the material being a silicon nitride not containing oxygen

Industry

CPC
H01L21/0217

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/0217the material being a silicon nitride not containing oxygen

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Methods for patterning a silicon oxide-silicon nitride-silicon oxid...
- Patent number 12,334,333
- Issue date Jun 17, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Yi-Ren Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inner spacers for gate-all-around semiconductor devices
- Patent number 12,336,214
- Issue date Jun 17, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Yun Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structures and methods for fabricating staircase regions of a three...
- Patent number 12,334,399
- Issue date Jun 17, 2025
- Yangtze Memory Technologies Co., Ltd.
- Xiongyu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for selective etch stop capping and selective...
- Patent number 12,334,394
- Issue date Jun 17, 2025
- Applied Materials, Inc.
- Suketu Parikh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching gas mixture and method of manufacturing integrated circuit...
- Patent number 12,327,731
- Issue date Jun 10, 2025
- Samsung Electronics Co., Ltd.
- Changgil Son
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultraviolet radiation activated atomic layer deposition
- Patent number 12,327,721
- Issue date Jun 10, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Christine Y. Ouyang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of processing substrate, substrate processing apparatus, rec...
- Patent number 12,327,720
- Issue date Jun 10, 2025
- Kokusai Electric Corporation
- Toshiyuki Kikuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing semiconductor device
- Patent number 12,328,908
- Issue date Jun 10, 2025
- Semiconductor Energy Laboratory Co., Ltd.
- Tetsuya Kakehata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film deposition process
- Patent number 12,322,591
- Issue date Jun 3, 2025
- ASM IP Holding B.V.
- Naoki Inoue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Epitaxial oxide transistor
- Patent number 12,324,276
- Issue date Jun 3, 2025
- SILANNA UV TECHNOLOGIES PTE LTD
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective passivation and selective deposition
- Patent number 12,322,593
- Issue date Jun 3, 2025
- ASM IP Holding B.V.
- Jan Willem Hub Maes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating Fin-type field-effect transistor device havin...
- Patent number 12,324,224
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Hung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods
- Patent number 12,322,647
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Kai Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical thin-film transistor and application as bit-line connector...
- Patent number 12,324,159
- Issue date Jun 3, 2025
- SUNRISE MEMORY CORPORATION
- Tianhong Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and a semiconductor...
- Patent number 12,315,864
- Issue date May 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Chi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of highly selective silicon oxide removal
- Patent number 12,315,736
- Issue date May 27, 2025
- Applied Materials, Inc.
- Lala Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing metal oxynitride film
- Patent number 12,315,717
- Issue date May 27, 2025
- Semiconductor Energy Laboratory Co., Ltd.
- Kazuki Tanemura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method, method of manufacturing semiconductor...
- Patent number 12,315,719
- Issue date May 27, 2025
- Kokusai Electric Corporation
- Yoshiro Hirose
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor structure having high breakdown voltage etch-stop layer
- Patent number 12,315,812
- Issue date May 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Joung-Wei Liou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin field-effect transistor device having contact plugs with re-ent...
- Patent number 12,310,051
- Issue date May 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Lien Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3D semiconductor device and array layout with isolated conductive p...
- Patent number 12,310,023
- Issue date May 20, 2025
- Macronix International Co., Ltd.
- Hang-Ting Lue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,308,241
- Issue date May 20, 2025
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices having fins and multiple isolation regions
- Patent number 12,300,696
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Sheng Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Warpage-reducing semiconductor structure and fabricating method of...
- Patent number 12,300,633
- Issue date May 13, 2025
- United Microelectronics Corp.
- Da-Jun Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformal low temperature hermetic dielectric diffusion barriers
- Patent number 12,300,537
- Issue date May 13, 2025
- Intel Corporation
- Sean King
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
FinFET structure with a composite stress layer and reduced fin buck...
- Patent number 12,302,611
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei-Jen Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
UV cure for local stress modulation
- Patent number 12,300,489
- Issue date May 13, 2025
- Lam Research Corporation
- Anirvan Sircar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of semiconductor integration films
- Patent number 12,300,491
- Issue date May 13, 2025
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of organic films
- Patent number 12,300,505
- Issue date May 13, 2025
- ASM IP Holding B.V.
- Eva E. Tois
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High resistivity silicon-on-insulator substrate comprising an isola...
- Patent number 12,300,535
- Issue date May 13, 2025
- GlobalWafers Co., Ltd.
- Igor Peidous
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
TRENCH CONTACT STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE...
- Publication number 20250194201
- Publication date Jun 12, 2025
- Intel Corporation
- Subhash M. JOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING STI REGION
- Publication number 20250194085
- Publication date Jun 12, 2025
- Micron Technology, Inc.
- Kunihiro Tsubomi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED INNER SPACER ON GATE-ALL-AROUND STRUCTURE AND METHODS...
- Publication number 20250194203
- Publication date Jun 12, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsungyu Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFICATION OF BACKSIDE STRESS MITIGATION WITH FRONTSIDE PROTECTION...
- Publication number 20250194165
- Publication date Jun 12, 2025
- Applied Materials, Inc.
- Changwoo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC STRUCTURE, SEMICONDUCTOR DEVICE STRUCTURE AND MANUFACTUR...
- Publication number 20250194192
- Publication date Jun 12, 2025
- ENKRIS SEMICONDUCTOR, INC.
- Kai CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal-Insulator-Metal Structure
- Publication number 20250192026
- Publication date Jun 12, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yuan-Yang Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING SILICON NITRIDE FILM AND FILM FORMING APPARATUS
- Publication number 20250179625
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Munehito KAGAYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ORGANOAMINOSILANE PRECURSORS AND METHODS FOR DEPOSITING FILMS COMPR...
- Publication number 20250183029
- Publication date Jun 5, 2025
- VERSUM MATERIALS US, LLC
- Mark Leonard O'Neill
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PLASMA PROCESS FOR ETCHING A MULTILAYER STACK
- Publication number 20250183046
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Jason Marion
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ROBUST ONO FILMS AND METHODS OF MAKING THEREOF
- Publication number 20250185263
- Publication date Jun 5, 2025
- TEXAS INSTRUMENTS INCORPORATED
- Saiful Islam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED CIRCUIT WITH SILICIDE FORMATION BLOCKING
- Publication number 20250183039
- Publication date Jun 5, 2025
- TEXAS INSTRUMENTS INCORPORATED
- Brian Ellingwood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE TREATMENT METHOD, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTR...
- Publication number 20250183044
- Publication date Jun 5, 2025
- FUJIMI INCORPORATED
- Tsutomu YOSHINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR TREATING OBJECT TO BE TREATED, TREATMENT LIQUID, AND MET...
- Publication number 20250183050
- Publication date Jun 5, 2025
- FUJIFILM CORPORATION
- Atsushi Mizutani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CIRCUIT DIE WITH CHAMFERED PASSIVATION LAYER
- Publication number 20250183108
- Publication date Jun 5, 2025
- NXP USA, Inc.
- Darrell Glenn Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TOPOLOGY SELECTIVE AND SACRIFICIAL SILICON NITRIDE LAYER FOR GENERA...
- Publication number 20250185338
- Publication date Jun 5, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tzu-Yang HO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TYPE III-V SEMICONDUCTOR DEVICE WITH STRUCTURED PASSIVATION
- Publication number 20250176206
- Publication date May 29, 2025
- Infineon Technologies Austria AG
- Simone Lavanga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH QUALITY NITRIDE AND OXIDE FABRICATION AND SYSTEM
- Publication number 20250174455
- Publication date May 29, 2025
- TEXAS INSTRUMENTS INCORPORATED
- Saiful Islam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250174462
- Publication date May 29, 2025
- TOKYO ELECTRON LIMITED
- Takuya SEINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20250169140
- Publication date May 22, 2025
- UNITED MICROELECTRONICS CORP.
- Chia-Ming Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROTECTIVE PASSIVATION LAYER FOR MAGNETIC TUNNEL JUNCTIONS
- Publication number 20250169372
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jodi Mari Iwata
- G11 - INFORMATION STORAGE
Information Patent Application
SURFACE OXIDATION LAYER FOR METAL VOIDING REDUCTION
- Publication number 20250167086
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Man-Yun Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON NITRIDE FILMS HAVING REDUCED INTERFACIAL STRAIN
- Publication number 20250166988
- Publication date May 22, 2025
- Psiquantum, Corp.
- Yong Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRONIC DEVICES COMPRISING A COMPRESSIVE DIELECTRIC MATERIAL
- Publication number 20250157935
- Publication date May 15, 2025
- Micron Technology, Inc.
- Jivaan Kishore Jhothiraman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS UTILIZING INDIUM-BASED PRECURSORS FOR INTEGRA...
- Publication number 20250157808
- Publication date May 15, 2025
- Intel Corporation
- Charles Mokhtarzadeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR PATTERNING A SEMICONDUCTOR SUBSTRATE USING METALATE SAL...
- Publication number 20250157810
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Paul Abel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON NITRIDE FILM FORMATION METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250154649
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Kenichi KOTE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20250157811
- Publication date May 15, 2025
- ASM IP HOLDING B.V.
- Jeonghoon Jang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20250157852
- Publication date May 15, 2025
- Samsung Electronics Co., Ltd.
- Hyunchul LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN-FILM FORMING COMPOSITION INCLUDING ALUMINUM COMPOUND, METHOD O...
- Publication number 20250157809
- Publication date May 15, 2025
- Samsung Electronics Co., Ltd.
- Daeun Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFORMAL BORON DOPING METHOD FOR THREE-DIMENSIONAL STRUCTURE AND U...
- Publication number 20250149339
- Publication date May 8, 2025
- Beijing Superstring Academy of Memory Technology
- Jianfeng Gao
- H01 - BASIC ELECTRIC ELEMENTS

the material being a silicon nitride not containing oxygen

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods for patterning a silicon oxide-silicon nitride-silicon oxid...

Inner spacers for gate-all-around semiconductor devices

Structures and methods for fabricating staircase regions of a three...

Methods and apparatus for selective etch stop capping and selective...

Etching gas mixture and method of manufacturing integrated circuit...

Ultraviolet radiation activated atomic layer deposition

Method of processing substrate, substrate processing apparatus, rec...

Semiconductor device and method for manufacturing semiconductor device

Thin film deposition process

Epitaxial oxide transistor

Selective passivation and selective deposition

Method of fabricating Fin-type field-effect transistor device havin...

Semiconductor devices and methods

Vertical thin-film transistor and application as bit-line connector...

Method of manufacturing a semiconductor device and a semiconductor...

Methods of highly selective silicon oxide removal

Method for manufacturing metal oxynitride film

Substrate processing method, method of manufacturing semiconductor...

Semiconductor structure having high breakdown voltage etch-stop layer

Fin field-effect transistor device having contact plugs with re-ent...

3D semiconductor device and array layout with isolated conductive p...

Plasma processing method and plasma processing apparatus

Semiconductor devices having fins and multiple isolation regions

Warpage-reducing semiconductor structure and fabricating method of...

Conformal low temperature hermetic dielectric diffusion barriers

FinFET structure with a composite stress layer and reduced fin buck...

UV cure for local stress modulation

Deposition of semiconductor integration films

Deposition of organic films

High resistivity silicon-on-insulator substrate comprising an isola...

Patents Applicationslast 30 patents

TRENCH CONTACT STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE...

SEMICONDUCTOR DEVICE HAVING STI REGION

SELF-ALIGNED INNER SPACER ON GATE-ALL-AROUND STRUCTURE AND METHODS...

UNIFICATION OF BACKSIDE STRESS MITIGATION WITH FRONTSIDE PROTECTION...

DIELECTRIC STRUCTURE, SEMICONDUCTOR DEVICE STRUCTURE AND MANUFACTUR...

Metal-Insulator-Metal Structure

METHOD OF FORMING SILICON NITRIDE FILM AND FILM FORMING APPARATUS

ORGANOAMINOSILANE PRECURSORS AND METHODS FOR DEPOSITING FILMS COMPR...

PLASMA PROCESS FOR ETCHING A MULTILAYER STACK

ROBUST ONO FILMS AND METHODS OF MAKING THEREOF

INTEGRATED CIRCUIT WITH SILICIDE FORMATION BLOCKING

SURFACE TREATMENT METHOD, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTR...

METHOD FOR TREATING OBJECT TO BE TREATED, TREATMENT LIQUID, AND MET...

CIRCUIT DIE WITH CHAMFERED PASSIVATION LAYER

TOPOLOGY SELECTIVE AND SACRIFICIAL SILICON NITRIDE LAYER FOR GENERA...

TYPE III-V SEMICONDUCTOR DEVICE WITH STRUCTURED PASSIVATION

HIGH QUALITY NITRIDE AND OXIDE FABRICATION AND SYSTEM

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

PROTECTIVE PASSIVATION LAYER FOR MAGNETIC TUNNEL JUNCTIONS

SURFACE OXIDATION LAYER FOR METAL VOIDING REDUCTION

SILICON NITRIDE FILMS HAVING REDUCED INTERFACIAL STRAIN

ELECTRONIC DEVICES COMPRISING A COMPRESSIVE DIELECTRIC MATERIAL

METHODS AND APPARATUS UTILIZING INDIUM-BASED PRECURSORS FOR INTEGRA...

METHODS FOR PATTERNING A SEMICONDUCTOR SUBSTRATE USING METALATE SAL...

SILICON NITRIDE FILM FORMATION METHOD AND PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD

SEMICONDUCTOR DEVICE

THIN-FILM FORMING COMPOSITION INCLUDING ALUMINUM COMPOUND, METHOD O...

CONFORMAL BORON DOPING METHOD FOR THREE-DIMENSIONAL STRUCTURE AND U...