the material being a silicon nitride not containing oxygen

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/0217the material being a silicon nitride not containing oxygen

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Patents Grantslast 30 patents

Information Patent Grant
Air gap spacer formation for nano-scale semiconductor devices
- Patent number 12,224,203
- Issue date Feb 11, 2025
- Adeia Semiconductor Solutions LLC
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of metal grid, thin film sensor and manufactur...
- Patent number 12,224,234
- Issue date Feb 11, 2025
- BEIJING BOE TECHNOLOGY DEVELOPMENT CO., LTD.
- Hu Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Long-term implantable electronic devices
- Patent number 12,220,239
- Issue date Feb 11, 2025
- Northwestern University
- John A. Rogers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a field effect transistor using carbon nano...
- Patent number 12,218,198
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Matthias Passlack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device structure with etch stop layer for reducing RC...
- Patent number 12,218,241
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chung-Ting Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching film and plasma processing apparatus
- Patent number 12,217,973
- Issue date Feb 4, 2025
- Tokyo Electron Limited
- Kosuke Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flowable chemical vapor deposition of metal oxides
- Patent number 12,211,736
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Hurshvardhan Srivastava
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Manufacturing method for silicon nitride thin film, thin film trans...
- Patent number 12,211,688
- Issue date Jan 28, 2025
- BEIHAI HKC OPTOELECTRONICS TECHNOLOGY CO., LTD.
- En-Tsung Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Protective passivation layer for magnetic tunnel junctions
- Patent number 12,213,385
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jodi Mari Iwata
- G11 - INFORMATION STORAGE
Information Patent Grant
Electronic devices comprising a compressive dielectric material, an...
- Patent number 12,205,900
- Issue date Jan 21, 2025
- Micron Technology, Inc.
- Jivaan Kishore Jhothiraman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and method of manufacturing semicond...
- Patent number 12,203,167
- Issue date Jan 21, 2025
- Kokusai Electric Corporation
- Hidetoshi Mimura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Epitaxial oxide materials, structures, and devices
- Patent number 12,206,048
- Issue date Jan 21, 2025
- SILANNA UV TECHNOLOGIES PTE LTD
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing same
- Patent number 12,207,470
- Issue date Jan 21, 2025
- Kioxia Corporation
- Shinya Arai
- G11 - INFORMATION STORAGE
Information Patent Grant
Silicon nitride films having reduced interfacial strain
- Patent number 12,198,926
- Issue date Jan 14, 2025
- PSIQUANTUM, CORP.
- Yong Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate line plug structures for advanced integrated circuit structure...
- Patent number 12,199,167
- Issue date Jan 14, 2025
- Intel Corporation
- Byron Ho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low resistance interconnect structure for semiconductor device
- Patent number 12,199,036
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jason Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit comprising trenches formed in a substrate
- Patent number 12,198,973
- Issue date Jan 14, 2025
- STMicroelectronics (Rousset) SAS
- Franck Julien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with multi-layer etch stop structure
- Patent number 12,198,979
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Po-Cheng Shih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plugs for interconnect lines for advanced integrated circuit struct...
- Patent number 12,199,168
- Issue date Jan 14, 2025
- Intel Corporation
- Andrew W. Yeoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Switching device and method for manufacturing the same
- Patent number 12,191,150
- Issue date Jan 7, 2025
- Denso Corporation
- Hidemoto Tomita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a semiconductor structure
- Patent number 12,191,377
- Issue date Jan 7, 2025
- United Semiconductor (Xiamen) Co., Ltd.
- Jun Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film transistor including a hydrogen-blocking dielectric barri...
- Patent number 12,183,825
- Issue date Dec 31, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Neil Quinn Murray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 12,183,832
- Issue date Dec 31, 2024
- Semiconductor Energy Laboratory Co., Ltd.
- Kengo Akimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated assemblies having vertically-spaced channel material seg...
- Patent number 12,185,544
- Issue date Dec 31, 2024
- John D. Hopkins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Source/drain feature separation structure
- Patent number 12,178,032
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wen-Chun Keng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatuses for forming semiconductor devices containin...
- Patent number 12,176,203
- Issue date Dec 24, 2024
- SanDisk Technologies LLC
- Fei Zhou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metal oxide composite as etch stop layer
- Patent number 12,176,247
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kai-Fang Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Additive process for circular printing
- Patent number 12,172,374
- Issue date Dec 24, 2024
- Texas Instruments Incorporated
- Daniel Lee Revier
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Cyclic low temperature film growth processes
- Patent number 12,176,204
- Issue date Dec 24, 2024
- Tokyo Electron Limited
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition method and plasma processing apparatus
- Patent number 12,170,198
- Issue date Dec 17, 2024
- Tokyo Electron Limited
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
ALD PULSE SEQUENCE ENGINEERING FOR IMPROVED CONFORMALITY FOR LOW TE...
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Information Patent Application
SYNAPTIC TRANSISTOR
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- G06 - COMPUTING CALCULATING COUNTING
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MEMORY ARRAYS AND METHODS USED IN FORMING A MEMORY ARRAY COMPRISING...
- Publication number 20250056800
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- Lodestar Licensing Group LLC
- Jordan D. Greenlee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EPITAXIAL OXIDE MATERIALS, STRUCTURES, AND DEVICES
- Publication number 20250056927
- Publication date Feb 13, 2025
- Silanna UV Technologies Pte Ltd
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADHESION IMPROVEMENTS IN METAL-CONTAINING HARDMASKS
- Publication number 20250054748
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Guangyan Zhong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20250054753
- Publication date Feb 13, 2025
- ASM IP HOLDING B.V.
- KiHun Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20250054758
- Publication date Feb 13, 2025
- Samsung SDI Co., Ltd.
- Dong Wan RYU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL DEPOSITION OF SILICON NITRIDE
- Publication number 20250054747
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Awnish Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE
- Publication number 20250054766
- Publication date Feb 13, 2025
- Infineon Technologies Austria AG
- Clemens Ostermaier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, AND...
- Publication number 20250043424
- Publication date Feb 6, 2025
- Kokusai Electric Corporation
- Atsushi HIRANO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Atomic Layer Deposition of Passivation Layer
- Publication number 20250046603
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Du Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PECVD Method and Apparatus
- Publication number 20250046604
- Publication date Feb 6, 2025
- SPTS TECHNOLOGIES LIMITED
- Giorgos ANTONIOU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REACTIVE-ION DEPOSITION PROCESSES FOR DIELECTRIC MATERIAL FORMATION
- Publication number 20250046602
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20250046607
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Takashi FUSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF HIGH COMPRESSIVE STRESS THERMALLY STABLE NITRIDE FILM
- Publication number 20250037992
- Publication date Jan 30, 2025
- LAM RESEARCH CORPORATION
- Soumana HAMMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEAM REMOVAL IN HIGH ASPECT RATIO GAP-FILL
- Publication number 20250037996
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Qinghua Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SILICON NITROGENOUS FILM ON SUBSTRATE HAVI...
- Publication number 20250037990
- Publication date Jan 30, 2025
- Merck Patent GmbH
- ISSEI SAKURAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF OXIDE THIN FILMS
- Publication number 20250037995
- Publication date Jan 30, 2025
- ASM IP HOLDING B.V.
- Suvi P. Haukka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEQUENTIAL PLASMA AND THERMAL TREATMENT
- Publication number 20250037989
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Ning Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING SILICON NITRIDE FILM SELECTIVELY ON SIDEWALLS OF...
- Publication number 20250037993
- Publication date Jan 30, 2025
- ASM IP HOLDING B.V.
- Tomomi Ban
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250022702
- Publication date Jan 16, 2025
- Kokusai Electric Corporation
- Masayuki ASAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Assemblies Having Conductive Structures Along Pillars of Semiconduc...
- Publication number 20250022955
- Publication date Jan 16, 2025
- Micron Technology, Inc.
- Sanh D. Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT OVER ACTIVE GATE STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT...
- Publication number 20250022939
- Publication date Jan 16, 2025
- Intel Corporation
- Andrew W. Yeoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING METHOD AND FILM-FORMING APPARATUS
- Publication number 20250019815
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Shimon OTSUKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...
- Publication number 20250022705
- Publication date Jan 16, 2025
- Kokusai Electric Corporation
- Takashi YAHATA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, METHOD...
- Publication number 20250011931
- Publication date Jan 9, 2025
- Kokusai Electric Corporation
- Shun MATSUI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250014891
- Publication date Jan 9, 2025
- Kokusai Electric Corporation
- Hiroyuki KOIDE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate Processing Method, Method of Manufacturing Semiconductor...
- Publication number 20250014894
- Publication date Jan 9, 2025
- Kokusai Electric Corporation
- Hiroki HATTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE PROCESSING WITH ETCH RESIDUE-BASED INHIBITORS
- Publication number 20250014904
- Publication date Jan 9, 2025
- LAM RESEARCH CORPORATION
- Kashish Sharma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, MET...
- Publication number 20250014930
- Publication date Jan 9, 2025
- Kokusai Electric Corporation
- Tsukasa KAMAKURA
- H01 - BASIC ELECTRIC ELEMENTS

the material being a silicon nitride not containing oxygen

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Air gap spacer formation for nano-scale semiconductor devices

Manufacturing method of metal grid, thin film sensor and manufactur...

Long-term implantable electronic devices

Method of manufacturing a field effect transistor using carbon nano...

Semiconductor device structure with etch stop layer for reducing RC...

Method of etching film and plasma processing apparatus

Flowable chemical vapor deposition of metal oxides

Manufacturing method for silicon nitride thin film, thin film trans...

Protective passivation layer for magnetic tunnel junctions

Electronic devices comprising a compressive dielectric material, an...

Substrate processing apparatus and method of manufacturing semicond...

Epitaxial oxide materials, structures, and devices

Semiconductor device and method for manufacturing same

Silicon nitride films having reduced interfacial strain

Gate line plug structures for advanced integrated circuit structure...

Low resistance interconnect structure for semiconductor device

Integrated circuit comprising trenches formed in a substrate

Semiconductor device with multi-layer etch stop structure

Plugs for interconnect lines for advanced integrated circuit struct...

Switching device and method for manufacturing the same

Method for forming a semiconductor structure

Thin film transistor including a hydrogen-blocking dielectric barri...

Semiconductor device and manufacturing method thereof

Integrated assemblies having vertically-spaced channel material seg...

Source/drain feature separation structure

Methods and apparatuses for forming semiconductor devices containin...

Metal oxide composite as etch stop layer

Additive process for circular printing

Cyclic low temperature film growth processes

Deposition method and plasma processing apparatus

Patents Applicationslast 30 patents

ALD PULSE SEQUENCE ENGINEERING FOR IMPROVED CONFORMALITY FOR LOW TE...

SYNAPTIC TRANSISTOR

MEMORY ARRAYS AND METHODS USED IN FORMING A MEMORY ARRAY COMPRISING...

EPITAXIAL OXIDE MATERIALS, STRUCTURES, AND DEVICES

ADHESION IMPROVEMENTS IN METAL-CONTAINING HARDMASKS

SUBSTRATE PROCESSING METHOD

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

CONFORMAL DEPOSITION OF SILICON NITRIDE

METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE

SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, AND...

Atomic Layer Deposition of Passivation Layer

PECVD Method and Apparatus

REACTIVE-ION DEPOSITION PROCESSES FOR DIELECTRIC MATERIAL FORMATION

SUBSTRATE PROCESSING METHOD

DEPOSITION OF HIGH COMPRESSIVE STRESS THERMALLY STABLE NITRIDE FILM

SEAM REMOVAL IN HIGH ASPECT RATIO GAP-FILL

METHOD FOR MANUFACTURING SILICON NITROGENOUS FILM ON SUBSTRATE HAVI...

DEPOSITION OF OXIDE THIN FILMS

SEQUENTIAL PLASMA AND THERMAL TREATMENT

METHOD FOR FORMING SILICON NITRIDE FILM SELECTIVELY ON SIDEWALLS OF...

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

Assemblies Having Conductive Structures Along Pillars of Semiconduc...

CONTACT OVER ACTIVE GATE STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT...

FILM-FORMING METHOD AND FILM-FORMING APPARATUS

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, METHOD...

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

Substrate Processing Method, Method of Manufacturing Semiconductor...

SELECTIVE PROCESSING WITH ETCH RESIDUE-BASED INHIBITORS

SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, MET...