Temperature

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CPC
G03F7/70875

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70875Temperature

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Interferometer systems and methods for real time etch process compe...
- Patent number 12,218,015
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chansyun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 12,204,256
- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Kouichi Mizunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ lithography pattern enhancement with localized stress treat...
- Patent number 12,204,253
- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Andrew Weloth
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 12,204,255
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Nicolaas Ten Kate
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method with improved contaminant particl...
- Patent number 12,158,706
- Issue date Dec 3, 2024
- ASML Netherlands B.V.
- Marcus Adrianus Van de Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for reducing particulate deposition on photomask
- Patent number 12,158,707
- Issue date Dec 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jui-Chieh Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of using a dual stage lithographic apparatus and lithographi...
- Patent number 12,153,354
- Issue date Nov 26, 2024
- ASML Netherlands B.V.
- Wouter Jan Cornelis Vijselaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stamp and method for embossing
- Patent number 12,135,500
- Issue date Nov 5, 2024
- EV Group E. Thallner GmbH
- Markus Wimplinger
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,111,583
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kai-Chieh Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for mitigating tin debris
- Patent number 12,061,423
- Issue date Aug 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng Hung Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
In-situ lithography pattern enhancement with localized stress treat...
- Patent number 11,994,807
- Issue date May 28, 2024
- Tokyo Electron Limited
- Andrew Weloth
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing system and substrate processing method, and de...
- Patent number 11,977,339
- Issue date May 7, 2024
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic systems and methods of operating the same
- Patent number 11,947,271
- Issue date Apr 2, 2024
- KULICKE & SOFFA LITEQ B.V.
- Jeroen de Boeij
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing apparatus and method of fabricating semiconduc...
- Patent number 11,927,890
- Issue date Mar 12, 2024
- Samsung Electronics Co., Ltd.
- Seok Heo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single-volume baking chamber for mask clean
- Patent number 11,921,422
- Issue date Mar 5, 2024
- Applied Materials, Inc.
- Banqiu Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic systems and methods of operating the same
- Patent number 11,921,435
- Issue date Mar 5, 2024
- KULICKE & SOFFA LITEQ B.V.
- Jeroen de Boeij
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing system and substrate processing method, and de...
- Patent number 11,921,436
- Issue date Mar 5, 2024
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for thermal management of reticle in semiconducto...
- Patent number 11,899,377
- Issue date Feb 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yueh-Lin Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Temperature control device and temperature control method
- Patent number 11,874,609
- Issue date Jan 16, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Enhao Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing apparatus
- Patent number 11,868,056
- Issue date Jan 9, 2024
- Tokyo Electron Limited
- Kouichi Mizunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Object positioner, method for correcting the shape of an object, li...
- Patent number 11,860,554
- Issue date Jan 2, 2024
- ASML Netherlands B.V.
- Mark Johannes Hermanus Frencken
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 11,822,256
- Issue date Nov 21, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kai-Chieh Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing apparatus and processing condition adjustment...
- Patent number 11,809,091
- Issue date Nov 7, 2023
- Tokyo Electron Limited
- Masahide Tadokoro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for determining overlay
- Patent number 11,774,869
- Issue date Oct 3, 2023
- ASML Netherlands B.V.
- Ruud Hendrikus Martinus Johannes Bloks
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for dynamically controlling temperature of thermo...
- Patent number 11,693,326
- Issue date Jul 4, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Jung Pan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for reducing particulate deposition on photomask
- Patent number 11,693,325
- Issue date Jul 4, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jui Chieh Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and a method of forming a particle shield
- Patent number 11,693,327
- Issue date Jul 4, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wen-Hao Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Gas mixing for fast temperature control of a cooling hood
- Patent number 11,681,233
- Issue date Jun 20, 2023
- ASML Netherlands B.V.
- Joost De Hoogh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 11,669,021
- Issue date Jun 6, 2023
- ASML Netherlands B.V.
- Koen Jacobus Johannes Maria Zaal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Support table for a lithographic apparatus, lithographic apparatus...
- Patent number 11,650,511
- Issue date May 16, 2023
- ASML Netherlands B.V.
- Johan Gertrudis Cornelis Kunnen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE SUBSTRATE DEVELOPING METHOD, PHOTOMASK CREATING METH...
- Publication number 20250060683
- Publication date Feb 20, 2025
- Gigaphoton Inc.
- Koichi FUJII
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND SYSTEMS FOR REDUCING PARTICULATE DEPOSITION ON PHOTOMASK
- Publication number 20250053104
- Publication date Feb 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jui-Chieh Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND SYSTEMS TO CALIBRATE RETICLE THERMAL EFFECTS
- Publication number 20250021017
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Raaja Ganapathy SUBRAMANIAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS USIN...
- Publication number 20250021025
- Publication date Jan 16, 2025
- Samsung Electronics Co., Ltd.
- Youngho HWANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, CONTROL METHOD, AND METHOD OF MANUFACTURING ART...
- Publication number 20250004388
- Publication date Jan 2, 2025
- Canon Kabushiki Kaisha
- HIRONOBU FUJISHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND ASSOCIATED METHODS
- Publication number 20240411233
- Publication date Dec 12, 2024
- ASML NETHERLANDS B.V.
- Gosse Charles DE VRIES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MACHINING A WORKPIECE
- Publication number 20240411234
- Publication date Dec 12, 2024
- Carl Zeiss SMT GMBH
- Tobias MEISCH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK, LITHOGRAPHING APPARATUS, METHOD OF MANUFACTURING MASK AND LIT...
- Publication number 20240402612
- Publication date Dec 5, 2024
- WESTLAKE UNIVERSITY
- Xijun LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INFORMATION PROCESSING APPARATUS, EXPOSURE APPARATUS, AND ARTICLE M...
- Publication number 20240393700
- Publication date Nov 28, 2024
- Canon Kabushiki Kaisha
- JUN KITAGAWA
- G05 - CONTROLLING REGULATING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND ART...
- Publication number 20240393702
- Publication date Nov 28, 2024
- Canon Kabushiki Kaisha
- RYOTA MAKINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240393705
- Publication date Nov 28, 2024
- SEMES CO., LTD.
- Sang Hyun PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR REAL TIME ETCH PROCESS COMPENSATION CONTROL
- Publication number 20240395637
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chansyun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
- Publication number 20240385524
- Publication date Nov 21, 2024
- SEMES CO., LTD.
- Hee Man AHN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20240385537
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kai-Chieh CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGE CAPTURING APPARATUS AND IMAGE CAPTURING METHOD
- Publication number 20240385539
- Publication date Nov 21, 2024
- HITACHI HIGH-TECH CORPORATION
- Akira NISHIOKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FIRST HOLDING APPARATUS, THIRD HOLDING APPARATUS, FIFTH HOLDING APP...
- Publication number 20240377763
- Publication date Nov 14, 2024
- Nikon Corporation
- Arata OCHINO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THERMAL CONDITIONING UNIT, SUBSTRATE HANDLING DEVICE AND LITHOGRAPH...
- Publication number 20240369948
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Gijs KRAMER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR MITIGATING TIN DEBRIS
- Publication number 20240353765
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng Hung TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AN OBJECT GRIPPER, A METHOD OF HOLDING AN OBJECT AND A LITHOGRAPHIC...
- Publication number 20240345490
- Publication date Oct 17, 2024
- ASML NETHERLANDS B.V.
- Paul VAN DONGEN
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
IMPRINTING APPARATUS
- Publication number 20240337955
- Publication date Oct 10, 2024
- Koninklijke Philips N.V.
- Didier Mathijs Maria Justina Petit
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
APPARATUS AND METHOD FOR PREPARING AND CLEANING A COMPONENT
- Publication number 20240337956
- Publication date Oct 10, 2024
- ASML NETHERLANDS B.V.
- Lucas Christiaan Johan HEIJMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TRANSFER METHOD AND SUBSTRATE TRANSFER APPARATUS
- Publication number 20240310740
- Publication date Sep 19, 2024
- TOKYO ELECTRON LIMITED
- Kenichirou MATSUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COOLING HOOD FOR RETICLE
- Publication number 20240288783
- Publication date Aug 29, 2024
- ASML NETHERLANDS B.V.
- Marcus Adrianus VAN DE KERKHOF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE HOLDER AND METHOD
- Publication number 20240264540
- Publication date Aug 8, 2024
- ASML NETHERLANDS B.V.
- Marcus Adrianus Van de Kerkhof
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A FLUID HANDLING SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS
- Publication number 20240248411
- Publication date Jul 25, 2024
- ASML NETHERLANDS B.V.
- Cornelius Maria ROPS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD OF FABRICATING SEMICONDUC...
- Publication number 20240248418
- Publication date Jul 25, 2024
- Samsung Electronics Co., Ltd.
- Seok HEO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING A SUBSTRATE AND METHOD FOR IMPROVING COOLING...
- Publication number 20240231246
- Publication date Jul 11, 2024
- SEMES CO., LTD.
- Minhee CHO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IN-SITU LITHOGRAPHY PATTERN ENHANCEMENT WITH LOCALIZED STRESS TREAT...
- Publication number 20240201601
- Publication date Jun 20, 2024
- TOKYO ELECTRON LIMITED
- Andrew WELOTH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AN INSPECTION TOOL, METHOD AND LITHOGRAPHIC APPARATUS
- Publication number 20240192608
- Publication date Jun 13, 2024
- ASML NETHERLANDS B.V.
- Shikhar BHARDWAJ
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING A MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXP...
- Publication number 20240192605
- Publication date Jun 13, 2024
- Carl Zeiss SMT GMBH
- Christoph ZACZEK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Temperature

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Interferometer systems and methods for real time etch process compe...

Substrate processing apparatus

In-situ lithography pattern enhancement with localized stress treat...

Lithographic apparatus and method

Lithographic apparatus and method with improved contaminant particl...

Methods and systems for reducing particulate deposition on photomask

Method of using a dual stage lithographic apparatus and lithographi...

Stamp and method for embossing

Semiconductor processing tool and methods of operation

Method and apparatus for mitigating tin debris

In-situ lithography pattern enhancement with localized stress treat...

Substrate processing system and substrate processing method, and de...

Lithographic systems and methods of operating the same

Substrate processing apparatus and method of fabricating semiconduc...

Single-volume baking chamber for mask clean

Lithographic systems and methods of operating the same

Substrate processing system and substrate processing method, and de...

System and method for thermal management of reticle in semiconducto...

Temperature control device and temperature control method

Substrate processing apparatus

Object positioner, method for correcting the shape of an object, li...

Semiconductor processing tool and methods of operation

Substrate processing apparatus and processing condition adjustment...

Method and system for determining overlay

System and method for dynamically controlling temperature of thermo...

Methods and systems for reducing particulate deposition on photomask

Apparatus and a method of forming a particle shield

Gas mixing for fast temperature control of a cooling hood

Lithographic apparatus and device manufacturing method

Support table for a lithographic apparatus, lithographic apparatus...

Patents Applicationslast 30 patents

PHOTOSENSITIVE SUBSTRATE DEVELOPING METHOD, PHOTOMASK CREATING METH...

METHODS AND SYSTEMS FOR REDUCING PARTICULATE DEPOSITION ON PHOTOMASK

METHODS AND SYSTEMS TO CALIBRATE RETICLE THERMAL EFFECTS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS USIN...

EXPOSURE APPARATUS, CONTROL METHOD, AND METHOD OF MANUFACTURING ART...

LITHOGRAPHIC APPARATUS AND ASSOCIATED METHODS

METHOD FOR MACHINING A WORKPIECE

MASK, LITHOGRAPHING APPARATUS, METHOD OF MANUFACTURING MASK AND LIT...

INFORMATION PROCESSING APPARATUS, EXPOSURE APPARATUS, AND ARTICLE M...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND ART...

SUBSTRATE PROCESSING APPARATUS

METHODS FOR REAL TIME ETCH PROCESS COMPENSATION CONTROL

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

IMAGE CAPTURING APPARATUS AND IMAGE CAPTURING METHOD

FIRST HOLDING APPARATUS, THIRD HOLDING APPARATUS, FIFTH HOLDING APP...

THERMAL CONDITIONING UNIT, SUBSTRATE HANDLING DEVICE AND LITHOGRAPH...

METHOD AND APPARATUS FOR MITIGATING TIN DEBRIS

AN OBJECT GRIPPER, A METHOD OF HOLDING AN OBJECT AND A LITHOGRAPHIC...

IMPRINTING APPARATUS

APPARATUS AND METHOD FOR PREPARING AND CLEANING A COMPONENT

SUBSTRATE TRANSFER METHOD AND SUBSTRATE TRANSFER APPARATUS

COOLING HOOD FOR RETICLE

SUBSTRATE HOLDER AND METHOD

A FLUID HANDLING SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS

SUBSTRATE PROCESSING APPARATUS AND METHOD OF FABRICATING SEMICONDUC...

APPARATUS FOR TREATING A SUBSTRATE AND METHOD FOR IMPROVING COOLING...

IN-SITU LITHOGRAPHY PATTERN ENHANCEMENT WITH LOCALIZED STRESS TREAT...

AN INSPECTION TOOL, METHOD AND LITHOGRAPHIC APPARATUS

METHOD FOR PRODUCING A MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXP...