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G03F1/60
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PHYSICS
G03
Photography
G03F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES
G03F1/00
Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof
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G03F1/60
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Patents Grants
last 30 patents
Information
Patent Grant
Method for forming target substrate and electronic device
Patent number
11,868,040
Issue date
Jan 9, 2024
Innolux Corporation
Chien-Hsing Lee
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Reticle in an apparatus for extreme ultraviolet exposure
Patent number
11,835,850
Issue date
Dec 5, 2023
Samsung Electronics Co., Ltd.
Sanghyun Kim
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Mask blank glass substrate
Patent number
11,835,853
Issue date
Dec 5, 2023
Shin-Etsu Chemical Co., Ltd.
Naoki Yarita
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Composition for forming organic film, patterning process, and polymer
Patent number
11,782,347
Issue date
Oct 10, 2023
Shin-Etsu Chemical Co., Ltd.
Daisuke Kori
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Extreme ultraviolet mask blank with multilayer absorber and method...
Patent number
11,754,917
Issue date
Sep 12, 2023
Applied Materials, Inc.
Vibhu Jindal
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for producing substrate
Patent number
11,740,551
Issue date
Aug 29, 2023
LG Chem, Ltd.
Jun Haeng Lee
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photomask and method for forming the same
Patent number
11,681,215
Issue date
Jun 20, 2023
Taiwan Semiconductor Manufacturing Company Ltd.
Hsuan-Wen Wang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Device having color resists pattern
Patent number
11,609,492
Issue date
Mar 21, 2023
Ming-An Hsu
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Large-size synthetic quartz glass substrate, evaluation method, and...
Patent number
11,591,260
Issue date
Feb 28, 2023
Shin-Etsu Chemical Co., Ltd.
Yoko Ishitsuka
B24 - GRINDING POLISHING
Information
Patent Grant
Pixel arrangement structure, organic light emitting device, display...
Patent number
11,561,465
Issue date
Jan 24, 2023
ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
Fengli Ji
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Monomer, polymer, negative resist composition, photomask blank, and...
Patent number
11,548,844
Issue date
Jan 10, 2023
Shin-Etsu Chemical Co., Ltd.
Daisuke Domon
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photomask assembly with reflective photomask and method of manufact...
Patent number
11,537,039
Issue date
Dec 27, 2022
Advanced Mask Technology Center GmbH & Co. KG
Thorsten Schedel
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method and apparatus to improve EUV mask blank flatness
Patent number
11,480,865
Issue date
Oct 25, 2022
Applied Materials, Inc.
Vibhu Jindal
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method and apparatus to anneal EUV mask blank
Patent number
11,480,866
Issue date
Oct 25, 2022
Applied Materials, Inc.
Herng Yau Yoong
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Highly homogeneous glass-ceramic component
Patent number
11,465,933
Issue date
Oct 11, 2022
Schott AG
Ralf Jedamzik
C03 - GLASS MINERAL OR SLAG WOOL
Information
Patent Grant
Mask treating method
Patent number
11,454,879
Issue date
Sep 27, 2022
Samsung Electronics Co., Ltd.
Yunsong Jeong
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Mask for lithography process and method for manufacturing the same
Patent number
11,448,955
Issue date
Sep 20, 2022
Taiwan Semiconductor Manufacturing Co., Ltd
Chi-Hung Liao
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Hexagonal boron nitride structures
Patent number
11,370,662
Issue date
Jun 28, 2022
Texas Instruments Incorporated
Luigi Colombo
C01 - INORGANIC CHEMISTRY
Information
Patent Grant
Method and apparatus for determining positions of a plurality of pi...
Patent number
11,366,383
Issue date
Jun 21, 2022
Carl Zeiss SMS Ltd.
Vladimir Dmitriev
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photomask, method of fabricating a photomask, and method of fabrica...
Patent number
11,340,524
Issue date
May 24, 2022
Taiwan Semiconductor Manufacturing Company Ltd.
Tzu Han Liu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Extreme ultraviolet mask absorber materials
Patent number
11,300,871
Issue date
Apr 12, 2022
Applied Materials, Inc.
Shiyu Liu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Mask substrate and method for forming mask substrate
Patent number
11,294,273
Issue date
Apr 5, 2022
Innolux Corporation
Chien-Hsing Lee
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photomask
Patent number
11,281,091
Issue date
Mar 22, 2022
Taiwan Semiconductor Manufacturing Co., Ltd
You-Hua Chou
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Chemically amplified negative resist composition and resist pattern...
Patent number
11,231,650
Issue date
Jan 25, 2022
Shin-Etsu Chemical Co., Ltd.
Masaaki Kotake
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Semiconductor structure and manufacturing method thereof
Patent number
11,226,562
Issue date
Jan 18, 2022
Taiwan Semiconductor Manufacturing Company Ltd.
Yung-Yao Lee
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Extreme ultraviolet mask blank with multilayer absorber and method...
Patent number
11,022,876
Issue date
Jun 1, 2021
Applied Materials, Inc.
Vibhu Jindal
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Process variability aware adaptive inspection and metrology
Patent number
11,003,093
Issue date
May 11, 2021
ASML Netherlands B.V.
Venugopal Vellanki
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Real-time correction of template deformation in nanoimprint lithogr...
Patent number
10,996,560
Issue date
May 4, 2021
Canon Kabushiki Kaisha
Anshuman Cherala
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for manufacturing a mask blank substrate, method for manufac...
Patent number
10,983,427
Issue date
Apr 20, 2021
Hoya Corporation
Masaru Tanabe
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Substrate processing control apparatus, recording medium, and metho...
Patent number
10,955,753
Issue date
Mar 23, 2021
TOSHIBA MEMORY CORPORATION
Kentaro Kasa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
ELECTRONIC DEVICE AND METHOD FOR MANUFACTURING TARGET SUBSTRATE
Publication number
20240103356
Publication date
Mar 28, 2024
InnoLux Corporation
Chien-Hsing LEE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MASK BLANK AND REFLECTIVE MASK
Publication number
20240094621
Publication date
Mar 21, 2024
HOYA CORPORATION
Kazutake TANIGUCHI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANU...
Publication number
20240085778
Publication date
Mar 14, 2024
Samsung Electronics Co., Ltd.
Byungje Jung
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Mask Blank Glass Substrate
Publication number
20240053675
Publication date
Feb 15, 2024
Shin-Etsu Chemical Co., Ltd.
Naoki YARITA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MASK-SUPPORT ASSEMBLY AND PRODUCING METHOD THEREOF
Publication number
20240049506
Publication date
Feb 8, 2024
Olum Material Corporation
Young Ho LEE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD AND APPARATUS FOR OPTIMIZING A DEFECT CORRECTION FOR AN OPTI...
Publication number
20230408911
Publication date
Dec 21, 2023
Carl Zeiss SMS Ltd.
Vladimir Dmitriev
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK
Publication number
20230375908
Publication date
Nov 23, 2023
TOPPAN PHOTOMASK CO., LTD.
Kazuaki MATSUI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
OPTICAL DEVICE FABRICATION METHOD
Publication number
20230367202
Publication date
Nov 16, 2023
Shphotonics Ltd
Lei SUN
B82 - NANO-TECHNOLOGY
Information
Patent Application
PRINT ELEMENT SUBSTRATE AND METHOD FOR MANUFACTURING PRINT ELEMENT...
Publication number
20230341762
Publication date
Oct 26, 2023
Canon Kabushiki Kaisha
KEIJI MATSUMOTO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MASK, MASK ASSEMBLY HAVING THE SAME, AND SUBSTRATE TRANSFER APPARATUS
Publication number
20230221642
Publication date
Jul 13, 2023
SAMSUNG DISPLAY CO., LTD.
CHEOLRAE JO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE
Publication number
20230211436
Publication date
Jul 6, 2023
SEMES CO., LTD.
Hyo Won YANG
B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information
Patent Application
SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
Publication number
20230213866
Publication date
Jul 6, 2023
SEMES CO.,LTD
Hyun YOON
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
Publication number
20230213849
Publication date
Jul 6, 2023
SKC solmics Co., Ltd.
GeonGon LEE
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD AND APPARATUS FOR FORMING A BLANK MASK AND A LAYER FOR A BLA...
Publication number
20230185185
Publication date
Jun 15, 2023
SKC solmics Co., Ltd.
GeonGon Lee
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
Publication number
20230176467
Publication date
Jun 8, 2023
TOPPAN PHOTOMASK CO., LTD.
Kenjiro ICHIKAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOMASK BLANK, MANUFACTURING METHOD OF PHOTOMASK AND PHOTOMASK
Publication number
20230148427
Publication date
May 11, 2023
Shin-Etsu Chemical Co., Ltd.
Naoki MATSUHASHI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOCHEMICAL AND THERMAL RELEASE LAYER PROCESSES AND USES IN DEVIC...
Publication number
20230144598
Publication date
May 11, 2023
Terecircuits Corporation
Jayna Sheats
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD AND APPARATUS FOR MANUFACTURING A PHOTOMASK FROM A BLANK MASK
Publication number
20230135120
Publication date
May 4, 2023
SKC solmics Co., Ltd.
Sung Hoon SON
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, RE...
Publication number
20230132780
Publication date
May 4, 2023
HOYA CORPORATION
Tatsuya SASAKI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
A METHOD OF MANUFACTURING SEGREGATED LAYERS ABOVE A SUBSTRATE, AND...
Publication number
20230119980
Publication date
Apr 20, 2023
Merck Patent GmbH
Daniel HUDSON
B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information
Patent Application
SUBSTRATE WITH FILM FOR REFLECTIVE MASK BLANK, REFLECTIVE MASK BLAN...
Publication number
20230104571
Publication date
Apr 6, 2023
Shin-Etsu Chemical Co., Ltd.
Takuro KOSAKA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MASK BLANK, TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCT...
Publication number
20230097280
Publication date
Mar 30, 2023
HOYA CORPORATION
Osamu NOZAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
EUV PHOTOMASK ARCHITECTURES FOR PATTERNING OF INTEGRATED CIRCUITS
Publication number
20230101021
Publication date
Mar 30, 2023
Astrileux Corporation
Supriya JAISWAL
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD OF CLEANING SUBSTRATE FOR BLANK MASK, SUBSTRATE FOR BLANK MA...
Publication number
20230064333
Publication date
Mar 2, 2023
SKC solmics Co., Ltd.
Taewan KIM
B08 - CLEANING
Information
Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE
Publication number
20230067973
Publication date
Mar 2, 2023
SEMES CO., LTD.
Tae Hee KIM
B08 - CLEANING
Information
Patent Application
MASK BLANKS SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME
Publication number
20230037856
Publication date
Feb 9, 2023
Shin-Etsu Chemical Co., Ltd.
Tomoaki SUGIYAMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOMASK AND PHOTOMASK FIXING DEVICE
Publication number
20230021136
Publication date
Jan 19, 2023
Changxin Memory Technologies, Inc.
KUAN-TING CHOU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD OF PREPARING METAL MASK SUBSTRATE
Publication number
20220404695
Publication date
Dec 22, 2022
Darwin Precisions Corporation
Chi-Wei LIN
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
CURVED RETICLE BY MECHANICAL AND PHASE BENDING ALONG ORTHOGONAL AXES
Publication number
20220357666
Publication date
Nov 10, 2022
Nikon Corporation
Donis G. Flagello
G02 - OPTICS
Information
Patent Application
REFLECTIVE MASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE MASK
Publication number
20220350234
Publication date
Nov 3, 2022
Shin-Etsu Chemical Co., Ltd.
Takuro Kosaka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY