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CPC
B24B37/015
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Parent Industries
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PERFORMING OPERATIONS TRANSPORTING
B24
Grinding technology
B24B
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
B24B37/00
Lapping machines or devices Accessories
Current Industry
B24B37/015
Temperature control
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Patents Grants
last 30 patents
Information
Patent Grant
System for adjusting pad surface temperature and polishing apparatus
Patent number
11,992,915
Issue date
May 28, 2024
Ebara Corporation
Shuji Uozumi
B24 - GRINDING POLISHING
Information
Patent Grant
Chemical mechanical polishing apparatus, chemical mechanical polish...
Patent number
11,986,921
Issue date
May 21, 2024
Samsung Electronics Co., Ltd.
Myung-Ki Hong
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Polishing method, polishing agent and cleaning agent for polishing
Patent number
11,986,920
Issue date
May 21, 2024
Kioxia Corporation
Mikiya Sakashita
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing pad, method for producing the same and method of fabricat...
Patent number
11,951,591
Issue date
Apr 9, 2024
SK ENPULSE CO., LTD.
Hye Young Heo
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing head, substrate processing apparatus including the same a...
Patent number
11,919,122
Issue date
Mar 5, 2024
Samsung Display Co., Ltd.
Seung Bae Kang
B24 - GRINDING POLISHING
Information
Patent Grant
Apparatus and method for CMP temperature control
Patent number
11,919,123
Issue date
Mar 5, 2024
Applied Materials, Inc.
Surajit Kumar
B24 - GRINDING POLISHING
Information
Patent Grant
Pad-temperature regulating apparatus, method of regulating pad-temp...
Patent number
11,919,124
Issue date
Mar 5, 2024
Ebara Corporation
Toru Maruyama
B24 - GRINDING POLISHING
Information
Patent Grant
Chemical mechanical polishing system with platen temperature control
Patent number
11,911,869
Issue date
Feb 27, 2024
Applied Materials, Inc.
Jeonghoon Oh
B24 - GRINDING POLISHING
Information
Patent Grant
Temperature control in chemical mechanical polish
Patent number
11,904,430
Issue date
Feb 20, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Kei-Wei Chen
B24 - GRINDING POLISHING
Information
Patent Grant
Low-temperature metal CMP for minimizing dishing and corrosion, and...
Patent number
11,897,079
Issue date
Feb 13, 2024
Applied Materials, Inc.
Haosheng Wu
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing apparatus
Patent number
11,897,080
Issue date
Feb 13, 2024
Ebara Corporation
Masashi Kabasawa
B24 - GRINDING POLISHING
Information
Patent Grant
Method of polishing silicon wafer
Patent number
11,890,719
Issue date
Feb 6, 2024
Sumco Corporation
Shuhei Matsuda
B24 - GRINDING POLISHING
Information
Patent Grant
Temperature-based in-situ edge assymetry correction during CMP
Patent number
11,865,671
Issue date
Jan 9, 2024
Applied Materials, Inc.
Haosheng Wu
B24 - GRINDING POLISHING
Information
Patent Grant
Chemical mechanical planarization membrane
Patent number
11,850,702
Issue date
Dec 26, 2023
Taiwan Semiconductor Manufacturing Company, Ltd
Cheng-Ping Chen
B24 - GRINDING POLISHING
Information
Patent Grant
Pad-temperature regulating apparatus, and polishing apparatus
Patent number
11,839,947
Issue date
Dec 12, 2023
Ebara Corporation
Keisuke Kamiki
B24 - GRINDING POLISHING
Information
Patent Grant
Control of steam generation for chemical mechanical polishing
Patent number
11,833,637
Issue date
Dec 5, 2023
Applied Materials, Inc.
Hari Soundararajan
F22 - STEAM GENERATION
Information
Patent Grant
Pad-temperature regulating apparatus, pad-temperature regulating me...
Patent number
11,826,871
Issue date
Nov 28, 2023
Ebara Corporation
Shuji Uozumi
B24 - GRINDING POLISHING
Information
Patent Grant
Temperature and slurry flow rate control in CMP
Patent number
11,826,872
Issue date
Nov 28, 2023
Applied Materials, Inc.
Haosheng Wu
B24 - GRINDING POLISHING
Information
Patent Grant
Control of steam generation for chemical mechanical polishing
Patent number
11,801,582
Issue date
Oct 31, 2023
Applied Materials, Inc.
Hari Soundararajan
B24 - GRINDING POLISHING
Information
Patent Grant
Methods and apparatus to control a fluid dispenser on a metallurgic...
Patent number
11,787,007
Issue date
Oct 17, 2023
Illinois Tool Works Inc.
Michael E. Keeble
B24 - GRINDING POLISHING
Information
Patent Grant
Chemical mechanical polishing apparatus including a multi-zone platen
Patent number
11,772,228
Issue date
Oct 3, 2023
Taiwan Semiconductor Manufacturing Co., Ltd
Ting-Hsun Chang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Chemical mechanical polishing temperature scanning apparatus for te...
Patent number
11,752,589
Issue date
Sep 12, 2023
Applied Materials, Inc.
Hari Soundararajan
B24 - GRINDING POLISHING
Information
Patent Grant
Substrate polish edge uniformity control with secondary fluid dispense
Patent number
11,724,355
Issue date
Aug 15, 2023
Applied Materials, Inc.
Justin H. Wong
B24 - GRINDING POLISHING
Information
Patent Grant
Semiconductor wafer thermal removal control
Patent number
11,707,813
Issue date
Jul 25, 2023
GlobalWafers Co., Ltd.
Emanuele Corsi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Temperature-based assymetry correction during CMP and nozzle for me...
Patent number
11,697,187
Issue date
Jul 11, 2023
Applied Materials, Inc.
Haosheng Wu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Chemical-mechanical polishing apparatus
Patent number
11,679,467
Issue date
Jun 20, 2023
Taiwan Semiconductor Manufacturing Co., Ltd.
Chun-Hsi Huang
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing method and polishing apparatus
Patent number
11,642,751
Issue date
May 9, 2023
Ebara Corporation
Masashi Kabasawa
B24 - GRINDING POLISHING
Information
Patent Grant
External heating system for use in chemical mechanical polishing sy...
Patent number
11,633,829
Issue date
Apr 25, 2023
Taiwan Semiconductor Manufacturing Co., Ltd
Yi-Sheng Lin
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing apparatus and polishing method
Patent number
11,612,983
Issue date
Mar 28, 2023
Ebara Corporation
Hiroshi Sotozaki
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing apparatus of substrate
Patent number
11,607,769
Issue date
Mar 21, 2023
Ebara Corporation
Tetsuji Togawa
B24 - GRINDING POLISHING
Patents Applications
last 30 patents
Information
Patent Application
POLISHING METHOD, AND POLISHING APPARATUS
Publication number
20240181594
Publication date
Jun 6, 2024
EBARA CORPORATION
Masashi KABASAWA
B24 - GRINDING POLISHING
Information
Patent Application
POLISHING APPARATUS
Publication number
20240157503
Publication date
May 16, 2024
EBARA CORPORATION
Seungho YUN
B24 - GRINDING POLISHING
Information
Patent Application
APPARATUS AND METHOD FOR CMP TEMPERATURE CONTROL
Publication number
20240157504
Publication date
May 16, 2024
Applied Materials, Inc.
Surajit Kumar
B24 - GRINDING POLISHING
Information
Patent Application
Temperature Control in Chemical Mechanical Polish
Publication number
20240149388
Publication date
May 9, 2024
Taiwan Semiconductor Manufacturing Co., Ltd.
Kei-Wei Chen
B24 - GRINDING POLISHING
Information
Patent Application
METHOD FOR CMP TEMPERATURE CONTROL
Publication number
20240109163
Publication date
Apr 4, 2024
Applied Materials, Inc.
Haosheng Wu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SUBSTRATE POLISHING APPARATUS AND SUBSTRATE POLISHING METHOD
Publication number
20240087963
Publication date
Mar 14, 2024
EBARA CORPORATION
Akira FUKUNAGA
B24 - GRINDING POLISHING
Information
Patent Application
PROCESSING APPARATUS
Publication number
20240066659
Publication date
Feb 29, 2024
Disco Corporation
Tomoya OGANE
B24 - GRINDING POLISHING
Information
Patent Application
LOW-TEMPERATURE METAL CMP FOR MINIMIZING DISHING AND CORROSION, AND...
Publication number
20240066660
Publication date
Feb 29, 2024
Applied Materials, Inc.
Haosheng Wu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
CLEANING OF CMP TEMPERATURE CONTROL SYSTEM
Publication number
20240042570
Publication date
Feb 8, 2024
Applied Materials, Inc.
Haosheng Wu
B24 - GRINDING POLISHING
Information
Patent Application
POLISHING APPARATUS
Publication number
20240033876
Publication date
Feb 1, 2024
EBARA CORPORATION
Shumpei MIURA
B24 - GRINDING POLISHING
Information
Patent Application
TEMPERATURE AND SLURRY FLOW RATE CONTROL IN CMP
Publication number
20240025006
Publication date
Jan 25, 2024
Applied Materials, Inc.
Haosheng Wu
B24 - GRINDING POLISHING
Information
Patent Application
APPARATUS AND METHOD FOR CMP TEMPERATURE CONTROL
Publication number
20230415296
Publication date
Dec 28, 2023
Applied Materials, Inc.
Shou-Sung Chang
B24 - GRINDING POLISHING
Information
Patent Application
CONTROL OF STEAM GENERATION FOR CHEMICAL MECHANICAL POLISHING
Publication number
20230415297
Publication date
Dec 28, 2023
Applied Materials, Inc.
Hari Soundararajan
B24 - GRINDING POLISHING
Information
Patent Application
APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE
Publication number
20230381914
Publication date
Nov 30, 2023
Taiwan Semiconductor Manufacturing company Ltd.
CHUN-HSI HUANG
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
POLISHING PAD AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME
Publication number
20230381913
Publication date
Nov 30, 2023
Samsung Electronics Co., Ltd.
Donghoon KWON
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Chemical Mechanical Polishing Apparatus Including a Multi-Zone Platen
Publication number
20230364733
Publication date
Nov 16, 2023
Taiwan Semiconductor Manufacturing Co., Ltd.
Ting-Hsun Chang
B24 - GRINDING POLISHING
Information
Patent Application
CHEMICAL MECHANICAL POLISHING TEMPERATURE SCANNING APPARATUS FOR TE...
Publication number
20230356351
Publication date
Nov 9, 2023
Applied Materials, Inc.
Hari Soundararajan
B24 - GRINDING POLISHING
Information
Patent Application
SEMICONDUCTOR WAFER THERMAL REMOVAL CONTROL
Publication number
20230347469
Publication date
Nov 2, 2023
GLOBALWAFERS CO., LTD.
Emanuele Corsi
B24 - GRINDING POLISHING
Information
Patent Application
SUBSTRATE POLISH EDGE UNIFORMITY CONTROL WITH SECONDARY FLUID DISPENSE
Publication number
20230339066
Publication date
Oct 26, 2023
Applied Materials, Inc.
Justin H. WONG
B24 - GRINDING POLISHING
Information
Patent Application
EXTERNAL HEATING SYSTEM FOR USE IN CHEMICAL MECHANICAL POLISHING SY...
Publication number
20230294237
Publication date
Sep 21, 2023
Taiwan Semiconductor Manufacturing Co., Ltd.
Yi-Sheng LIN
B24 - GRINDING POLISHING
Information
Patent Application
NOVEL CHEMICAL-MECHANICAL POLISHING APPARATUS
Publication number
20230286106
Publication date
Sep 14, 2023
Taiwan Semiconductor Manufacturing Co., LTD
Chun-Hsi Huang
B24 - GRINDING POLISHING
Information
Patent Application
POLISHING METHOD AND POLISHING APPARATUS
Publication number
20230219187
Publication date
Jul 13, 2023
EBARA CORPORATION
Masashi KABASAWA
B24 - GRINDING POLISHING
Information
Patent Application
GAS ENTRAINMENT DURING JETTING OF FLUID FOR TEMPERATURE CONTROL IN...
Publication number
20230182259
Publication date
Jun 15, 2023
Applied Materials, Inc.
Surajit Kumar
B24 - GRINDING POLISHING
Information
Patent Application
CMP PROCESS APPLIED TO A THIN SIC WAFER FOR STRESS RELEASE AND DAMA...
Publication number
20230128739
Publication date
Apr 27, 2023
STMicroelectronics S.r.l.
Agata GRASSO
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
WET CHEMICAL HEATING SYSTEM AND A METHOD OF CHEMICAL MECHANICAL POL...
Publication number
20230095741
Publication date
Mar 30, 2023
Taiwan Semiconductor Manufacturing company Ltd.
JI JAMES CUI
B24 - GRINDING POLISHING
Information
Patent Application
APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE
Publication number
20230064706
Publication date
Mar 2, 2023
Taiwan Semiconductor Manufacturing company Ltd.
CHIEN-LIN HUANG
B24 - GRINDING POLISHING
Information
Patent Application
TEMPERATURE CONTROL OF CHEMICAL MECHANICAL POLISHING
Publication number
20230029290
Publication date
Jan 26, 2023
Applied Materials, Inc.
Hari Soundararajan
B24 - GRINDING POLISHING
Information
Patent Application
PAD-TEMPERATURE REGULATING APPARATUS, AND POLISHING APPARATUS
Publication number
20220305617
Publication date
Sep 29, 2022
EBARA CORPORATION
Keisuke KAMIKI
B24 - GRINDING POLISHING
Information
Patent Application
SUBSTRATE POLISHING SYSTEM AND SUBSTRATE POLISHING METHOD
Publication number
20220305611
Publication date
Sep 29, 2022
KCTECH CO., LTD.
Hee Cheul JUNG
B24 - GRINDING POLISHING
Information
Patent Application
POLISHING SOLUTION, POLISHING APPARATUS, AND POLISHING METHOD
Publication number
20220290009
Publication date
Sep 15, 2022
KIOXIA Corporation
Mikiya SAKASHITA
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...