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CPC
G03F7/70716

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70716Stages

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method of clamping a substrate to a clamping system, a substrate ho...
- Patent number 12,158,704
- Issue date Dec 3, 2024
- ASML Netherlands B.V.
- Abraham Alexander Soethoudt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of using a dual stage lithographic apparatus and lithographi...
- Patent number 12,153,354
- Issue date Nov 26, 2024
- ASML Netherlands B.V.
- Wouter Jan Cornelis Vijselaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positioning device
- Patent number 12,140,873
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Paul Corné Henri De Wit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Control method of driving apparatus, driving apparatus, lithography...
- Patent number 12,130,560
- Issue date Oct 29, 2024
- Canon Kabushiki Kaisha
- Hayato Hoshino
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 12,117,721
- Issue date Oct 15, 2024
- ASML Netherlands B.V.
- Nicolaas Rudolf Kemper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thermo-mechanical actuator
- Patent number 12,117,739
- Issue date Oct 15, 2024
- ASML Netherlands B.V.
- Bas Jansen
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Apparatus and method for cleaning a support structure in a lithogra...
- Patent number 12,117,737
- Issue date Oct 15, 2024
- ASML Holding N.V.
- Keane Michael Levy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle detection apparatus, reticle detection method, exposure mac...
- Patent number 12,117,738
- Issue date Oct 15, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Xueyu Liang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Magnetic levitation gravity compensation device
- Patent number 12,103,158
- Issue date Oct 1, 2024
- YinGuan Semiconductor Technology Co., LTD.
- Hui Meng
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Six-degree-of-freedom air-floating moving apparatus
- Patent number 12,090,590
- Issue date Sep 17, 2024
- WUXI XIVI SCIENCE AND TECHNOLOGY CO., LTD.
- Minjie Lu
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Lithographic apparatus and a method of operating the apparatus
- Patent number 12,072,635
- Issue date Aug 27, 2024
- ASML Netherlands B.V.
- Christian Gerardus Norbertus Hendricus Marie Cloin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for fast loading substrates in a flat panel tool
- Patent number 12,061,422
- Issue date Aug 13, 2024
- Applied Materials, Inc.
- Benjamin M. Johnston
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate holder, lithographic apparatus, device manufacturing meth...
- Patent number 12,055,862
- Issue date Aug 6, 2024
- ASML Netherlands B.V.
- Raymond Wilhelmus Louis Lafarre
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing photo masks
- Patent number 12,038,693
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement tool and method for lithography masks
- Patent number 12,032,298
- Issue date Jul 9, 2024
- Intel Corporation
- Yoshihiro Tezuka
- G01 - MEASURING TESTING
Information Patent Grant
Object table comprising an electrostatic clamp
- Patent number 12,028,000
- Issue date Jul 2, 2024
- ASML Netherlands B.V.
- Jan-Gerard Cornelis Van Der Toorn
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Apparatus for fabricating a semiconductor device and method for fab...
- Patent number 12,009,238
- Issue date Jun 11, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Po-Chien Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography exposure system with debris removing mechanism
- Patent number 12,001,143
- Issue date Jun 4, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Jung Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic apparatus, substrate table, and method
- Patent number 11,988,971
- Issue date May 21, 2024
- ASML Holding N.V.
- Matthew Lipson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing system and substrate processing method, and de...
- Patent number 11,977,339
- Issue date May 7, 2024
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holder, lithographic apparatus, device manufacturing meth...
- Patent number 11,960,213
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Raymond Wilhelmus Louis Lafarre
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Reticle processing system
- Patent number 11,940,724
- Issue date Mar 26, 2024
- Applied Materials, Inc.
- Sanjay Bhat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabricating reticle
- Patent number 11,940,737
- Issue date Mar 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsueh-Yi Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Intermediate layer for mechanical interface
- Patent number 11,927,889
- Issue date Mar 12, 2024
- ASML Holding N.V.
- Kushal Sandeep Doshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing system and substrate processing method, and de...
- Patent number 11,921,436
- Issue date Mar 5, 2024
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic apparatus
- Patent number 11,914,308
- Issue date Feb 27, 2024
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multifunctional lithography device
- Patent number 11,868,055
- Issue date Jan 9, 2024
- The Institute of Optics and Electronics, the Chinese Academy of Sciences
- Xiangang Luo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography system and method thereof
- Patent number 11,782,350
- Issue date Oct 10, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Hua Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Carrier device, exposure apparatus, exposure method, manufacturing...
- Patent number 11,774,864
- Issue date Oct 3, 2023
- Nikon Corporation
- Yasuo Aoki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography exposure method with debris removing mechanism
- Patent number 11,754,928
- Issue date Sep 12, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Jung Hsu
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
IMAGE-FORMING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE PRODUC...
- Publication number 20250013156
- Publication date Jan 9, 2025
- Nikon Corporation
- Hideki Komatsuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Rotary Substrate Support Having an Actuator for Aligning a Substrate
- Publication number 20240427255
- Publication date Dec 26, 2024
- Applied Materials, Inc.
- Nagesha JANSALE VENKATESHA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR AND METHOD OF LITHOGRAPHY SUPPORT CLEANING
- Publication number 20240419089
- Publication date Dec 19, 2024
- ASML Holding N.V.
- Keane Michael LEVY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH RESOLUTION PHOTOLITHOGRAPHY
- Publication number 20240411229
- Publication date Dec 12, 2024
- TERA-PRINT LLC
- Andrey IVANKIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND ASSOCIATED METHODS
- Publication number 20240411233
- Publication date Dec 12, 2024
- ASML NETHERLANDS B.V.
- Gosse Charles DE VRIES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20240411235
- Publication date Dec 12, 2024
- Samsung Electronics Co., Ltd.
- Dae Geun YOON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UVC LED LIGHT FINISHER FOR DETACKING FLEXOGRAPHIC PRINTING PLATES
- Publication number 20240402607
- Publication date Dec 5, 2024
- ESKO-GRAPHICS IMAGING GMBH
- Thomas Klein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THERMO-MECHANICAL ACTUATOR
- Publication number 20240402621
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Bas JANSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STRUCTURE, EXPOSURE APPARATUS, AND ARTICLE MANUFACTURING METHOD
- Publication number 20240393704
- Publication date Nov 28, 2024
- Canon Kabushiki Kaisha
- Norihiro SAKURAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OBJECT TABLE COMPRISING AN ELECTROSTATIC CLAMP
- Publication number 20240396476
- Publication date Nov 28, 2024
- ASML NETHERLANDS B.V.
- Jan-Gerard Cornelis VAN DER TOORN
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...
- Publication number 20240355644
- Publication date Oct 24, 2024
- TOKYO ELECTRON LIMITED
- Shinsuke TAKAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE DEVICE
- Publication number 20240345486
- Publication date Oct 17, 2024
- Nikon Corporation
- Masaki KATO
- G02 - OPTICS
Information Patent Application
METHOD OF MANUFACTURING PHOTO MASKS
- Publication number 20240337951
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Cheng CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS
- Publication number 20240329545
- Publication date Oct 3, 2024
- Ushio Denki Kabushiki Kaisha
- Naoya SOHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS
- Publication number 20240329549
- Publication date Oct 3, 2024
- Ushio Denki Kabushiki Kaisha
- Naoya SOHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, LOCKING DEVICE, AND METHOD
- Publication number 20240319618
- Publication date Sep 26, 2024
- ASML Holding N.V.
- Daniel Nathan BURBANK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A CONTAMINATION REDUCTION SYSTEM
- Publication number 20240310742
- Publication date Sep 19, 2024
- ASML NETHERLANDS B.V.
- Vladimir KVON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR FABRICATING A SEMICONDUCTOR DEVICE AND METHOD FOR FAB...
- Publication number 20240297057
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- PO-CHIEN HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF OBTAINING ARRAY OF PLURALITY OF REGIONS ON SUBSTRATE, EXP...
- Publication number 20240288781
- Publication date Aug 29, 2024
- Canon Kabushiki Kaisha
- MITSURU INOSE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMBINED DISPENSING AND STAMPING APPARATUS AND METHOD FOR APPLYING...
- Publication number 20240264524
- Publication date Aug 8, 2024
- ASMPT SINGAPORE PTE. LTD
- Kai Siu LAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METH...
- Publication number 20240264533
- Publication date Aug 8, 2024
- ASML NETHERLANDS B.V.
- Raymond Wilhelmus Louis Lafarre
- B22 - CASTING POWDER METALLURGY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240248417
- Publication date Jul 25, 2024
- TOKYO ELECTRON LIMITED
- Yoji SAKATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET EXPOSURE APPARATUS INCLUDING A MASK STAGE
- Publication number 20240219848
- Publication date Jul 4, 2024
- Samsung Electronics Co., Ltd.
- Sanghwan LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPRINT METHOD, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD
- Publication number 20240210833
- Publication date Jun 27, 2024
- Canon Kabushiki Kaisha
- MASAYOSHI FUJIMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIONING DEVICE
- Publication number 20240168393
- Publication date May 23, 2024
- Dr. Johannes Heidenhain Gmbh
- Arjan Bakker
- G01 - MEASURING TESTING
Information Patent Application
MASK EXPOSURE SYSTEM AND MASK EXPOSURE METHOD
- Publication number 20240152062
- Publication date May 9, 2024
- Samsung Electronics Co., Ltd.
- Sukjong Bae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240142886
- Publication date May 2, 2024
- Samsung Electronics Co., Ltd.
- Injae Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD, AND DE...
- Publication number 20240134295
- Publication date Apr 25, 2024
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETERMINING APPARATUS, PATTERN FORMING APPARATUS, AND METHOD FOR MA...
- Publication number 20240085811
- Publication date Mar 14, 2024
- Canon Kabushiki Kaisha
- TAKAHIRO YAMAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DUAL WAVELENGTH OVERLAY MEASUREMENT WITH FOCUS AT A PHOT...
- Publication number 20240079341
- Publication date Mar 7, 2024
- SANDISK TECHNOLOGIES LLC
- Katsuya KATO
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method of clamping a substrate to a clamping system, a substrate ho...

Method of using a dual stage lithographic apparatus and lithographi...

Positioning device

Control method of driving apparatus, driving apparatus, lithography...

Lithographic apparatus and device manufacturing method

Thermo-mechanical actuator

Apparatus and method for cleaning a support structure in a lithogra...

Reticle detection apparatus, reticle detection method, exposure mac...

Magnetic levitation gravity compensation device

Six-degree-of-freedom air-floating moving apparatus

Lithographic apparatus and a method of operating the apparatus

Method for fast loading substrates in a flat panel tool

Substrate holder, lithographic apparatus, device manufacturing meth...

Method of manufacturing photo masks

Measurement tool and method for lithography masks

Object table comprising an electrostatic clamp

Apparatus for fabricating a semiconductor device and method for fab...

Lithography exposure system with debris removing mechanism

Lithographic apparatus, substrate table, and method

Substrate processing system and substrate processing method, and de...

Substrate holder, lithographic apparatus, device manufacturing meth...

Reticle processing system

Method of fabricating reticle

Intermediate layer for mechanical interface

Substrate processing system and substrate processing method, and de...

Lithographic apparatus

Multifunctional lithography device

Lithography system and method thereof

Carrier device, exposure apparatus, exposure method, manufacturing...

Lithography exposure method with debris removing mechanism

Patents Applicationslast 30 patents

IMAGE-FORMING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE PRODUC...

Rotary Substrate Support Having an Actuator for Aligning a Substrate

APPARATUS FOR AND METHOD OF LITHOGRAPHY SUPPORT CLEANING

HIGH RESOLUTION PHOTOLITHOGRAPHY

LITHOGRAPHIC APPARATUS AND ASSOCIATED METHODS

SEMICONDUCTOR MANUFACTURING APPARATUS

UVC LED LIGHT FINISHER FOR DETACKING FLEXOGRAPHIC PRINTING PLATES

THERMO-MECHANICAL ACTUATOR

STRUCTURE, EXPOSURE APPARATUS, AND ARTICLE MANUFACTURING METHOD

OBJECT TABLE COMPRISING AN ELECTROSTATIC CLAMP

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...

EXPOSURE DEVICE

METHOD OF MANUFACTURING PHOTO MASKS

EXPOSURE APPARATUS

EXPOSURE APPARATUS

LITHOGRAPHIC APPARATUS, LOCKING DEVICE, AND METHOD

A CONTAMINATION REDUCTION SYSTEM

APPARATUS FOR FABRICATING A SEMICONDUCTOR DEVICE AND METHOD FOR FAB...

METHOD OF OBTAINING ARRAY OF PLURALITY OF REGIONS ON SUBSTRATE, EXP...

COMBINED DISPENSING AND STAMPING APPARATUS AND METHOD FOR APPLYING...

SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METH...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

EXTREME ULTRAVIOLET EXPOSURE APPARATUS INCLUDING A MASK STAGE

IMPRINT METHOD, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD

POSITIONING DEVICE

MASK EXPOSURE SYSTEM AND MASK EXPOSURE METHOD

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD, AND DE...

DETERMINING APPARATUS, PATTERN FORMING APPARATUS, AND METHOD FOR MA...

METHOD FOR DUAL WAVELENGTH OVERLAY MEASUREMENT WITH FOCUS AT A PHOT...