the radio frequency energy being capacitively coupled to the plasma

Industry

CPC
H01J37/32091

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32091the radio frequency energy being capacitively coupled to the plasma

Industries

Patents Grantslast 30 patents

Information Patent Grant
Methods of forming metal nitride films
- Patent number 11,978,625
- Issue date May 7, 2024
- Applied Materials, Inc.
- Joseph AuBuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed voltage source for plasma processing applications
- Patent number 11,972,924
- Issue date Apr 30, 2024
- Applied Materials, Inc.
- A N M Wasekul Azad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with ceramic monolithic body
- Patent number 11,967,517
- Issue date Apr 23, 2024
- Lam Research Corporation
- Feng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,961,718
- Issue date Apr 16, 2024
- Tokyo Electron Limited
- Shojiro Yahata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flow metrology calibration for improved processing chamber matching...
- Patent number 11,959,793
- Issue date Apr 16, 2024
- Lam Research Corporation
- Evangelos T. Spyropoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for handling an implant
- Patent number 11,955,321
- Issue date Apr 9, 2024
- NOVA PLASMA LTD.
- Amnon Lam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching and apparatus for plasma processing
- Patent number 11,955,342
- Issue date Apr 9, 2024
- Tokyo Electron Limited
- Masanori Hosoya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric VHF source for a plasma reactor
- Patent number 11,935,724
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low impedance current path for edge non-uniformity tuning
- Patent number 11,929,278
- Issue date Mar 12, 2024
- Applied Materials, Inc.
- Madhu Santosh Kumar Mutyala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Paired dynamic parallel plate capacitively coupled plasmas
- Patent number 11,923,172
- Issue date Mar 5, 2024
- Applied Materials, Inc.
- Hari Ponnekanti
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Two piece electrode assembly with gap for plasma control
- Patent number 11,915,911
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Tien Fak Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning of sin with CCP plasma or RPS clean
- Patent number 11,915,918
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Jothilingam Ramalingam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Measurement method and measurement system
- Patent number 11,906,466
- Issue date Feb 20, 2024
- Tokyo Electron Limited
- Takayuki Hatanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and measurement method
- Patent number 11,908,665
- Issue date Feb 20, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 11,908,666
- Issue date Feb 20, 2024
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for tuning plasma distribution using phase control
- Patent number 11,908,662
- Issue date Feb 20, 2024
- Applied Materials, Inc.
- Xiaopu Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,908,664
- Issue date Feb 20, 2024
- Tokyo Electron Limited
- Naohiko Okunishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,898,236
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Zhiyong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck, support platform, and plasma processing apparatus
- Patent number 11,894,218
- Issue date Feb 6, 2024
- Tokyo Electron Limited
- Masato Takayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge ring, plasma processing apparatus, and manufacturing method of...
- Patent number 11,887,821
- Issue date Jan 30, 2024
- Tokyo Electron Limited
- Masato Kon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing chambers for deposition and etch
- Patent number 11,887,811
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Khokan Chandra Paul
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck device
- Patent number 11,887,877
- Issue date Jan 30, 2024
- Sumitomo Osaka Cement Co., Ltd.
- Mamoru Kosakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and method using radio frequency (RF) and...
- Patent number 11,887,815
- Issue date Jan 30, 2024
- Tokyo Electron Limited
- Yunho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film deposition apparatus for fine pattern forming
- Patent number 11,881,379
- Issue date Jan 23, 2024
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Capacitance measurement without disconnecting from high power circuit
- Patent number 11,881,381
- Issue date Jan 23, 2024
- Lam Research Corporation
- Sunil Kapoor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Efficient energy recovery in a nanosecond pulser circuit
- Patent number 11,875,971
- Issue date Jan 16, 2024
- Eagle Harbor Technologies, Inc.
- James Prager
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency electrode assembly for plasma processing apparatus,...
- Patent number 11,875,970
- Issue date Jan 16, 2024
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Longbao Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mechanical suppression of parasitic plasma in substrate processing...
- Patent number 11,862,435
- Issue date Jan 2, 2024
- Lam Research Corporation
- Douglas Keil
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical vapor deposition apparatus and method of manufacturing dis...
- Patent number 11,842,883
- Issue date Dec 12, 2023
- Samsung Display Co., Ltd.
- Jong-hoon Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nanosecond pulser ADC system
- Patent number 11,810,761
- Issue date Nov 7, 2023
- Eagle Harbor Technologies, Inc.
- Ilia Slobodov
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MULTI-SHAPE VOLTAGE PULSE TRAINS FOR UNIFORMITY AND ETCH PROFILE TU...
- Publication number 20240153741
- Publication date May 9, 2024
- Applied Materials, Inc.
- Linying CUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE AND PLASMA PROCESSING APPARATUS
- Publication number 20240153749
- Publication date May 9, 2024
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED VOLTAGE PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20240145215
- Publication date May 2, 2024
- Applied Materials, Inc.
- Shreeram Jyoti DASH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOSECOND PULSER ADC SYSTEM
- Publication number 20240136152
- Publication date Apr 25, 2024
- Eagle Harbor Technologies, Inc.
- Kenneth Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COST EFFECTIVE RADIO FREQUENCY IMPEDANCE MATCHING NETWORKS
- Publication number 20240120178
- Publication date Apr 11, 2024
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-Situ Adsorbate Formation for Dielectric Etch
- Publication number 20240112888
- Publication date Apr 4, 2024
- TOKYO ELECTRON LIMITED
- Du Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING SYSTEM
- Publication number 20240112922
- Publication date Apr 4, 2024
- TOKYO ELECTRON LIMITED
- Ryo MATSUBARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WIRELESS DATA COMMUNICATION IN PLASMA PROCESS CHAMBER THROUGH VI SE...
- Publication number 20240112885
- Publication date Apr 4, 2024
- Applied Materials, Inc.
- Chuang-Chia Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240112891
- Publication date Apr 4, 2024
- TOKYO ELECTRON LIMITED
- Masaru ISAGO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROFILE TWISTING CONTROL IN DIELECTRIC ETCH
- Publication number 20240105432
- Publication date Mar 28, 2024
- LAM RESEARCH CORPORATION
- Neil Macaraeg Mackie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITANCE MEASUREMENT WITHOUT DISCONNECTING FROM HIGH POWER CIRCUIT
- Publication number 20240096598
- Publication date Mar 21, 2024
- LAM RESEARCH CORPORATION
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...
- Publication number 20240096637
- Publication date Mar 21, 2024
- Samsung Electronics Co., Ltd.
- Hyungsik KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING
- Publication number 20240096595
- Publication date Mar 21, 2024
- TOKYO ELECTRON LIMITED
- Kazuhide HASEBE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, PLASMA GENERATION APPARATUS, METHOD...
- Publication number 20240096604
- Publication date Mar 21, 2024
- Kokusai Electric Corporation
- Yukinori ABURATANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND RF SYSTEM
- Publication number 20240087846
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Toshiharu WADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240079215
- Publication date Mar 7, 2024
- TOKYO ELECTRON LIMITED
- Tetsuma YAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240079208
- Publication date Mar 7, 2024
- TOKYO ELECTRON LIMITED
- Takeshi KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR DETECTING END POINT
- Publication number 20240063002
- Publication date Feb 22, 2024
- TOKYO ELECTRON LIMITED
- Masakazu HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, PLASMA GENERATING APPARATUS, AND ME...
- Publication number 20240055237
- Publication date Feb 15, 2024
- Kokusai Electric Corporation
- Tsuyoshi TAKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING TREATED SILICON-CARBON MATERIAL
- Publication number 20240047198
- Publication date Feb 8, 2024
- ASM IP HOLDING B.V.
- Hirotsugu Sugiura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240044006
- Publication date Feb 8, 2024
- TOKYO ELECTRON LIMITED
- Hiroki ARAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUNGSTEN GAP FILL WITH HYDROGEN PLASMA TREATMENT
- Publication number 20240047267
- Publication date Feb 8, 2024
- Tsung-Han YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM DEPOSITION APPARATUS
- Publication number 20240038498
- Publication date Feb 1, 2024
- TOKYO ELECTRON LIMITED
- Taehoon PARK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF PROCESSING SUBSTRATES AND APPARATUSES THEREOF
- Publication number 20240038510
- Publication date Feb 1, 2024
- Samsung Electronics Co., Ltd.
- Changheon LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240030003
- Publication date Jan 25, 2024
- TOKYO ELECTRON LIMITED
- Torai IWASA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TRANSFER SYSTEM AND TRANSFER MODULE
- Publication number 20240030011
- Publication date Jan 25, 2024
- TOKYO ELECTRON LIMITED
- Toshiaki TOYOMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN OXIDE THIN FILM SPACERS IN SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20240030031
- Publication date Jan 25, 2024
- LAM RESEARCH CORPORATION
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR CONTROLLING PLASMA IN A PLASMA PROCESSING...
- Publication number 20240021408
- Publication date Jan 18, 2024
- LAM RESEARCH CORPORATION
- John C. Valcore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
C-shroud Modification For Plasma Uniformity Without Impacting Mecha...
- Publication number 20240014015
- Publication date Jan 11, 2024
- LAM RESEARCH CORPORATION
- Pratik Mankidy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240014005
- Publication date Jan 11, 2024
- TOKYO ELECTRON LIMITED
- Hiroyuki MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS

the radio frequency energy being capacitively coupled to the plasma

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods of forming metal nitride films

Pulsed voltage source for plasma processing applications

Electrostatic chuck with ceramic monolithic body

Plasma processing method and plasma processing apparatus

Flow metrology calibration for improved processing chamber matching...

Method for handling an implant

Method of etching and apparatus for plasma processing

Symmetric VHF source for a plasma reactor

Low impedance current path for edge non-uniformity tuning

Paired dynamic parallel plate capacitively coupled plasmas

Two piece electrode assembly with gap for plasma control

Cleaning of sin with CCP plasma or RPS clean

Measurement method and measurement system

Plasma processing apparatus and measurement method

Stage and plasma processing apparatus

Device and method for tuning plasma distribution using phase control

Plasma processing apparatus

Methods and apparatus for processing a substrate

Electrostatic chuck, support platform, and plasma processing apparatus

Edge ring, plasma processing apparatus, and manufacturing method of...

Semiconductor processing chambers for deposition and etch

Electrostatic chuck device

Plasma processing system and method using radio frequency (RF) and...

Film deposition apparatus for fine pattern forming

Capacitance measurement without disconnecting from high power circuit

Efficient energy recovery in a nanosecond pulser circuit

Radio frequency electrode assembly for plasma processing apparatus,...

Mechanical suppression of parasitic plasma in substrate processing...

Chemical vapor deposition apparatus and method of manufacturing dis...

Nanosecond pulser ADC system

Patents Applicationslast 30 patents

MULTI-SHAPE VOLTAGE PULSE TRAINS FOR UNIFORMITY AND ETCH PROFILE TU...

STAGE AND PLASMA PROCESSING APPARATUS

PULSED VOLTAGE PLASMA PROCESSING APPARATUS AND METHOD

NANOSECOND PULSER ADC SYSTEM

COST EFFECTIVE RADIO FREQUENCY IMPEDANCE MATCHING NETWORKS

In-Situ Adsorbate Formation for Dielectric Etch

ETCHING METHOD AND PLASMA PROCESSING SYSTEM

WIRELESS DATA COMMUNICATION IN PLASMA PROCESS CHAMBER THROUGH VI SE...

PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS

PROFILE TWISTING CONTROL IN DIELECTRIC ETCH

CAPACITANCE MEASUREMENT WITHOUT DISCONNECTING FROM HIGH POWER CIRCUIT

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...

FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING

SUBSTRATE PROCESSING APPARATUS, PLASMA GENERATION APPARATUS, METHOD...

PLASMA PROCESSING APPARATUS AND RF SYSTEM

SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND METHOD FOR DETECTING END POINT

SUBSTRATE PROCESSING APPARATUS, PLASMA GENERATING APPARATUS, AND ME...

METHOD OF FORMING TREATED SILICON-CARBON MATERIAL

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

TUNGSTEN GAP FILL WITH HYDROGEN PLASMA TREATMENT

FILM DEPOSITION APPARATUS

METHODS OF PROCESSING SUBSTRATES AND APPARATUSES THEREOF

PLASMA PROCESSING APPARATUS

SUBSTRATE TRANSFER SYSTEM AND TRANSFER MODULE

TIN OXIDE THIN FILM SPACERS IN SEMICONDUCTOR DEVICE MANUFACTURING

METHODS AND APPARATUS FOR CONTROLLING PLASMA IN A PLASMA PROCESSING...

C-shroud Modification For Plasma Uniformity Without Impacting Mecha...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD