the conductor comprising at least another non-silicon conductive layer

Industry

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H01L21/28044

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/28044the conductor comprising at least another non-silicon conductive layer

Industries

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor devices including a buried gate electrode
- Patent number 11,765,885
- Issue date Sep 19, 2023
- Samsung Electronics Co., Ltd.
- Hyewon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device including polysilicon structures and method of...
- Patent number 11,676,856
- Issue date Jun 13, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- J. J. Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Isolator
- Patent number 11,615,981
- Issue date Mar 28, 2023
- Kabushiki Kaisha Toshiba
- Tatsuhiro Oda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate noble metal nanoparticles
- Patent number 11,557,592
- Issue date Jan 17, 2023
- Micron Technology, Inc.
- Fatma Arzum Simsek-Ege
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device and semiconductor device
- Patent number 11,335,594
- Issue date May 17, 2022
- Mitsubishi Electric Corporation
- Kohei Nishiguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming semiconductor device including polysilicon struct...
- Patent number 11,094,584
- Issue date Aug 17, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- J. J. Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate noble metal nanoparticles
- Patent number 10,818,666
- Issue date Oct 27, 2020
- Micron Technology, Inc.
- Fatma Arzum Simsek-Ege
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrode structure, method of fabricating the same, and semiconduc...
- Patent number 10,685,959
- Issue date Jun 16, 2020
- Samsung Electronics Co., Ltd.
- Dong-kak Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device including polysilicon structures having differ...
- Patent number 10,553,476
- Issue date Feb 4, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- J. J. Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating semiconductor device
- Patent number 10,374,051
- Issue date Aug 6, 2019
- United Microelectronics Corp.
- Ji-Min Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silane and borane treatments for titanium carbide films
- Patent number 9,583,348
- Issue date Feb 28, 2017
- ASM IP Holding B.V.
- Jerry Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of fabricating the same
- Patent number 9,530,693
- Issue date Dec 27, 2016
- SK Hynix Inc.
- Jong Il Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Memory device and method of fabricating thereof
- Patent number 9,461,136
- Issue date Oct 4, 2016
- Micron Technology, Inc.
- Giulio Albini
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrating transistors with different poly-silicon heights on the...
- Patent number 9,431,503
- Issue date Aug 30, 2016
- Cypress Semiconductor Corporation
- Chuan Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual-metal gate CMOS devices and method for manufacturing the same
- Patent number 9,384,986
- Issue date Jul 5, 2016
- NSITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES
- Huaxiang Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silane and borane treatments for titanium carbide films
- Patent number 9,236,247
- Issue date Jan 12, 2016
- ASM IP Holding B.V.
- Jerry Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming and integrating metal gate transistors having se...
- Patent number 9,000,534
- Issue date Apr 7, 2015
- GLOBALFOUNDRIES Inc.
- Andreas H. Knorr
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMOS dual metal gate semiconductor device
- Patent number 8,836,038
- Issue date Sep 16, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yong-Tian Hou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabricating method of transistor
- Patent number 8,772,119
- Issue date Jul 8, 2014
- Nanya Technology Corporation
- Kuo-Hui Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Memory device and method of fabricating thereof
- Patent number 8,673,715
- Issue date Mar 18, 2014
- Micron Technology, Inc.
- Giulio Albini
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrating transistors with different poly-silicon heights on the...
- Patent number 8,652,907
- Issue date Feb 18, 2014
- Spansion LLC
- Chuan Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate pattern of semiconductor device and method for fabricating the...
- Patent number 8,604,556
- Issue date Dec 10, 2013
- Hynix Semiconductor Inc.
- Joon-Young Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming MOS transistors including SiON gate dielectric wi...
- Patent number 8,450,221
- Issue date May 28, 2013
- Texas Instruments Incorporated
- Brian K. Kirkpatrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxide-nitride stack gate dielectric
- Patent number 8,445,381
- Issue date May 21, 2013
- Cypress Semiconductor Corporation
- Krishnaswamy Ramkumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 8,410,547
- Issue date Apr 2, 2013
- Hynix Semiconductor Inc.
- Heung-Jae Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing same
- Patent number 8,404,575
- Issue date Mar 26, 2013
- Kabushiki Kaisha Toshiba
- Akio Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for deposition of semiconductor films
- Patent number 8,360,001
- Issue date Jan 29, 2013
- ASM America, Inc.
- Michael A. Todd
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Process for manufacturing a large-scale integration MOS device and...
- Patent number 8,283,702
- Issue date Oct 9, 2012
- STMicroelectronics S.r.l.
- Dario Salinas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing same
- Patent number 8,084,834
- Issue date Dec 27, 2011
- Kabushiki Kaisha Toshiba
- Akio Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for deposition of semiconductor films
- Patent number 8,067,297
- Issue date Nov 29, 2011
- ASM America, Inc.
- Michael A. Todd
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE INCLUDING POLYSILICON STRUCTURES AND METHOD OF...
- Publication number 20230298935
- Publication date Sep 21, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- J. J. LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
- Publication number 20220013408
- Publication date Jan 13, 2022
- Mitsubishi Electric Corporation
- Kohei NISHIGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE INCLUDING POLYSILICON STRUCTURES AND METHOD OF...
- Publication number 20210351070
- Publication date Nov 11, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- J. J. LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME
- Publication number 20210336014
- Publication date Oct 28, 2021
- Changxin Memory Technologies, Inc.
- Yanjie ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ISOLATOR
- Publication number 20210287931
- Publication date Sep 16, 2021
- Kabushiki Kaisha Toshiba
- Tatsuhiro ODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE NOBLE METAL NANOPARTICLES
- Publication number 20210035979
- Publication date Feb 4, 2021
- Micron Technology, Inc.
- Fatma Arzum Simsek-Ege
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE NOBLE METAL NANOPARTICLES
- Publication number 20200286893
- Publication date Sep 10, 2020
- Micron Technology, Inc.
- Arzum F. Simsek-Ege
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING SEMICONDUCTOR DEVICE INCLUDING POLYSILICON STRUCT...
- Publication number 20200161174
- Publication date May 21, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- J. J. LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRODE STRUCTURE, METHOD OF FABRICATING THE SAME, AND SEMICONDUC...
- Publication number 20190131301
- Publication date May 2, 2019
- Samsung Electronics Co., Ltd.
- Dong-Kak Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING NANOSHEET TRANSISTORS WITH DIFFERING CHARACTERISTICS
- Publication number 20180254322
- Publication date Sep 6, 2018
- International Business Machines Corporation
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING NANOSHEET TRANSISTORS WITH DIFFERING CHARACTERISTICS
- Publication number 20180182848
- Publication date Jun 28, 2018
- International Business Machines Corporation
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING NANOSHEET TRANSISTORS WITH DIFFERING CHARACTERISTICS
- Publication number 20180061944
- Publication date Mar 1, 2018
- International Business Machines Corporation
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20160372359
- Publication date Dec 22, 2016
- Samsung Electronics Co., Ltd.
- Myung-ho Kong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRODE STRUCTURE, METHOD OF FABRICATING THE SAME, AND SEMICONDUC...
- Publication number 20160247802
- Publication date Aug 25, 2016
- Samsung Electronics Co., Ltd.
- Dong-Kak Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
- Publication number 20150214108
- Publication date Jul 30, 2015
- SK HYNIX INC.
- Jong IL KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Manufacturing Semiconductor Device and the Semiconductor...
- Publication number 20150091021
- Publication date Apr 2, 2015
- Sanken Electric Co., Ltd
- Toru Yoshie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR ELEMENT AND METHOD FOR PRODUCING THE SAME
- Publication number 20150069536
- Publication date Mar 12, 2015
- Magnachip Semiconductor, Ltd.
- Youngjae KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING CONTACT PLUG AND METHOD OF MANUFACTURIN...
- Publication number 20140327056
- Publication date Nov 6, 2014
- Samsung Electronics Co., Ltd.
- Jung-hwan Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE STACK OF BORON SEMICONDUCTOR ALLOY, POLYSILICON AND HIGH-K GAT...
- Publication number 20140264638
- Publication date Sep 18, 2014
- Martin M. Frank
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILANE AND BORANE TREATMENTS FOR TITANIUM CARBIDE FILMS
- Publication number 20140273510
- Publication date Sep 18, 2014
- Jerry Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE STACK OF BORON SEMICONDUCTOR ALLOY, POLYSILICON AND HIGH-K GAT...
- Publication number 20140264639
- Publication date Sep 18, 2014
- International Business Machines Corporation
- Martin M. Frank
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20140239419
- Publication date Aug 28, 2014
- United Microelectronics Corp.
- Chien-Hao Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMORY DEVICE AND METHOD OF FABRICATING THEREOF
- Publication number 20140191307
- Publication date Jul 10, 2014
- Micron Technology, Inc.
- Giulio Albini
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATING TRANSISTORS WITH DIFFERENT POLY-SILICON HEIGHTS ON THE...
- Publication number 20140117435
- Publication date May 1, 2014
- SPANSION LLC
- Chuan LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
- Publication number 20140015018
- Publication date Jan 16, 2014
- SK HYNIX INC.
- Jong IL KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOS TRANSISTORS INCLUDING SiON GATE DIELECTRIC WITH ENHANCED NITROG...
- Publication number 20130221451
- Publication date Aug 29, 2013
- TEXAS INSTRUMENTS INCORPORATED
- Brian K. KIRKPATRICK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FABRICATING METHOD OF TRANSISTOR
- Publication number 20130071978
- Publication date Mar 21, 2013
- NANYA TECHNOLOGY CORPORATION
- Kuo-Hui Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20130049091
- Publication date Feb 28, 2013
- Elpida Memory, Inc.
- Kanta Saino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATING TRANSISTORS WITH DIFFERENT POLY-SILICON HEIGHTS ON THE...
- Publication number 20120241871
- Publication date Sep 27, 2012
- SPANSION LLC
- Chuan Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Minimization of Surface Reflectivity
- Publication number 20120223062
- Publication date Sep 6, 2012
- Ultratech, Inc.
- Andrew M. Hawryluk
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR

the conductor comprising at least another non-silicon conductive layer

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor devices including a buried gate electrode

Semiconductor device including polysilicon structures and method of...

Isolator

Gate noble metal nanoparticles

Method for manufacturing semiconductor device and semiconductor device

Method of forming semiconductor device including polysilicon struct...

Gate noble metal nanoparticles

Electrode structure, method of fabricating the same, and semiconduc...

Semiconductor device including polysilicon structures having differ...

Method for fabricating semiconductor device

Silane and borane treatments for titanium carbide films

Semiconductor device and method of fabricating the same

Memory device and method of fabricating thereof

Integrating transistors with different poly-silicon heights on the...

Dual-metal gate CMOS devices and method for manufacturing the same

Silane and borane treatments for titanium carbide films

Method for forming and integrating metal gate transistors having se...

CMOS dual metal gate semiconductor device

Fabricating method of transistor

Memory device and method of fabricating thereof

Integrating transistors with different poly-silicon heights on the...

Gate pattern of semiconductor device and method for fabricating the...

Method of forming MOS transistors including SiON gate dielectric wi...

Oxide-nitride stack gate dielectric

Semiconductor device and method for fabricating the same

Semiconductor device and method for manufacturing same

Process for deposition of semiconductor films

Process for manufacturing a large-scale integration MOS device and...

Semiconductor device and method for manufacturing same

Process for deposition of semiconductor films

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE INCLUDING POLYSILICON STRUCTURES AND METHOD OF...

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE INCLUDING POLYSILICON STRUCTURES AND METHOD OF...

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME

ISOLATOR

GATE NOBLE METAL NANOPARTICLES

GATE NOBLE METAL NANOPARTICLES

METHOD OF FORMING SEMICONDUCTOR DEVICE INCLUDING POLYSILICON STRUCT...

ELECTRODE STRUCTURE, METHOD OF FABRICATING THE SAME, AND SEMICONDUC...

FORMING NANOSHEET TRANSISTORS WITH DIFFERING CHARACTERISTICS

FORMING NANOSHEET TRANSISTORS WITH DIFFERING CHARACTERISTICS

FORMING NANOSHEET TRANSISTORS WITH DIFFERING CHARACTERISTICS

METHOD OF FABRICATING SEMICONDUCTOR DEVICE

ELECTRODE STRUCTURE, METHOD OF FABRICATING THE SAME, AND SEMICONDUC...

SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME

Method of Manufacturing Semiconductor Device and the Semiconductor...

SEMICONDUCTOR ELEMENT AND METHOD FOR PRODUCING THE SAME

SEMICONDUCTOR DEVICE HAVING CONTACT PLUG AND METHOD OF MANUFACTURIN...

GATE STACK OF BORON SEMICONDUCTOR ALLOY, POLYSILICON AND HIGH-K GAT...

SILANE AND BORANE TREATMENTS FOR TITANIUM CARBIDE FILMS

GATE STACK OF BORON SEMICONDUCTOR ALLOY, POLYSILICON AND HIGH-K GAT...

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

MEMORY DEVICE AND METHOD OF FABRICATING THEREOF

INTEGRATING TRANSISTORS WITH DIFFERENT POLY-SILICON HEIGHTS ON THE...

SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME

MOS TRANSISTORS INCLUDING SiON GATE DIELECTRIC WITH ENHANCED NITROG...

FABRICATING METHOD OF TRANSISTOR

SEMICONDUCTOR DEVICE

INTEGRATING TRANSISTORS WITH DIFFERENT POLY-SILICON HEIGHTS ON THE...

Minimization of Surface Reflectivity