the radio frequency energy being capacitively coupled to the plasma

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CPC
H01J37/32091

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

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H01J37/32091the radio frequency energy being capacitively coupled to the plasma

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Patents Grantslast 30 patents

Information Patent Grant
Etch selectivity control in atomic layer etching
- Patent number 12,280,091
- Issue date Apr 22, 2025
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma antenna and apparatus for generating plasma having the same
- Patent number 12,278,088
- Issue date Apr 15, 2025
- Semes Co., Ltd.
- Il Gyo Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process control enabled VDC sensor for plasma process
- Patent number 12,272,520
- Issue date Apr 8, 2025
- Tokyo Electron Limited
- Merritt Funk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 12,272,528
- Issue date Apr 8, 2025
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma viewport
- Patent number 12,272,534
- Issue date Apr 8, 2025
- Lam Researh Corporation
- Bin Luo
- G02 - OPTICS
Information Patent Grant
Hybrid plasma source array
- Patent number 12,266,503
- Issue date Apr 1, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing apparatus and dielectric window cleaning m...
- Patent number 12,257,608
- Issue date Mar 25, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Chunming Liu
- B08 - CLEANING
Information Patent Grant
Plasma treatment apparatus, lower electrode assembly and forming me...
- Patent number 12,261,012
- Issue date Mar 25, 2025
- ADVANCED MICRO-FABRICATION EQUIPMENT INC.
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus to control ion energy
- Patent number 12,255,048
- Issue date Mar 18, 2025
- Advanced Energy Industries, Inc.
- Victor Brouk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-shape voltage pulse trains for uniformity and etch profile tu...
- Patent number 12,255,051
- Issue date Mar 18, 2025
- Applied Materials, Inc.
- Linying Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for controlling radio frequency electrode imp...
- Patent number 12,249,484
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Jian Janson Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature RF connection with integral thermal choke
- Patent number 12,243,725
- Issue date Mar 4, 2025
- Lam Research Corporation
- Timothy S. Thomas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate holding method and substrate processing apparatus
- Patent number 12,243,728
- Issue date Mar 4, 2025
- Tokyo Electron Limited
- Shinsuke Oka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Batch type substrate processing apparatus
- Patent number 12,243,724
- Issue date Mar 4, 2025
- Eugene Technology Co., Ltd.
- Sung Ho Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flow metrology calibration for improved processing chamber matching...
- Patent number 12,241,772
- Issue date Mar 4, 2025
- Lam Research Corporation
- Evangelos T. Spyropoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic shielding for plasma sources
- Patent number 12,237,155
- Issue date Feb 25, 2025
- Lam Research Corporation
- Hema Swaroop Mopidevi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanosecond pulser ADC system
- Patent number 12,230,477
- Issue date Feb 18, 2025
- Eagle Harbor Technologies, Inc.
- Kenneth Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 12,230,474
- Issue date Feb 18, 2025
- Kokusai Electric Corporation
- Takeshi Yasui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon dry etching method
- Patent number 12,217,969
- Issue date Feb 4, 2025
- ULVAC, Inc.
- Kenta Doi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rating substrate support assemblies based on impedance circuit elec...
- Patent number 12,205,791
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Arvind Shankar Raman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma processing device
- Patent number 12,205,795
- Issue date Jan 21, 2025
- Ulvac, Inc.
- Taichi Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support and plasma processing apparatus
- Patent number 12,198,906
- Issue date Jan 14, 2025
- Tokyo Electron Limited
- Hajime Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tuning voltage setpoint in a pulsed RF signal for a tunable edge sh...
- Patent number 12,183,544
- Issue date Dec 31, 2024
- Lam Research Corporation
- David Hopkins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 12,183,546
- Issue date Dec 31, 2024
- ASM IP Holding B.V.
- KiChul Um
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Arc management algorithm of RF generator and match box for CCP plas...
- Patent number 12,176,190
- Issue date Dec 24, 2024
- Applied Materials, Inc.
- Tiefeng Shi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Substrate support and substrate processing apparatus
- Patent number 12,165,854
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Nobutaka Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniformity control circuit for impedance match
- Patent number 12,165,844
- Issue date Dec 10, 2024
- Lam Research Corporation
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus to control a waveform
- Patent number 12,154,759
- Issue date Nov 26, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 12,154,790
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Seiichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support
- Patent number 12,148,636
- Issue date Nov 19, 2024
- Tokyo Electron Limited
- Masanori Takahashi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method and System for Plasma Process
- Publication number 20250132128
- Publication date Apr 24, 2025
- TOKYO ELECTRON LIMITED
- Evrim Solmaz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FREQUENCY CONTROL OF SOURCE RADIO FREQUENCY POWER IN PLASMA PROCESSING
- Publication number 20250132129
- Publication date Apr 24, 2025
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD OF SUBSTRATE PROCESSING APPARATUS INCLUDING PARTIALL...
- Publication number 20250125130
- Publication date Apr 17, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Novel arc management algorithm of RF generator and Match box for CC...
- Publication number 20250118543
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Tiefeng SHI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND CL...
- Publication number 20250112031
- Publication date Apr 3, 2025
- TOKYO ELECTRON LIMITED
- Takashi ARAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE TREATMENT ENABLING SUPER-CONFORMAL METAL CAP PROFILE ON MID...
- Publication number 20250112091
- Publication date Apr 3, 2025
- Applied Materials, Inc.
- Jianqiu GUO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR SEMICONDUCTOR PROCESSING
- Publication number 20250105002
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Hunter Frost
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MONITORING AND CONTROL OF PLASMA-BASED PROCESSES
- Publication number 20250104982
- Publication date Mar 27, 2025
- LAM RESEARCH CORPORATION
- Gordon Alex MacDonald
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250096006
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Rin SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNING VOLTAGE SETPOINT IN A PULSED RF SIGNAL FOR A TUNABLE EDGE SH...
- Publication number 20250087458
- Publication date Mar 13, 2025
- LAM RESEARCH CORPORATION
- David Hopkins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE PATTERNED SURFACE UNIFORMITY USING DIRECT CURRENT BIAS
- Publication number 20250087459
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Pingshan Luan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE
- Publication number 20250087462
- Publication date Mar 13, 2025
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STAGE PUMPING LINER
- Publication number 20250087471
- Publication date Mar 13, 2025
- Applied Materials, Inc.
- Mingle Tong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INVERTED PLASMA SOURCE, AND METHOD
- Publication number 20250087457
- Publication date Mar 13, 2025
- MKS Instruments, Inc.
- Gordon HILL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250087460
- Publication date Mar 13, 2025
- ASM IP HOLDING B.V.
- KiChul Um
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH SELECTIVITY AND UNIFORM DIELECTRIC ETCH
- Publication number 20250087456
- Publication date Mar 13, 2025
- LAM RESEARCH CORPORATION
- Sriharsha Jayanti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINER STRUCTURE
- Publication number 20250079129
- Publication date Mar 6, 2025
- Samsung Electronics Co., Ltd.
- Junho LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250079133
- Publication date Mar 6, 2025
- PSK INC.
- Kwang Sung YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250069862
- Publication date Feb 27, 2025
- TOKYO ELECTRON LIMITED
- Nobutaka SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK WITH SEAL SURFACE
- Publication number 20250062150
- Publication date Feb 20, 2025
- LAM RESEARCH CORPORATION
- Patrick Girard Breiling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORMITY CONTROL CIRCUIT FOR IMPEDANCE MATCH
- Publication number 20250062102
- Publication date Feb 20, 2025
- LAM RESEARCH CORPORATION
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU PARTICLE DETECTION
- Publication number 20250060298
- Publication date Feb 20, 2025
- Applied Materials, Inc.
- Wei Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and Methods for Extracting Process Control Information from...
- Publication number 20250054730
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT
- Publication number 20250022724
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Masanori TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS CLUSTER ASSISTED PLASMA PROCESSING
- Publication number 20250022689
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATER PLATES WITH DISTRIBUTED PURGE CHANNELS, RF MESHES AND GROUND...
- Publication number 20250022694
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Pranav Vijay Gadre
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Rotating Biasable Pedestal and Electrostatic Chuck in Semiconductor...
- Publication number 20250022745
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Qiwei LIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ANTENNA UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME
- Publication number 20250008636
- Publication date Jan 2, 2025
- SEMES CO., LTD.
- Dae Hyun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE CAPACITIVELY COUPLED PLASMA CHAMBER STRUCTURE
- Publication number 20250006470
- Publication date Jan 2, 2025
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NITRIDE FILM FORMING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250006471
- Publication date Jan 2, 2025
- Tokyo Electron Limited
- Takamichi KIKUCHI
- H01 - BASIC ELECTRIC ELEMENTS

the radio frequency energy being capacitively coupled to the plasma

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Etch selectivity control in atomic layer etching

Plasma antenna and apparatus for generating plasma having the same

Process control enabled VDC sensor for plasma process

Stage and plasma processing apparatus

Plasma viewport

Hybrid plasma source array

Semiconductor processing apparatus and dielectric window cleaning m...

Plasma treatment apparatus, lower electrode assembly and forming me...

Apparatus to control ion energy

Multi-shape voltage pulse trains for uniformity and etch profile tu...

Methods and apparatus for controlling radio frequency electrode imp...

High temperature RF connection with integral thermal choke

Substrate holding method and substrate processing apparatus

Batch type substrate processing apparatus

Flow metrology calibration for improved processing chamber matching...

Magnetic shielding for plasma sources

Nanosecond pulser ADC system

Substrate processing apparatus, method of manufacturing semiconduct...

Silicon dry etching method

Rating substrate support assemblies based on impedance circuit elec...

Plasma processing device

Substrate support and plasma processing apparatus

Tuning voltage setpoint in a pulsed RF signal for a tunable edge sh...

Substrate processing apparatus

Arc management algorithm of RF generator and match box for CCP plas...

Substrate support and substrate processing apparatus

Uniformity control circuit for impedance match

Apparatus to control a waveform

Etching method and plasma processing apparatus

Substrate support

Patents Applicationslast 30 patents

Method and System for Plasma Process

FREQUENCY CONTROL OF SOURCE RADIO FREQUENCY POWER IN PLASMA PROCESSING

CONTROL METHOD OF SUBSTRATE PROCESSING APPARATUS INCLUDING PARTIALL...

Novel arc management algorithm of RF generator and Match box for CC...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND CL...

SURFACE TREATMENT ENABLING SUPER-CONFORMAL METAL CAP PROFILE ON MID...

METHOD FOR SEMICONDUCTOR PROCESSING

MONITORING AND CONTROL OF PLASMA-BASED PROCESSES

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

TUNING VOLTAGE SETPOINT IN A PULSED RF SIGNAL FOR A TUNABLE EDGE SH...

TUNABLE PATTERNED SURFACE UNIFORMITY USING DIRECT CURRENT BIAS

RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE

MULTI-STAGE PUMPING LINER

INVERTED PLASMA SOURCE, AND METHOD

SUBSTRATE PROCESSING APPARATUS

HIGH SELECTIVITY AND UNIFORM DIELECTRIC ETCH

LINER STRUCTURE

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUS

ELECTROSTATIC CHUCK WITH SEAL SURFACE

UNIFORMITY CONTROL CIRCUIT FOR IMPEDANCE MATCH

IN-SITU PARTICLE DETECTION

Systems and Methods for Extracting Process Control Information from...

SUBSTRATE SUPPORT

GAS CLUSTER ASSISTED PLASMA PROCESSING

HEATER PLATES WITH DISTRIBUTED PURGE CHANNELS, RF MESHES AND GROUND...

Rotating Biasable Pedestal and Electrostatic Chuck in Semiconductor...

ANTENNA UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME

EDGE CAPACITIVELY COUPLED PLASMA CHAMBER STRUCTURE

NITRIDE FILM FORMING METHOD AND PLASMA PROCESSING APPARATUS