the alicyclic moiety being in a side chain

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/0397the alicyclic moiety being in a side chain

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Patents Grantslast 30 patents

Information Patent Grant
Pattern formation methods
- Patent number 12,228,859
- Issue date Feb 18, 2025
- Rohm and Haas Electronic Materials LLC
- Choong-Bong Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
- Patent number 12,228,857
- Issue date Feb 18, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Salt, acid generator, resist composition and method for producing r...
- Patent number 12,222,648
- Issue date Feb 11, 2025
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 12,222,649
- Issue date Feb 11, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive resin composition and display device using...
- Patent number 12,216,403
- Issue date Feb 4, 2025
- DONJIN SEMICHEM CO., LTD.
- Kyoungsoon Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and pattern forming process
- Patent number 12,174,536
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, method for producing resist patte...
- Patent number 12,174,538
- Issue date Dec 24, 2024
- JSR Corporation
- Naoki Nishiguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive resin composition, positive photosensitive...
- Patent number 12,085,856
- Issue date Sep 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masashi Iio
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 12,072,627
- Issue date Aug 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist with polar-acid-labile-group
- Patent number 12,050,404
- Issue date Jul 30, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,038,689
- Issue date Jul 16, 2024
- FUJIFILM Corporation
- Akihiro Kaneko
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,032,290
- Issue date Jul 9, 2024
- FUJIFILM Corporation
- Daisuke Asakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist material and patterning process
- Patent number 12,013,639
- Issue date Jun 18, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt, acid generator, resist composition and method for producing r...
- Patent number 12,013,636
- Issue date Jun 18, 2024
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing electronic device
- Patent number 12,013,644
- Issue date Jun 18, 2024
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist composition and method of manufacturing a semiconductor...
- Patent number 11,966,162
- Issue date Apr 23, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Yang Lin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Radiation-sensitive resin composition, method of forming resist pat...
- Patent number 11,966,161
- Issue date Apr 23, 2024
- JSR Corporation
- Takuhiro Taniguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition, coated substrate including the photoresist...
- Patent number 11,960,206
- Issue date Apr 16, 2024
- Rohm and Hass Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 11,953,832
- Issue date Apr 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid-generating monomer, polymer derived therefrom, photoresis...
- Patent number 11,947,258
- Issue date Apr 2, 2024
- Rohm and Hass Electronic Materials LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,934,099
- Issue date Mar 19, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Yoichi Hori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method of semiconductor chip, and kit
- Patent number 11,914,300
- Issue date Feb 27, 2024
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Salts and photoresists comprising same
- Patent number 11,880,134
- Issue date Jan 23, 2024
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,880,136
- Issue date Jan 23, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition comprising amide compound and pattern forma...
- Patent number 11,874,603
- Issue date Jan 16, 2024
- Rohm and Haas Electronic Materials Korea Ltd.
- Philjae Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 11,860,540
- Issue date Jan 2, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Material for lithography, production method therefor, composition f...
- Patent number 11,852,970
- Issue date Dec 26, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Hiroto Kudo
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,835,860
- Issue date Dec 5, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and methods
- Patent number 11,829,069
- Issue date Nov 28, 2023
- Rohm and Haas Electronic Materials LLC
- Joshua Kaitz
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist composition and patterning process
- Patent number 11,829,067
- Issue date Nov 28, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD
- Publication number 20250051501
- Publication date Feb 13, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Minoru Adegawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...
- Publication number 20250053090
- Publication date Feb 13, 2025
- Samsung SDI Co., Ltd.
- Hwayoung JIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM
- Publication number 20250036027
- Publication date Jan 30, 2025
- NISSAN CHEMICAL CORPORATION
- Kosuke IGATA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20250036028
- Publication date Jan 30, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE TONE ULTRA THICK PHOTORESIST COMPOSITION
- Publication number 20250028245
- Publication date Jan 23, 2025
- Merck Patent GmbH
- Weihong LIU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER, MONOMER, RESIST COMPOSITION COMPRISING THE SAME AND METHOD...
- Publication number 20250021003
- Publication date Jan 16, 2025
- Samsung Electronics Co., Ltd.
- Cheol KANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ION IMPLANTATION THICK FILM RESIST COMPOSITION, A METHOD FOR MANUFA...
- Publication number 20250021004
- Publication date Jan 16, 2025
- MERCK ELECTRONICS LTD.
- TETSUMASA TAKAICHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND AC...
- Publication number 20250013148
- Publication date Jan 9, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Uehara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, ACID...
- Publication number 20250004366
- Publication date Jan 2, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi ARAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20250004377
- Publication date Jan 2, 2025
- FUJIFILM CORPORATION
- Eiji FUKUZAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20240427244
- Publication date Dec 26, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuo SOMEYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER COMP...
- Publication number 20240411226
- Publication date Dec 12, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroki Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...
- Publication number 20240402604
- Publication date Dec 5, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Rin Odashima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUNDS, MONOMERS, POLYMERS, PHOTORESIST COMPOSITIONS AND PATTERN...
- Publication number 20240393689
- Publication date Nov 28, 2024
- DuPont Electronic Materials International, LLC
- Li Cui
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIN, COMPOUND, AND PATTERN...
- Publication number 20240385518
- Publication date Nov 21, 2024
- JSR Corporation
- Katsuaki NISHIKORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND AC...
- Publication number 20240377734
- Publication date Nov 14, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Uehara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240361692
- Publication date Oct 31, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SOLVENT SYSTEMS FOR SELECTIVE REMOVAL OF POLYMERIC MATERIALS
- Publication number 20240337940
- Publication date Oct 10, 2024
- Entegris, Inc.
- Hsing-Chen Wu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITIO...
- Publication number 20240329527
- Publication date Oct 3, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, P...
- Publication number 20240319596
- Publication date Sep 26, 2024
- JSR Corporation
- Hiromu MIYATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, ME...
- Publication number 20240319597
- Publication date Sep 26, 2024
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240310727
- Publication date Sep 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240310723
- Publication date Sep 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
- Publication number 20240295822
- Publication date Sep 5, 2024
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PROD...
- Publication number 20240279166
- Publication date Aug 22, 2024
- Sumitomo Chemical Company, Limited
- Shohei TERAHIGASHI
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PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...
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- Tzu-Yang LIN
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SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PROD...
- Publication number 20240272548
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- Sumitomo Chemical Company, Limited
- Shohei TERAHIGASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20240248403
- Publication date Jul 25, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Tetsuya Matsushita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...
- Publication number 20240248402
- Publication date Jul 25, 2024
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...
- Publication number 20240219830
- Publication date Jul 4, 2024
- Sumitomo Chemical Company, Limited
- Shohei TERAHIGASHI
- C07 - ORGANIC CHEMISTRY

the alicyclic moiety being in a side chain

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Pattern formation methods

Solution, solution storage body, actinic ray-sensitive or radiation...

Salt, acid generator, resist composition and method for producing r...

Positive resist composition and pattern forming process

Positive photosensitive resin composition and display device using...

Resist composition and pattern forming process

Photosensitive resin composition, method for producing resist patte...

Positive photosensitive resin composition, positive photosensitive...

Resist composition and patterning process

Photoresist with polar-acid-labile-group

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Positive resist material and patterning process

Salt, acid generator, resist composition and method for producing r...

Method for manufacturing electronic device

Photoresist composition and method of manufacturing a semiconductor...

Radiation-sensitive resin composition, method of forming resist pat...

Photoresist composition, coated substrate including the photoresist...

Positive resist composition and pattern forming process

Photoacid-generating monomer, polymer derived therefrom, photoresis...

Resist composition and method of forming resist pattern

Manufacturing method of semiconductor chip, and kit

Salts and photoresists comprising same

Resist composition and patterning process

Photoresist composition comprising amide compound and pattern forma...

Positive resist composition and patterning process

Material for lithography, production method therefor, composition f...

Resist composition and patterning process

Photoresist compositions and methods

Resist composition and patterning process

Patents Applicationslast 30 patents

RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD

RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

POSITIVE TONE ULTRA THICK PHOTORESIST COMPOSITION

POLYMER, MONOMER, RESIST COMPOSITION COMPRISING THE SAME AND METHOD...

ION IMPLANTATION THICK FILM RESIST COMPOSITION, A METHOD FOR MANUFA...

RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND AC...

RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, ACID...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER COMP...

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...

COMPOUNDS, MONOMERS, POLYMERS, PHOTORESIST COMPOSITIONS AND PATTERN...

RADIATION-SENSITIVE RESIN COMPOSITION, RESIN, COMPOUND, AND PATTERN...

RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND AC...

POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

SOLVENT SYSTEMS FOR SELECTIVE REMOVAL OF POLYMERIC MATERIALS

ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITIO...

RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, P...

RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, ME...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS

PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PROD...

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...

SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PROD...

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...