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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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Patents Grantslast 30 patents

Information Patent Grant
Metal oxide resists for EUV patterning and methods for developing t...
- Patent number 12,332,568
- Issue date Jun 17, 2025
- Tokyo Electron Limited
- Hamed Hajibabaeinajafabadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatment condition setting method, storage medium, and substrate t...
- Patent number 12,314,023
- Issue date May 27, 2025
- Tokyo Electron Limited
- Takuya Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Storage container storing treatment liquid for manufacturing semico...
- Patent number 12,313,976
- Issue date May 27, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Micro- and nano-fluidic chip, method of fabricating the same, and a...
- Patent number 12,303,897
- Issue date May 20, 2025
- SHENZHEN INSTITUTES OF ADVANCED TECHNOLOGY
- Hui Yang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 12,306,538
- Issue date May 20, 2025
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flow cells and methods for making the same
- Patent number 12,298,665
- Issue date May 13, 2025
- Illumina, Inc.
- Sahngki Hong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Heat treatment apparatus and heat treatment method
- Patent number 12,298,668
- Issue date May 13, 2025
- Tokyo Electron Limited
- Shinichiro Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Novolak/DNQ based, chemically amplified photoresist
- Patent number 12,276,909
- Issue date Apr 15, 2025
- Merck Patent GmbH
- Medhat A. Toukhy
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Organotin oxide hydroxide patterning compositions, precursors, and...
- Patent number 12,276,913
- Issue date Apr 15, 2025
- Inpria Corporation
- Stephen T. Meyers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated dry processes for patterning radiation photoresist patte...
- Patent number 12,278,125
- Issue date Apr 15, 2025
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation-sensitive resin composition, method of forming resist pat...
- Patent number 12,259,653
- Issue date Mar 25, 2025
- JSR Corporation
- Katsuaki Nishikori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 12,253,802
- Issue date Mar 18, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus, system and method
- Patent number 12,242,197
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Po-Han Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern formation methods
- Patent number 12,228,859
- Issue date Feb 18, 2025
- Rohm and Haas Electronic Materials LLC
- Choong-Bong Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
- Patent number 12,228,857
- Issue date Feb 18, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating composition for forming resist underlayer film for EUV lith...
- Patent number 12,228,858
- Issue date Feb 18, 2025
- DuPont Specialty Materials Korea Ltd.
- Jae Hwan Sim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a semiconductor device and pattern formatio...
- Patent number 12,222,643
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Cheng Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 12,222,649
- Issue date Feb 11, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal-compound-removing solvent and method in lithography
- Patent number 12,210,286
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preparing pixel define layer
- Patent number 12,207,498
- Issue date Jan 21, 2025
- DUK SAN NEOLUX CO., LTD.
- Hyunsang Cho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal oxide resist patterning with electrical field guided post-exp...
- Patent number 12,204,246
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Huixiong Dai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Surface charge release in lithography developing process
- Patent number 12,204,248
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Ling Tseng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive resin composition, positive photosensitive...
- Patent number 12,195,568
- Issue date Jan 14, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masashi Iio
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition and method of forming photoresist pattern
- Patent number 12,189,287
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Li-Po Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chamber and methods of treating a substrate after exposure to radia...
- Patent number 12,181,801
- Issue date Dec 31, 2024
- Applied Materials, Inc.
- Dmitry Lubomirsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of producing three-dimensional objects with apparatus havin...
- Patent number 12,179,435
- Issue date Dec 31, 2024
- Carbon, Inc.
- Jason P. Rolland
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Integrated dry processes for patterning radiation photoresist patte...
- Patent number 12,183,604
- Issue date Dec 31, 2024
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for producing three-dimensional objects
- Patent number 12,172,382
- Issue date Dec 24, 2024
- Carbon, Inc.
- Jason P. Rolland
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,174,541
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Support unit, bake apparatus and substrate treating apparatus inclu...
- Patent number 12,174,553
- Issue date Dec 24, 2024
- Semes Co., Ltd.
- Tae Hoon Lee
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION, METHOD FOR MANUFACTURING RESIST FILM, AND METHO...
- Publication number 20250237949
- Publication date Jul 24, 2025
- Merck Patent GmbH
- Tetsumasa Takaichi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNAB...
- Publication number 20250231492
- Publication date Jul 17, 2025
- SUNTIFIC MATERIALS (WEIFANG), LTD.
- Sam SUN
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR D...
- Publication number 20250231479
- Publication date Jul 17, 2025
- Samsung Electronics Co., Ltd.
- Chawon Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND...
- Publication number 20250224680
- Publication date Jul 10, 2025
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250224683
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICRO- AND NANO-FLUIDIC CHIP, METHOD OF FABRICATING THE SAME, AND A...
- Publication number 20250196140
- Publication date Jun 19, 2025
- SHENZHEN INSTITUTES OF ADVANCED TECHNOLOGY
- Hui Yang
- B82 - NANO-TECHNOLOGY
Information Patent Application
SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...
- Publication number 20250201586
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Shinsuke TAKAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICRO- AND NANO-FLUIDIC CHIP, METHOD OF FABRICATING THE SAME, AND A...
- Publication number 20250196139
- Publication date Jun 19, 2025
- SHENZHEN INSTITUTES OF ADVANCED TECHNOLOGY
- Hui Yang
- B82 - NANO-TECHNOLOGY
Information Patent Application
RINSE MATERIAL COMPOSITION FOR PATTERNING PROCESS USING LITHOGRAPHY...
- Publication number 20250197782
- Publication date Jun 19, 2025
- Samsung Electronics Co., Ltd.
- Chawon Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF INCREASING CROSSLINKING DENSITY OF PHOTORESIST
- Publication number 20250199412
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yuan Chih LO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HEAT TREATMENT APPARATUS AND HEAT TREATMENT METHOD
- Publication number 20250180996
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Shinichiro KAWAKAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL-COMPOUND-REMOVING SOLVENT AND METHOD IN LITHOGRAPHY
- Publication number 20250172879
- Publication date May 29, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS AND VIS...
- Publication number 20250166167
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Yusuke MIYAKUBO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROCESS ENVIRONMENT FOR INORGANIC RESIST PATTERNING
- Publication number 20250164887
- Publication date May 22, 2025
- INPRIA CORPORATION
- Alan J. Telecky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRC...
- Publication number 20250164873
- Publication date May 22, 2025
- Samsung Electronics Co., Ltd.
- Yonghoon Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW VOLUME SHRINKAGE, HIGH ETCH RESISTANCE AND HIGH RESOLUTION PHOT...
- Publication number 20250157818
- Publication date May 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jia-Lin WEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND PATTERN FORMATIO...
- Publication number 20250147417
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Cheng LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHOTOLITHOGRAPHIC RINSE COMPOSITIONS AND METHODS OF FORMING PATTERN...
- Publication number 20250147423
- Publication date May 8, 2025
- Samsung Electronics Co., Ltd.
- JINJOO KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE TYPE LIFT-OFF RESIST COMPOSITION AND METHOD FOR MANUFACTUR...
- Publication number 20250130496
- Publication date Apr 24, 2025
- Merck Patent GmbH
- YANO TOMOTSUGU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SWITCHABLE UNDERLAYERS FOR EUV LITHOGRAPHY
- Publication number 20250110408
- Publication date Apr 3, 2025
- Intel Corporation
- Robert JORDAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
- Publication number 20250093775
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Li-Po YANG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS
- Publication number 20250085631
- Publication date Mar 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chung SU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTI-SPACER BASED SELF-ALIGNED HIGH ORDER PATTERNING
- Publication number 20250068064
- Publication date Feb 27, 2025
- Geminatio, Inc.
- Brennan Peterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
- Publication number 20250068080
- Publication date Feb 27, 2025
- SEMES CO., LTD.
- Kyung Taek IM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST STRIPPER COMPOSITION AND METHOD FOR FORMING PATTERN USI...
- Publication number 20250060675
- Publication date Feb 20, 2025
- SAMSUNG DISPLAY CO., LTD.
- KYU-SOON PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AQUEOUS ACID DEVELOPMENT OR TREATMENT OF ORGANOMETALLIC PHOTORESIST
- Publication number 20250053092
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Nizan Kenane
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DRY DEVELOPMENT FOR METAL-OXIDE PHOTORESISTS
- Publication number 20250028248
- Publication date Jan 23, 2025
- Applied Materials, Inc.
- NASRIN KAZEM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOTIN PHOTORESISTS AND METHOD OF DEVELOPING PHOTOLITHOGRAPHY PA...
- Publication number 20250020996
- Publication date Jan 16, 2025
- Feng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING...
- Publication number 20250020995
- Publication date Jan 16, 2025
- Samsung SDI Co., Ltd.
- Seungbeom KEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20250004374
- Publication date Jan 2, 2025
- FUJIFILM CORPORATION
- Michihiro SHIRAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Treatment before imagewise removal

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Metal oxide resists for EUV patterning and methods for developing t...

Treatment condition setting method, storage medium, and substrate t...

Storage container storing treatment liquid for manufacturing semico...

Micro- and nano-fluidic chip, method of fabricating the same, and a...

Treatment liquid and pattern forming method

Flow cells and methods for making the same

Heat treatment apparatus and heat treatment method

Novolak/DNQ based, chemically amplified photoresist

Organotin oxide hydroxide patterning compositions, precursors, and...

Integrated dry processes for patterning radiation photoresist patte...

Radiation-sensitive resin composition, method of forming resist pat...

Positive resist composition and pattern forming process

Apparatus, system and method

Pattern formation methods

Solution, solution storage body, actinic ray-sensitive or radiation...

Coating composition for forming resist underlayer film for EUV lith...

Method of manufacturing a semiconductor device and pattern formatio...

Positive resist composition and pattern forming process

Metal-compound-removing solvent and method in lithography

Method for preparing pixel define layer

Metal oxide resist patterning with electrical field guided post-exp...

Surface charge release in lithography developing process

Positive photosensitive resin composition, positive photosensitive...

Photoresist composition and method of forming photoresist pattern

Chamber and methods of treating a substrate after exposure to radia...

Methods of producing three-dimensional objects with apparatus havin...

Integrated dry processes for patterning radiation photoresist patte...

Methods for producing three-dimensional objects

Composition for forming silicon-containing resist underlayer film a...

Support unit, bake apparatus and substrate treating apparatus inclu...

Patents Applicationslast 30 patents

RESIST COMPOSITION, METHOD FOR MANUFACTURING RESIST FILM, AND METHO...

MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNAB...

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR D...

ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

MICRO- AND NANO-FLUIDIC CHIP, METHOD OF FABRICATING THE SAME, AND A...

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...

MICRO- AND NANO-FLUIDIC CHIP, METHOD OF FABRICATING THE SAME, AND A...

RINSE MATERIAL COMPOSITION FOR PATTERNING PROCESS USING LITHOGRAPHY...

METHOD OF INCREASING CROSSLINKING DENSITY OF PHOTORESIST

HEAT TREATMENT APPARATUS AND HEAT TREATMENT METHOD

METAL-COMPOUND-REMOVING SOLVENT AND METHOD IN LITHOGRAPHY

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS AND VIS...

PROCESS ENVIRONMENT FOR INORGANIC RESIST PATTERNING

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRC...

LOW VOLUME SHRINKAGE, HIGH ETCH RESISTANCE AND HIGH RESOLUTION PHOT...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND PATTERN FORMATIO...

PHOTOLITHOGRAPHIC RINSE COMPOSITIONS AND METHODS OF FORMING PATTERN...

POSITIVE TYPE LIFT-OFF RESIST COMPOSITION AND METHOD FOR MANUFACTUR...

SWITCHABLE UNDERLAYERS FOR EUV LITHOGRAPHY

PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN

PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS

ANTI-SPACER BASED SELF-ALIGNED HIGH ORDER PATTERNING

SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD

PHOTORESIST STRIPPER COMPOSITION AND METHOD FOR FORMING PATTERN USI...

AQUEOUS ACID DEVELOPMENT OR TREATMENT OF ORGANOMETALLIC PHOTORESIST

DRY DEVELOPMENT FOR METAL-OXIDE PHOTORESISTS

ORGANOTIN PHOTORESISTS AND METHOD OF DEVELOPING PHOTOLITHOGRAPHY PA...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...