Target holders (includes backing plates and endblocks)

Industry

CPC
H01J37/3435

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3435Target holders (includes backing plates and endblocks)

Industries

Patents Grantslast 30 patents

Information Patent Grant
Sputter trap having a thin high purity coating layer and method of...
- Patent number 11,981,991
- Issue date May 14, 2024
- Honeywell International Inc.
- Jaeyeon Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering apparatus
- Patent number 11,978,615
- Issue date May 7, 2024
- Samsung Display Co., Ltd.
- Hyun-Woo Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,961,710
- Issue date Apr 16, 2024
- Canon Anelva Corporation
- Tadashi Inoue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Liquid sputter target
- Patent number 11,952,654
- Issue date Apr 9, 2024
- EVATEC AG
- Dominik Jaeger
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation apparatus
- Patent number 11,955,367
- Issue date Apr 9, 2024
- SHIBAURA MECHATRONICS CORPORATION
- Shohei Tanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tilted PVD source with rotating pedestal
- Patent number 11,948,784
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Harish Penmethsa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning of sin with CCP plasma or RPS clean
- Patent number 11,915,918
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Jothilingam Ramalingam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing apparatus
- Patent number 11,891,685
- Issue date Feb 6, 2024
- ULVAC, Inc.
- Yukihito Tashiro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor manufacturing apparatus and earth shield
- Patent number 11,887,826
- Issue date Jan 30, 2024
- Kioxia Corporation
- Takashi Izumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process chamber with reduced plasma arc
- Patent number 11,875,969
- Issue date Jan 16, 2024
- Applied Materials, Inc.
- Fei Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetically enhanced high density plasma-chemical vapor deposition...
- Patent number 11,821,068
- Issue date Nov 21, 2023
- IonQuest Corp.
- Bassam Hanna Abraham
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering a layer on a substrate using a high-energy density plasm...
- Patent number 11,823,859
- Issue date Nov 21, 2023
- IonQuest Corp.
- Bassam Hanna Abraham
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation apparatus and film formation method
- Patent number 11,823,879
- Issue date Nov 21, 2023
- Tokyo Electron Limited
- Masato Shinada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Target structure and film forming apparatus
- Patent number 11,823,880
- Issue date Nov 21, 2023
- Tokyo Electron Limited
- Einstein Noel Abarra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PVD target design and semiconductor devices formed using the same
- Patent number 11,725,270
- Issue date Aug 15, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Hsi Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,694,882
- Issue date Jul 4, 2023
- Canon Anelva Corporation
- Yuji Takanami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Physical vapor deposition apparatus and method thereof
- Patent number 11,688,591
- Issue date Jun 27, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Hsi Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Isolator ring clamp and physical vapor deposition chamber incorpora...
- Patent number 11,670,493
- Issue date Jun 6, 2023
- Applied Materials, Inc.
- Ilya Lavitsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film-forming apparatus, film-forming system, and film-forming method
- Patent number 11,664,207
- Issue date May 30, 2023
- Tokyo Electron Limited
- Masato Shinada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Target structure of physical vapor deposition
- Patent number 11,649,543
- Issue date May 16, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ping-Yuan Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering equipment and operation method thereof
- Patent number 11,626,272
- Issue date Apr 11, 2023
- Au Optronics Corporation
- Chun-Yueh Hou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for an improved magnetron electromagnetic assembly
- Patent number 11,615,947
- Issue date Mar 28, 2023
- OEM Group, LLC
- Marc-Andre Lariviere
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Target object processing method and plasma processing apparatus
- Patent number 11,610,766
- Issue date Mar 21, 2023
- Tokyo Electron Limited
- Seiji Yokoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer support and thin-film deposition apparatus using the same
- Patent number 11,598,006
- Issue date Mar 7, 2023
- SKY TECH INC.
- Jing-Cheng Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition system with multi-cathode and method of manufacture thereof
- Patent number 11,600,476
- Issue date Mar 7, 2023
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrochromic devices
- Patent number 11,592,722
- Issue date Feb 28, 2023
- View, Inc.
- Zhongchun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputter trap having a thin high purity coating layer and method of...
- Patent number 11,584,985
- Issue date Feb 21, 2023
- Honeywell International Inc.
- Jaeyeon Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cathode unit and film forming apparatus
- Patent number 11,581,171
- Issue date Feb 14, 2023
- Tokyo Electron Limited
- Masato Shinada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target assembly to prevent overetch of backing plate and...
- Patent number 11,557,470
- Issue date Jan 17, 2023
- Taiwan Semiconductor Manufacturing Company Limited
- Chen-Fang Chung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus
- Patent number 11,551,918
- Issue date Jan 10, 2023
- Tokyo Electron Limited
- Kenichi Imakita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SPUTTERING TARGET AND SPUTTERING APPARATUS INCLUDING THE SAME
- Publication number 20240084441
- Publication date Mar 14, 2024
- SAMSUNG DISPLAY CO., LTD.
- HYUNEOK SHIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING APPARATUS
- Publication number 20240063003
- Publication date Feb 22, 2024
- Canon ANELVA Corporation
- Susumu KARINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE FOR REDUCING MISALIGNMENT BETWEEN SPUTTERING TARGET AND SHIELD
- Publication number 20240021422
- Publication date Jan 18, 2024
- Honeywell International Inc.
- Bo Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MOLTEN LIQUID TRANSPORT FOR TUNABLE VAPORIZATION IN ION SOURCES
- Publication number 20230402247
- Publication date Dec 14, 2023
- Applied Materials, Inc.
- Craig R. Chaney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN SITU AND TUNABLE DEPOSITION OF A FILM
- Publication number 20230374654
- Publication date Nov 23, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Hsi Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PVD TARGET DESIGN AND SEMICONDUCTOR DEVICES FORMED USING THE SAME
- Publication number 20230366079
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Hsi WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING TARGET-BACKING PLATE ASSEMBLY, MANUFACTURING METHOD THER...
- Publication number 20230360897
- Publication date Nov 9, 2023
- FURUYA METAL CO., LTD.
- Tomohiro Maruko
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHYSICAL VAPOR DEPOSITION APPARATUS AND METHOD THEREOF
- Publication number 20230307218
- Publication date Sep 28, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Hsi WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING TARGET, METHOD OF BONDING TARGET MATERIAL AND BACKING PL...
- Publication number 20230274921
- Publication date Aug 31, 2023
- Sumitomo Chemical Company, Limited
- Masahiro FUJITA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS
- Publication number 20230167542
- Publication date Jun 1, 2023
- TOKYO ELECTRON LIMITED
- Junichi TAKEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETRON TARGET COUPLING AND SUPPORT DEVICE
- Publication number 20230154733
- Publication date May 18, 2023
- VON ARDENNE Asset GmbH & Co. KG
- Goetz GROSSER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROCHROMIC DEVICES
- Publication number 20230144179
- Publication date May 11, 2023
- VIEW, INC.
- Zhongchun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTER TRAP HAVING A THIN HIGH PURITY COATING LAYER AND METHOD OF...
- Publication number 20230143320
- Publication date May 11, 2023
- Honeywell International Inc.
- Jaeyeon Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CATHODE UNIT FOR MAGNETRON SPUTTERING APPARATUS AND MAGNETRON SPUTT...
- Publication number 20230138552
- Publication date May 4, 2023
- Ulvac, Inc.
- Koji Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TILTED PVD SOURCE WITH ROTATING PEDESTAL
- Publication number 20230130947
- Publication date Apr 27, 2023
- Applied Materials, Inc.
- Harish PENMETHSA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION METHOD FOR TUNING MAGNETIC FIELD DISTRIBUTION OF DEPOSIT...
- Publication number 20230091273
- Publication date Mar 23, 2023
- SKY TECH INC.
- JING-CHENG LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING APPARATUS AND METHOD FOR THIN FILM ELECTRODE DEPOSITION
- Publication number 20230085216
- Publication date Mar 16, 2023
- SAMSUNG DISPLAY CO., LTD.
- You Jong LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING APPARATUS
- Publication number 20230035198
- Publication date Feb 2, 2023
- SAMSUNG DISPLAY CO., LTD.
- HYUN-WOO KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Electrically and Magnetically Enhanced Ionized Physical Vapor Depos...
- Publication number 20230005724
- Publication date Jan 5, 2023
- IonQuest Corp.
- Bassam Hanna ABRAHAM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING OF SIN WITH CCP PLASMA OR RPS CLEAN
- Publication number 20220415636
- Publication date Dec 29, 2022
- Applied Materials, Inc.
- Jothilingam Ramalingam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS, PROCESSING CONDITION DETERMINATION METHOD,...
- Publication number 20220415634
- Publication date Dec 29, 2022
- TOKYO ELECTRON LIMITED
- Kenichi Imakita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING OF SIN WITH CCP PLASMA OR RPS CLEAN
- Publication number 20220415637
- Publication date Dec 29, 2022
- Applied Materials, Inc.
- Jothilingam Ramalingam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTIFOCAL MAGNETRON DESIGN FOR PHYSICAL VAPOR DEPOSITION PROCESSIN...
- Publication number 20220406582
- Publication date Dec 22, 2022
- HIA, Inc.
- Samuel D. Harkness
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTER DEPOSITION
- Publication number 20220399195
- Publication date Dec 15, 2022
- Dyson Technology Limited
- Michael Edward RENDALL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETIC-FIELD-DISTRIBUTION TUNER, DEPOSITION EQUIPMENT AND METHOD...
- Publication number 20220384166
- Publication date Dec 1, 2022
- SKY TECH INC.
- JING-CHENG LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHYSICAL VAPOR DEPOSITION APPARATUS AND METHOD THEREOF
- Publication number 20220367161
- Publication date Nov 17, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Hsi WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ANALYZING METHOD
- Publication number 20220359175
- Publication date Nov 10, 2022
- Taiwan Semiconductor Manufacturing company Ltd.
- PRADIP GIRDHAR CHAUDHARI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING TARGET ASSEMBLY TO PREVENT OVERETCH OF BACKING PLATE AND...
- Publication number 20220351953
- Publication date Nov 3, 2022
- Taiwan Semiconductor Manufacturing Company Limited
- Chen-Fang Chung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD FOR ION-ASSISTED DEPOSITION OF OPTICAL COATINGS
- Publication number 20220316045
- Publication date Oct 6, 2022
- Guorong Vera Zhuang
- G02 - OPTICS
Information Patent Application
FILM DEPOSITION APPARATUS, SPUTTERING TARGET, AND MANUFACTURING MET...
- Publication number 20220301837
- Publication date Sep 22, 2022
- KIOXIA Corporation
- Akitsugu HATAZAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Target holders (includes backing plates and endblocks)

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Sputter trap having a thin high purity coating layer and method of...

Sputtering apparatus

Plasma processing apparatus

Liquid sputter target

Film formation apparatus

Tilted PVD source with rotating pedestal

Cleaning of sin with CCP plasma or RPS clean

Vacuum processing apparatus

Semiconductor manufacturing apparatus and earth shield

Process chamber with reduced plasma arc

Magnetically enhanced high density plasma-chemical vapor deposition...

Sputtering a layer on a substrate using a high-energy density plasm...

Film formation apparatus and film formation method

Target structure and film forming apparatus

PVD target design and semiconductor devices formed using the same

Substrate processing apparatus and substrate processing method

Physical vapor deposition apparatus and method thereof

Isolator ring clamp and physical vapor deposition chamber incorpora...

Film-forming apparatus, film-forming system, and film-forming method

Target structure of physical vapor deposition

Sputtering equipment and operation method thereof

Systems and methods for an improved magnetron electromagnetic assembly

Target object processing method and plasma processing apparatus

Wafer support and thin-film deposition apparatus using the same

Deposition system with multi-cathode and method of manufacture thereof

Electrochromic devices

Sputter trap having a thin high purity coating layer and method of...

Cathode unit and film forming apparatus

Sputtering target assembly to prevent overetch of backing plate and...

Film forming apparatus

Patents Applicationslast 30 patents

SPUTTERING TARGET AND SPUTTERING APPARATUS INCLUDING THE SAME

SPUTTERING APPARATUS

DEVICE FOR REDUCING MISALIGNMENT BETWEEN SPUTTERING TARGET AND SHIELD

MOLTEN LIQUID TRANSPORT FOR TUNABLE VAPORIZATION IN ION SOURCES

IN SITU AND TUNABLE DEPOSITION OF A FILM

PVD TARGET DESIGN AND SEMICONDUCTOR DEVICES FORMED USING THE SAME

SPUTTERING TARGET-BACKING PLATE ASSEMBLY, MANUFACTURING METHOD THER...

PHYSICAL VAPOR DEPOSITION APPARATUS AND METHOD THEREOF

SPUTTERING TARGET, METHOD OF BONDING TARGET MATERIAL AND BACKING PL...

FILM FORMING APPARATUS

MAGNETRON TARGET COUPLING AND SUPPORT DEVICE

ELECTROCHROMIC DEVICES

SPUTTER TRAP HAVING A THIN HIGH PURITY COATING LAYER AND METHOD OF...

CATHODE UNIT FOR MAGNETRON SPUTTERING APPARATUS AND MAGNETRON SPUTT...

TILTED PVD SOURCE WITH ROTATING PEDESTAL

DEPOSITION METHOD FOR TUNING MAGNETIC FIELD DISTRIBUTION OF DEPOSIT...

SPUTTERING APPARATUS AND METHOD FOR THIN FILM ELECTRODE DEPOSITION

SPUTTERING APPARATUS

Electrically and Magnetically Enhanced Ionized Physical Vapor Depos...

CLEANING OF SIN WITH CCP PLASMA OR RPS CLEAN

FILM FORMING APPARATUS, PROCESSING CONDITION DETERMINATION METHOD,...

CLEANING OF SIN WITH CCP PLASMA OR RPS CLEAN

MULTIFOCAL MAGNETRON DESIGN FOR PHYSICAL VAPOR DEPOSITION PROCESSIN...

SPUTTER DEPOSITION

MAGNETIC-FIELD-DISTRIBUTION TUNER, DEPOSITION EQUIPMENT AND METHOD...

PHYSICAL VAPOR DEPOSITION APPARATUS AND METHOD THEREOF

ANALYZING METHOD

SPUTTERING TARGET ASSEMBLY TO PREVENT OVERETCH OF BACKING PLATE AND...

SYSTEM AND METHOD FOR ION-ASSISTED DEPOSITION OF OPTICAL COATINGS

FILM DEPOSITION APPARATUS, SPUTTERING TARGET, AND MANUFACTURING MET...