Signal processing

Industry

CPC
G03F9/7092

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces

Current Industry

G03F9/7092Signal processing

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Height measurement method and height measurement system
- Patent number 12,253,807
- Issue date Mar 18, 2025
- ASML Netherlands B.V.
- Andrey Valerievich Rogachevskiy
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Processing system, processing method, measurement apparatus, substr...
- Patent number 12,140,878
- Issue date Nov 12, 2024
- Canon Kabushiki Kaisha
- Shinichi Egashira
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus and method for optimizing actuator forces
- Patent number 12,124,165
- Issue date Oct 22, 2024
- Canon Kabushiki Kaisha
- Nilabh K. Roy
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of determining position of mark, lithography method, exposur...
- Patent number 12,092,967
- Issue date Sep 17, 2024
- Canon Kabushiki Kaisha
- Ryota Makino
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement of stitching error using split targets
- Patent number 12,094,100
- Issue date Sep 17, 2024
- KLA Corporation
- Mark Ghinovker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Detection method, detection apparatus, lithography apparatus, and a...
- Patent number 12,061,079
- Issue date Aug 13, 2024
- Canon Kabushiki Kaisha
- Masaharu Kajitani
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method and associated metrology and lithographic apparatuses
- Patent number 12,032,299
- Issue date Jul 9, 2024
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment method and associated alignment and lithographic apparatuses
- Patent number 12,032,305
- Issue date Jul 9, 2024
- ASML Netherlands B.V.
- Edo Maria Hulsebos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining a center of a radiation spot, sensor and sta...
- Patent number 11,982,948
- Issue date May 14, 2024
- ASML Netherlands B.V.
- Mihaita Popinciuc
- G01 - MEASURING TESTING
Information Patent Grant
Methods and apparatus for obtaining diagnostic information relating...
- Patent number 11,940,740
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Alexander Ypma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Alignment method and associated alignment and lithographic apparatuses
- Patent number 11,927,892
- Issue date Mar 12, 2024
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Bonding alignment marks at bonding interface
- Patent number 11,876,049
- Issue date Jan 16, 2024
- Yangtze Memory Technologies Co., Ltd.
- Meng Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for calibrating alignment of wafer and lithography system
- Patent number 11,854,854
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chang-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alignment sensor based on wavelength-scanning
- Patent number 11,841,626
- Issue date Dec 12, 2023
- ASML Holding N.V.
- Muhsin Eralp
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for enhancing alignment performance of lithograph...
- Patent number 11,796,927
- Issue date Oct 24, 2023
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Zhao Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Misalignment measuring apparatus and misalignment measuring method
- Patent number 11,776,112
- Issue date Oct 3, 2023
- Kioxia Corporation
- Yuki Watanabe
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Alignment method
- Patent number 11,762,305
- Issue date Sep 19, 2023
- ASML Netherlands B.V.
- Sergei Sokolov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Processing system, processing method, measurement apparatus, substr...
- Patent number 11,726,412
- Issue date Aug 15, 2023
- Canon Kabushiki Kaisha
- Shinichi Egashira
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Measurement apparatus, lithography apparatus and article manufactur...
- Patent number 11,693,328
- Issue date Jul 4, 2023
- Canon Kabushiki Kaisha
- Wataru Yamaguchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus and method for measuring substrate height
- Patent number 11,662,669
- Issue date May 30, 2023
- ASML Netherlands B.V.
- Andrey Valerievich Rogachevskiy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment mark evaluation method and alignment mark evaluation system
- Patent number 11,586,118
- Issue date Feb 21, 2023
- GHANGXIN MEMORY TECHNOLOGIES, INC.
- Liyuan Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology method and apparatus, substrate, lithographic system and...
- Patent number 11,526,085
- Issue date Dec 13, 2022
- ASML Netherlands B.V.
- Hendrik Jan Hidde Smilde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Adaptive alignment
- Patent number 11,513,446
- Issue date Nov 29, 2022
- ASML Holding N.V.
- Greger Göte Andersson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Noise correction for alignment signal
- Patent number 11,493,852
- Issue date Nov 8, 2022
- ASML Holdings N.V.
- Zahrasadat Dastouri
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for monitoring a lithographic manufacturing p...
- Patent number 11,422,476
- Issue date Aug 23, 2022
- ASML Netherlands B.V.
- Emil Peter Schmitt-Weaver
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining a position of a feature
- Patent number 11,392,044
- Issue date Jul 19, 2022
- ASML Netherlands B.V.
- Ralph Timotheus Huijgen
- G01 - MEASURING TESTING
Information Patent Grant
Methods and apparatus for obtaining diagnostic information relating...
- Patent number 11,385,550
- Issue date Jul 12, 2022
- ASML Netherlands B.V.
- Alexander Ypma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for evaluating control strategies in a semiconductor manufac...
- Patent number 11,372,338
- Issue date Jun 28, 2022
- ASML Netherlands B.V.
- Ivo Matteo Leonardus Weijden
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Position measurement apparatus, overlay inspection apparatus, posit...
- Patent number 11,372,342
- Issue date Jun 28, 2022
- Canon Kabushiki Kaisha
- Toshiki Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment apparatus, alignment method, lithography apparatus, and m...
- Patent number 11,360,401
- Issue date Jun 14, 2022
- Canon Kabushiki Kaisha
- Shinichi Egashira
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
POSITION MEASURING METHOD, METHOD FOR MANUFACTURING ARTICLE, POSITI...
- Publication number 20250085645
- Publication date Mar 13, 2025
- Canon Kabushiki Kaisha
- Nozomu Hayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AN OPTICAL SYSTEM IMPLEMENTED IN A SYSTEM FOR FAST OPTICAL INSPECTI...
- Publication number 20250060684
- Publication date Feb 20, 2025
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ENHANCED ALIGNMENT FOR A PHOTOLITHOGRAPHIC APPARATUS
- Publication number 20250053106
- Publication date Feb 13, 2025
- ASML Netherlands B,V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY METROLOGY BASED ON TEMPLATE MATCHING WITH ADAPTIVE WEIGHTING
- Publication number 20250044710
- Publication date Feb 6, 2025
- ASML NETHERLANDS B.V.
- Jiyou FU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD, INFORMATION PROCE...
- Publication number 20250036032
- Publication date Jan 30, 2025
- Canon Kabushiki Kaisha
- FUMA KIZU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD
- Publication number 20240377767
- Publication date Nov 14, 2024
- Canon Kabushiki Kaisha
- MIZUKI ISHIMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SCALABLE NANOIMPRINT MANUFACTURING OF FUNCTIONAL MULTI-LAYER METASU...
- Publication number 20240369738
- Publication date Nov 7, 2024
- Arizona Board of Regents on behalf of Arizona State University
- Chao WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHOD
- Publication number 20240353761
- Publication date Oct 24, 2024
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN CORRECTION DEVICE, PATTERN CORRECTION METHOD, AND PATTERN F...
- Publication number 20240302758
- Publication date Sep 12, 2024
- Samsung Electronics Co., Ltd.
- Ingyun CHUNG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASURING METHOD OF MEASURING SUBSTRATE BY CAPTURING IMAGES OF MARK...
- Publication number 20240288787
- Publication date Aug 29, 2024
- Canon Kabushiki Kaisha
- WATARU YAMAGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTENSITY IMBALANCE CALIBRATION ON AN OVERFILLED BIDIRECTIONAL MARK
- Publication number 20240263941
- Publication date Aug 8, 2024
- ASML NETHERLANDS B.V.
- Rui CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES
- Publication number 20240210844
- Publication date Jun 27, 2024
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ASYMMETRY EXTENDED GRID MODEL FOR WAFER ALIGNMENT
- Publication number 20240168397
- Publication date May 23, 2024
- ASML NETHERLANDS B.V.
- Joshua ADAMS
- G01 - MEASURING TESTING
Information Patent Application
DATA FILTER FOR SCANNING METROLOGY
- Publication number 20240069454
- Publication date Feb 29, 2024
- ASML NETHERLANDS B.V.
- Cristina CARESIO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING A FOCUS ACTUATION PROFILE FOR ONE OR MORE AC...
- Publication number 20240061353
- Publication date Feb 22, 2024
- ASML NETHERLANDS B.V.
- Simon Hendrik Celine VAN GORP
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF METROLOGY AND ASSOCIATED APPARATUSES
- Publication number 20240036484
- Publication date Feb 1, 2024
- ASML NETHERLANDS B.V.
- Timothy Dugan DAVIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEEP LEARNING BASED ADAPTIVE ALIGNMENT PRECISION METROLOGY FOR DIGI...
- Publication number 20230408932
- Publication date Dec 21, 2023
- Applied Materials, Inc.
- Tamer COSKUN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROCESSING SYSTEM, PROCESSING METHOD, MEASUREMENT APPARATUS, SUBSTR...
- Publication number 20230359134
- Publication date Nov 9, 2023
- Canon Kabushiki Kaisha
- Shinichi Egashira
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MEASUREMENT APPARATUS, LITHOGRAPHY APPARATUS AND ARTICLE MANUFACTUR...
- Publication number 20230288823
- Publication date Sep 14, 2023
- Canon Kabushiki Kaisha
- Wataru Yamaguchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MEASUREMENT OF STITCHING ERROR USING SPLIT TARGETS
- Publication number 20230281779
- Publication date Sep 7, 2023
- KLA Corporation
- Mark GHINOVKER
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES
- Publication number 20230259042
- Publication date Aug 17, 2023
- ASML NETHERLANDS B.V.
- Sarathi ROY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HEIGHT MEASUREMENT METHOD AND HEIGHT MEASUREMENT SYSTEM
- Publication number 20230244153
- Publication date Aug 3, 2023
- ASML NETHERLANDS B.V.
- Andrey Valerievich ROGACHEVSKIY
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETECTION APPARATUS, DETECTION METHOD, EXPOSURE APPARATUS AND ARTIC...
- Publication number 20230229095
- Publication date Jul 20, 2023
- Canon Kabushiki Kaisha
- HIRONORI MAEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GENERATING AN ALIGNMENT SIGNAL BASED ON LOCAL ALIGNMENT MARK DISTOR...
- Publication number 20230176494
- Publication date Jun 8, 2023
- ASML Holding N.V.
- Zahrasadat DASTOURI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES
- Publication number 20230168595
- Publication date Jun 1, 2023
- ASML NETHERLANDS B.V.
- Edo Maria HULSEBOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR OPTIMIZING ACTUATOR FORCES
- Publication number 20230127984
- Publication date Apr 27, 2023
- Canon Kabushiki Kaisha
- Nilabh K. Roy
- B82 - NANO-TECHNOLOGY
Information Patent Application
ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES
- Publication number 20230004097
- Publication date Jan 5, 2023
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALIGNMENT METHOD
- Publication number 20220382175
- Publication date Dec 1, 2022
- ASML NETHERLANDS B.V.
- Sergei SOKOLOV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MARK DETECTING APPARATUS, MARK LEARNING APPARATUS, SUBSTRATE PROCES...
- Publication number 20220365454
- Publication date Nov 17, 2022
- Canon Kabushiki Kaisha
- Masashi Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESSING SYSTEM, PROCESSING METHOD, MEASUREMENT APPARATUS, SUBSTR...
- Publication number 20220342324
- Publication date Oct 27, 2022
- Canon Kabushiki Kaisha
- Shinichi Egashira
- G06 - COMPUTING CALCULATING COUNTING

Signal processing

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Height measurement method and height measurement system

Processing system, processing method, measurement apparatus, substr...

Apparatus and method for optimizing actuator forces

Method of determining position of mark, lithography method, exposur...

Measurement of stitching error using split targets

Detection method, detection apparatus, lithography apparatus, and a...

Metrology method and associated metrology and lithographic apparatuses

Alignment method and associated alignment and lithographic apparatuses

Method for determining a center of a radiation spot, sensor and sta...

Methods and apparatus for obtaining diagnostic information relating...

Alignment method and associated alignment and lithographic apparatuses

Bonding alignment marks at bonding interface

Method for calibrating alignment of wafer and lithography system

Alignment sensor based on wavelength-scanning

Method and device for enhancing alignment performance of lithograph...

Misalignment measuring apparatus and misalignment measuring method

Alignment method

Processing system, processing method, measurement apparatus, substr...

Measurement apparatus, lithography apparatus and article manufactur...

Apparatus and method for measuring substrate height

Alignment mark evaluation method and alignment mark evaluation system

Metrology method and apparatus, substrate, lithographic system and...

Adaptive alignment

Noise correction for alignment signal

Methods and apparatus for monitoring a lithographic manufacturing p...

Method of determining a position of a feature

Methods and apparatus for obtaining diagnostic information relating...

Method for evaluating control strategies in a semiconductor manufac...

Position measurement apparatus, overlay inspection apparatus, posit...

Alignment apparatus, alignment method, lithography apparatus, and m...

Patents Applicationslast 30 patents

POSITION MEASURING METHOD, METHOD FOR MANUFACTURING ARTICLE, POSITI...

AN OPTICAL SYSTEM IMPLEMENTED IN A SYSTEM FOR FAST OPTICAL INSPECTI...

ENHANCED ALIGNMENT FOR A PHOTOLITHOGRAPHIC APPARATUS

OVERLAY METROLOGY BASED ON TEMPLATE MATCHING WITH ADAPTIVE WEIGHTING

LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD, INFORMATION PROCE...

IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD

SCALABLE NANOIMPRINT MANUFACTURING OF FUNCTIONAL MULTI-LAYER METASU...

METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHOD

PATTERN CORRECTION DEVICE, PATTERN CORRECTION METHOD, AND PATTERN F...

MEASURING METHOD OF MEASURING SUBSTRATE BY CAPTURING IMAGES OF MARK...

INTENSITY IMBALANCE CALIBRATION ON AN OVERFILLED BIDIRECTIONAL MARK

METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES

ASYMMETRY EXTENDED GRID MODEL FOR WAFER ALIGNMENT

DATA FILTER FOR SCANNING METROLOGY

METHOD FOR DETERMINING A FOCUS ACTUATION PROFILE FOR ONE OR MORE AC...

METHOD OF METROLOGY AND ASSOCIATED APPARATUSES

DEEP LEARNING BASED ADAPTIVE ALIGNMENT PRECISION METROLOGY FOR DIGI...

PROCESSING SYSTEM, PROCESSING METHOD, MEASUREMENT APPARATUS, SUBSTR...

MEASUREMENT APPARATUS, LITHOGRAPHY APPARATUS AND ARTICLE MANUFACTUR...

MEASUREMENT OF STITCHING ERROR USING SPLIT TARGETS

METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES

HEIGHT MEASUREMENT METHOD AND HEIGHT MEASUREMENT SYSTEM

DETECTION APPARATUS, DETECTION METHOD, EXPOSURE APPARATUS AND ARTIC...

GENERATING AN ALIGNMENT SIGNAL BASED ON LOCAL ALIGNMENT MARK DISTOR...

ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES

APPARATUS AND METHOD FOR OPTIMIZING ACTUATOR FORCES

ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES

ALIGNMENT METHOD

MARK DETECTING APPARATUS, MARK LEARNING APPARATUS, SUBSTRATE PROCES...

PROCESSING SYSTEM, PROCESSING METHOD, MEASUREMENT APPARATUS, SUBSTR...