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H
ELECTRICITY
H01
Electric elements
H01J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
H01J2237/00
Discharge tubes exposing object to beam
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H01J2237/3346
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Patents Grants
last 30 patents
Information
Patent Grant
Plasma etching techniques
Patent number
11,482,423
Issue date
Oct 25, 2022
Tokyo Electron Limited
Pingshan Luan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Etching method and etching device
Patent number
11,443,952
Issue date
Sep 13, 2022
Tokyo Electron Limited
Akitaka Shimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Chamber conditioning and removal processes
Patent number
11,328,909
Issue date
May 10, 2022
Applied Materials, Inc.
Hanshen Zhang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma etching apparatus and method
Patent number
10,861,678
Issue date
Dec 8, 2020
Tokyo Electron Limited
Akira Koshiishi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Selective atomic layer etching
Patent number
10,847,375
Issue date
Nov 24, 2020
Lam Research Corporation
Chia-Chun Wang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Power modulation for etching high aspect ratio features
Patent number
10,410,873
Issue date
Sep 10, 2019
Tokyo Electron Limited
Hiroto Ohtake
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma etching apparatus and method
Patent number
10,229,815
Issue date
Mar 12, 2019
Tokyo Electron Limited
Akira Koshiishi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Etch suppression with germanium
Patent number
9,576,809
Issue date
Feb 21, 2017
Applied Materials, Inc.
Mikhail Korolik
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for manufacturing touch screen panels using a dry etching ap...
Patent number
9,552,122
Issue date
Jan 24, 2017
Samsung Display Co., Ltd.
Bong-Sub Song
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Etching method
Patent number
9,105,585
Issue date
Aug 11, 2015
Tokyo Electron Limited
Hironori Matsuoka
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Structure and method for improving solar cell efficiency and mechan...
Patent number
8,828,517
Issue date
Sep 9, 2014
Solexel, Inc.
David Xuan-Qi Wang
Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information
Patent Grant
Gas cluster ion beam etching process for Si-containing and Ge-conta...
Patent number
8,513,138
Issue date
Aug 20, 2013
TEL Epion Inc.
Yan Shao
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Low ceiling temperature process for a plasma reactor with heated so...
Patent number
6,818,140
Issue date
Nov 16, 2004
Jian Ding
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma reactor having RF power applicator and a dual-purpose window
Patent number
6,790,311
Issue date
Sep 14, 2004
Kenneth S Collins
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Inductively coupled RF plasma reactor and plasma chamber enclosure...
Patent number
6,736,931
Issue date
May 18, 2004
Kenneth S. Collins
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma reactor having an inductive antenna coupling power through a...
Patent number
6,623,596
Issue date
Sep 23, 2003
Applied Materials, Inc.
Kenneth S. Collins
A21 - BAKING EDIBLE DOUGHS
Information
Patent Grant
Parallel-plate electrode plasma reactor having an inductive antenna...
Patent number
6,572,732
Issue date
Jun 3, 2003
Applied Materials Inc.
Kenneth S. Collins
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Thermal control apparatus for inductively coupled RF plasma reactor...
Patent number
6,514,376
Issue date
Feb 4, 2003
Applied Materials Inc.
Kenneth Collins
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Inductively coupled RF Plasma reactor having an overhead solenoidal...
Patent number
6,454,898
Issue date
Sep 24, 2002
Applied Materials, Inc.
Kenneth Collins
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Inductively coupled RF plasma reactor having an antenna adjacent a...
Patent number
6,444,085
Issue date
Sep 3, 2002
Applied Materials Inc.
Kenneth S. Collins
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma reactor with heated source of a polymer-hardening precursor...
Patent number
6,440,866
Issue date
Aug 27, 2002
Applied Materials, Inc.
Kenneth S. Collins
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma reactor having a dual mode RF power application
Patent number
6,365,063
Issue date
Apr 2, 2002
Applied Materials, Inc.
Kenneth S Collins
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Parallel-plate electrode reactor having an inductive antenna coupli...
Patent number
6,361,644
Issue date
Mar 26, 2002
Applied Materials, Inc.
Kenneth S. Collins
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
High pressure high non-reactive diluent gas content high plasma ion...
Patent number
6,238,588
Issue date
May 29, 2001
Applied Materials, Inc.
Kenneth Collins
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Scavenging fluorine in a planar inductively coupled plasma reactor
Patent number
6,217,785
Issue date
Apr 17, 2001
Applied Materials, Inc.
Kenneth S. Collins
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma reactor with heated source of a polymer-hardening precursor...
Patent number
6,218,312
Issue date
Apr 17, 2001
Applied Materials Inc.
Kenneth S. Collins
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Oxide etch process with high selectivity to nitride suitable for us...
Patent number
6,184,150
Issue date
Feb 6, 2001
Applied Materials Inc.
Chan-Lon Yang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Inductively coupled RF plasma reactor having an overhead solenoidal...
Patent number
6,165,311
Issue date
Dec 26, 2000
Applied Materials, Inc.
Kenneth S. Collins
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Helicon wave plasma processing apparatus
Patent number
6,096,160
Issue date
Aug 1, 2000
Sony Corporation
Shingo Kadomura
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Vacuum processing chamber having multi-mode access
Patent number
6,095,083
Issue date
Aug 1, 2000
Applied Materiels, Inc.
Michael Rice
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Patents Applications
last 30 patents
Information
Patent Application
Multiple State Pulsing for High Aspect Ratio Etch
Publication number
20240120205
Publication date
Apr 11, 2024
LAM RESEARCH CORPORATION
Aniruddha Joi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
System and Method for Plasma Process Uniformity Control
Publication number
20240120181
Publication date
Apr 11, 2024
TOKYO ELECTRON LIMITED
Sergey Voronin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
In-Situ Adsorbate Formation for Dielectric Etch
Publication number
20240112888
Publication date
Apr 4, 2024
TOKYO ELECTRON LIMITED
Du Zhang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
In-Situ Adsorbate Formation for Plasma Etch Process
Publication number
20240112887
Publication date
Apr 4, 2024
TOKYO ELECTRON LIMITED
Du Zhang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
High Aspect Ratio Contact (HARC) Etch
Publication number
20240096640
Publication date
Mar 21, 2024
TOKYO ELECTRON LIMITED
Pingshan Luan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA ETCHING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR EL...
Publication number
20240038546
Publication date
Feb 1, 2024
SHOWA DENKO K.K.
Kazuma MATSUI
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Application
ETCHING METHOD AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE
Publication number
20230395389
Publication date
Dec 7, 2023
Resonac Corporation
Jumpei IWASAKI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
ETCHING METHOD AND SEMICONDUCTOR ELEMENT MANUFACTURING METHOD
Publication number
20230290643
Publication date
Sep 14, 2023
SHOWA DENKO K,K,
Kazuma MATSUI
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM
Publication number
20230268190
Publication date
Aug 24, 2023
TOKYO ELECTRON LIMITED
Atsuki HASHIMOTO
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
ETCHING METHOD AND PLASMA PROCESSING SYSTEM
Publication number
20230230844
Publication date
Jul 20, 2023
TOKYO ELECTRON LIMITED
Maju TOMURA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA-BASED METHOD FOR DELAYERING OF CIRCUITS
Publication number
20230223273
Publication date
Jul 13, 2023
National Technology & Engineering Solutions of Sandia, LLC
Randy J. Shul
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF TREATING SUBSTRATE AND APPARATUS FOR TREATING SUBSTRATE
Publication number
20230215699
Publication date
Jul 6, 2023
SEMES CO., LTD.
Myoungsub NOH
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
APPARATUS AND METHOD FOR PROCESSING SUBSTRATE USING PLASMA
Publication number
20230197412
Publication date
Jun 22, 2023
SEMES CO, LTD.
Seong Gil LEE
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF PROCESSING SUBSTRATE
Publication number
20230154731
Publication date
May 18, 2023
TES CO., LTD.
Bong-Soo KWON
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
Publication number
20230124597
Publication date
Apr 20, 2023
TOKYO ELECTRON LIMITED
Nobuhiro TAKAHASHI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
HIGH ASPECT RATIO ETCH WITH INFINITE SELECTIVITY
Publication number
20230081817
Publication date
Mar 16, 2023
LAM RESEARCH CORPORATION
Leonid Belau
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
MULTI-STATE PULSING FOR ACHIEVING A BALANCE BETWEEN BOW CONTROL AND...
Publication number
20230005717
Publication date
Jan 5, 2023
LAM RESEARCH CORPORATION
Nikhil Dole
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
Publication number
20220375724
Publication date
Nov 24, 2022
TOKYO ELECTRON LIMITED
Manabu OIE
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
MULTI-STATE RF PULSING TO CONTROL MASK SHAPE AND BREAKING SELECTIVI...
Publication number
20220285130
Publication date
Sep 8, 2022
LAM RESEARCH CORPORATION
Nikhil Dole
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA ETCHING TECHNIQUES
Publication number
20220238344
Publication date
Jul 28, 2022
TOKYO ELECTRON LIMITED
Pingshan Luan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Etching Method and Etching Device
Publication number
20210151326
Publication date
May 20, 2021
TOKYO ELECTRON LIMITED
Akitaka SHIMIZU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
CHAMBER CONDITIONING AND REMOVAL PROCESSES
Publication number
20190198300
Publication date
Jun 27, 2019
Applied Materials, Inc.
Hanshen Zhang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
STRUCTURES AND METHODS FOR IMPROVING SOLAR CELL EFFICIENCY AND MECH...
Publication number
20150162465
Publication date
Jun 11, 2015
SOLEXEL, INC.
Pawan Kapur
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA ETCHING APPARATUS AND METHOD
Publication number
20150000843
Publication date
Jan 1, 2015
TOKYO ELECTRON LIMITED
Akira KOSHIISHI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
ETCHING METHOD
Publication number
20140308817
Publication date
Oct 16, 2014
Hironori Matsuoka
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
GAS CLUSTER ION BEAM ETCHING PROCESS FOR Si-CONTAINING and Ge-CONTA...
Publication number
20130059445
Publication date
Mar 7, 2013
TEL EPION, INC.
Yan SHAO
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Dry etching apparatus and method for manufacturing touch screen pan...
Publication number
20110226726
Publication date
Sep 22, 2011
Bong-Sub Song
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
STRUCTURE AND METHOD FOR IMPROVING SOLAR CELL EFFICIENCY AND MECHAN...
Publication number
20100294333
Publication date
Nov 25, 2010
SOLEXEL, INC.
David Xuan-Qi Wang
Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information
Patent Application
PLASMA ETCHING APPARATUS AND METHOD
Publication number
20080110859
Publication date
May 15, 2008
TOKYO ELECTRON LIMITED
Akira Koshiishi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Inductively coupled RF plasma reactor and plasma chamber enclosure...
Publication number
20040163764
Publication date
Aug 26, 2004
APPLIED MATERIALS, INC.
Kenneth S. Collins
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...