-
OPTICAL APPARATUS
-
Publication number 20250116943
-
Publication date Apr 10, 2025
-
ASML NETHERLANDS B.V.
-
Debashis DE MUNSHI
-
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
-
-
-
-
-
SEMICONDUCTOR PROCESS APPARATUS
-
Publication number 20250028257
-
Publication date Jan 23, 2025
-
Samsung Electronics Co., Ltd.
-
Kyoungwhan Oh
-
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
-
-
-
-
-
-
-
HIGH RESOLUTION PHOTOLITHOGRAPHY
-
Publication number 20240411229
-
Publication date Dec 12, 2024
-
TERA-PRINT LLC
-
Andrey IVANKIN
-
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
-
-
-
-
THERMO-MECHANICAL ACTUATOR
-
Publication number 20240402621
-
Publication date Dec 5, 2024
-
ASML NETHERLANDS B.V.
-
Bas JANSEN
-
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
-
-
-
-
EXPOSURE DEVICE
-
Publication number 20240345486
-
Publication date Oct 17, 2024
-
Nikon Corporation
-
Masaki KATO
-
G02 - OPTICS
-
METHOD OF MANUFACTURING PHOTO MASKS
-
Publication number 20240337951
-
Publication date Oct 10, 2024
-
Taiwan Semiconductor Manufacturing Company, Ltd.
-
Chien-Cheng CHEN
-
H01 - BASIC ELECTRIC ELEMENTS
-
EXPOSURE APPARATUS
-
Publication number 20240329545
-
Publication date Oct 3, 2024
-
Ushio Denki Kabushiki Kaisha
-
Naoya SOHARA
-
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
-
EXPOSURE APPARATUS
-
Publication number 20240329549
-
Publication date Oct 3, 2024
-
Ushio Denki Kabushiki Kaisha
-
Naoya SOHARA
-
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
-
-
A CONTAMINATION REDUCTION SYSTEM
-
Publication number 20240310742
-
Publication date Sep 19, 2024
-
ASML NETHERLANDS B.V.
-
Vladimir KVON
-
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
-
-
-
-