Substrates

Industry

CPC
G03F1/60

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/60Substrates

Industries

Patents Grantslast 30 patents

Information Patent Grant
Substrate with film for reflective mask blank, reflective mask blan...
- Patent number 12,124,162
- Issue date Oct 22, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank glass substrate
- Patent number 12,117,724
- Issue date Oct 15, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki Yarita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process variability aware adaptive inspection and metrology
- Patent number 12,092,965
- Issue date Sep 17, 2024
- ASML Netherlands B.V.
- Venugopal Vellanki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for lithography process
- Patent number 12,066,756
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hung Liao
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method of preparing metal mask substrate
- Patent number 12,024,780
- Issue date Jul 2, 2024
- DARWIN PRECISIONS CORPORATION
- Chi-Wei Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming target substrate and electronic device
- Patent number 11,868,040
- Issue date Jan 9, 2024
- Innolux Corporation
- Chien-Hsing Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle in an apparatus for extreme ultraviolet exposure
- Patent number 11,835,850
- Issue date Dec 5, 2023
- Samsung Electronics Co., Ltd.
- Sanghyun Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank glass substrate
- Patent number 11,835,853
- Issue date Dec 5, 2023
- Shin-Etsu Chemical Co., Ltd.
- Naoki Yarita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming organic film, patterning process, and polymer
- Patent number 11,782,347
- Issue date Oct 10, 2023
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Extreme ultraviolet mask blank with multilayer absorber and method...
- Patent number 11,754,917
- Issue date Sep 12, 2023
- Applied Materials, Inc.
- Vibhu Jindal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing substrate
- Patent number 11,740,551
- Issue date Aug 29, 2023
- LG Chem, Ltd.
- Jun Haeng Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and method for forming the same
- Patent number 11,681,215
- Issue date Jun 20, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Hsuan-Wen Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device having color resists pattern
- Patent number 11,609,492
- Issue date Mar 21, 2023
- Ming-An Hsu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Large-size synthetic quartz glass substrate, evaluation method, and...
- Patent number 11,591,260
- Issue date Feb 28, 2023
- Shin-Etsu Chemical Co., Ltd.
- Yoko Ishitsuka
- B24 - GRINDING POLISHING
Information Patent Grant
Pixel arrangement structure, organic light emitting device, display...
- Patent number 11,561,465
- Issue date Jan 24, 2023
- ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- Fengli Ji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monomer, polymer, negative resist composition, photomask blank, and...
- Patent number 11,548,844
- Issue date Jan 10, 2023
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Domon
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photomask assembly with reflective photomask and method of manufact...
- Patent number 11,537,039
- Issue date Dec 27, 2022
- Advanced Mask Technology Center GmbH & Co. KG
- Thorsten Schedel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to improve EUV mask blank flatness
- Patent number 11,480,865
- Issue date Oct 25, 2022
- Applied Materials, Inc.
- Vibhu Jindal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to anneal EUV mask blank
- Patent number 11,480,866
- Issue date Oct 25, 2022
- Applied Materials, Inc.
- Herng Yau Yoong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Highly homogeneous glass-ceramic component
- Patent number 11,465,933
- Issue date Oct 11, 2022
- Schott AG
- Ralf Jedamzik
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Mask treating method
- Patent number 11,454,879
- Issue date Sep 27, 2022
- Samsung Electronics Co., Ltd.
- Yunsong Jeong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask for lithography process and method for manufacturing the same
- Patent number 11,448,955
- Issue date Sep 20, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hung Liao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hexagonal boron nitride structures
- Patent number 11,370,662
- Issue date Jun 28, 2022
- Texas Instruments Incorporated
- Luigi Colombo
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Method and apparatus for determining positions of a plurality of pi...
- Patent number 11,366,383
- Issue date Jun 21, 2022
- Carl Zeiss SMS Ltd.
- Vladimir Dmitriev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, method of fabricating a photomask, and method of fabrica...
- Patent number 11,340,524
- Issue date May 24, 2022
- Taiwan Semiconductor Manufacturing Company Ltd.
- Tzu Han Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,300,871
- Issue date Apr 12, 2022
- Applied Materials, Inc.
- Shiyu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask substrate and method for forming mask substrate
- Patent number 11,294,273
- Issue date Apr 5, 2022
- Innolux Corporation
- Chien-Hsing Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask
- Patent number 11,281,091
- Issue date Mar 22, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- You-Hua Chou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified negative resist composition and resist pattern...
- Patent number 11,231,650
- Issue date Jan 25, 2022
- Shin-Etsu Chemical Co., Ltd.
- Masaaki Kotake
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Semiconductor structure and manufacturing method thereof
- Patent number 11,226,562
- Issue date Jan 18, 2022
- Taiwan Semiconductor Manufacturing Company Ltd.
- Yung-Yao Lee
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE DEVICE AND PELLICLE PRO...
- Publication number 20240377726
- Publication date Nov 14, 2024
- MITSUI CHEMICALS, INC.
- Takashi UNEZAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY METHOD
- Publication number 20240264523
- Publication date Aug 8, 2024
- The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Xiangang LUO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASKS HAVING INTERMEDIATE BARRIER LAYERS
- Publication number 20240241434
- Publication date Jul 18, 2024
- Intel Corporation
- Yongbae Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HARD MASK AND SEMICONDUCTOR DEVICE COMPRISING THE SAME
- Publication number 20240231219
- Publication date Jul 11, 2024
- Samsung Electronics Co., Ltd.
- Nam Jin CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
- Publication number 20240192584
- Publication date Jun 13, 2024
- SK enpulse Co., Ltd.
- Hyung-joo LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRONIC DEVICE AND METHOD FOR MANUFACTURING TARGET SUBSTRATE
- Publication number 20240103356
- Publication date Mar 28, 2024
- InnoLux Corporation
- Chien-Hsing LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK AND REFLECTIVE MASK
- Publication number 20240094621
- Publication date Mar 21, 2024
- HOYA CORPORATION
- Kazutake TANIGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANU...
- Publication number 20240085778
- Publication date Mar 14, 2024
- Samsung Electronics Co., Ltd.
- Byungje Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask Blank Glass Substrate
- Publication number 20240053675
- Publication date Feb 15, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki YARITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK-SUPPORT ASSEMBLY AND PRODUCING METHOD THEREOF
- Publication number 20240049506
- Publication date Feb 8, 2024
- Olum Material Corporation
- Young Ho LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR OPTIMIZING A DEFECT CORRECTION FOR AN OPTI...
- Publication number 20230408911
- Publication date Dec 21, 2023
- Carl Zeiss SMS Ltd.
- Vladimir Dmitriev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK
- Publication number 20230375908
- Publication date Nov 23, 2023
- TOPPAN PHOTOMASK CO., LTD.
- Kazuaki MATSUI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL DEVICE FABRICATION METHOD
- Publication number 20230367202
- Publication date Nov 16, 2023
- Shphotonics Ltd
- Lei SUN
- B82 - NANO-TECHNOLOGY
Information Patent Application
PRINT ELEMENT SUBSTRATE AND METHOD FOR MANUFACTURING PRINT ELEMENT...
- Publication number 20230341762
- Publication date Oct 26, 2023
- Canon Kabushiki Kaisha
- KEIJI MATSUMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK, MASK ASSEMBLY HAVING THE SAME, AND SUBSTRATE TRANSFER APPARATUS
- Publication number 20230221642
- Publication date Jul 13, 2023
- SAMSUNG DISPLAY CO., LTD.
- CHEOLRAE JO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE
- Publication number 20230211436
- Publication date Jul 6, 2023
- SEMES CO., LTD.
- Hyo Won YANG
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
- Publication number 20230213866
- Publication date Jul 6, 2023
- SEMES CO.,LTD
- Hyun YOON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
- Publication number 20230213849
- Publication date Jul 6, 2023
- SKC solmics Co., Ltd.
- GeonGon LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR FORMING A BLANK MASK AND A LAYER FOR A BLA...
- Publication number 20230185185
- Publication date Jun 15, 2023
- SKC solmics Co., Ltd.
- GeonGon Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20230176467
- Publication date Jun 8, 2023
- TOPPAN PHOTOMASK CO., LTD.
- Kenjiro ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, MANUFACTURING METHOD OF PHOTOMASK AND PHOTOMASK
- Publication number 20230148427
- Publication date May 11, 2023
- Shin-Etsu Chemical Co., Ltd.
- Naoki MATSUHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOCHEMICAL AND THERMAL RELEASE LAYER PROCESSES AND USES IN DEVIC...
- Publication number 20230144598
- Publication date May 11, 2023
- Terecircuits Corporation
- Jayna Sheats
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR MANUFACTURING A PHOTOMASK FROM A BLANK MASK
- Publication number 20230135120
- Publication date May 4, 2023
- SKC solmics Co., Ltd.
- Sung Hoon SON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, RE...
- Publication number 20230132780
- Publication date May 4, 2023
- HOYA CORPORATION
- Tatsuya SASAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A METHOD OF MANUFACTURING SEGREGATED LAYERS ABOVE A SUBSTRATE, AND...
- Publication number 20230119980
- Publication date Apr 20, 2023
- Merck Patent GmbH
- Daniel HUDSON
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE WITH FILM FOR REFLECTIVE MASK BLANK, REFLECTIVE MASK BLAN...
- Publication number 20230104571
- Publication date Apr 6, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCT...
- Publication number 20230097280
- Publication date Mar 30, 2023
- HOYA CORPORATION
- Osamu NOZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV PHOTOMASK ARCHITECTURES FOR PATTERNING OF INTEGRATED CIRCUITS
- Publication number 20230101021
- Publication date Mar 30, 2023
- Astrileux Corporation
- Supriya JAISWAL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CLEANING SUBSTRATE FOR BLANK MASK, SUBSTRATE FOR BLANK MA...
- Publication number 20230064333
- Publication date Mar 2, 2023
- SKC solmics Co., Ltd.
- Taewan KIM
- B08 - CLEANING
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE
- Publication number 20230067973
- Publication date Mar 2, 2023
- SEMES CO., LTD.
- Tae Hee KIM
- B08 - CLEANING

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Substrate with film for reflective mask blank, reflective mask blan...

Mask blank glass substrate

Process variability aware adaptive inspection and metrology

Method for lithography process

Method of preparing metal mask substrate

Method for forming target substrate and electronic device

Reticle in an apparatus for extreme ultraviolet exposure

Mask blank glass substrate

Composition for forming organic film, patterning process, and polymer

Extreme ultraviolet mask blank with multilayer absorber and method...

Method for producing substrate

Photomask and method for forming the same

Device having color resists pattern

Large-size synthetic quartz glass substrate, evaluation method, and...

Pixel arrangement structure, organic light emitting device, display...

Monomer, polymer, negative resist composition, photomask blank, and...

Photomask assembly with reflective photomask and method of manufact...

Method and apparatus to improve EUV mask blank flatness

Method and apparatus to anneal EUV mask blank

Highly homogeneous glass-ceramic component

Mask treating method

Mask for lithography process and method for manufacturing the same

Hexagonal boron nitride structures

Method and apparatus for determining positions of a plurality of pi...

Photomask, method of fabricating a photomask, and method of fabrica...

Extreme ultraviolet mask absorber materials

Mask substrate and method for forming mask substrate

Photomask

Chemically amplified negative resist composition and resist pattern...

Semiconductor structure and manufacturing method thereof

Patents Applicationslast 30 patents

PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE DEVICE AND PELLICLE PRO...

PHOTOLITHOGRAPHY METHOD

PHOTOMASKS HAVING INTERMEDIATE BARRIER LAYERS

HARD MASK AND SEMICONDUCTOR DEVICE COMPRISING THE SAME

BLANK MASK AND PHOTOMASK USING THE SAME

ELECTRONIC DEVICE AND METHOD FOR MANUFACTURING TARGET SUBSTRATE

MASK BLANK AND REFLECTIVE MASK

PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANU...

Mask Blank Glass Substrate

MASK-SUPPORT ASSEMBLY AND PRODUCING METHOD THEREOF

METHOD AND APPARATUS FOR OPTIMIZING A DEFECT CORRECTION FOR AN OPTI...

REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK

OPTICAL DEVICE FABRICATION METHOD

PRINT ELEMENT SUBSTRATE AND METHOD FOR MANUFACTURING PRINT ELEMENT...

MASK, MASK ASSEMBLY HAVING THE SAME, AND SUBSTRATE TRANSFER APPARATUS

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE

SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD

BLANK MASK AND PHOTOMASK USING THE SAME

METHOD AND APPARATUS FOR FORMING A BLANK MASK AND A LAYER FOR A BLA...

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

PHOTOMASK BLANK, MANUFACTURING METHOD OF PHOTOMASK AND PHOTOMASK

PHOTOCHEMICAL AND THERMAL RELEASE LAYER PROCESSES AND USES IN DEVIC...

METHOD AND APPARATUS FOR MANUFACTURING A PHOTOMASK FROM A BLANK MASK

MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, RE...

A METHOD OF MANUFACTURING SEGREGATED LAYERS ABOVE A SUBSTRATE, AND...

SUBSTRATE WITH FILM FOR REFLECTIVE MASK BLANK, REFLECTIVE MASK BLAN...

MASK BLANK, TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCT...

EUV PHOTOMASK ARCHITECTURES FOR PATTERNING OF INTEGRATED CIRCUITS

METHOD OF CLEANING SUBSTRATE FOR BLANK MASK, SUBSTRATE FOR BLANK MA...

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE