Subphotolithographic processing

Industry

CPC
Y10S438/947

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Parent Industries

YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S438/00Semiconductor device manufacturing: process

Current Industry

Y10S438/947Subphotolithographic processing

Industries

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor patterning and resulting structures
- Patent number 11,929,254
- Issue date Mar 12, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Ming Lung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming patterned mask layer
- Patent number 11,699,589
- Issue date Jul 11, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Chen Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor patterning and resulting structures
- Patent number 11,521,856
- Issue date Dec 6, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Ming Lung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alternating hardmasks for tight-pitch line formation
- Patent number 11,171,002
- Issue date Nov 9, 2021
- Tessera, Inc.
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alternating hardmasks for tight-pitch line formation
- Patent number 10,580,652
- Issue date Mar 3, 2020
- Tessera, Inc.
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch multiplication using self-assembling materials
- Patent number 10,515,801
- Issue date Dec 24, 2019
- Micron Technology, Inc.
- Gurtej Sandhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-patterning method and device formed by the method
- Patent number 10,276,376
- Issue date Apr 30, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Ying Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alternating hardmasks for tight-pitch line formation
- Patent number 10,103,022
- Issue date Oct 16, 2018
- International Business Machines Corporation
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned quadruple patterning process
- Patent number 9,842,737
- Issue date Dec 12, 2017
- International Business Machines Corporation
- Matthew E. Colburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for modifying spacer profile
- Patent number 9,812,325
- Issue date Nov 7, 2017
- Nihar Mohanty
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Methods of forming semiconductor device structures including metal...
- Patent number 9,768,021
- Issue date Sep 19, 2017
- Micron Technology, Inc.
- Dan B. Millward
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods for manufacturing a spacer with desired profile in an advan...
- Patent number 9,741,566
- Issue date Aug 22, 2017
- Applied Materials, Inc.
- Dai-Wen Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single spacer process for multiplying pitch by a factor greater tha...
- Patent number 9,478,497
- Issue date Oct 25, 2016
- Micron Technology, Inc.
- David H Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit fabrication
- Patent number 9,412,594
- Issue date Aug 9, 2016
- Micron Technology, Inc.
- Luan C. Tran
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Semiconductor device structures including metal oxide structures
- Patent number 9,276,059
- Issue date Mar 1, 2016
- Micron Technology, Inc.
- Dan B. Millward
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Integrated circuit fabrication
- Patent number 9,147,608
- Issue date Sep 29, 2015
- Micron Technology, Inc.
- Luan C. Tran
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Integrated circuit structure having arrays of small, closely spaced...
- Patent number 9,099,402
- Issue date Aug 4, 2015
- Micron Technology, Inc.
- Mirzafer Abatchev
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Gate electrode with a shrink spacer
- Patent number 9,040,405
- Issue date May 26, 2015
- GLOBALFOUNDRIES Inc.
- Tom Hasche
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern forming method
- Patent number 9,023,222
- Issue date May 5, 2015
- Kabushiki Kaisha Toshiba
- Ayako Kawanishi
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Primer and pattern forming method for layer including block copolymer
- Patent number 8,999,631
- Issue date Apr 7, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Senzaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polymeric materials in self-assembled arrays and semiconductor stru...
- Patent number 8,993,088
- Issue date Mar 31, 2015
- Micron Technology, Inc.
- Dan B. Millward
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Multi-patterning method and device formed by the method
- Patent number 8,987,142
- Issue date Mar 24, 2015
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Ying Lee
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Nonvolatile memory device using semiconductor nanocrystals and meth...
- Patent number 8,987,138
- Issue date Mar 24, 2015
- International Business Machines Corporation
- Charles T. Black
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods using block co-polymer self-assembly for sub-lithographic p...
- Patent number 8,974,678
- Issue date Mar 10, 2015
- Micron Technology, Inc.
- Dan Millward
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Primer and pattern forming method for layer including block copolymer
- Patent number 8,956,810
- Issue date Feb 17, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Senzaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for fabricating large-area nanoscale pattern
- Patent number 8,956,962
- Issue date Feb 17, 2015
- LG Innotek Co., Ltd
- Young-Jae Lee
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Polymeric materials in self-assembled arrays and semiconductor stru...
- Patent number 8,945,700
- Issue date Feb 3, 2015
- Micron Technology, Inc.
- Dan B. Millward
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Double patterning with inline critical dimension slimming
- Patent number 8,940,475
- Issue date Jan 27, 2015
- Tokyo Electron Limited
- Shannon W. Dunn
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Integrated circuit pattern and method
- Patent number 8,922,020
- Issue date Dec 30, 2014
- Macronix International Co., Ltd.
- Shih-Hung Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Methods of forming a pattern on a substrate
- Patent number 8,889,559
- Issue date Nov 18, 2014
- Micron Technology, Inc.
- Shane J. Trapp
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
Semiconductor Patterning and Resulting Structures
- Publication number 20240177995
- Publication date May 30, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Ming Lung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING PATTERNED MASK LAYER
- Publication number 20230352303
- Publication date Nov 2, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chen CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Patterning and Resulting Structures
- Publication number 20230108424
- Publication date Apr 6, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Ming Lung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION
- Publication number 20200266066
- Publication date Aug 20, 2020
- Tessera, Inc.
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION
- Publication number 20180350600
- Publication date Dec 6, 2018
- International Business Machines Corporation
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20140295669
- Publication date Oct 2, 2014
- Kabushiki Kaisha Toshiba
- Ayako KAWANISHI
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
METHOD FOR MANUFACTURING POROUS STRUCTURE AND METHOD FOR FORMING PA...
- Publication number 20140284306
- Publication date Sep 25, 2014
- Kabushiki Kaisha Toshiba
- Koji Asakawa
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHODS FOR FABRICATING INTEGRATED CIRCUITS WITH IMPROVED SEMICONDU...
- Publication number 20140227879
- Publication date Aug 14, 2014
- GLOBALFOUNDRIES, Inc.
- Wontae Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FABRICATING ELECTRICALLY-ISOLATED FINFET SEMICONDUCTOR...
- Publication number 20140213033
- Publication date Jul 31, 2014
- GLOBALFOUNDRIES, Inc.
- David P. Brunco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-PATTERNING METHOD AND DEVICE FORMED BY THE METHOD
- Publication number 20140193974
- Publication date Jul 10, 2014
- Taiwan Semiconductor Manufacturing Co., LTD
- Chia-Ying LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Forming A Pattern On A Substrate
- Publication number 20140162459
- Publication date Jun 12, 2014
- Micron Technology, Inc.
- Shane J. Trapp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURES INCLUDING METAL OXIDE STRUCTURES, A...
- Publication number 20140151843
- Publication date Jun 5, 2014
- Micron Technology, Inc.
- Dan B. Millward
- B82 - NANO-TECHNOLOGY
Information Patent Application
SINGLE SPACER PROCESS FOR MULTIPLYING PITCH BY A FACTOR GREATER THA...
- Publication number 20140038416
- Publication date Feb 6, 2014
- Micron Technology, Inc.
- David H. Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRIMER AND PATTERN FORMING METHOD FOR LAYER INCLUDING BLOCK COPOLYMER
- Publication number 20140030652
- Publication date Jan 30, 2014
- Riken
- Takahiro Senzaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Thermal annealing process
- Publication number 20140014001
- Publication date Jan 16, 2014
- DOW GLOBAL TECHNOLOGIES LLC
- Phillip Hustad
- B44 - DECORATIVE ARTS
Information Patent Application
High temperature thermal annealing process
- Publication number 20140014002
- Publication date Jan 16, 2014
- DOW GLOBAL TECHNOLOGIES LLC
- Xinyu Gu
- B44 - DECORATIVE ARTS
Information Patent Application
INTEGRATED CIRCUIT FABRICATION
- Publication number 20130320552
- Publication date Dec 5, 2013
- Micron Technology, Inc.
- Luan C. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYMERIC MATERIALS IN SELF-ASSEMBLED ARRAYS AND SEMICONDUCTOR STRU...
- Publication number 20130285214
- Publication date Oct 31, 2013
- Dan B. Millward
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Methods Using Block Co-Polymer Self-Assembly for Sub-Lithographic P...
- Publication number 20130270226
- Publication date Oct 17, 2013
- Dan Millward
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20130241073
- Publication date Sep 19, 2013
- Takaki Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF SiOCl-CONTAINING LAYER ON SPACER SIDEWALLS TO PREVENT...
- Publication number 20130237059
- Publication date Sep 12, 2013
- TOKYO ELECTRON LIMITED
- Alok RANJAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REGISTERED STRUCTURE FORMATION VIA THE APPLICATION OF DIRECTED THER...
- Publication number 20130189492
- Publication date Jul 25, 2013
- Micron Technology, Inc.
- Dan B. Millward
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
CRITICAL DIMENSION REDUCTION AND ROUGHNESS CONTROL
- Publication number 20120309201
- Publication date Dec 6, 2012
- LAM RESEARCH CORPORATION
- Sangheon LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SYSTEM FOR MANUFAC...
- Publication number 20120282713
- Publication date Nov 8, 2012
- TOKYO ELECTRON LIMITED
- Keisuke Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR FORMING ARRAYS OF SMALL, CLOSELY SPACED FEATURES
- Publication number 20120228742
- Publication date Sep 13, 2012
- Micron Technology, Inc.
- Mirzafer Abatchev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT FABRICATION
- Publication number 20120193777
- Publication date Aug 2, 2012
- Micron Technology, Inc.
- Luan C. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSES AND APPARATUS HAVING A SEMICONDUCTOR FIN
- Publication number 20120190184
- Publication date Jul 26, 2012
- Mark Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated Circuit Pattern and Method
- Publication number 20120168955
- Publication date Jul 5, 2012
- Macronix International Co., Ltd.
- Shih-Hung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING LARGE-AREA NANOSCALE PATTERN
- Publication number 20120156882
- Publication date Jun 21, 2012
- LG Innotek Co., Ltd.
- YOUNG-JAE LEE
- B82 - NANO-TECHNOLOGY
Information Patent Application
MULTI-EXPOSURE LITHOGRAPHY EMPLOYING DIFFERENTIALLY SENSITIVE PHOTO...
- Publication number 20120156450
- Publication date Jun 21, 2012
- International Business Machines Corporation
- Wu-Song Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Subphotolithographic processing

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor patterning and resulting structures

Method for forming patterned mask layer

Semiconductor patterning and resulting structures

Alternating hardmasks for tight-pitch line formation

Alternating hardmasks for tight-pitch line formation

Pitch multiplication using self-assembling materials

Multi-patterning method and device formed by the method

Alternating hardmasks for tight-pitch line formation

Self-aligned quadruple patterning process

Method for modifying spacer profile

Methods of forming semiconductor device structures including metal...

Methods for manufacturing a spacer with desired profile in an advan...

Single spacer process for multiplying pitch by a factor greater tha...

Integrated circuit fabrication

Semiconductor device structures including metal oxide structures

Integrated circuit fabrication

Integrated circuit structure having arrays of small, closely spaced...

Gate electrode with a shrink spacer

Pattern forming method

Primer and pattern forming method for layer including block copolymer

Polymeric materials in self-assembled arrays and semiconductor stru...

Multi-patterning method and device formed by the method

Nonvolatile memory device using semiconductor nanocrystals and meth...

Methods using block co-polymer self-assembly for sub-lithographic p...

Primer and pattern forming method for layer including block copolymer

Method for fabricating large-area nanoscale pattern

Polymeric materials in self-assembled arrays and semiconductor stru...

Double patterning with inline critical dimension slimming

Integrated circuit pattern and method

Methods of forming a pattern on a substrate

Patents Applicationslast 30 patents

Semiconductor Patterning and Resulting Structures

METHOD FOR FORMING PATTERNED MASK LAYER

Semiconductor Patterning and Resulting Structures

ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION

ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION

PATTERN FORMING METHOD

METHOD FOR MANUFACTURING POROUS STRUCTURE AND METHOD FOR FORMING PA...

METHODS FOR FABRICATING INTEGRATED CIRCUITS WITH IMPROVED SEMICONDU...

METHODS FOR FABRICATING ELECTRICALLY-ISOLATED FINFET SEMICONDUCTOR...

MULTI-PATTERNING METHOD AND DEVICE FORMED BY THE METHOD

Methods of Forming A Pattern On A Substrate

SEMICONDUCTOR DEVICE STRUCTURES INCLUDING METAL OXIDE STRUCTURES, A...

SINGLE SPACER PROCESS FOR MULTIPLYING PITCH BY A FACTOR GREATER THA...

PRIMER AND PATTERN FORMING METHOD FOR LAYER INCLUDING BLOCK COPOLYMER

Thermal annealing process

High temperature thermal annealing process

INTEGRATED CIRCUIT FABRICATION

POLYMERIC MATERIALS IN SELF-ASSEMBLED ARRAYS AND SEMICONDUCTOR STRU...

Methods Using Block Co-Polymer Self-Assembly for Sub-Lithographic P...

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

FORMATION OF SiOCl-CONTAINING LAYER ON SPACER SIDEWALLS TO PREVENT...

REGISTERED STRUCTURE FORMATION VIA THE APPLICATION OF DIRECTED THER...

CRITICAL DIMENSION REDUCTION AND ROUGHNESS CONTROL

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SYSTEM FOR MANUFAC...

METHODS FOR FORMING ARRAYS OF SMALL, CLOSELY SPACED FEATURES

INTEGRATED CIRCUIT FABRICATION

PROCESSES AND APPARATUS HAVING A SEMICONDUCTOR FIN

Integrated Circuit Pattern and Method

METHOD FOR FABRICATING LARGE-AREA NANOSCALE PATTERN

MULTI-EXPOSURE LITHOGRAPHY EMPLOYING DIFFERENTIALLY SENSITIVE PHOTO...