the layer being a laminate, i.e. composed of sublayers

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/022the layer being a laminate, i.e. composed of sublayers

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method for manufacturing semiconductor structure and same
- Patent number 12,211,697
- Issue date Jan 28, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- You Lv
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vapor deposition precursor compounds and process of use
- Patent number 12,209,105
- Issue date Jan 28, 2025
- Entegris, Inc.
- Philip S. H. Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing gap filling fluid
- Patent number 12,211,742
- Issue date Jan 28, 2025
- ASM IP Holding B.V.
- Timothee Blanquart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device capable of controlling...
- Patent number 12,211,689
- Issue date Jan 28, 2025
- Kokusai Electric Corporation
- Keigo Nishida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Flowable chemical vapor deposition of metal oxides
- Patent number 12,211,736
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Hurshvardhan Srivastava
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gate-all-around integrated circuit structures having oxide sub-fins
- Patent number 12,211,925
- Issue date Jan 28, 2025
- Intel Corporation
- Leonard P. Guler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reactor and related methods
- Patent number 12,209,308
- Issue date Jan 28, 2025
- ASM IP Holding B.V.
- Antonius Aarnink
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Zone-controlled rare-earth oxide ALD and CVD coatings
- Patent number 12,209,307
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Xiaowei Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing chamber deposition confinement
- Patent number 12,211,673
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Sarah Michelle Bobek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Manufacturing method for silicon nitride thin film, thin film trans...
- Patent number 12,211,688
- Issue date Jan 28, 2025
- BEIHAI HKC OPTOELECTRONICS TECHNOLOGY CO., LTD.
- En-Tsung Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra-high modulus and etch selectivity boron-carbon hardmask films
- Patent number 12,211,694
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Prashant Kumar Kulshreshtha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
SOI substrate and related methods
- Patent number 12,211,784
- Issue date Jan 28, 2025
- SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Mark Griswold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electronic devices comprising a compressive dielectric material, an...
- Patent number 12,205,900
- Issue date Jan 21, 2025
- Micron Technology, Inc.
- Jivaan Kishore Jhothiraman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing chamber to accommodate parasitic plasma fo...
- Patent number 12,205,845
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Khokan Chandra Paul
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for depositing film and film deposition system
- Patent number 12,205,817
- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Capacitor structure and forming method thereof
- Patent number 12,205,981
- Issue date Jan 21, 2025
- Semiconductor Manufacturing International (Shanghai) Corporation
- Changzhou Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reducing K values of dielectric films through anneal
- Patent number 12,206,012
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wen-Kai Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Epitaxial oxide materials, structures, and devices
- Patent number 12,206,048
- Issue date Jan 21, 2025
- SILANNA UV TECHNOLOGIES PTE LTD
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency power generator having multiple output ports
- Patent number 12,205,796
- Issue date Jan 21, 2025
- Lam Research Corporation
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Batch curing chamber with gas distribution and individual pumping
- Patent number 12,203,171
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Adib Khan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of organic films
- Patent number 12,205,820
- Issue date Jan 21, 2025
- ASM IP Holding B.V.
- Eva E. Tois
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing a multi-gate device having a semiconductor...
- Patent number 12,199,170
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei Ju Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and a manufacturing method thereof
- Patent number 12,199,014
- Issue date Jan 14, 2025
- Samsung Electronics Co., Ltd.
- Kyeong Bin Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Seam free isolation structures and method for making the same
- Patent number 12,199,097
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yi-Ruei Jhan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 12,198,929
- Issue date Jan 14, 2025
- Kokusai Electric Corporation
- Hiroshi Ashihara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Defect free germanium oxide gap fill
- Patent number 12,198,936
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Huiyuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
MIM capacitor with a symmetrical capacitor insulator structure
- Patent number 12,199,029
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsing-Lien Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for depositing low-k dielectric films
- Patent number 12,198,925
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Shaunak Mukherjee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of processing substrate, met...
- Patent number 12,195,854
- Issue date Jan 14, 2025
- Kokusai Electric Corporation
- Teruo Yoshino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method for manufacturing semiconductor device
- Patent number 12,199,186
- Issue date Jan 14, 2025
- Semiconductor Energy Laboratory Co., Ltd.
- Kenichi Okazaki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DEPOSITION OF HIGH COMPRESSIVE STRESS THERMALLY STABLE NITRIDE FILM
- Publication number 20250037992
- Publication date Jan 30, 2025
- LAM RESEARCH CORPORATION
- Soumana HAMMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FILLING TRENCHES ON SUBSTRATE SURFACE
- Publication number 20250037994
- Publication date Jan 30, 2025
- ASM IP HOLDING B.V.
- Yoshio Susa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SILICON NITROGENOUS FILM ON SUBSTRATE HAVI...
- Publication number 20250037990
- Publication date Jan 30, 2025
- Merck Patent GmbH
- ISSEI SAKURAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING METHOD AND FILM-FORMING APPARATUS
- Publication number 20250037991
- Publication date Jan 30, 2025
- TOKYO ELECTRON LIMITED
- Takashi CHIBA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION OF OXIDE THIN FILMS
- Publication number 20250037995
- Publication date Jan 30, 2025
- ASM IP HOLDING B.V.
- Suvi P. Haukka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF FORMING ABRUPT INTERFACES BETWEEN SILICON-AND-CARBON-CON...
- Publication number 20250037987
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Stephen Weeks
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEQUENTIAL PLASMA AND THERMAL TREATMENT
- Publication number 20250037989
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Ning Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD
- Publication number 20250034715
- Publication date Jan 30, 2025
- TOKYO ELECTRON LIMITED
- Shuji AZUMO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON OXIDE DEPOSITION METHOD
- Publication number 20250037988
- Publication date Jan 30, 2025
- ASM IP HOLDING B.V.
- Varun Sharma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SILICON NITRIDE FILM SELECTIVELY ON SIDEWALLS OF...
- Publication number 20250037993
- Publication date Jan 30, 2025
- ASM IP HOLDING B.V.
- Tomomi Ban
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VAPOR PHASE TRANSPORT SYSTEM AND METHOD FOR DEPOSITING PEROVSKITE S...
- Publication number 20250029830
- Publication date Jan 23, 2025
- Swift Solar Inc.
- Kevin Alexander Bush
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR DEPOSITING A MOLYBDENUM METAL FILM ON A DIELECTRIC SURF...
- Publication number 20250029834
- Publication date Jan 23, 2025
- ASM IP HOLDING B.V.
- Bhushan Zope
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20250031375
- Publication date Jan 23, 2025
- SK HYNIX INC.
- Sung-Lae OH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH VOLTAGE THREE-DIMENSIONAL DEVICES HAVING DIELECTRIC LINERS
- Publication number 20250031446
- Publication date Jan 23, 2025
- Intel Corporation
- Walid M. HAFEZ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20250029829
- Publication date Jan 23, 2025
- ASM IP HOLDING B.V.
- SungBae Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Formation of SiOCN Thin Films
- Publication number 20250029832
- Publication date Jan 23, 2025
- ASM IP HOLDING B.V.
- Varun Sharma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR CONTROLLING SPIN-ON SELF-ASSEMBLED MONOLAYER (SAM) SELE...
- Publication number 20250029833
- Publication date Jan 23, 2025
- TOKYO ELECTRON LIMITED
- Lior Huli
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VAPOR PHASE DEPOSITION OF ORGANIC FILMS
- Publication number 20250025911
- Publication date Jan 23, 2025
- ASM IP HOLDING B.V.
- Viljami J. Pore
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR SEPARATING SEMICONDUCTOR DEVICES USING SINGULATION GROO...
- Publication number 20250029878
- Publication date Jan 23, 2025
- Micron Technology, Inc.
- Jungbae Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS AND APPARATUS FOR RADICAL ENHANCED VAPOR DEPOSITION
- Publication number 20250029831
- Publication date Jan 23, 2025
- ASM IP HOLDING B.V.
- Tommi Tynell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED PLASMA CLEAN AND DIELECTRIC PASSIVATION DEPOSITION PROCE...
- Publication number 20250029835
- Publication date Jan 23, 2025
- Applied Materials, Inc.
- Ryan Ley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE ETCHING BETWEEN SILICON-AND-GERMANIUM-CONTAINING MATERIAL...
- Publication number 20250029841
- Publication date Jan 23, 2025
- Applied Materials, Inc.
- Jiayin Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250022702
- Publication date Jan 16, 2025
- Kokusai Electric Corporation
- Masayuki ASAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...
- Publication number 20250022703
- Publication date Jan 16, 2025
- Kokusai Electric Corporation
- Yukinori ABURATANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250022706
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Tomohiko NIIZEKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20250022766
- Publication date Jan 16, 2025
- Vanguard International Semiconductor Corporation
- Hsiu-Mei YU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING METHOD AND FILM-FORMING APPARATUS
- Publication number 20250019815
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Shimon OTSUKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIRECTIONAL SELECTIVE FILL OF SILICON OXIDE MATERIALS
- Publication number 20250022704
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Qiang Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...
- Publication number 20250022705
- Publication date Jan 16, 2025
- Kokusai Electric Corporation
- Takashi YAHATA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF CARBON HARD-MASK
- Publication number 20250022709
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Byung Seok KWON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

the layer being a laminate, i.e. composed of sublayers

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for manufacturing semiconductor structure and same

Vapor deposition precursor compounds and process of use

Methods for depositing gap filling fluid

Method of manufacturing semiconductor device capable of controlling...

Flowable chemical vapor deposition of metal oxides

Gate-all-around integrated circuit structures having oxide sub-fins

Reactor and related methods

Zone-controlled rare-earth oxide ALD and CVD coatings

Processing chamber deposition confinement

Manufacturing method for silicon nitride thin film, thin film trans...

Ultra-high modulus and etch selectivity boron-carbon hardmask films

SOI substrate and related methods

Electronic devices comprising a compressive dielectric material, an...

Semiconductor processing chamber to accommodate parasitic plasma fo...

Method for depositing film and film deposition system

Capacitor structure and forming method thereof

Reducing K values of dielectric films through anneal

Epitaxial oxide materials, structures, and devices

Radio frequency power generator having multiple output ports

Batch curing chamber with gas distribution and individual pumping

Deposition of organic films

Method of manufacturing a multi-gate device having a semiconductor...

Semiconductor device and a manufacturing method thereof

Seam free isolation structures and method for making the same

Method of manufacturing semiconductor device, substrate processing...

Defect free germanium oxide gap fill

MIM capacitor with a symmetrical capacitor insulator structure

Systems and methods for depositing low-k dielectric films

Substrate processing apparatus, method of processing substrate, met...

Semiconductor device and method for manufacturing semiconductor device

Patents Applicationslast 30 patents

DEPOSITION OF HIGH COMPRESSIVE STRESS THERMALLY STABLE NITRIDE FILM

METHODS OF FILLING TRENCHES ON SUBSTRATE SURFACE

METHOD FOR MANUFACTURING SILICON NITROGENOUS FILM ON SUBSTRATE HAVI...

FILM-FORMING METHOD AND FILM-FORMING APPARATUS

DEPOSITION OF OXIDE THIN FILMS

METHODS OF FORMING ABRUPT INTERFACES BETWEEN SILICON-AND-CARBON-CON...

SEQUENTIAL PLASMA AND THERMAL TREATMENT

FILM FORMING METHOD

SILICON OXIDE DEPOSITION METHOD

METHOD FOR FORMING SILICON NITRIDE FILM SELECTIVELY ON SIDEWALLS OF...

VAPOR PHASE TRANSPORT SYSTEM AND METHOD FOR DEPOSITING PEROVSKITE S...

METHODS FOR DEPOSITING A MOLYBDENUM METAL FILM ON A DIELECTRIC SURF...

SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREOF

HIGH VOLTAGE THREE-DIMENSIONAL DEVICES HAVING DIELECTRIC LINERS

SUBSTRATE PROCESSING METHOD

Formation of SiOCN Thin Films

METHODS FOR CONTROLLING SPIN-ON SELF-ASSEMBLED MONOLAYER (SAM) SELE...

VAPOR PHASE DEPOSITION OF ORGANIC FILMS

METHODS FOR SEPARATING SEMICONDUCTOR DEVICES USING SINGULATION GROO...

PROCESS AND APPARATUS FOR RADICAL ENHANCED VAPOR DEPOSITION

INTEGRATED PLASMA CLEAN AND DIELECTRIC PASSIVATION DEPOSITION PROCE...

SELECTIVE ETCHING BETWEEN SILICON-AND-GERMANIUM-CONTAINING MATERIAL...

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SEMICONDUCTOR DEVICE

FILM-FORMING METHOD AND FILM-FORMING APPARATUS

DIRECTIONAL SELECTIVE FILL OF SILICON OXIDE MATERIALS

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...

PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF CARBON HARD-MASK