Canon Kabushiki Kaisha
- Masaki Tai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, and article manufacturing method
- Patent number 11,187,988
- Issue date Nov 30, 2021
- Canon Kabushiki Kaisha
- Michio Kono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Movable body apparatus, moving method, exposure apparatus, exposure...
- Patent number 11,187,999
- Issue date Nov 30, 2021
- Nikon Corporation
- Yasuo Aoki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic method and lithographic apparatus
- Patent number 11,156,923
- Issue date Oct 26, 2021
- ASML Netherlands B.V.
- Hakki Ergün Cekli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method, exposure apparatus, and device manufacturing method
- Patent number 11,067,894
- Issue date Jul 20, 2021
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Real-time autofocus for maskless lithography on substrates
- Patent number 11,067,905
- Issue date Jul 20, 2021
- Applied Materials, Inc.
- Diana Valverde-Paniagua
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dense line extreme ultraviolet lithography system with distortion m...
- Patent number 11,067,900
- Issue date Jul 20, 2021
- NIKON CORPORATION
- Michael B. Binnard
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus with improved patterning performance
- Patent number 11,048,178
- Issue date Jun 29, 2021
- ASML Netherlands B.V.
- Federico La Torre
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoetching apparatus and method
- Patent number 11,042,099
- Issue date Jun 22, 2021
- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Chang Zhou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR SUBSTRATE STAGE FOR CARRING SUBSTRATE
- Publication number 20240377762
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Huan CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE DEVICE
- Publication number 20240345486
- Publication date Oct 17, 2024
- Nikon Corporation
- Masaki KATO
- G02 - OPTICS
Information Patent Application
METHOD OF MANUFACTURING PHOTO MASKS
- Publication number 20240337951
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Cheng CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COOLING HOOD FOR RETICLE
- Publication number 20240288783
- Publication date Aug 29, 2024
- ASML NETHERLANDS B.V.
- Marcus Adrianus VAN DE KERKHOF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIGITAL LITHOGRAPHY EXPOSURE UNIT BOUNDARY SMOOTHING
- Publication number 20240280911
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- CHI-MING TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTRONIC DEVICE MANUFACTURING METHOD AND LITHOGRAPHY CONTROL PROC...
- Publication number 20240219846
- Publication date Jul 4, 2024
- Gigaphoton Inc.
- Koichi FUJII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETERMINATION METHOD, EXPOSURE METHOD, METHOD OF MANUFACTURING ARTI...
- Publication number 20240176250
- Publication date May 30, 2024
- Canon Kabushiki Kaisha
- ATSUSHI TAKAGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPATIAL LIGHT MODULATION UNIT AND EXPOSURE APPARATUS
- Publication number 20240126176
- Publication date Apr 18, 2024
- Nikon Corporation
- Yasuhito KUBOTA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING METHOD, ST...
- Publication number 20240069444
- Publication date Feb 29, 2024
- Canon Kabushiki Kaisha
- YOSHIHIRO OMAMEUDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD AND ARTICLE MANUFACTURING METHOD
- Publication number 20240053686
- Publication date Feb 15, 2024
- Canon Kabushiki Kaisha
- MASAKI IMAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ADVANCED-PACKAGING HIGH-VOLUME-MODE DIGITAL-LITHOGRAPHY-TOOL
- Publication number 20240027896
- Publication date Jan 25, 2024
- Applied Materials, Inc.
- Shih-Hao Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20230393486
- Publication date Dec 7, 2023
- Canon Kabushiki Kaisha
- Keiji Emoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20230384688
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kai-Chieh CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE STAGE AND SUBSTRATE PROCESSING SYSTEM USING THE SAME
- Publication number 20230359133
- Publication date Nov 9, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Huan CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE DEVICE AND PROJECTION EXPOSURE METHOD
- Publication number 20230359126
- Publication date Nov 9, 2023
- V TECHNOLOGY CO., LTD.
- Yoshiyuki ENOMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PRINT ELEMENT SUBSTRATE AND METHOD FOR MANUFACTURING PRINT ELEMENT...
- Publication number 20230341762
- Publication date Oct 26, 2023
- Canon Kabushiki Kaisha
- KEIJI MATSUMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR DETERMINING THE HEATING STATE OF AN OPTICAL E...
- Publication number 20230288260
- Publication date Sep 14, 2023
- Carl Zeiss SMT GMBH
- Johannes Schurer
- G01 - MEASURING TESTING
Information Patent Application
Pellicle Frame, Pellicle, Exposure Original Plate with Pellicle, Ex...
- Publication number 20230061797
- Publication date Mar 2, 2023
- Shin-Etsu Chemical Co., Ltd.
- Akinori Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20230013155
- Publication date Jan 19, 2023
- Canon Kabushiki Kaisha
- Keiji Emoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reduced Spatial/Temporal Overlaps to Increase Temporal Overlaps to...
- Publication number 20230011739
- Publication date Jan 12, 2023
- Nigel D Browning
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES USING A PHOTOMASK
- Publication number 20220382168
- Publication date Dec 1, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chung-Hao CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20220350259
- Publication date Nov 3, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kai-Chieh CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PARTICLE REMOVAL DEVICE AND METHOD
- Publication number 20220334496
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Hsuan Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR CLEANING AN EUV MASK WITHIN A SCANNER
- Publication number 20220299882
- Publication date Sep 22, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yuru Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE STAGE, SUBSTRATE PROCESSING SYSTEM USING THE SAME, AND ME...
- Publication number 20220283517
- Publication date Sep 8, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Huan CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE MANUFACTURING METHOD AND COMPUTER PROGRAM
- Publication number 20220187717
- Publication date Jun 16, 2022
- ASML NETHERLANDS B.V.
- Giovanni Luca GATTOBIGIO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PARTICLE REMOVAL DEVICE AND METHOD
- Publication number 20220100100
- Publication date Mar 31, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Hsuan Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC PATTERNING METHOD AND SYSTEM THEREFORE
- Publication number 20220057720
- Publication date Feb 24, 2022
- NEDERLANDSE ORGANISATIE VOOR TOEGEPAST- NATUURWETENSCHAPPELIJK ONDERZOEK TNO
- Diederik Jan MAAS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SCANNING LIGHT MEASURING APPARATUS
- Publication number 20220011568
- Publication date Jan 13, 2022
- TOSHIBA TEC KABUSHIKI KAISHA
- Miki Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD AND LITHOGRAPHIC APPARATUS
- Publication number 20220011681
- Publication date Jan 13, 2022
- ASML NETHERLANDS B.V.
- Hakki Ergün CEKLI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Scanning exposure

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Substrate stage and substrate processing system using the same

Method of manufacturing photo masks

Advanced-packaging high-volume-mode digital-lithography-tool

Semiconductor processing tool and methods of operation

Exposure apparatus and method of manufacturing article

Substrate stage, substrate processing system using the same, and me...

Method of manufacturing photo masks

Method and apparatus for illuminating image points

Lithographic method

Control apparatus, exposure apparatus, and method of manufacturing...

Lithographic method and lithographic apparatus

Method and apparatus for illumination adjustment

Particle removal device and method

Device manufacturing method and computer program

Method and apparatus for configuring spatial dimensions of a beam d...

Control method for a scanning exposure apparatus

Method of manufacturing photo masks

Lithographic apparatus, an operating method and device manufacturin...

Photomask

Exposure apparatus, and article manufacturing method

Performance optimized scanning sequence for eBeam metrology and ins...

Exposure method, exposure apparatus, method of manufacturing articl...

Exposure apparatus, and article manufacturing method

Movable body apparatus, moving method, exposure apparatus, exposure...

Lithographic method and lithographic apparatus

Exposure method, exposure apparatus, and device manufacturing method

Real-time autofocus for maskless lithography on substrates

Dense line extreme ultraviolet lithography system with distortion m...

Lithographic apparatus with improved patterning performance

Photoetching apparatus and method

Patents Applicationslast 30 patents

SEMICONDUCTOR SUBSTRATE STAGE FOR CARRING SUBSTRATE

EXPOSURE DEVICE

METHOD OF MANUFACTURING PHOTO MASKS

COOLING HOOD FOR RETICLE

DIGITAL LITHOGRAPHY EXPOSURE UNIT BOUNDARY SMOOTHING

ELECTRONIC DEVICE MANUFACTURING METHOD AND LITHOGRAPHY CONTROL PROC...

DETERMINATION METHOD, EXPOSURE METHOD, METHOD OF MANUFACTURING ARTI...

SPATIAL LIGHT MODULATION UNIT AND EXPOSURE APPARATUS

INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING METHOD, ST...

EXPOSURE APPARATUS, EXPOSURE METHOD AND ARTICLE MANUFACTURING METHOD

ADVANCED-PACKAGING HIGH-VOLUME-MODE DIGITAL-LITHOGRAPHY-TOOL

EXPOSURE APPARATUS AND METHOD OF MANUFACTURING ARTICLE

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

SUBSTRATE STAGE AND SUBSTRATE PROCESSING SYSTEM USING THE SAME

PROJECTION EXPOSURE DEVICE AND PROJECTION EXPOSURE METHOD

PRINT ELEMENT SUBSTRATE AND METHOD FOR MANUFACTURING PRINT ELEMENT...

METHOD AND DEVICE FOR DETERMINING THE HEATING STATE OF AN OPTICAL E...

Pellicle Frame, Pellicle, Exposure Original Plate with Pellicle, Ex...

EXPOSURE APPARATUS AND METHOD OF MANUFACTURING ARTICLE

Reduced Spatial/Temporal Overlaps to Increase Temporal Overlaps to...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES USING A PHOTOMASK

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

PARTICLE REMOVAL DEVICE AND METHOD

SYSTEM AND METHOD FOR CLEANING AN EUV MASK WITHIN A SCANNER

SUBSTRATE STAGE, SUBSTRATE PROCESSING SYSTEM USING THE SAME, AND ME...

DEVICE MANUFACTURING METHOD AND COMPUTER PROGRAM

PARTICLE REMOVAL DEVICE AND METHOD

LITHOGRAPHIC PATTERNING METHOD AND SYSTEM THEREFORE

SCANNING LIGHT MEASURING APPARATUS

LITHOGRAPHIC METHOD AND LITHOGRAPHIC APPARATUS