the radio frequency energy being capacitively coupled to the plasma

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CPC
H01J37/32091

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

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H01J37/32091the radio frequency energy being capacitively coupled to the plasma

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Patents Grantslast 30 patents

Information Patent Grant
Tuning voltage setpoint in a pulsed RF signal for a tunable edge sh...
- Patent number 12,183,544
- Issue date Dec 31, 2024
- Lam Research Corporation
- David Hopkins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 12,183,546
- Issue date Dec 31, 2024
- ASM IP Holding B.V.
- KiChul Um
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Arc management algorithm of RF generator and match box for CCP plas...
- Patent number 12,176,190
- Issue date Dec 24, 2024
- Applied Materials, Inc.
- Tiefeng Shi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Substrate support and substrate processing apparatus
- Patent number 12,165,854
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Nobutaka Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniformity control circuit for impedance match
- Patent number 12,165,844
- Issue date Dec 10, 2024
- Lam Research Corporation
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus to control a waveform
- Patent number 12,154,759
- Issue date Nov 26, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 12,154,790
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Seiichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support
- Patent number 12,148,636
- Issue date Nov 19, 2024
- Tokyo Electron Limited
- Masanori Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma uniformity control in pulsed DC plasma chamber
- Patent number 12,148,595
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Linying Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma source to generate pie-shaped treatment
- Patent number 12,142,458
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck with seal surface
- Patent number 12,142,509
- Issue date Nov 12, 2024
- Lam Research Corporation
- Patrick G. Breiling
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cost effective radio frequency impedance matching networks
- Patent number 12,136,537
- Issue date Nov 5, 2024
- Applied Materials, Inc.
- Yue Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating apparatus, plasma processing apparatus, and plasm...
- Patent number 12,131,889
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Takeshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for extracting process control information from...
- Patent number 12,131,886
- Issue date Oct 29, 2024
- Lam Research Corporation
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and method using radio frequency and micro...
- Patent number 12,131,887
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Yunho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas cluster assisted plasma processing
- Patent number 12,131,888
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus and substrate treating method
- Patent number 12,125,682
- Issue date Oct 22, 2024
- Semes Co., Ltd.
- Shant Arakelyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,125,685
- Issue date Oct 22, 2024
- Samsung Electronics Co., Ltd.
- Jun Soo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rotating biasable pedestal and electrostatic chuck in semiconductor...
- Patent number 12,112,972
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,112,921
- Issue date Oct 8, 2024
- Tokyo Electron Limited
- Hiroyuki Ikuta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method for dechucking wafer in the...
- Patent number 12,106,942
- Issue date Oct 1, 2024
- Samsung Electronics Co., Ltd.
- Yi Rop Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer edge ring lifting solution
- Patent number 12,094,752
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Michael R. Rice
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,094,687
- Issue date Sep 17, 2024
- HITACHI HIGH-TECH CORPORATION
- Masayuki Shiina
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,087,556
- Issue date Sep 10, 2024
- Kioxia Corporation
- Yosuke Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor
- Patent number 12,087,548
- Issue date Sep 10, 2024
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Leyi Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, temperature control method, and temper...
- Patent number 12,087,559
- Issue date Sep 10, 2024
- Tokyo Electron Limited
- Shinsuke Oka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-stage pumping liner
- Patent number 12,068,144
- Issue date Aug 20, 2024
- Applied Materials, Inc.
- Mingle Tong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 12,068,139
- Issue date Aug 20, 2024
- Tokyo Electron Limited
- Shin Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 12,062,522
- Issue date Aug 13, 2024
- Tokyo Electron Limited
- Keiji Kitagaito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for prefixing of substrates
- Patent number 12,062,521
- Issue date Aug 13, 2024
- EV Group E. Thallner GmbH
- Friedrich Paul Lindner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
WAFER EDGE RING LIFTING SOLUTION
- Publication number 20240429088
- Publication date Dec 26, 2024
- Applied Materials, Inc.
- Michael R. RICE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME EDGE FEATURE PROFILE TILT CONTROL BY ALTERING INPUT VOLTAGE...
- Publication number 20240420929
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Rajesh Dorai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
- Publication number 20240412951
- Publication date Dec 12, 2024
- SEMES CO., LTD.
- DONG-HUN KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20240404860
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Fu Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240395510
- Publication date Nov 28, 2024
- TOKYO ELECTRON LIMITED
- Norihiko AMIKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, POWER SOURCE SYSTEM, AND PLASMA PROCES...
- Publication number 20240387143
- Publication date Nov 21, 2024
- TOKYO ELECTRON LIMITED
- Pengkai HONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ION-ASSISTED SELF-LIMITED CONFORMAL ETCH
- Publication number 20240379372
- Publication date Nov 14, 2024
- TOKYO ELECTRON LIMITED
- Adam Pranda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED VOLTAGE SOURCE FOR PLASMA PROCESSING APPLICATIONS
- Publication number 20240379328
- Publication date Nov 14, 2024
- Timothy M. Ziemba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUS RING AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME
- Publication number 20240371610
- Publication date Nov 7, 2024
- Samsung Electronics Co., Ltd.
- Hyungsik KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240371609
- Publication date Nov 7, 2024
- TOKYO ELECTRON LIMITED
- Shin MATSUURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Balanced RF Resonant Antenna System
- Publication number 20240363310
- Publication date Oct 31, 2024
- TOKYO ELECTRON LIMITED
- Qiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PREFIXING OF SUBSTRATES
- Publication number 20240355582
- Publication date Oct 24, 2024
- EV GROUP E. THALLNER GMBH
- Friedrich Paul Lindner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COATING COMPONENTS FOR SEMICONDUCTOR PROCESSING WITH FLUORINE-CONTA...
- Publication number 20240347336
- Publication date Oct 17, 2024
- Applied Materials, Inc.
- Nitin Deepak
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING SYSTEMS WITH MATCHING NETWORK AND METHODS
- Publication number 20240339297
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Qiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CCP GAS DELIVERY NOZZLE
- Publication number 20240339301
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Yogananda Sarode Vishwanath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Methods for Plasma Processing
- Publication number 20240331979
- Publication date Oct 3, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYNCHRONIZATION OF RF GENERATORS
- Publication number 20240331976
- Publication date Oct 3, 2024
- LAM RESEARCH CORPORATION
- Ying Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL DIELECTRIC PLANAR WAVEGUIDE PROCESS
- Publication number 20240329310
- Publication date Oct 3, 2024
- POET Technologies, Inc.
- William Ring
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS FOR PROCESSING ONE OR MORE SEMICONDUCTOR DEVICES, AND RELAT...
- Publication number 20240321603
- Publication date Sep 26, 2024
- Micron Technology, Inc.
- Michael E. Koltonski
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
EFFICIENT ENERGY RECOVERY IN A NANOSECOND PULSER CIRCUIT
- Publication number 20240304417
- Publication date Sep 12, 2024
- Eagle Harbor Technologies, Inc.
- James Prager
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Novel arc management algorithm of RF generator and match box for CC...
- Publication number 20240304429
- Publication date Sep 12, 2024
- Tiefeng SHI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20240298555
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Sheng-Siang Ruan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING SYSTEM AND PLASMA PROCESSING APPARATUS
- Publication number 20240297025
- Publication date Sep 5, 2024
- TOKYO ELECTRON LIMITED
- Kota SENO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240290577
- Publication date Aug 29, 2024
- TOKYO ELECTRON LIMITED
- Shinya ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO FREQUENCY DIVERTER ASSEMBLY ENABLING ON-DEMAND DIFFERENT SPAT...
- Publication number 20240290578
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Kartik RAMASWAMY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULE FOR MEASURING CURRENT/VOLTAGE/POWER OF PLASMA APPARATUS AND...
- Publication number 20240266156
- Publication date Aug 8, 2024
- KOREA INSTITUTE OF FUSION ENERGY
- Jongsik KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOW METROLOGY CALIBRATION FOR IMPROVED PROCESSING CHAMBER MATCHING...
- Publication number 20240255341
- Publication date Aug 1, 2024
- LAM RESEARCH CORPORATION
- Evangelos T. SPYROPOULOS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITIVELY COUPLED PLASMA SUBSTRATE PROCESSING APPARATUS
- Publication number 20240258079
- Publication date Aug 1, 2024
- INNOVATION FOR CREATIVE DEVICES CO., LTD.
- Buil JEON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HOLDING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240258082
- Publication date Aug 1, 2024
- TOKYO ELECTRON LIMITED
- Shinsuke OKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240249922
- Publication date Jul 25, 2024
- TOKYO ELECTRON LIMITED
- Ryota SAKANE
- H01 - BASIC ELECTRIC ELEMENTS

the radio frequency energy being capacitively coupled to the plasma

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Tuning voltage setpoint in a pulsed RF signal for a tunable edge sh...

Substrate processing apparatus

Arc management algorithm of RF generator and match box for CCP plas...

Substrate support and substrate processing apparatus

Uniformity control circuit for impedance match

Apparatus to control a waveform

Etching method and plasma processing apparatus

Substrate support

Plasma uniformity control in pulsed DC plasma chamber

Symmetric plasma source to generate pie-shaped treatment

Electrostatic chuck with seal surface

Cost effective radio frequency impedance matching networks

Plasma generating apparatus, plasma processing apparatus, and plasm...

Systems and methods for extracting process control information from...

Plasma processing system and method using radio frequency and micro...

Gas cluster assisted plasma processing

Substrate treating apparatus and substrate treating method

Plasma processing apparatus

Rotating biasable pedestal and electrostatic chuck in semiconductor...

Plasma processing method and plasma processing apparatus

Plasma processing apparatus and method for dechucking wafer in the...

Wafer edge ring lifting solution

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma reactor

Plasma processing apparatus, temperature control method, and temper...

Multi-stage pumping liner

Plasma processing apparatus

Plasma etching method and plasma etching apparatus

Method for prefixing of substrates

Patents Applicationslast 30 patents

WAFER EDGE RING LIFTING SOLUTION

EXTREME EDGE FEATURE PROFILE TILT CONTROL BY ALTERING INPUT VOLTAGE...

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE

PLASMA PROCESSING APPARATUS AND METHOD

SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS, POWER SOURCE SYSTEM, AND PLASMA PROCES...

METHOD FOR ION-ASSISTED SELF-LIMITED CONFORMAL ETCH

PULSED VOLTAGE SOURCE FOR PLASMA PROCESSING APPLICATIONS

FOCUS RING AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME

PLASMA PROCESSING APPARATUS

Balanced RF Resonant Antenna System

METHOD FOR PREFIXING OF SUBSTRATES

COATING COMPONENTS FOR SEMICONDUCTOR PROCESSING WITH FLUORINE-CONTA...

PLASMA PROCESSING SYSTEMS WITH MATCHING NETWORK AND METHODS

CCP GAS DELIVERY NOZZLE

Apparatus and Methods for Plasma Processing

SYNCHRONIZATION OF RF GENERATORS

OPTICAL DIELECTRIC PLANAR WAVEGUIDE PROCESS

SYSTEMS FOR PROCESSING ONE OR MORE SEMICONDUCTOR DEVICES, AND RELAT...

EFFICIENT ENERGY RECOVERY IN A NANOSECOND PULSER CIRCUIT

Novel arc management algorithm of RF generator and match box for CC...

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

PLASMA PROCESSING SYSTEM AND PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

RADIO FREQUENCY DIVERTER ASSEMBLY ENABLING ON-DEMAND DIFFERENT SPAT...

MODULE FOR MEASURING CURRENT/VOLTAGE/POWER OF PLASMA APPARATUS AND...

FLOW METROLOGY CALIBRATION FOR IMPROVED PROCESSING CHAMBER MATCHING...

CAPACITIVELY COUPLED PLASMA SUBSTRATE PROCESSING APPARATUS

SUBSTRATE HOLDING METHOD AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS