the substrate being supported substantially vertically

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CPC
C23C16/4587

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CCHEMISTRY METALLURGY C23Surface treatment C23CCOATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating

Current Industry

C23C16/4587the substrate being supported substantially vertically

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Electrostatic chuck with multiple radio frequency meshes to control...
- Patent number 12,136,536
- Issue date Nov 5, 2024
- Applied Materials, Inc.
- Edward P. Hammond
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Magnetic levitation system, base and carrier of a magnetic levitati...
- Patent number 12,119,173
- Issue date Oct 15, 2024
- Applied Materials, Inc.
- Henning Aust
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Substrate processing apparatus
- Patent number 12,018,373
- Issue date Jun 25, 2024
- Kokusai Electric Corporation
- Seiyo Nakashima
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Information Patent Grant
Vaporizer, substrate processing apparatus and method for manufactur...
- Patent number 11,970,771
- Issue date Apr 30, 2024
- Kokusai Electric Corporation
- Atsushi Morikawa
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Information Patent Grant
Plasma generating device, substrate processing apparatus, and metho...
- Patent number 11,967,490
- Issue date Apr 23, 2024
- Kokusai Electric Corporation
- Akihiro Sato
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Information Patent Grant
High power electrostatic chuck design with radio frequency coupling
- Patent number 11,948,826
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Jaeyong Cho
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Coating method for continuous preparation of diamond thin film with...
- Patent number 11,939,669
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- Lusheng Liu
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Plasma boat for receiving wafers with regulated plasma deposition
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Information Patent Grant
Method of manufacturing semiconductor device and non-transitory com...
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Information Patent Grant
Plasma generating device, substrate processing apparatus, and metho...
- Patent number 11,749,510
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Information Patent Grant
In-line coater for vacuum deposition of thin film coatings
- Patent number 11,732,349
- Issue date Aug 22, 2023
- OOO IZOVAK TEHNOLOGII
- Vladimir J. Shiripov
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Information Patent Grant
Mask arrangement for masking a substrate in a processing chamber, a...
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- Stefan Bangert
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Information Patent Grant
Wafer rack and vertical wafer boat having the same
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- Issue date Feb 7, 2023
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
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Information Patent Grant
Plasma generating device, substrate processing apparatus, and metho...
- Patent number 11,551,914
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- Kokusai Electric Corporation
- Akihiro Sato
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Information Patent Grant
High power electrostatic chuck design with radio frequency coupling
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- Issue date Dec 20, 2022
- Applied Materials, Inc.
- Jaeyong Cho
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Information Patent Grant
Substrate accommodating unit and maintenance method for vacuum tran...
- Patent number 11,476,140
- Issue date Oct 18, 2022
- Tokyo Electron Limited
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Information Patent Grant
Plasma generating device, substrate processing apparatus, and metho...
- Patent number 11,469,083
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Plasma generating device, substrate processing apparatus, and metho...
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Substrate processing apparatus
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Substrate processing apparatus and heater device
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- Kokusai Electric Corporation
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Film-forming device
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High throughput vacuum deposition sources and system
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Information Patent Grant
Inline thin film processing device
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Information Patent Grant
Substrate processing apparatus, method for manufacturing semiconduc...
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- Issue date Apr 5, 2022
- Kokusai Electric Corporation
- Atsushi Morikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device and non-transitory com...
- Patent number 11,257,699
- Issue date Feb 22, 2022
- Kokusai Electric Corporation
- Tomoyuki Miyada
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Information Patent Grant
Batch type plasma substrate processing apparatus
- Patent number 11,183,372
- Issue date Nov 23, 2021
- EUGENE TECHNOLOGY CO., LTD.
- Sung Ho Kang
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Device and method for vacuum coating
- Patent number 11,155,921
- Issue date Oct 26, 2021
- Bühler Alzenau GmbH
- Torsten Schmauder
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Method for forming films on wafers separated by different distances
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- Wen-Bin Yang
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Process chamber with resistive heating
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- Issue date Sep 7, 2021
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Information Patent Grant
Apparatus and method for etching one side of a semiconductor substrate
- Patent number 10,975,490
- Issue date Apr 13, 2021
- NexWafe GmbH
- Stefan Reber
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

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ENABLE CVD CHAMBER PROCESS WAFERS AT DIFFERENT TEMPERATURES
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PLASMA GENERATING DEVICE, SUBSTRATE PROCESSING APPARATUS, AND METHO...
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ELECTROSTATIC CHUCK WITH MULTIPLE RADIO FREQUENCY MESHES TO CONTROL...
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ACOUSTIC WAVE ASSISTED CHEMICAL VAPOR IINFILTRATION
- Publication number 20240141479
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- RTX Corporation
- JinQuan Xu
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NOVEL COATING METHOD OF COMPLEX 3D STRUCTURES USING LOW PRESSURE CH...
- Publication number 20240102167
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- California Institute of Technology
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Method of Manufacturing Semiconductor Device and Non-transitory Com...
- Publication number 20240087929
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VACUUM CHAMBER AND ARRANGEMENT FOR ATOMIC LAYER DEPOSITION
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FABRICATING APPARATUS OF SIC EPITAXIAL WAFER AND FABRICATION METHOD...
- Publication number 20230374698
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- H01 - BASIC ELECTRIC ELEMENTS
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SUPPORT FOR SEMICONDUCTOR SUBSTRATES FOR PECVD TREATMENT WITH HIGH...
- Publication number 20230357930
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PLASMA GENERATING DEVICE, SUBSTRATE PROCESSING APPARATUS, AND METHO...
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GAS INJECTOR FOR A VERTICAL FURNACE
- Publication number 20230111229
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- ASM IP HOLDING B.V.
- Theodorus G.M. Oosterlaken
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HIGH POWER ELECTROSTATIC CHUCK DESIGN WITH RADIO FREQUENCY COUPLING
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Holding System for Holding Substrates during a Processing of the Su...
- Publication number 20230026860
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PLASMA GENERATING DEVICE, SUBSTRATE PROCESSING APPARATUS, AND METHO...
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FILM FORMING APPARATUS
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HFCVD DEVICE USED FOR CONTINUOUS PREPARATION OF DIAMOND THIN FILM,...
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- Institute of Metal Research Chinese Academy of Scienes
- Lusheng LIU
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MAGNETIC LEVITATION SYSTEM, BASE AND CARRIER OF A MAGNETIC LEVITATI...
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Pedestal Geometry for Fast Gas Exchange
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High throughput Vacuum Deposition Sources and System
- Publication number 20210164099
- Publication date Jun 3, 2021
- Ascentool, Inc.
- George Xinsheng Guo
- H01 - BASIC ELECTRIC ELEMENTS

the substrate being supported substantially vertically

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Electrostatic chuck with multiple radio frequency meshes to control...

Magnetic levitation system, base and carrier of a magnetic levitati...

Substrate processing apparatus

Vaporizer, substrate processing apparatus and method for manufactur...

Plasma generating device, substrate processing apparatus, and metho...

High power electrostatic chuck design with radio frequency coupling

Coating method for continuous preparation of diamond thin film with...

Plasma boat for receiving wafers with regulated plasma deposition

Method of manufacturing semiconductor device and non-transitory com...

Plasma generating device, substrate processing apparatus, and metho...

In-line coater for vacuum deposition of thin film coatings

Mask arrangement for masking a substrate in a processing chamber, a...

Wafer rack and vertical wafer boat having the same

Plasma generating device, substrate processing apparatus, and metho...

High power electrostatic chuck design with radio frequency coupling

Substrate accommodating unit and maintenance method for vacuum tran...

Plasma generating device, substrate processing apparatus, and metho...

Plasma generating device, substrate processing apparatus, and metho...

Substrate processing apparatus

Substrate processing apparatus and heater device

Film-forming device

High throughput vacuum deposition sources and system

Inline thin film processing device

Substrate processing apparatus, method for manufacturing semiconduc...

Method of manufacturing semiconductor device and non-transitory com...

Batch type plasma substrate processing apparatus

Device and method for vacuum coating

Method for forming films on wafers separated by different distances

Process chamber with resistive heating

Apparatus and method for etching one side of a semiconductor substrate

Patents Applicationslast 30 patents

SOLID SOURCE CHEMICAL VAPORIZER

Batch Mode Silicon Carbide Epitaxial Reactor

ENABLE CVD CHAMBER PROCESS WAFERS AT DIFFERENT TEMPERATURES

PLASMA GENERATING DEVICE, SUBSTRATE PROCESSING APPARATUS, AND METHO...

ELECTROSTATIC CHUCK WITH MULTIPLE RADIO FREQUENCY MESHES TO CONTROL...

ACOUSTIC WAVE ASSISTED CHEMICAL VAPOR IINFILTRATION

NOVEL COATING METHOD OF COMPLEX 3D STRUCTURES USING LOW PRESSURE CH...

Method of Manufacturing Semiconductor Device and Non-transitory Com...

VACUUM CHAMBER AND ARRANGEMENT FOR ATOMIC LAYER DEPOSITION

FABRICATING APPARATUS OF SIC EPITAXIAL WAFER AND FABRICATION METHOD...

SUPPORT FOR SEMICONDUCTOR SUBSTRATES FOR PECVD TREATMENT WITH HIGH...

PLASMA GENERATING DEVICE, SUBSTRATE PROCESSING APPARATUS, AND METHO...

GAS INJECTOR FOR A VERTICAL FURNACE

HIGH POWER ELECTROSTATIC CHUCK DESIGN WITH RADIO FREQUENCY COUPLING

Holding System for Holding Substrates during a Processing of the Su...

PLASMA GENERATING DEVICE, SUBSTRATE PROCESSING APPARATUS, AND METHO...

FILM FORMING APPARATUS

HFCVD DEVICE USED FOR CONTINUOUS PREPARATION OF DIAMOND THIN FILM,...

MAGNETIC LEVITATION SYSTEM, BASE AND CARRIER OF A MAGNETIC LEVITATI...

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING S...

SUBSTRATE PROCESSING APPARATUS, METHOD FOR MANUFACTURING SEMICONDUC...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE SUPPPORT AND METHOD OF MA...

Method of Manufacturing Semiconductor Device and Non-transitory Com...

CVD REACTOR CHAMBER WITH RESISTIVE HEATING FOR SILICON CARBIDE DEPO...

PLASMA BOAT FOR RECEIVING WAFERS WITH REGULATED PLASMA DEPOSITION

Pedestal Geometry for Fast Gas Exchange

PLASMA TREATMENT APPARATUS

PLASMA GENERATING DEVICE, SUBSTRATE PROCESSING APPARATUS, AND METHO...

PLASMA GENERATING DEVICE, SUBSTRATE PROCESSING APPARATUS, AND METHO...

High throughput Vacuum Deposition Sources and System