the radio frequency energy being capacitively coupled to the plasma

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H01J37/32091

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

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H01J37/32091the radio frequency energy being capacitively coupled to the plasma

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Patents Grantslast 30 patents

Information Patent Grant
Pulsed voltage source for plasma processing applications
- Patent number 12,368,020
- Issue date Jul 22, 2025
- Applied Materials, Inc.
- A N M Wasekul Azad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,368,050
- Issue date Jul 22, 2025
- Tokyo Electron Limited
- Masahiko Yokoi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method for controlling source frequ...
- Patent number 12,362,144
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,362,143
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Satoru Kawakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,362,145
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Yuji Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for measuring pedestal voltage uniformity in p...
- Patent number 12,362,136
- Issue date Jul 15, 2025
- Stephen Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High aspect ratio etch with infinite selectivity
- Patent number 12,354,880
- Issue date Jul 8, 2025
- Lam Research Corporation
- Leonid Belau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ focus ring coating
- Patent number 12,354,842
- Issue date Jul 8, 2025
- Tokyo Electron Limited
- Minjoon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing device, substrate processing system, control m...
- Patent number 12,354,841
- Issue date Jul 8, 2025
- Tokyo Electron Limited
- Hiroshi Tsujimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,354,837
- Issue date Jul 8, 2025
- Tokyo Electron Limited
- Takahiro Yonezawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Susceptor assembly for plasma apparatus
- Patent number 12,347,644
- Issue date Jul 1, 2025
- ASM IP Holding B.V.
- Sam Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,347,645
- Issue date Jul 1, 2025
- Tokyo Electron Limited
- Shinya Morikita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,340,985
- Issue date Jun 24, 2025
- Tokyo Electron Limited
- Tetsuji Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency power return path
- Patent number 12,340,984
- Issue date Jun 24, 2025
- Applied Materials, Inc.
- Luke Bonecutter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integration processes utilizing boron-doped silicon materials
- Patent number 12,334,358
- Issue date Jun 17, 2025
- Applied Materials, Inc.
- Takehito Koshizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Filter device and plasma processing apparatus
- Patent number 12,334,309
- Issue date Jun 17, 2025
- Tokyo Electron Limited
- Naohiko Okunishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus, and method and program for controlling...
- Patent number 12,315,704
- Issue date May 27, 2025
- Tokyo Electron Limited
- Yusuke Saitoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mechanical suppression of parasitic plasma in substrate processing...
- Patent number 12,308,216
- Issue date May 20, 2025
- Lam Research Corporation
- Douglas Keil
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,308,208
- Issue date May 20, 2025
- Tokyo Electron Limited
- Shinya Morikita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing substrate having silicon nitride layer
- Patent number 12,308,243
- Issue date May 20, 2025
- Tes Co., Ltd.
- Bong-Soo Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF immune sensor probe for monitoring a temperature of an electrost...
- Patent number 12,308,265
- Issue date May 20, 2025
- Lam Research Corporation
- Siyuan Tian
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for low temperature selective epitaxy in a dee...
- Patent number 12,297,559
- Issue date May 13, 2025
- Applied Materials, Inc.
- Abhishek Dube
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,300,467
- Issue date May 13, 2025
- Tokyo Electron Limited
- Manabu Oie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency diverter assembly enabling on-demand different spatial
- Patent number 12,293,897
- Issue date May 6, 2025
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film deposition apparatus for fine pattern forming
- Patent number 12,288,671
- Issue date Apr 29, 2025
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and substrate transfer position adju...
- Patent number 12,288,678
- Issue date Apr 29, 2025
- Tokyo Electron Limited
- Joji Takayoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch selectivity control in atomic layer etching
- Patent number 12,280,091
- Issue date Apr 22, 2025
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma antenna and apparatus for generating plasma having the same
- Patent number 12,278,088
- Issue date Apr 15, 2025
- Semes Co., Ltd.
- Il Gyo Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process control enabled VDC sensor for plasma process
- Patent number 12,272,520
- Issue date Apr 8, 2025
- Tokyo Electron Limited
- Merritt Funk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 12,272,528
- Issue date Apr 8, 2025
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA SYSTEMS AND METHODS FOR USING SQUARE-SHAPED PULSE SIGNALS
- Publication number 20250239434
- Publication date Jul 24, 2025
- LAM RESEARCH CORPORATION
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA VIEWPORT
- Publication number 20250226191
- Publication date Jul 10, 2025
- LAM RESEARCH CORPORATION
- Bin Luo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING
- Publication number 20250226177
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Kazuhide HASEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PLASMA PROCESSING APPARATUS AND POWER SUPPLY SYSTEM
- Publication number 20250226181
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Mitsuhiro IWANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH SELECTIVITY CONTROL IN ATOMIC LAYER ETCHING
- Publication number 20250213650
- Publication date Jul 3, 2025
- LAM RESEARCH CORPORATION
- Andreas Fischer
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND MA...
- Publication number 20250218739
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Joon Hee LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250218725
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Hiroshi TSUJIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20250210308
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Takamitsu TAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPEDANCE MEASUREMENT METHOD OF SUBSTRATE PROCESSING APPARATUS
- Publication number 20250201515
- Publication date Jun 19, 2025
- SEMES CO., LTD.
- Sang Moon YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hybrid Plasma Source Array
- Publication number 20250201517
- Publication date Jun 19, 2025
- Beijing E-Town Semiconductor Technology Co., LTD
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD OF CONTROLLING SOURCE FREQUE...
- Publication number 20250201519
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Yuma YAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, PROCESSING MODULE, AND SEMICONDUCTOR M...
- Publication number 20250191892
- Publication date Jun 12, 2025
- SEMES CO., LTD.
- Soon Cheon CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Device for Performing Plasma Treatment, and Method for Performing P...
- Publication number 20250188610
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Jianming HAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND METHOD OF CLEANING INSIDE OF CHAMBER
- Publication number 20250191896
- Publication date Jun 12, 2025
- ASM IP HOLDING B.V.
- Ryo MIYAMA
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, MET...
- Publication number 20250191878
- Publication date Jun 12, 2025
- Kokusai Electric Corporation
- Takeshi YASUI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TEMPERATURE CONTROL SYSTEM AND PLASMA PROCESSING SYSTEM
- Publication number 20250191899
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Hayato SAKAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20250183005
- Publication date Jun 5, 2025
- Samsung Electronics Co., Ltd.
- Changho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250183086
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND POWER SUPPLY SYSTEM
- Publication number 20250174434
- Publication date May 29, 2025
- TOKYO ELECTRON LIMITED
- Kota SHIHOMMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSIENT CONTROL OF AN ASYMMETRIC WAVEFORM
- Publication number 20250174435
- Publication date May 29, 2025
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RATING SUBSTRATE SUPPORT ASSEMBLIES BASED ON IMPEDANCE CIRCUIT ELEC...
- Publication number 20250157788
- Publication date May 15, 2025
- Applied Materials, Inc.
- Arvind Shankar Raman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250149308
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Nozomu NAGASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250149291
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Hiroyuki MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250149292
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Hiroyuki Matsuura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250149307
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Nozomu NAGASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250149309
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Hiroki SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF PROCESSING SUBSTRATES AND APPARATUSES THEREOF
- Publication number 20250140536
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- Changheon LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Plasma Process
- Publication number 20250132128
- Publication date Apr 24, 2025
- TOKYO ELECTRON LIMITED
- Evrim Solmaz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FREQUENCY CONTROL OF SOURCE RADIO FREQUENCY POWER IN PLASMA PROCESSING
- Publication number 20250132129
- Publication date Apr 24, 2025
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD OF SUBSTRATE PROCESSING APPARATUS INCLUDING PARTIALL...
- Publication number 20250125130
- Publication date Apr 17, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

the radio frequency energy being capacitively coupled to the plasma

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Pulsed voltage source for plasma processing applications

Plasma processing method and plasma processing apparatus

Plasma processing apparatus and method for controlling source frequ...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Apparatus and method for measuring pedestal voltage uniformity in p...

High aspect ratio etch with infinite selectivity

In-situ focus ring coating

Substrate processing device, substrate processing system, control m...

Plasma processing method and plasma processing apparatus

Susceptor assembly for plasma apparatus

Substrate processing method and substrate processing apparatus

Plasma processing apparatus and plasma processing method

Radio frequency power return path

Integration processes utilizing boron-doped silicon materials

Filter device and plasma processing apparatus

Plasma processing apparatus, and method and program for controlling...

Mechanical suppression of parasitic plasma in substrate processing...

Substrate processing method and substrate processing apparatus

Method of processing substrate having silicon nitride layer

RF immune sensor probe for monitoring a temperature of an electrost...

Method and apparatus for low temperature selective epitaxy in a dee...

Plasma processing method and plasma processing apparatus

Radio frequency diverter assembly enabling on-demand different spatial

Film deposition apparatus for fine pattern forming

Substrate processing apparatus and substrate transfer position adju...

Etch selectivity control in atomic layer etching

Plasma antenna and apparatus for generating plasma having the same

Process control enabled VDC sensor for plasma process

Stage and plasma processing apparatus

Patents Applicationslast 30 patents

PLASMA SYSTEMS AND METHODS FOR USING SQUARE-SHAPED PULSE SIGNALS

PLASMA VIEWPORT

FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING

PLASMA PROCESSING APPARATUS AND POWER SUPPLY SYSTEM

ETCH SELECTIVITY CONTROL IN ATOMIC LAYER ETCHING

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND MA...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

IMPEDANCE MEASUREMENT METHOD OF SUBSTRATE PROCESSING APPARATUS

Hybrid Plasma Source Array

PLASMA PROCESSING APPARATUS AND METHOD OF CONTROLLING SOURCE FREQUE...

SUBSTRATE PROCESSING METHOD, PROCESSING MODULE, AND SEMICONDUCTOR M...

Device for Performing Plasma Treatment, and Method for Performing P...

SUBSTRATE TREATMENT APPARATUS AND METHOD OF CLEANING INSIDE OF CHAMBER

SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, MET...

TEMPERATURE CONTROL SYSTEM AND PLASMA PROCESSING SYSTEM

SUBSTRATE PROCESSING METHOD

ELECTROSTATIC CHUCK AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND POWER SUPPLY SYSTEM

TRANSIENT CONTROL OF AN ASYMMETRIC WAVEFORM

RATING SUBSTRATE SUPPORT ASSEMBLIES BASED ON IMPEDANCE CIRCUIT ELEC...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

METHODS OF PROCESSING SUBSTRATES AND APPARATUSES THEREOF

Method and System for Plasma Process

FREQUENCY CONTROL OF SOURCE RADIO FREQUENCY POWER IN PLASMA PROCESSING

CONTROL METHOD OF SUBSTRATE PROCESSING APPARATUS INCLUDING PARTIALL...