Temperature

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G03F7/70891

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70891Temperature

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Optical system and lithography apparatus
- Patent number 12,130,557
- Issue date Oct 29, 2024
- Carl Zeiss SMT GmbH
- Matthias Manger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for exposure of relief precursors
- Patent number 12,124,171
- Issue date Oct 22, 2024
- XSYS PREPRESS N.V.
- Pieter Lenssens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thermo-mechanical actuator
- Patent number 12,117,739
- Issue date Oct 15, 2024
- ASML Netherlands B.V.
- Bas Jansen
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Method for producing a mirror of a microlithographic projection exp...
- Patent number 12,117,731
- Issue date Oct 15, 2024
- Carl Zeiss SMT GmbH
- Christoph Zaczek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,111,583
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kai-Chieh Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system with an aperture stop
- Patent number 12,105,429
- Issue date Oct 1, 2024
- Carl Zeiss SMT GmbH
- Tanja Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system, heating arrangement, and method for heating an opti...
- Patent number 12,085,780
- Issue date Sep 10, 2024
- Carl Zeiss SMT GmbH
- Andrea Berner
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method and apparatus for predicting aberrations in a projection system
- Patent number 12,078,938
- Issue date Sep 3, 2024
- ASML Netherlands B.V.
- Mhamed Akhssay
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Vibration attenuation structure and exposure device
- Patent number 12,072,639
- Issue date Aug 27, 2024
- Changxin Memory Technologies, Inc.
- Xianyong Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light source apparatus, exposure apparatus, and article manufacturi...
- Patent number 12,066,759
- Issue date Aug 20, 2024
- Canon Kabushiki Kaisha
- Hiroyuki Tomita
- F21 - LIGHTING
Information Patent Grant
Extreme ultraviolet lithography system
- Patent number 12,055,865
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element having a coating for influencing heating radiation...
- Patent number 12,025,818
- Issue date Jul 2, 2024
- Carl Zeiss SMT GmbH
- Boris Bittner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Lithography apparatus and method
- Patent number 12,007,694
- Issue date Jun 11, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei-Chun Yen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Dispatch method for production line in semiconductor process, stora...
- Patent number 11,988,969
- Issue date May 21, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Chin-Chang Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Contamination trap
- Patent number 11,982,947
- Issue date May 14, 2024
- ASML NETHERLAND B.V.
- Sander Catharina Reinier Derks
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus and method for determining a condition associated with a...
- Patent number 11,906,907
- Issue date Feb 20, 2024
- ASML Netherlands B.V.
- Derk Servatius Gertruda Brouns
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for thermal management of reticle in semiconducto...
- Patent number 11,899,377
- Issue date Feb 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yueh-Lin Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical component and clamp used in lithographic apparatus
- Patent number 11,892,779
- Issue date Feb 6, 2024
- ASML Holding N.V.
- Victor Antonio Perez-Falcon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Temperature control device and temperature control method
- Patent number 11,874,609
- Issue date Jan 16, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Enhao Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element and lithography system
- Patent number 11,874,525
- Issue date Jan 16, 2024
- Carl Zeiss SMT GmbH
- Eric Eva
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target debris collection device and extreme ultraviolet light sourc...
- Patent number 11,852,984
- Issue date Dec 26, 2023
- Samsung Electronics Co., Ltd.
- Sunghyup Kim
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Exposure apparatus and method of manufacturing article
- Patent number 11,841,624
- Issue date Dec 12, 2023
- Canon Kabushiki Kaisha
- Masato Homma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature conditioning system
- Patent number 11,835,870
- Issue date Dec 5, 2023
- ASML Netherlands B.V.
- Güneş Nakiboğlu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 11,822,256
- Issue date Nov 21, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kai-Chieh Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus
- Patent number 11,762,304
- Issue date Sep 19, 2023
- ASML Netherlands B.V.
- Güneş Nakiboğlu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and cooling method
- Patent number 11,720,034
- Issue date Aug 8, 2023
- ASML Netherlands B.V.
- Gosse Charles De Vries
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light source, EUV lithography system, and method for performing cir...
- Patent number 11,703,769
- Issue date Jul 18, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi Yang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System and method for dynamically controlling temperature of thermo...
- Patent number 11,693,326
- Issue date Jul 4, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Jung Pan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing method, substrate processing apparatus, and st...
- Patent number 11,693,319
- Issue date Jul 4, 2023
- Tokyo Electron Limited
- Keiichi Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for in-situ dynamic protection of a surface and optical asse...
- Patent number 11,681,236
- Issue date Jun 20, 2023
- Carl Zeiss SMT GmbH
- Vitaliy Shklover
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS FOR SUPPLYING LIQUID TARGET MATERIAL TO A RADIATION SOURCE
- Publication number 20250021026
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- William Peter VAN DRENT
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD FOR INCORPORATING TEMPERATURE-REGULATING HOLLOW STRUCTURES I...
- Publication number 20240419066
- Publication date Dec 19, 2024
- Carl Zeiss SMT GMBH
- Uwe BIELKE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MACHINING A WORKPIECE
- Publication number 20240411234
- Publication date Dec 12, 2024
- Carl Zeiss SMT GMBH
- Tobias MEISCH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THERMO-MECHANICAL ACTUATOR
- Publication number 20240402621
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Bas JANSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INFORMATION PROCESSING APPARATUS, EXPOSURE APPARATUS, AND ARTICLE M...
- Publication number 20240393700
- Publication date Nov 28, 2024
- Canon Kabushiki Kaisha
- JUN KITAGAWA
- G05 - CONTROLLING REGULATING
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20240385537
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kai-Chieh CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM
- Publication number 20240353766
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPERATURE ADJUSTMENT APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICL...
- Publication number 20240345494
- Publication date Oct 17, 2024
- Canon Kabushiki Kaisha
- NAOKI FUNABASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR THERMALLY STABLE MOUNTING OF OPTICAL COLUMNS
- Publication number 20240329548
- Publication date Oct 3, 2024
- ASML NETHERLANDS B.V.
- Jasper WINTERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR PRODUCING AT LEAST ONE HOLLOW STRUCTURE, M...
- Publication number 20240329285
- Publication date Oct 3, 2024
- Carl Zeiss SMT GMBH
- Tobias ULLSPERGER
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
APPARATUS AND METHOD FOR AVOIDING A DEGRADATION OF AN OPTICAL USED...
- Publication number 20240319621
- Publication date Sep 26, 2024
- Carl Zeiss SMT GMBH
- Moritz BECKER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD, OPTICAL SYSTEM, TEST DEVICE AND ARRANGEMENT
- Publication number 20240302453
- Publication date Sep 12, 2024
- Carl Zeiss SMT GMBH
- Stefan Krone
- G01 - MEASURING TESTING
Information Patent Application
LITHOGRAPHIC APPARATUS, TEMPERATURE SENSOR, AND FIBER BRAGG GRATING...
- Publication number 20240302753
- Publication date Sep 12, 2024
- ASML Holding N.V.
- Mahesh Upendra AJGAONKAR
- G01 - MEASURING TESTING
Information Patent Application
Lithography Apparatus and Method
- Publication number 20240295825
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Chun Yen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM, PROJECTION EXPOSURE SYSTEM AND METHOD
- Publication number 20240288784
- Publication date Aug 29, 2024
- Carl Zeiss SMT GMBH
- Martin Martin von Hodenberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A SEED LASER OPTICAL ISOLATOR, SEED ISOLATOR MODULE, EUV RADIATION...
- Publication number 20240275114
- Publication date Aug 15, 2024
- ASML NETHERLANDS B.V.
- Karel Joop BOSSCHAART
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
JIG FOR MEASURING TEMPERATURE AND HUMIDITY OF RETICLE CARRIER
- Publication number 20240219242
- Publication date Jul 4, 2024
- GUDENG EQUIPMENT CO., LTD.
- CHAO-CHIN CHIN
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL ELEMENT WITH COOLING CHANNELS, AND OPTICAL ARRANGEMENT
- Publication number 20240219849
- Publication date Jul 4, 2024
- Carl Zeiss SMT GMBH
- Eric EVA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPERATURE MEASUREMENT OF OPTICAL ELEMENTS IN AN OPTICAL APPARATUS
- Publication number 20240201029
- Publication date Jun 20, 2024
- ASML Netherland B.V.
- Koen Martin Willem Jan BOS
- G01 - MEASURING TESTING
Information Patent Application
TEMPERATURE CONDITIONING SYSTEM, A LITHOGRAPHIC APPARATUS AND A MET...
- Publication number 20240176255
- Publication date May 30, 2024
- ASML NETHERLANDS B.V.
- Remco VAN DE MEERENDONK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT, PROJECTION OPTICAL UNIT AND PROJECTION EXPOSURE AP...
- Publication number 20240176249
- Publication date May 30, 2024
- Carl Zeiss SMT GMBH
- Marwene Nefzi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD FOR ILLUMINATION UNIFORMITY CORRE...
- Publication number 20240160108
- Publication date May 16, 2024
- ASML NETHERLANDS B.V.
- Nikolaos SOTIROPOULOS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR OPERATING AN OPTICAL SYSTEM
- Publication number 20240160113
- Publication date May 16, 2024
- Carl Zeiss SMT GMBH
- Julian Zips
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR THERMAL MANAGEMENT OF RETICLE IN SEMICONDUCTO...
- Publication number 20240134293
- Publication date Apr 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yueh-Lin Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY
- Publication number 20240111223
- Publication date Apr 4, 2024
- Carl Zeiss SMT GMBH
- Klaus Rief
- G02 - OPTICS
Information Patent Application
APPARATUS AND METHOD FOR DETERMINING A CONDITION ASSOCIATED WITH A...
- Publication number 20240103386
- Publication date Mar 28, 2024
- ASML NETHERLANDS B.V.
- Derk Servatius Gertruda BROUNS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Microelectromechanical Apparatus with Heating Element
- Publication number 20240085661
- Publication date Mar 14, 2024
- ROBERT BOSCH GmbH
- Ralf Noltemeyer
- G02 - OPTICS
Information Patent Application
A METHOD AND SYSTEM FOR PREDICTING ABERRATIONS IN A PROJECTION SYSTEM
- Publication number 20240077380
- Publication date Mar 7, 2024
- ASML NETHERLANDS B.V.
- Marinus Maria Johannes VAN DE WAL
- G01 - MEASURING TESTING
Information Patent Application
MULTI-CHANNEL LIGHT SOURCE FOR PROJECTION OPTICS HEATING
- Publication number 20240077803
- Publication date Mar 7, 2024
- ASML NETHERLANDS B.V.
- Laurentius Johannes Adrianus VAN BOKHOVEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HEATING ARRANGEMENT AND METHOD FOR HEATING AN OPTICAL ELEMENT
- Publication number 20240069453
- Publication date Feb 29, 2024
- Carl Zeiss SMT GMBH
- Susanne Beder
- G02 - OPTICS

Temperature

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Optical system and lithography apparatus

Apparatus and method for exposure of relief precursors

Thermo-mechanical actuator

Method for producing a mirror of a microlithographic projection exp...

Semiconductor processing tool and methods of operation

Optical system with an aperture stop

Optical system, heating arrangement, and method for heating an opti...

Method and apparatus for predicting aberrations in a projection system

Vibration attenuation structure and exposure device

Light source apparatus, exposure apparatus, and article manufacturi...

Extreme ultraviolet lithography system

Optical element having a coating for influencing heating radiation...

Lithography apparatus and method

Dispatch method for production line in semiconductor process, stora...

Contamination trap

Apparatus and method for determining a condition associated with a...

System and method for thermal management of reticle in semiconducto...

Optical component and clamp used in lithographic apparatus

Temperature control device and temperature control method

Optical element and lithography system

Target debris collection device and extreme ultraviolet light sourc...

Exposure apparatus and method of manufacturing article

Temperature conditioning system

Semiconductor processing tool and methods of operation

Lithographic apparatus

Lithographic apparatus and cooling method

Light source, EUV lithography system, and method for performing cir...

System and method for dynamically controlling temperature of thermo...

Substrate processing method, substrate processing apparatus, and st...

Method for in-situ dynamic protection of a surface and optical asse...

Patents Applicationslast 30 patents

APPARATUS FOR SUPPLYING LIQUID TARGET MATERIAL TO A RADIATION SOURCE

METHOD FOR INCORPORATING TEMPERATURE-REGULATING HOLLOW STRUCTURES I...

METHOD FOR MACHINING A WORKPIECE

THERMO-MECHANICAL ACTUATOR

INFORMATION PROCESSING APPARATUS, EXPOSURE APPARATUS, AND ARTICLE M...

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM

TEMPERATURE ADJUSTMENT APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICL...

SYSTEMS AND METHODS FOR THERMALLY STABLE MOUNTING OF OPTICAL COLUMNS

METHOD AND APPARATUS FOR PRODUCING AT LEAST ONE HOLLOW STRUCTURE, M...

APPARATUS AND METHOD FOR AVOIDING A DEGRADATION OF AN OPTICAL USED...

METHOD, OPTICAL SYSTEM, TEST DEVICE AND ARRANGEMENT

LITHOGRAPHIC APPARATUS, TEMPERATURE SENSOR, AND FIBER BRAGG GRATING...

Lithography Apparatus and Method

OPTICAL SYSTEM, PROJECTION EXPOSURE SYSTEM AND METHOD

A SEED LASER OPTICAL ISOLATOR, SEED ISOLATOR MODULE, EUV RADIATION...

JIG FOR MEASURING TEMPERATURE AND HUMIDITY OF RETICLE CARRIER

OPTICAL ELEMENT WITH COOLING CHANNELS, AND OPTICAL ARRANGEMENT

TEMPERATURE MEASUREMENT OF OPTICAL ELEMENTS IN AN OPTICAL APPARATUS

TEMPERATURE CONDITIONING SYSTEM, A LITHOGRAPHIC APPARATUS AND A MET...

OPTICAL ELEMENT, PROJECTION OPTICAL UNIT AND PROJECTION EXPOSURE AP...

LITHOGRAPHIC APPARATUS AND METHOD FOR ILLUMINATION UNIFORMITY CORRE...

METHOD FOR OPERATING AN OPTICAL SYSTEM

SYSTEM AND METHOD FOR THERMAL MANAGEMENT OF RETICLE IN SEMICONDUCTO...

PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY

APPARATUS AND METHOD FOR DETERMINING A CONDITION ASSOCIATED WITH A...

Microelectromechanical Apparatus with Heating Element

A METHOD AND SYSTEM FOR PREDICTING ABERRATIONS IN A PROJECTION SYSTEM

MULTI-CHANNEL LIGHT SOURCE FOR PROJECTION OPTICS HEATING

HEATING ARRANGEMENT AND METHOD FOR HEATING AN OPTICAL ELEMENT