Thick-thin oxides

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CPC
Y10S148/163

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YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S148/00Metal treatment

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Y10S148/163Thick-thin oxides

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Patents Grantslast 30 patents

Information Patent Grant
Active matrix display device including a transistor
- Patent number 6,476,447
- Issue date Nov 5, 2002
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- G09 - EDUCATION CRYPTOGRAPHY DISPLAY ADVERTISING SEALS
Information Patent Grant
Dual gate oxide process for deep submicron ICS
- Patent number 6,358,819
- Issue date Mar 19, 2002
- LSI Logic Corporation
- Gail D. Shelton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating different gate oxide thicknesses within the...
- Patent number 6,335,262
- Issue date Jan 1, 2002
- International Business Machines Corporation
- Scott W. Crowder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insulation layer structure and method for making the same
- Patent number 6,150,220
- Issue date Nov 21, 2000
- Hyundai Electronics Industries Co., Ltd.
- Yun-Jun Huh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Active matrix display device
- Patent number 6,147,375
- Issue date Nov 14, 2000
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- G09 - EDUCATION CRYPTOGRAPHY DISPLAY ADVERTISING SEALS
Information Patent Grant
Method for manufacturing a polysilicon TFT with a variable thicknes...
- Patent number 6,124,153
- Issue date Sep 26, 2000
- SamSung Electronics Co., Ltd.
- Joo-hyung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing mixed-mode devices
- Patent number 6,037,201
- Issue date Mar 14, 2000
- United Microelectronics Corp.
- Meng-Jin Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming SRAM cells and pairs of field effect transistors
- Patent number 5,989,946
- Issue date Nov 23, 1999
- Micron Technology, Inc.
- Jeffrey W. Honeycutt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a static random access memory
- Patent number 5,943,566
- Issue date Aug 24, 1999
- United Semiconductor Corp.
- Jyh-Ming Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a high voltage gate dielectric for use in integr...
- Patent number 5,861,347
- Issue date Jan 19, 1999
- Motorola Inc.
- Bikas Maiti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a taper shaped contact hole by oxidizing a wiring
- Patent number 5,849,611
- Issue date Dec 15, 1998
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- G09 - EDUCATION CRYPTOGRAPHY DISPLAY ADVERTISING SEALS
Information Patent Grant
Method of manufacturing semiconductor device having elements differ...
- Patent number 5,716,863
- Issue date Feb 10, 1998
- Kabushiki Kaisha Toshiba
- Norihisa Arai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing method of forming a pair of field effect t...
- Patent number 5,691,217
- Issue date Nov 25, 1997
- Micron Technology, Inc.
- Jeffrey W. Honeycutt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of producing a fully planarized concave transistor
- Patent number 5,677,210
- Issue date Oct 14, 1997
- Hyundai Electronics Industries Co., Ltd.
- Chan Kwang Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for forming the same
- Patent number 5,485,019
- Issue date Jan 16, 1996
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- G09 - EDUCATION CRYPTOGRAPHY DISPLAY ADVERTISING SEALS
Information Patent Grant
Method of making transistor devices in an SRAM cell
- Patent number 5,426,065
- Issue date Jun 20, 1995
- SGS-Thomson Microelectronics, Inc.
- Tsiu C. Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxidation enhancement in narrow masked field regions of a semicondu...
- Patent number 5,358,894
- Issue date Oct 25, 1994
- Micron Technology, Inc.
- Pierre Fazan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming thin tunneling windows in EEPROMs
- Patent number 5,352,618
- Issue date Oct 4, 1994
- Atmel Corporation
- Bradley J. Larsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling gate oxide thickness in the fabrication of se...
- Patent number 5,330,920
- Issue date Jul 19, 1994
- Digital Equipment Corporation
- Hamid R. Soleimani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory device
- Patent number 5,308,781
- Issue date May 3, 1994
- Ricoh Company, Ltd.
- Yuichi Ando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of fabrication thereof
- Patent number 5,279,985
- Issue date Jan 18, 1994
- NEC Corporation
- Satoshi Kamiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective oxidation of silicon trench sidewall
- Patent number 5,240,875
- Issue date Aug 31, 1993
- North American Philips Corporation
- Len-Yuan Tsou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of treating a gallium arsenide surface and gallium arsenide...
- Patent number 5,219,797
- Issue date Jun 15, 1993
- The United States of America as represented by the Secretary of the Army
- Gary J. Gerardi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for the manufacture of CMOS FET by P+ maskless technique
- Patent number 5,106,768
- Issue date Apr 21, 1992
- United Microelectronics Corporation
- Kuo-Yun Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for producing a semiconductor device
- Patent number 5,079,191
- Issue date Jan 7, 1992
- Hitachi, Ltd.
- Hiroshi Shinriki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for creating two thicknesses of gate oxide within a dynamic...
- Patent number 5,057,449
- Issue date Oct 15, 1991
- Micron Technology, Inc.
- Tyler A. Lowrey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device isolation
- Patent number 4,897,363
- Issue date Jan 30, 1990
- Mitsubishi Denki Kabushiki Kaisha
- Kakutaro Suda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing an insulated gate field effect transistor
- Patent number 4,892,838
- Issue date Jan 9, 1990
- U.S. Philips Corporation
- Carole A. Fisher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming an N+ poly-to- N+ silicon capacitor structure uti...
- Patent number 4,877,751
- Issue date Oct 31, 1989
- National Semiconductor Corporation
- Chih-Sieh Teng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of isolating a semiconductor device using local oxidation
- Patent number 4,840,920
- Issue date Jun 20, 1989
- Mitsubishi Denki Kabushiki Kaisha
- Kakutaro Suda
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method for fabricating different gate oxide thickness within the sa...
- Publication number 20030094660
- Publication date May 22, 2003
- Scott W. Crowder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual gate oxide process for deep submicron ICS
- Publication number 20020058382
- Publication date May 16, 2002
- Gail D. Shelton
- H01 - BASIC ELECTRIC ELEMENTS

Thick-thin oxides

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Active matrix display device including a transistor

Dual gate oxide process for deep submicron ICS

Method for fabricating different gate oxide thicknesses within the...

Insulation layer structure and method for making the same

Active matrix display device

Method for manufacturing a polysilicon TFT with a variable thicknes...

Method for manufacturing mixed-mode devices

Method of forming SRAM cells and pairs of field effect transistors

Method of fabricating a static random access memory

Method for forming a high voltage gate dielectric for use in integr...

Method for forming a taper shaped contact hole by oxidizing a wiring

Method of manufacturing semiconductor device having elements differ...

Semiconductor processing method of forming a pair of field effect t...

Method of producing a fully planarized concave transistor

Semiconductor device and method for forming the same

Method of making transistor devices in an SRAM cell

Oxidation enhancement in narrow masked field regions of a semicondu...

Method for forming thin tunneling windows in EEPROMs

Method of controlling gate oxide thickness in the fabrication of se...

Semiconductor memory device

Semiconductor device and method of fabrication thereof

Selective oxidation of silicon trench sidewall

Method of treating a gallium arsenide surface and gallium arsenide...

Method for the manufacture of CMOS FET by P+ maskless technique

Process for producing a semiconductor device

Process for creating two thicknesses of gate oxide within a dynamic...

Method of manufacturing semiconductor device isolation

Method of manufacturing an insulated gate field effect transistor

Method of forming an N+ poly-to- N+ silicon capacitor structure uti...

Method of isolating a semiconductor device using local oxidation

Patents Applicationslast 30 patents

Method for fabricating different gate oxide thickness within the sa...

Dual gate oxide process for deep submicron ICS