Telecentric systems

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CPC
H01J2237/04928

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/04928Telecentric systems

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Patents Grantslast 30 patents

Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,705,304
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lithography system
- Patent number 11,610,758
- Issue date Mar 21, 2023
- KKT HOLDINGS SYNDICATE
- Tzu-Yi Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-beam electron characterization tool with telecentric illumina...
- Patent number 11,373,838
- Issue date Jun 28, 2022
- KLA Corporation
- Alan D. Brodie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3D mapping of samples in charged particle microscopy
- Patent number 11,355,307
- Issue date Jun 7, 2022
- FEI Company
- Jaroslav Kamenec
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,062,877
- Issue date Jul 13, 2021
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 10,541,110
- Issue date Jan 21, 2020
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 9,922,799
- Issue date Mar 20, 2018
- Hermes-Microvision, Inc.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam source
- Patent number 8,183,543
- Issue date May 22, 2012
- IMS Nanofabrication AG
- Elmar Platzgummer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Projection imaging type electron microscope
- Patent number 7,423,268
- Issue date Sep 9, 2008
- Nikon Corporation
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optimized curvilinear variable axis lens doublet for charged partic...
- Patent number 6,617,585
- Issue date Sep 9, 2003
- Nikon Corporation
- Werner Stickel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a quadrupole device for projection lithography by...
- Patent number 6,365,903
- Issue date Apr 2, 2002
- U.S. Philips Corporation
- Marcellinus P. C. M. Krijn
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Projection lithography device utilizing charged particles
- Patent number 6,326,629
- Issue date Dec 4, 2001
- U.S. Philips Corporation
- Marcellinus P. C. M. Krijn
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Quadrupole device for projection lithography by means of charged pa...
- Patent number 6,236,052
- Issue date May 22, 2001
- U.S. Philips Corporation
- Marcellinus P. C. M. Krijn
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Illumination deflection system for E-beam projection
- Patent number 6,005,250
- Issue date Dec 21, 1999
- Nikon Corporation
- Werner Stickel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam, in particular ionic optic imaging system
- Patent number 5,801,388
- Issue date Sep 1, 1998
- IMS-Ionen Mikropfabrikations Systeme GmbH
- Gerhard Stengl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Curvilinear variable axis lens correction with crossed coils
- Patent number 5,708,274
- Issue date Jan 13, 1998
- International Business Machines Corporation
- Guenther O. Langner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dynamic compensation of non-linear electron beam landing angle in v...
- Patent number 5,285,074
- Issue date Feb 8, 1994
- International Business Machines Corporation
- Don F. Haire
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam lithography
- Patent number 4,985,634
- Issue date Jan 15, 1991
- Oesterreichische Investitionskredit Aktiengesellschaft and Ionen Mikrofabrica...
- Gerhard Stengl
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
3D MAPPING OF SAMPLES IN CHARGED PARTICLE MICROSCOPY
- Publication number 20220181116
- Publication date Jun 9, 2022
- FEI Company
- Jaroslav Kamenec
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Lithography System
- Publication number 20200227235
- Publication date Jul 16, 2020
- Tzu-Yi Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20180350555
- Publication date Dec 6, 2018
- HERMES MICROVISION, INC.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM SOURCE
- Publication number 20090026389
- Publication date Jan 29, 2009
- IMS Nanofabrication AG
- Elmar Platzgummer
- B82 - NANO-TECHNOLOGY
Information Patent Application
Projection imaging type electron microscope
- Publication number 20060011833
- Publication date Jan 19, 2006
- Nikon Corporation
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming a quadrupole device for projection lithography by...
- Publication number 20010023926
- Publication date Sep 27, 2001
- PHILIPS CORPORATION
- Marcellinus P.C.M. Krijn
- B82 - NANO-TECHNOLOGY

Telecentric systems

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Apparatus of plural charged-particle beams

Charged particle beam lithography system

Multi-beam electron characterization tool with telecentric illumina...

3D mapping of samples in charged particle microscopy

Apparatus of plural charged-particle beams

Apparatus of plural charged-particle beams

Apparatus of plural charged-particle beams

Multi-beam source

Projection imaging type electron microscope

Optimized curvilinear variable axis lens doublet for charged partic...

Method of forming a quadrupole device for projection lithography by...

Projection lithography device utilizing charged particles

Quadrupole device for projection lithography by means of charged pa...

Illumination deflection system for E-beam projection

Particle beam, in particular ionic optic imaging system

Curvilinear variable axis lens correction with crossed coils

Dynamic compensation of non-linear electron beam landing angle in v...

Ion beam lithography

Patents Applicationslast 30 patents

3D MAPPING OF SAMPLES IN CHARGED PARTICLE MICROSCOPY

Charged Particle Beam Lithography System

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

MULTI-BEAM SOURCE

Projection imaging type electron microscope

Method of forming a quadrupole device for projection lithography by...