Claims
- 1. A method of manufacturing an integrated electronic circuit, in which a projection lithographic image of a lithographic object structure (14) is formed on a lithographic imaging surface (16), forming part of the integrated electronic circuit, by means of a beam of charged particles, which image is realized by means of an imaging particle optical system, characterized in thatthe imaging beam is subjected to the effects of a first up to and including a fifth quadrupole field forming part of the particle-optical system, neighboring quadrupole fields of said quadrupole fields extending each time perpendicularly to one another, the strength and the location of said quadrupole fields being chosen to be such that the imaging of the lithographic object structure (14) on the lithographic imaging surface (16) is stigmatic, and that the system is telescopic in the x-z plane as well as in the y-z plane.
- 2. A method as claimed in claim 1, in which the strength and the location of the quadrupole fields are chosen to be such that the x magnification Mx from the lithographic object structure to the lithographic imaging surface equals the y magnification My.
- 3. A method as claimed in claim 2, in which the various dimensional parameters (A, a, b, c, d, D) of the particle-optical system are chosen to be such tat the following four relations exist between these dimensional parameters: A=-2DM2(1+M)+b(1+4M+M2-C)2(1+M)(1)a=b-2,+C2(1+M)(2)c=bM(3)d=b-2M+C2M2(1+M)(4)in which:M=the angular magnification by the imaging particle-optical system from the lithographic object structure (14) to the lithographic imaging plane (16), C=(M+6M2+M3), A=the distance between the lithographic object structure (14) and the center of the first quadrupole field, a=the distance between the center of the first quadrupole field and the center of the second quadrupole field, b=the distance between the center of the second quadrupole field and the center of the third quadrupole field, c=the distance between the center of the third quadrupole field and the center of the fourth quadrupole field, d=the distance between the center of the fourth quadrupole field and the center of the fifth quadrupole field, and D=the distance between the center of the fifth quadrupole field and the lithographic imaging plane (16).
Priority Claims (1)
Number |
Date |
Country |
Kind |
98203014 |
Sep 1998 |
EP |
|
Parent Case Info
This application is a Division of Ser. No 09/392,686 filed Sep. 9, 1999 now U.S. Pat. No. 6,236,052.
US Referenced Citations (2)
Number |
Name |
Date |
Kind |
4823013 |
Van Der Mast |
Apr 1989 |
A |
5298757 |
Okayama |
Mar 1994 |
A |