to form insulating layers thereon

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H01L21/31

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/31to form insulating layers thereon

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Patents Grantslast 30 patents

Information Patent Grant
Superstrate including a body and layers and methods of forming and...
- Patent number 12,325,046
- Issue date Jun 10, 2025
- Canon Kabushiki Kaisha
- Niyaz Khusnatdinov
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Semiconductor FinFET device and method
- Patent number 12,327,729
- Issue date Jun 10, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Yu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching gas mixture and method of manufacturing integrated circuit...
- Patent number 12,327,731
- Issue date Jun 10, 2025
- Samsung Electronics Co., Ltd.
- Changgil Son
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liner for V-NAND word line stack
- Patent number 12,328,872
- Issue date Jun 10, 2025
- Applied Materials, Inc.
- Jacqueline S. Wrench
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Contact with a silicide region
- Patent number 12,328,890
- Issue date Jun 10, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Wen Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 12,327,812
- Issue date Jun 10, 2025
- Amkor Technology Singapore Holding Pte Ltd.
- Yeong Beom Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two-color self-aligned double patterning (SADP) to yield static ran...
- Patent number 12,327,730
- Issue date Jun 10, 2025
- Adeia Semiconductor Solutions LLC
- Fee Li Lie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system and substrate processing method
- Patent number 12,327,768
- Issue date Jun 10, 2025
- Tokyo Electron Limited
- Hayato Tanoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Micron scale tin oxide-based semiconductor devices
- Patent number 12,328,906
- Issue date Jun 10, 2025
- Cornell University
- Jisung Park
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Method of forming thin dummy sidewall spacers for transistors with...
- Patent number 12,328,929
- Issue date Jun 10, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wen-Ju Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet-dry bilayer resist dual tone exposure
- Patent number 12,327,726
- Issue date Jun 10, 2025
- Tokyo Electron Limited
- Anton J. deVilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve profile control during selective etching of silic...
- Patent number 12,327,732
- Issue date Jun 10, 2025
- American Air Liquide, Inc.
- Xiangyu Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to reduce UNCD film roughness
- Patent number 12,327,733
- Issue date Jun 10, 2025
- Applied Materials, Inc.
- Vicknesh Sahmuganathan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating semiconductor device
- Patent number 12,327,758
- Issue date Jun 10, 2025
- SK Hynix Inc.
- Nam Yeal Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for processing substrate
- Patent number 12,325,919
- Issue date Jun 10, 2025
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing liquid supply apparatus and method of removing solids fr...
- Patent number 12,322,610
- Issue date Jun 3, 2025
- Semes Co., Ltd.
- Mu Hyeon Lee
- B08 - CLEANING
Information Patent Grant
Method for fabricating physically unclonable function device
- Patent number 12,322,645
- Issue date Jun 3, 2025
- United Microelectronics Corp.
- Ping-Chia Shih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching processes and processing assemblies
- Patent number 12,322,575
- Issue date Jun 3, 2025
- ASM IP Holding B.V.
- Bablu Mukherjee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with contracted isolation feature
- Patent number 12,324,222
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Dian-Sheg Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal atomic layer etching processes
- Patent number 12,320,012
- Issue date Jun 3, 2025
- ASM IP Holding B.V.
- Tom E. Blomberg
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Memory devices and method of fabricating same
- Patent number 12,324,156
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chang-Ming Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating Fin-type field-effect transistor device havin...
- Patent number 12,324,224
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Hung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming high density, high shorting margin, and low capac...
- Patent number 12,322,699
- Issue date Jun 3, 2025
- Tahoe Research, LTD.
- Christopher J. Jezewski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 12,324,193
- Issue date Jun 3, 2025
- Semiconductor Energy Laboratory Co., Ltd.
- Yoshinobu Asami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching to reduce line wiggling
- Patent number 12,322,651
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuan-Wei Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsing plasma treatment for film densification
- Patent number 12,322,573
- Issue date Jun 3, 2025
- Applied Materials, Inc.
- Rui Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Passivation layers with rounded corners
- Patent number 12,322,646
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Mingni Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and manufacturing method thereof
- Patent number 12,324,140
- Issue date Jun 3, 2025
- CHANGXIN MEMORY TECHNOLOGY, INC.
- Xiang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical thin-film transistor and application as bit-line connector...
- Patent number 12,324,159
- Issue date Jun 3, 2025
- SUNRISE MEMORY CORPORATION
- Tianhong Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming protective film, method for manufacturing patter...
- Patent number 12,312,487
- Issue date May 27, 2025
- JSR Corporation
- Kazunori Takanashi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
COMPONENT FOR FABRICATING A SEMICONDUCTOR, HAVING PLURALITY OF LAYE...
- Publication number 20250188603
- Publication date Jun 12, 2025
- TOKAI CARBON KOREA CO., LTD.
- JOUNG IL KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LAYER BY LAYER ETCH PROCESS
- Publication number 20250191929
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Alec Dorfner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING ELECTRONIC CHIPS
- Publication number 20250191977
- Publication date Jun 12, 2025
- STMicroelectronics International N.V.
- Gregoire DELACOURT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND METHOD OF FORMING THE SAME
- Publication number 20250191994
- Publication date Jun 12, 2025
- Macronix International Co., Ltd.
- Yun-Yuan WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FERROELECTRIC MEMORY DEVICE
- Publication number 20250194100
- Publication date Jun 12, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Han-Jong Chia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING CAPACITOR ARRAY
- Publication number 20250194117
- Publication date Jun 12, 2025
- NANYA TECHNOLOGY CORPORATION
- Zhi-Xuan SHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRENCH CONTACT STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE...
- Publication number 20250194201
- Publication date Jun 12, 2025
- Intel Corporation
- Subhash M. JOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHODS OF MANUFACTURE
- Publication number 20250194227
- Publication date Jun 12, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Ting Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING SYSTEM
- Publication number 20250191927
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Takuya SAWANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING STI REGION
- Publication number 20250194085
- Publication date Jun 12, 2025
- Micron Technology, Inc.
- Kunihiro Tsubomi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEEP ULTRAVIOLET LITHOGRAPHY METHOD, LITHOGRAPHY PATTERN AND SEMICO...
- Publication number 20250191930
- Publication date Jun 12, 2025
- Institute of Microelectronics, Chinese Academy of Sciences
- Xiaobin He
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-TEMPERATURE IMPLANT FOR GATE-ALL-AROUND DEVICES
- Publication number 20250194127
- Publication date Jun 12, 2025
- Applied Materials, Inc.
- Yan ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFICATION OF BACKSIDE STRESS MITIGATION WITH FRONTSIDE PROTECTION...
- Publication number 20250194165
- Publication date Jun 12, 2025
- Applied Materials, Inc.
- Changwoo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250191889
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Ryutaro SUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20250191907
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Ayuta SUZUKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER TOTAL THICKNESS VARIATION USING MASKLESS IMPLANT
- Publication number 20250191917
- Publication date Jun 12, 2025
- Applied Materials, Inc.
- Qintao ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARBON BASED DEPOSITIONS USED FOR CRITICAL DIMENSION CONTROL DURING...
- Publication number 20250191926
- Publication date Jun 12, 2025
- LAM RESEARCH CORPORATION
- Jon HENRI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TERMINATION STRUCTURES FOR SEMICONDUCTOR DEVICES
- Publication number 20250191928
- Publication date Jun 12, 2025
- Virginia Tech Intellectual Properties, Inc.
- Yuhao ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING THIN DUMMY SIDEWALL SPACERS FOR TRANSISTORS WITH...
- Publication number 20250194222
- Publication date Jun 12, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wen-Ju Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR IN-SITU CHEMICAL SEPARATION AND RECIRCULAT...
- Publication number 20250187141
- Publication date Jun 12, 2025
- AXUS TECHNOLOGY, LLC
- Daniel Ray Trojan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal-Insulator-Metal Structure
- Publication number 20250192026
- Publication date Jun 12, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yuan-Yang Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250191910
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Ryuichi ASAKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING ELECTRODE WITH MULTI-DIELECTRIC LAYERS
- Publication number 20250191922
- Publication date Jun 12, 2025
- MIKRO MESA TECHNOLOGY CO., LTD.
- Li-Yi CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW RESISTANCE MOLYBDENUM DEPOSITION FOR LOGIC SOURCE/DRAIN CONTACTS
- Publication number 20250183041
- Publication date Jun 5, 2025
- LAM RESEARCH CORPORATION
- Yao-Tsung HSIEH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESS FOR ETCHING A MULTILAYER STACK
- Publication number 20250183046
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Jason Marion
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE PRECISION ETCHING OF SEMICONDUCTOR MATERIALS
- Publication number 20250183051
- Publication date Jun 5, 2025
- LAM RESEARCH CORPORATION
- Madeleine Parker GORDON
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SILICON NITRIDE ETCHING LIQUID COMPOSITION
- Publication number 20250179360
- Publication date Jun 5, 2025
- KANTO KAGAKU KABUSHlKI KAISHA
- Takuo Owada
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Semiconductor Devices With Backside Air Gap Dielectric
- Publication number 20250185348
- Publication date Jun 5, 2025
- Taiwan Semiconductor Manufacturing Co., LTD
- Chun-Yuan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF GATE-ALL-AROUND DEVICES AND STRUCTURES THEREOF
- Publication number 20250185270
- Publication date Jun 5, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ka-Hing FUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INNER FILLER LAYER FOR MULTI-PATTERNED METAL GATE FOR NANOSTRUCTURE...
- Publication number 20250185347
- Publication date Jun 5, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shahaji B. More
- H01 - BASIC ELECTRIC ELEMENTS

to form insulating layers thereon

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Superstrate including a body and layers and methods of forming and...

Semiconductor FinFET device and method

Etching gas mixture and method of manufacturing integrated circuit...

Liner for V-NAND word line stack

Contact with a silicide region

Semiconductor device and manufacturing method thereof

Two-color self-aligned double patterning (SADP) to yield static ran...

Substrate processing system and substrate processing method

Micron scale tin oxide-based semiconductor devices

Method of forming thin dummy sidewall spacers for transistors with...

Wet-dry bilayer resist dual tone exposure

Method to improve profile control during selective etching of silic...

Methods to reduce UNCD film roughness

Method for fabricating semiconductor device

Apparatus for processing substrate

Processing liquid supply apparatus and method of removing solids fr...

Method for fabricating physically unclonable function device

Etching processes and processing assemblies

Semiconductor device with contracted isolation feature

Thermal atomic layer etching processes

Memory devices and method of fabricating same

Method of fabricating Fin-type field-effect transistor device havin...

Method of forming high density, high shorting margin, and low capac...

Semiconductor device and method for manufacturing the same

Etching to reduce line wiggling

Pulsing plasma treatment for film densification

Passivation layers with rounded corners

Semiconductor structure and manufacturing method thereof

Vertical thin-film transistor and application as bit-line connector...

Method for forming protective film, method for manufacturing patter...

Patents Applicationslast 30 patents

COMPONENT FOR FABRICATING A SEMICONDUCTOR, HAVING PLURALITY OF LAYE...

LAYER BY LAYER ETCH PROCESS

METHOD OF FABRICATING ELECTRONIC CHIPS

SEMICONDUCTOR STRUCTURE AND METHOD OF FORMING THE SAME

FERROELECTRIC MEMORY DEVICE

METHOD OF MANUFACTURING CAPACITOR ARRAY

TRENCH CONTACT STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE...

SEMICONDUCTOR DEVICE AND METHODS OF MANUFACTURE

ETCHING METHOD AND PLASMA PROCESSING SYSTEM

SEMICONDUCTOR DEVICE HAVING STI REGION

DEEP ULTRAVIOLET LITHOGRAPHY METHOD, LITHOGRAPHY PATTERN AND SEMICO...

HIGH-TEMPERATURE IMPLANT FOR GATE-ALL-AROUND DEVICES

UNIFICATION OF BACKSIDE STRESS MITIGATION WITH FRONTSIDE PROTECTION...

PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING SYSTEM

FILM FORMING METHOD AND FILM FORMING APPARATUS

WAFER TOTAL THICKNESS VARIATION USING MASKLESS IMPLANT

CARBON BASED DEPOSITIONS USED FOR CRITICAL DIMENSION CONTROL DURING...

TERMINATION STRUCTURES FOR SEMICONDUCTOR DEVICES

METHOD OF FORMING THIN DUMMY SIDEWALL SPACERS FOR TRANSISTORS WITH...

APPARATUS AND METHOD FOR IN-SITU CHEMICAL SEPARATION AND RECIRCULAT...

Metal-Insulator-Metal Structure

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

METHOD OF FORMING ELECTRODE WITH MULTI-DIELECTRIC LAYERS

LOW RESISTANCE MOLYBDENUM DEPOSITION FOR LOGIC SOURCE/DRAIN CONTACTS

PLASMA PROCESS FOR ETCHING A MULTILAYER STACK

SELECTIVE PRECISION ETCHING OF SEMICONDUCTOR MATERIALS

SILICON NITRIDE ETCHING LIQUID COMPOSITION

Semiconductor Devices With Backside Air Gap Dielectric

FORMATION OF GATE-ALL-AROUND DEVICES AND STRUCTURES THEREOF

INNER FILLER LAYER FOR MULTI-PATTERNED METAL GATE FOR NANOSTRUCTURE...