the material being a silicon oxide

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H01L21/02164

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02164the material being a silicon oxide

Industries

Patents Grantslast 30 patents

Information Patent Grant
Deposition of silicon-based dielectric films
- Patent number 12,322,592
- Issue date Jun 3, 2025
- Applied Materials, Inc.
- Geetika Bajaj
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating Fin-type field-effect transistor device havin...
- Patent number 12,324,224
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Hung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical thin-film transistor and application as bit-line connector...
- Patent number 12,324,159
- Issue date Jun 3, 2025
- SUNRISE MEMORY CORPORATION
- Tianhong Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Helium-free silicon formation
- Patent number 12,315,724
- Issue date May 27, 2025
- Applied Materials, Inc.
- Zeqiong Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing a semiconductor device and a semiconductor...
- Patent number 12,315,864
- Issue date May 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Chi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of highly selective silicon oxide removal
- Patent number 12,315,736
- Issue date May 27, 2025
- Applied Materials, Inc.
- Lala Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming thermal oxide film on semiconductor substrate
- Patent number 12,308,225
- Issue date May 20, 2025
- Shin-Etsu Handotai Co., Ltd.
- Tsuyoshi Ohtsuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a semiconductor device
- Patent number 12,310,043
- Issue date May 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Chen Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin field-effect transistor device having contact plugs with re-ent...
- Patent number 12,310,051
- Issue date May 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Lien Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method for semiconductor silicon wafer
- Patent number 12,308,228
- Issue date May 20, 2025
- Globalwafers Japan Co., Ltd
- Takeshi Senda
- C30 - CRYSTAL GROWTH
Information Patent Grant
3D semiconductor device and array layout with isolated conductive p...
- Patent number 12,310,023
- Issue date May 20, 2025
- Macronix International Co., Ltd.
- Hang-Ting Lue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,308,241
- Issue date May 20, 2025
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Warpage-reducing semiconductor structure and fabricating method of...
- Patent number 12,300,633
- Issue date May 13, 2025
- United Microelectronics Corp.
- Da-Jun Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for analyzing defects in CVD films
- Patent number 12,300,554
- Issue date May 13, 2025
- Applied Materials, Inc.
- Mandar B. Pandit
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method for forming the same
- Patent number 12,302,631
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kun-Yu Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High resistivity silicon-on-insulator substrate comprising an isola...
- Patent number 12,300,535
- Issue date May 13, 2025
- GlobalWafers Co., Ltd.
- Igor Peidous
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with self-aligned vias
- Patent number 12,293,944
- Issue date May 6, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Han Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, elevator and method of manufacturin...
- Patent number 12,293,932
- Issue date May 6, 2025
- Kokusai Electric Corporation
- Yuji Takebayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nitride semiconductor device and manufacturing method thereof
- Patent number 12,289,914
- Issue date Apr 29, 2025
- United Microelectronics Corp.
- Chih Tung Yeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film deposition apparatus for fine pattern forming
- Patent number 12,288,671
- Issue date Apr 29, 2025
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective deposition method to form air gaps
- Patent number 12,283,520
- Issue date Apr 22, 2025
- ASM IP Holding B.V.
- Chiyu Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching composition and method for selectively removing silicon nit...
- Patent number 12,281,251
- Issue date Apr 22, 2025
- VERSUM MATERIALS US, LLC
- Jhih Kuei Ge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 12,283,476
- Issue date Apr 22, 2025
- Kokusai Electric Corporation
- Hiroshi Ashihara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 12,283,481
- Issue date Apr 22, 2025
- United Microelectronics Corp.
- Yu Cheng Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench-gated heterostructure and double-heterostructure active devices
- Patent number 12,284,817
- Issue date Apr 22, 2025
- MaxPower Semiconductor Inc.
- Jun Zeng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated assemblies and methods of forming integrated assemblies
- Patent number 12,279,431
- Issue date Apr 15, 2025
- Ramey M. Abdelrahaman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High bandwidth package structure
- Patent number 12,278,166
- Issue date Apr 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Harry-Haklay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 12,278,111
- Issue date Apr 15, 2025
- Ajou University Industry-Academic Cooperation Foundation
- Chang-Koo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of semiconductor structure
- Patent number 12,278,114
- Issue date Apr 15, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Qiang Wan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor memory device and semiconduc...
- Patent number 12,279,432
- Issue date Apr 15, 2025
- Kioxia Corporation
- Hirotaka Tsuda
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ORGANOAMINOSILANE PRECURSORS AND METHODS FOR DEPOSITING FILMS COMPR...
- Publication number 20250183029
- Publication date Jun 5, 2025
- VERSUM MATERIALS US, LLC
- Mark Leonard O'Neill
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ROBUST ONO FILMS AND METHODS OF MAKING THEREOF
- Publication number 20250185263
- Publication date Jun 5, 2025
- TEXAS INSTRUMENTS INCORPORATED
- Saiful Islam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CIRCUIT DIE WITH CHAMFERED PASSIVATION LAYER
- Publication number 20250183108
- Publication date Jun 5, 2025
- NXP USA, Inc.
- Darrell Glenn Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method For FinFET Fabrication And Structure Thereof
- Publication number 20250185346
- Publication date Jun 5, 2025
- Taiwan Semiconductor Manufacturing Co., LTD
- Han-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR ETCHING SILICON OXIDE
- Publication number 20250174464
- Publication date May 29, 2025
- Central Glass Company, Limited
- Shoi SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WORD LINE STRUCTURE OF THREE-DIMENSIONAL MEMORY DEVICE
- Publication number 20250176182
- Publication date May 29, 2025
- Yangtze Memory Technologies Co., Ltd.
- Qiang XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH QUALITY NITRIDE AND OXIDE FABRICATION AND SYSTEM
- Publication number 20250174455
- Publication date May 29, 2025
- TEXAS INSTRUMENTS INCORPORATED
- Saiful Islam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FILLING GAPS ON SUBSTRATE SURFACE USING PLASMA
- Publication number 20250171891
- Publication date May 29, 2025
- ASM IP HOLDING B.V.
- Sho Ichinose
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250174462
- Publication date May 29, 2025
- TOKYO ELECTRON LIMITED
- Takuya SEINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL FILM DEPOSITION
- Publication number 20250166989
- Publication date May 22, 2025
- LAM RESEARCH CORPORATION
- Jason Alexander Varnell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON NITRIDE FILMS HAVING REDUCED INTERFACIAL STRAIN
- Publication number 20250166988
- Publication date May 22, 2025
- Psiquantum, Corp.
- Yong Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING SEMICONDUCTOR DEVICES HAVING LINERS
- Publication number 20250159944
- Publication date May 15, 2025
- Micron Technology, Inc.
- Christopher J. Larsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING A POWER SEMICONDUCTOR COMPONENT HAVING CONTACT...
- Publication number 20250157931
- Publication date May 15, 2025
- SEMIKRON DANFOSS ELEKTRONIK GMBH & CO. KG
- Bernhard KÖNIG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROCESSING A SUBSTRATE
- Publication number 20250157819
- Publication date May 15, 2025
- ASM IP HOLDING B.V.
- SeungHyun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRONIC DEVICES COMPRISING A COMPRESSIVE DIELECTRIC MATERIAL
- Publication number 20250157935
- Publication date May 15, 2025
- Micron Technology, Inc.
- Jivaan Kishore Jhothiraman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20250157852
- Publication date May 15, 2025
- Samsung Electronics Co., Ltd.
- Hyunchul LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH PRESSURE INERT OXIDATION AND IN-SITU ANNEALING PROCESS TO IMPR...
- Publication number 20250154644
- Publication date May 15, 2025
- LAM RESEARCH CORPORATION
- Eli Jeon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Memory Arrays Comprising Vertically-Alternating Tiers Of Insulative...
- Publication number 20250151284
- Publication date May 8, 2025
- Micron Technology, Inc.
- Durai Vishak Nirmal Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING FEATURES USING A TARGETED DEPOSITION FOR SELECTI...
- Publication number 20250149330
- Publication date May 8, 2025
- LAM RESEARCH CORPORATION
- Wenchi LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING A FIELD EFFECT TRANSISTOR USING CARBON NANO...
- Publication number 20250151347
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Matthias PASSLACK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRONIC DEVICE
- Publication number 20250151409
- Publication date May 8, 2025
- InnoLux Corporation
- Kuan-feng LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20250142934
- Publication date May 1, 2025
- Mitsubishi Electric Corporation
- Asuka MATSUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device Having Dielectric Material Treated with Microw...
- Publication number 20250140553
- Publication date May 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Szu-Hua Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES
- Publication number 20250140568
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- SangHyuk YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Assemblies Having Conductive Structures Along Pillars of Semiconduc...
- Publication number 20250142875
- Publication date May 1, 2025
- Micron Technology, Inc.
- Sanh D. Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND FABRICATION METHOD THEREOF
- Publication number 20250132210
- Publication date Apr 24, 2025
- UNITED MICROELECTRONICS CORP.
- Yao-Hsien Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING METHOD AND FILM-FORMING SYSTEM
- Publication number 20250129479
- Publication date Apr 24, 2025
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HARDMASK INTEGRATION FOR HIGH ASPECT RATIO APPLICATIONS
- Publication number 20250132159
- Publication date Apr 24, 2025
- TOKYO ELECTRON LIMITED
- Joshua Baillargeon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EPITAXIAL SOURCE OR DRAIN STRUCTURES FOR ADVANCED INTEGRATED CIRCUI...
- Publication number 20250126869
- Publication date Apr 17, 2025
- Intel Corporation
- Subhash JOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR HAVING A FUNCTIONAL PROTECTION STRUCTURE AND METHOD O...
- Publication number 20250125267
- Publication date Apr 17, 2025
- The Charles Stark Draper Laboratory, Inc.
- Richard MORRISON
- H01 - BASIC ELECTRIC ELEMENTS

the material being a silicon oxide

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Deposition of silicon-based dielectric films

Method of fabricating Fin-type field-effect transistor device havin...

Vertical thin-film transistor and application as bit-line connector...

Helium-free silicon formation

Method of manufacturing a semiconductor device and a semiconductor...

Methods of highly selective silicon oxide removal

Method for forming thermal oxide film on semiconductor substrate

Method of fabricating a semiconductor device

Fin field-effect transistor device having contact plugs with re-ent...

Manufacturing method for semiconductor silicon wafer

3D semiconductor device and array layout with isolated conductive p...

Plasma processing method and plasma processing apparatus

Warpage-reducing semiconductor structure and fabricating method of...

Systems and methods for analyzing defects in CVD films

Semiconductor device and method for forming the same

High resistivity silicon-on-insulator substrate comprising an isola...

Semiconductor device with self-aligned vias

Substrate processing apparatus, elevator and method of manufacturin...

Nitride semiconductor device and manufacturing method thereof

Film deposition apparatus for fine pattern forming

Selective deposition method to form air gaps

Etching composition and method for selectively removing silicon nit...

Method of manufacturing semiconductor device, substrate processing...

Method for manufacturing semiconductor device

Trench-gated heterostructure and double-heterostructure active devices

Integrated assemblies and methods of forming integrated assemblies

High bandwidth package structure

Plasma etching method

Manufacturing method of semiconductor structure

Method for manufacturing semiconductor memory device and semiconduc...

Patents Applicationslast 30 patents

ORGANOAMINOSILANE PRECURSORS AND METHODS FOR DEPOSITING FILMS COMPR...

ROBUST ONO FILMS AND METHODS OF MAKING THEREOF

CIRCUIT DIE WITH CHAMFERED PASSIVATION LAYER

Method For FinFET Fabrication And Structure Thereof

METHOD AND DEVICE FOR ETCHING SILICON OXIDE

WORD LINE STRUCTURE OF THREE-DIMENSIONAL MEMORY DEVICE

HIGH QUALITY NITRIDE AND OXIDE FABRICATION AND SYSTEM

METHOD OF FILLING GAPS ON SUBSTRATE SURFACE USING PLASMA

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

THERMAL FILM DEPOSITION

SILICON NITRIDE FILMS HAVING REDUCED INTERFACIAL STRAIN

METHODS OF FORMING SEMICONDUCTOR DEVICES HAVING LINERS

METHOD FOR PRODUCING A POWER SEMICONDUCTOR COMPONENT HAVING CONTACT...

METHOD FOR PROCESSING A SUBSTRATE

ELECTRONIC DEVICES COMPRISING A COMPRESSIVE DIELECTRIC MATERIAL

SEMICONDUCTOR DEVICE

HIGH PRESSURE INERT OXIDATION AND IN-SITU ANNEALING PROCESS TO IMPR...

Memory Arrays Comprising Vertically-Alternating Tiers Of Insulative...

METHOD FOR ETCHING FEATURES USING A TARGETED DEPOSITION FOR SELECTI...

METHOD OF MANUFACTURING A FIELD EFFECT TRANSISTOR USING CARBON NANO...

ELECTRONIC DEVICE

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

Semiconductor Device Having Dielectric Material Treated with Microw...

METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES

Assemblies Having Conductive Structures Along Pillars of Semiconduc...

SEMICONDUCTOR STRUCTURE AND FABRICATION METHOD THEREOF

FILM-FORMING METHOD AND FILM-FORMING SYSTEM

HARDMASK INTEGRATION FOR HIGH ASPECT RATIO APPLICATIONS

EPITAXIAL SOURCE OR DRAIN STRUCTURES FOR ADVANCED INTEGRATED CIRCUI...

SEMICONDUCTOR HAVING A FUNCTIONAL PROTECTION STRUCTURE AND METHOD O...