the compound comprising silicon and nitrogen

Industry

CPC
H01L21/02219

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Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02219the compound comprising silicon and nitrogen

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method of post-deposition treatment for silicon oxide film
- Patent number 12,100,588
- Issue date Sep 24, 2024
- ASM IP Holding B.V.
- Toshiya Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma atomic layer deposition
- Patent number 12,077,864
- Issue date Sep 3, 2024
- ASM IP Holding B.V.
- Harm C. M. Knoops
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Precursors and methods for preparing silicon-containing films
- Patent number 12,071,688
- Issue date Aug 27, 2024
- Entegris, Inc.
- SangJin Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Compositions and methods using same for deposition of silicon-conta...
- Patent number 12,049,695
- Issue date Jul 30, 2024
- VERSUM MATERIALS US, LLC
- Raymond Nicholas Vrtis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 12,040,179
- Issue date Jul 16, 2024
- Kokusai Electric Corporation
- Takaaki Noda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for filling a gap and related systems and devices
- Patent number 12,027,365
- Issue date Jul 2, 2024
- ASM IP Holding B.V.
- Zecheng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of SiOCN thin films
- Patent number 11,996,284
- Issue date May 28, 2024
- ASM IP Holding B.V.
- Toshiya Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for filling a gap
- Patent number 11,990,333
- Issue date May 21, 2024
- ASM IP Holding B.V.
- Viljami Pore
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Transistor isolation structures
- Patent number 11,908,921
- Issue date Feb 20, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Yun Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric film for semiconductor fabrication
- Patent number 11,901,295
- Issue date Feb 13, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng-Yi Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film deposition apparatus for fine pattern forming
- Patent number 11,881,379
- Issue date Jan 23, 2024
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device structure with gate spacer
- Patent number 11,854,796
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Guan-Yao Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device, recording medium, and...
- Patent number 11,848,201
- Issue date Dec 19, 2023
- Kokusai Electric Corporation
- Tsukasa Kamakura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method
- Patent number 11,837,515
- Issue date Dec 5, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yin-Jie Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for processing workpiece
- Patent number 11,823,903
- Issue date Nov 21, 2023
- Tokyo Electron Limited
- Yoshihide Kihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Halogen free syntheses of aminosilanes by catalytic dehydrogenative...
- Patent number 11,780,859
- Issue date Oct 10, 2023
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Antonio Sanchez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing substrate and manufacturing semiconductor devi...
- Patent number 11,746,416
- Issue date Sep 5, 2023
- Kokusai Electric Corporation
- Kimihiko Nakatani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of post-deposition treatment for silicon oxide film
- Patent number 11,735,414
- Issue date Aug 22, 2023
- ASM IP Holding B.V.
- Toshiya Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 11,735,412
- Issue date Aug 22, 2023
- Kokusai Electric Corporation
- Atsushi Sano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Precursors and flowable CVD methods for making low-k films to fill...
- Patent number 11,735,413
- Issue date Aug 22, 2023
- VERSUM MATERIALS US, LLC
- Manchao Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Workpiece processing method
- Patent number 11,735,423
- Issue date Aug 22, 2023
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low-k films
- Patent number 11,713,507
- Issue date Aug 1, 2023
- Applied Materials, Inc.
- Shuaidi Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
N-alkyl substituted cyclic and oligomeric perhydridosilazanes, meth...
- Patent number 11,702,434
- Issue date Jul 18, 2023
- Gelest, Inc.
- Barry C. Arkles
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Method and apparatus for filling a gap
- Patent number 11,694,892
- Issue date Jul 4, 2023
- ASM IP Holding B.V.
- Viljami Pore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of improving deposition induced CD imbalance using spatially...
- Patent number 11,651,963
- Issue date May 16, 2023
- Lam Research Corporation
- Ishtak Karim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming silicon nitride including plasma exposure
- Patent number 11,651,955
- Issue date May 16, 2023
- Micron Technology, Inc.
- Sumeet C. Pandey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formulation for deposition of silicon doped hafnium oxide as ferroe...
- Patent number 11,631,580
- Issue date Apr 18, 2023
- VERSUM MATERIALS US, LLC
- Xinjian Lei
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method and apparatus for filling a gap
- Patent number 11,610,775
- Issue date Mar 21, 2023
- ASM IP Holding B.V.
- Viljami Pore
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method
- Patent number 11,574,806
- Issue date Feb 7, 2023
- Tokyo Electron Limited
- Sho Kumakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure
- Patent number 11,562,930
- Issue date Jan 24, 2023
- Semiconductor Manufacturing International (Shanghai) Corporation
- Fei Zhou
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS FOR FORMING LOW-K DIELECTRIC MATERIALS WITH INCREASED ETCH...
- Publication number 20240387167
- Publication date Nov 21, 2024
- Applied Materials, Inc.
- Shanshan Yao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURE AND MANUFACTURING METHOD THEREOF
- Publication number 20240371630
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- I-Hsuan Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20240258101
- Publication date Aug 1, 2024
- ASM IP HOLDING B.V.
- JiHye Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20240258102
- Publication date Aug 1, 2024
- ASM IP HOLDING B.V.
- JiHye Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOPARTICLE FLUOROPOLYMER ELECTRODE
- Publication number 20240230991
- Publication date Jul 11, 2024
- KING FAHD UNIVERSITY OF PETROLEUM AND MINERALS
- Mohammad Nahid SIDDIQUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AUXILIARY PRECURSOR, THIN-FILM PRECURSOR COMPOSITION, METHOD OF FOR...
- Publication number 20240136175
- Publication date Apr 25, 2024
- SOULBRAIN CO., LTD.
- Jae Sun JUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ISOTROPIC SILICON NITRIDE REMOVAL
- Publication number 20240120210
- Publication date Apr 11, 2024
- Applied Materials, Inc.
- Mikhail Korolik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING OXIDE-NITRIDE-OXIDE STACK OF NON-VOLATILE MEMORY...
- Publication number 20240107771
- Publication date Mar 28, 2024
- Infineon Technologies LLC
- Michael ALLEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING
- Publication number 20240096595
- Publication date Mar 21, 2024
- TOKYO ELECTRON LIMITED
- Kazuhide HASEBE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW LOSS SILICON NITRIDE AND WAVEGUIDES COMPRISING LOW LOSS SILICON...
- Publication number 20240079228
- Publication date Mar 7, 2024
- Quantinuum LLC
- Christopher John Carron
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20240063014
- Publication date Feb 22, 2024
- ASM IP HOLDING B.V.
- SangHeon Yong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20240047199
- Publication date Feb 8, 2024
- ASM IP HOLDING B.V.
- SungHa Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, PR...
- Publication number 20230411148
- Publication date Dec 21, 2023
- Kokusai Electric Corporation
- Atsushi SANO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING SiOCN LAYER
- Publication number 20230407465
- Publication date Dec 21, 2023
- ASM IP HOLDING B.V.
- Takashi Yoshida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON COMPOUND AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEV...
- Publication number 20230406822
- Publication date Dec 21, 2023
- DNF CO., LTD.
- Sunhye HWANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD
- Publication number 20230386947
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yin-Jie Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING MET...
- Publication number 20230357926
- Publication date Nov 9, 2023
- Kokusai Electric Corporation
- Kimihiko NAKATANI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF POST-DEPOSITION TREATMENT FOR SILICON OXIDE FILM
- Publication number 20230343587
- Publication date Oct 26, 2023
- ASM IP HOLDING B.V.
- Toshiya Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20230343580
- Publication date Oct 26, 2023
- Kokusai Electric Corporation
- Atsushi SANO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20230335399
- Publication date Oct 19, 2023
- ASM IP HOLDING B.V.
- SangHeon Yong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR FILLING A GAP
- Publication number 20230335397
- Publication date Oct 19, 2023
- ASM IP HOLDING B.V.
- Viljami Pore
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
N-ALKYL SUBSTITUTED CYCLIC AND OLIGOMERIC PERHYDRIDOSILAZANES, METH...
- Publication number 20230279031
- Publication date Sep 7, 2023
- Gelest, Inc.
- Barry C. ARKLES
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR FILLING A GAP
- Publication number 20230207309
- Publication date Jun 29, 2023
- ASM IP HOLDING B.V.
- Viljami PORE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE FILM FORMATION METHOD
- Publication number 20230175115
- Publication date Jun 8, 2023
- TOKYO ELECTRON LIMITED
- Shuji AZUMO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Selective Passivation Of Damaged Nitride
- Publication number 20230136499
- Publication date May 4, 2023
- Applied Materials, Inc.
- Shumao Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON PRECURSORS
- Publication number 20230088079
- Publication date Mar 23, 2023
- Entegris, Inc.
- SangJin Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND APPARATUS
- Publication number 20230040728
- Publication date Feb 9, 2023
- ASM IP HOLDING B.V.
- Akinori Nakano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20230031720
- Publication date Feb 2, 2023
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20230005753
- Publication date Jan 5, 2023
- TOKYO ELECTRON LIMITED
- Fumiya TAKATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING
- Publication number 20220328301
- Publication date Oct 13, 2022
- TOKYO ELECTRON LIMITED
- Kazuhide HASEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

the compound comprising silicon and nitrogen

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method of post-deposition treatment for silicon oxide film

Plasma atomic layer deposition

Precursors and methods for preparing silicon-containing films

Compositions and methods using same for deposition of silicon-conta...

Method of manufacturing semiconductor device, substrate processing...

Methods for filling a gap and related systems and devices

Formation of SiOCN thin films

Method and apparatus for filling a gap

Transistor isolation structures

Dielectric film for semiconductor fabrication

Film deposition apparatus for fine pattern forming

Semiconductor device structure with gate spacer

Method of manufacturing semiconductor device, recording medium, and...

Semiconductor device and method

Method for processing workpiece

Halogen free syntheses of aminosilanes by catalytic dehydrogenative...

Method of processing substrate and manufacturing semiconductor devi...

Method of post-deposition treatment for silicon oxide film

Method of manufacturing semiconductor device, substrate processing...

Precursors and flowable CVD methods for making low-k films to fill...

Workpiece processing method

Low-k films

N-alkyl substituted cyclic and oligomeric perhydridosilazanes, meth...

Method and apparatus for filling a gap

Method of improving deposition induced CD imbalance using spatially...

Methods of forming silicon nitride including plasma exposure

Formulation for deposition of silicon doped hafnium oxide as ferroe...

Method and apparatus for filling a gap

Film forming method

Semiconductor structure

Patents Applicationslast 30 patents

METHODS FOR FORMING LOW-K DIELECTRIC MATERIALS WITH INCREASED ETCH...

SEMICONDUCTOR DEVICE STRUCTURE AND MANUFACTURING METHOD THEREOF

SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING METHOD

NANOPARTICLE FLUOROPOLYMER ELECTRODE

AUXILIARY PRECURSOR, THIN-FILM PRECURSOR COMPOSITION, METHOD OF FOR...

ISOTROPIC SILICON NITRIDE REMOVAL

METHOD OF FORMING OXIDE-NITRIDE-OXIDE STACK OF NON-VOLATILE MEMORY...

FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING

LOW LOSS SILICON NITRIDE AND WAVEGUIDES COMPRISING LOW LOSS SILICON...

SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING METHOD

PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, PR...

METHOD OF FORMING SiOCN LAYER

SILICON COMPOUND AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEV...

SEMICONDUCTOR DEVICE AND METHOD

SUBSTRATE PROCESSING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING MET...

METHOD OF POST-DEPOSITION TREATMENT FOR SILICON OXIDE FILM

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

SUBSTRATE PROCESSING METHOD

METHOD AND APPARATUS FOR FILLING A GAP

N-ALKYL SUBSTITUTED CYCLIC AND OLIGOMERIC PERHYDRIDOSILAZANES, METH...

METHOD AND APPARATUS FOR FILLING A GAP

SELECTIVE FILM FORMATION METHOD

Selective Passivation Of Damaged Nitride

SILICON PRECURSORS

SUBSTRATE PROCESSING METHOD AND APPARATUS

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING