Stitching

Industry

CPC
G03F7/70475

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70475Stitching

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Digital lithography scan sequencing
- Patent number 12,189,299
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Ying-Chiao Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for aligned stitching
- Patent number 12,154,862
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Chia Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3-side buttable stitched image sensor
- Patent number 12,061,420
- Issue date Aug 13, 2024
- IMASENIC ADVANCED IMAGING S.L.
- Renato Turchetta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple-mask multiple-exposure lithography and masks
- Patent number 12,044,977
- Issue date Jul 23, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Peter Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern decomposition method
- Patent number 11,977,335
- Issue date May 7, 2024
- United Microelectronics Corp.
- Min Cheng Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Digital exposure machine and exposure control method thereof
- Patent number 11,971,662
- Issue date Apr 30, 2024
- BOE Technology Group Co., Ltd.
- Zhichong Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Touch sensor and exposure mask for forming same
- Patent number 11,774,858
- Issue date Oct 3, 2023
- Dongwoo Fine-Chem Co., Ltd.
- Byoungin Kim
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for performing a manufacturing process and associated appara...
- Patent number 11,733,606
- Issue date Aug 22, 2023
- ASML Netherlands B.V.
- Thomas Theeuwes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multiple-mask multiple-exposure lithography and masks
- Patent number 11,726,408
- Issue date Aug 15, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Peter Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for aligned stitching
- Patent number 11,676,908
- Issue date Jun 13, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Chia Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for making accurate grating patterns using multiple writing...
- Patent number 11,243,480
- Issue date Feb 8, 2022
- Applied Materials, Inc.
- David Markle
- G02 - OPTICS
Information Patent Grant
System, software application, and method for lithography stitching
- Patent number 11,237,485
- Issue date Feb 1, 2022
- Applied Materials, Inc.
- Yongan Xu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 11,226,568
- Issue date Jan 18, 2022
- ASML Netherlands B.V.
- Paul Van Dongen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask, exposure method and touch display panel
- Patent number 11,169,438
- Issue date Nov 9, 2021
- Hefei Xinsheng Optoelectronics Technology Co., Ltd.
- Qitao Zheng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Exposure apparatus and exposure method, and flat panel display manu...
- Patent number 11,086,236
- Issue date Aug 10, 2021
- Nikon Corporation
- Akinori Shirato
- G02 - OPTICS
Information Patent Grant
Systems and methods for hierarchical exposure of an integrated circ...
- Patent number 10,923,456
- Issue date Feb 16, 2021
- Cerebras Systems Inc.
- Jean-Philippe Fricker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for the alignment of photolithographic masks and correspondi...
- Patent number 10,895,809
- Issue date Jan 19, 2021
- LFOUNDRY S.R.L
- Gianluca Eugeni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and fabrication method thereof, display panel and touch panel
- Patent number 10,859,920
- Issue date Dec 8, 2020
- BOE Technology Group Co., Ltd.
- Liqing Liao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Maskless exposure device, maskless exposure method and display subs...
- Patent number 10,859,921
- Issue date Dec 8, 2020
- Samsung Display Co., Ltd.
- Jun-Ho Sim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask, stitching exposure method, and display panel having the mask
- Patent number 10,824,070
- Issue date Nov 3, 2020
- NANJING CEC PANDA LCD TECHNOLOGY CO., LTD.
- Liufei Zhou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask, related display device, and related exposure method for manuf...
- Patent number 10,809,627
- Issue date Oct 20, 2020
- Samsung Display Co., Ltd.
- Inwoo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing patterned substrate and method of manufactu...
- Patent number 10,777,703
- Issue date Sep 15, 2020
- Nichia Corporation
- Yuki Kanagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet lithography system that utilizes pattern stitching
- Patent number 10,747,117
- Issue date Aug 18, 2020
- Nikon Corporation
- Michael B. Binnard
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and exposure method, and flat panel display manu...
- Patent number 10,732,517
- Issue date Aug 4, 2020
- Nikon Corporation
- Akinori Shirato
- G01 - MEASURING TESTING
Information Patent Grant
Method and device for calibrating multiple energy rays for the addi...
- Patent number 10,725,446
- Issue date Jul 28, 2020
- LAYERWISE
- Peter Mercelis
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Deflection scan speed adjustment during charged particle exposure
- Patent number 10,692,696
- Issue date Jun 23, 2020
- ASML Netherlands B.V.
- Teunis Van De Peut
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Spatial light modulator with variable intensity diodes
- Patent number 10,684,555
- Issue date Jun 16, 2020
- Applied Materials, Inc.
- Joseph R. Johnson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing same
- Patent number 10,679,948
- Issue date Jun 9, 2020
- TowerJazz Panasonic Semiconductor Co., Ltd.
- Takahisa Ogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Baseline overlay control with residual noise reduction
- Patent number 10,642,161
- Issue date May 5, 2020
- International Business Machines Corporation
- Daniel A. Corliss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stitchless direct imaging for high resolution electronic patterning
- Patent number 10,429,742
- Issue date Oct 1, 2019
- Orbotech Ltd.
- Steffen Ruecker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR STITCH STRUCTURE AND METHOD FOR FORMING THE SAME
- Publication number 20250004201
- Publication date Jan 2, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- YOU-CHENG LU
- G02 - OPTICS
Information Patent Application
EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, EXPOSURE DEVICE, AND...
- Publication number 20240377754
- Publication date Nov 14, 2024
- Nikon Corporation
- Yoji WATANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIPLE-MASK MULTIPLE-EXPOSURE LITHOGRAPHY AND MASKS
- Publication number 20240377755
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Peter Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING FLEXIBLE PRINTED WIRING BOARD
- Publication number 20240365469
- Publication date Oct 31, 2024
- FUJIKURA PRINTED CIRCUITS LTD.
- Daisuke Arai
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
DIGITAL LITHOGRAPHY SCAN SEQUENCING
- Publication number 20240288778
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Ying-Chiao Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIGITAL LITHOGRAPHY EXPOSURE UNIT BOUNDARY SMOOTHING
- Publication number 20240280911
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- CHI-MING TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AUTOMATED METROLOGY METHOD FOR LARGE DEVICES
- Publication number 20230408928
- Publication date Dec 21, 2023
- Applied Materials, Inc.
- Yongan XU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE MASK AND METHOD OF MANUFACTURING DISPLAY DEVICE USING THE...
- Publication number 20230393482
- Publication date Dec 7, 2023
- SAMSUNG DISPLAY CO., LTD.
- SOOHONG CHEON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIPLE-MASK MULTIPLE-EXPOSURE LITHOGRAPHY AND MASKS
- Publication number 20230367229
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- Peter Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY STITCHING
- Publication number 20230324805
- Publication date Oct 12, 2023
- Applied Materials, Inc.
- Yongan XU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHODS FOR MULTI-EXPOSURE OF A SUBSTRATE
- Publication number 20230296986
- Publication date Sep 21, 2023
- ASML Holding N.V.
- Timothy Allan BRUNNER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and Method for Aligned Stitching
- Publication number 20230268285
- Publication date Aug 24, 2023
- Taiwan Semiconductor Manufacturing, Ltd.
- Chih-Chia Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIMULATING DIE ROTATION TO MINIMIZE AREA OVERHEAD OF RETICLE STITCH...
- Publication number 20230205094
- Publication date Jun 29, 2023
- Intel Corporation
- Scott Siers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INCREASING OVERLAY MARGINS FOR LINES THAT SPAN RETICLE BOUNDARIES I...
- Publication number 20230194997
- Publication date Jun 22, 2023
- Intel Corporation
- Mark Phillips
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Measuring Stitching Overlay Accuracy of Image Sensor Sti...
- Publication number 20230120126
- Publication date Apr 20, 2023
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Yu Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR LITHOGRAPHIC PROCESS PERFORMANCE DETERMINA...
- Publication number 20220291593
- Publication date Sep 15, 2022
- ASML NETHERLANDS B.V.
- Roy WERKMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TOUCH SENSOR AND EXPOSURE MASK FOR FORMING SAME
- Publication number 20220179324
- Publication date Jun 9, 2022
- DONGWOO FINE-CHEM CO., LTD.
- Byoungin KIM
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR PERFORMING A MANUFACTURING PROCESS AND ASSOCIATED APPARA...
- Publication number 20210240073
- Publication date Aug 5, 2021
- ASML NETHERLANDS B.V.
- Thomas THEEUWES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM, SOFTWARE APPLICATION, AND METHOD FOR LITHOGRAPHY STITCHING
- Publication number 20210223704
- Publication date Jul 22, 2021
- Applied Materials, Inc.
- Yongan XU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A SYSTEM FOR MAKING ACCURATE GRATING PATTERNS USING MULTIPLE WRITIN...
- Publication number 20210191285
- Publication date Jun 24, 2021
- Applied Materials, Inc.
- David MARKLE
- G02 - OPTICS
Information Patent Application
SYSTEMS AND METHODS FOR HIERARCHICAL EXPOSURE OF AN INTEGRATED CIRC...
- Publication number 20210167037
- Publication date Jun 3, 2021
- Cerebras Systems Inc.
- Jean-Philippe Fricker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Lithographic Apparatus and Method
- Publication number 20200393770
- Publication date Dec 17, 2020
- ASML NETHERLANDS B.V.
- Paul VAN DONGEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND EXPOSURE METHOD, AND FLAT PANEL DISPLAY MANU...
- Publication number 20200326638
- Publication date Oct 15, 2020
- Nikon Corporation
- Akinori SHIRATO
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR THE ALIGNMENT OF PHOTOLITHOGRAPHIC MASKS AND CORRESPONDI...
- Publication number 20200166853
- Publication date May 28, 2020
- LFOUNDRY S.R.L.
- Gianluca EUGENI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and Method for Aligned Stitching
- Publication number 20200118937
- Publication date Apr 16, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Chia Hu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BASELINE OVERLAY CONTROL WITH RESIDUAL NOISE REDUCTION
- Publication number 20200117100
- Publication date Apr 16, 2020
- International Business Machines Corporation
- Daniel A. Corliss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK, EXPOSURE METHOD AND TOUCH DISPLAY PANEL
- Publication number 20200103750
- Publication date Apr 2, 2020
- HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Qitao Zheng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Semiconductor Manufacturing Apparatus and Method Thereof
- Publication number 20200033723
- Publication date Jan 30, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Ching-Hai Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM THAT UTILIZES PATTERN STITCHING
- Publication number 20190235393
- Publication date Aug 1, 2019
- Nikon Corporation
- Michael B. Binnard
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK, RELATED DISPLAY DEVICE, AND RELATED EXPOSURE METHOD FOR MANUF...
- Publication number 20190219928
- Publication date Jul 18, 2019
- SAMSUNG DISPLAY CO., LTD.
- Inwoo KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Digital lithography scan sequencing

System and method for aligned stitching

3-side buttable stitched image sensor

Multiple-mask multiple-exposure lithography and masks

Pattern decomposition method

Digital exposure machine and exposure control method thereof

Touch sensor and exposure mask for forming same

Method for performing a manufacturing process and associated appara...

Multiple-mask multiple-exposure lithography and masks

System and method for aligned stitching

System for making accurate grating patterns using multiple writing...

System, software application, and method for lithography stitching

Lithographic apparatus and method

Mask, exposure method and touch display panel

Exposure apparatus and exposure method, and flat panel display manu...

Systems and methods for hierarchical exposure of an integrated circ...

Method for the alignment of photolithographic masks and correspondi...

Mask and fabrication method thereof, display panel and touch panel

Maskless exposure device, maskless exposure method and display subs...

Mask, stitching exposure method, and display panel having the mask

Mask, related display device, and related exposure method for manuf...

Method of manufacturing patterned substrate and method of manufactu...

Extreme ultraviolet lithography system that utilizes pattern stitching

Exposure apparatus and exposure method, and flat panel display manu...

Method and device for calibrating multiple energy rays for the addi...

Deflection scan speed adjustment during charged particle exposure

Spatial light modulator with variable intensity diodes

Semiconductor device and method for manufacturing same

Baseline overlay control with residual noise reduction

Stitchless direct imaging for high resolution electronic patterning

Patents Applicationslast 30 patents

SEMICONDUCTOR STITCH STRUCTURE AND METHOD FOR FORMING THE SAME

EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, EXPOSURE DEVICE, AND...

MULTIPLE-MASK MULTIPLE-EXPOSURE LITHOGRAPHY AND MASKS

METHOD FOR PRODUCING FLEXIBLE PRINTED WIRING BOARD

DIGITAL LITHOGRAPHY SCAN SEQUENCING

DIGITAL LITHOGRAPHY EXPOSURE UNIT BOUNDARY SMOOTHING

AUTOMATED METROLOGY METHOD FOR LARGE DEVICES

EXPOSURE MASK AND METHOD OF MANUFACTURING DISPLAY DEVICE USING THE...

MULTIPLE-MASK MULTIPLE-EXPOSURE LITHOGRAPHY AND MASKS

LITHOGRAPHY STITCHING

LITHOGRAPHIC APPARATUS AND METHODS FOR MULTI-EXPOSURE OF A SUBSTRATE

System and Method for Aligned Stitching

SIMULATING DIE ROTATION TO MINIMIZE AREA OVERHEAD OF RETICLE STITCH...

INCREASING OVERLAY MARGINS FOR LINES THAT SPAN RETICLE BOUNDARIES I...

Method for Measuring Stitching Overlay Accuracy of Image Sensor Sti...

METHOD AND APPARATUS FOR LITHOGRAPHIC PROCESS PERFORMANCE DETERMINA...

TOUCH SENSOR AND EXPOSURE MASK FOR FORMING SAME

METHOD FOR PERFORMING A MANUFACTURING PROCESS AND ASSOCIATED APPARA...

SYSTEM, SOFTWARE APPLICATION, AND METHOD FOR LITHOGRAPHY STITCHING

A SYSTEM FOR MAKING ACCURATE GRATING PATTERNS USING MULTIPLE WRITIN...

SYSTEMS AND METHODS FOR HIERARCHICAL EXPOSURE OF AN INTEGRATED CIRC...

Lithographic Apparatus and Method

EXPOSURE APPARATUS AND EXPOSURE METHOD, AND FLAT PANEL DISPLAY MANU...

METHOD FOR THE ALIGNMENT OF PHOTOLITHOGRAPHIC MASKS AND CORRESPONDI...

System and Method for Aligned Stitching

BASELINE OVERLAY CONTROL WITH RESIDUAL NOISE REDUCTION

MASK, EXPOSURE METHOD AND TOUCH DISPLAY PANEL

Semiconductor Manufacturing Apparatus and Method Thereof

EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM THAT UTILIZES PATTERN STITCHING

MASK, RELATED DISPLAY DEVICE, AND RELATED EXPOSURE METHOD FOR MANUF...