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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing a semiconductor device and pattern formatio...
- Patent number 12,222,643
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Cheng Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 12,222,649
- Issue date Feb 11, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal-compound-removing solvent and method in lithography
- Patent number 12,210,286
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preparing pixel define layer
- Patent number 12,207,498
- Issue date Jan 21, 2025
- DUK SAN NEOLUX CO., LTD.
- Hyunsang Cho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal oxide resist patterning with electrical field guided post-exp...
- Patent number 12,204,246
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Huixiong Dai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Surface charge release in lithography developing process
- Patent number 12,204,248
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Ling Tseng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive resin composition, positive photosensitive...
- Patent number 12,195,568
- Issue date Jan 14, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masashi Iio
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition and method of forming photoresist pattern
- Patent number 12,189,287
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Li-Po Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of producing three-dimensional objects with apparatus havin...
- Patent number 12,179,435
- Issue date Dec 31, 2024
- Carbon, Inc.
- Jason P. Rolland
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chamber and methods of treating a substrate after exposure to radia...
- Patent number 12,181,801
- Issue date Dec 31, 2024
- Applied Materials, Inc.
- Dmitry Lubomirsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated dry processes for patterning radiation photoresist patte...
- Patent number 12,183,604
- Issue date Dec 31, 2024
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for producing three-dimensional objects
- Patent number 12,172,382
- Issue date Dec 24, 2024
- Carbon, Inc.
- Jason P. Rolland
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,174,541
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Support unit, bake apparatus and substrate treating apparatus inclu...
- Patent number 12,174,553
- Issue date Dec 24, 2024
- Semes Co., Ltd.
- Tae Hoon Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film material, patterning process, and method for...
- Patent number 12,147,160
- Issue date Nov 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonium salt, photoacid generator, curable composition and resist...
- Patent number 12,129,240
- Issue date Oct 29, 2024
- San-Apro Ltd.
- Takuto Nakao
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Negative resist formulation for producing undercut pattern profiles
- Patent number 12,124,166
- Issue date Oct 22, 2024
- Merck Patent GmbH
- Anupama Mukherjee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Carboxylate, resist composition and method for producing resist pat...
- Patent number 12,124,167
- Issue date Oct 22, 2024
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing integrated circuit device using a metal-con...
- Patent number 12,112,948
- Issue date Oct 8, 2024
- Samsung Electronics Co., Ltd.
- Chawon Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet photolithography method with infiltration for e...
- Patent number 12,111,576
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Christine Y Ouyang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt, quencher, resist composition and method for producing resist...
- Patent number 12,105,419
- Issue date Oct 1, 2024
- Sumitomo Chemical Company, Limited
- Katsuhiro Komuro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,085,857
- Issue date Sep 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoresist patterning process
- Patent number 12,085,858
- Issue date Sep 10, 2024
- Applied Materials, Inc.
- Huixiong Dai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laminate, optical filter, solid image pickup element, image display...
- Patent number 12,078,828
- Issue date Sep 3, 2024
- FUJIFILM Corporation
- Shunsuke Kitajima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist with polar-acid-labile-group
- Patent number 12,050,404
- Issue date Jul 30, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist structure, patterned deposition layer, semiconductor ch...
- Patent number 12,040,188
- Issue date Jul 16, 2024
- Tencent Technology (Shenzhen) Company Limited
- Wenlong Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,038,689
- Issue date Jul 16, 2024
- FUJIFILM Corporation
- Akihiro Kaneko
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for producing substrate with patterned film
- Patent number 12,038,691
- Issue date Jul 16, 2024
- Central Glass Company, Limited
- Yuzuru Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing substrate with patterned film and fluorine-con...
- Patent number 12,038,692
- Issue date Jul 16, 2024
- Central Glass Company, Limited
- Yuzuru Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for lithography in semiconductor fabrication
- Patent number 12,025,918
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Kuan Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
AQUEOUS ACID DEVELOPMENT OR TREATMENT OF ORGANOMETALLIC PHOTORESIST
- Publication number 20250053092
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Nizan Kenane
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DRY DEVELOPMENT FOR METAL-OXIDE PHOTORESISTS
- Publication number 20250028248
- Publication date Jan 23, 2025
- Applied Materials, Inc.
- NASRIN KAZEM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOTIN PHOTORESISTS AND METHOD OF DEVELOPING PHOTOLITHOGRAPHY PA...
- Publication number 20250020996
- Publication date Jan 16, 2025
- Feng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING...
- Publication number 20250020995
- Publication date Jan 16, 2025
- Samsung SDI Co., Ltd.
- Seungbeom KEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20250004374
- Publication date Jan 2, 2025
- FUJIFILM CORPORATION
- Michihiro SHIRAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
On-site Growth of Halide Perovskite Micro and Nanocrystals
- Publication number 20250003109
- Publication date Jan 2, 2025
- Massachusetts Institute of Technology
- Farnaz Niroui
- C30 - CRYSTAL GROWTH
Information Patent Application
METHOD OF FORMING PHOTORESIST PATTERNS AND BAKING EQUIPMENT
- Publication number 20250004381
- Publication date Jan 2, 2025
- Samsung Electronics Co., Ltd.
- Hyungju Ryu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST AND FORMATION METHOD THEREOF
- Publication number 20240429051
- Publication date Dec 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hui-Chun LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20240427243
- Publication date Dec 26, 2024
- FUJIFILM CORPORATION
- Michihiro SHIRAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO REDUCE DEFECTS POST-SEQUENTIAL INFILTRATION SYNTHESIS
- Publication number 20240419081
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Lin ZHOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS
- Publication number 20240419069
- Publication date Dec 19, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PREPARING PIXEL DEFINE LAYER
- Publication number 20240419070
- Publication date Dec 19, 2024
- DUK SAN NEOLUX CO., LTD.
- Jun Ki KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20240402600
- Publication date Dec 5, 2024
- Sumitomo Chemical Company, Limited
- Saki KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST PATTERNING PROCESS
- Publication number 20240393695
- Publication date Nov 28, 2024
- Applied Materials, Inc.
- Huixiong DAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS, SYSTEM AND METHOD
- Publication number 20240385525
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Po-Han Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...
- Publication number 20240377737
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Gentaro Hida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BOTTOM ANTIREFLECTIVE COATING MATERIALS
- Publication number 20240377743
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Chih Chen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...
- Publication number 20240355644
- Publication date Oct 24, 2024
- TOKYO ELECTRON LIMITED
- Shinsuke TAKAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADDITIVE FOR LITHOGRAPHY
- Publication number 20240345485
- Publication date Oct 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ching-Yu CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEAT-TREATING METHOD, HEAT-TREATING APPARATUS, AND STORAGE MEDIUM
- Publication number 20240347354
- Publication date Oct 17, 2024
- TOKYO ELECTRON LIMITED
- Ryouichirou NAITOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...
- Publication number 20240345479
- Publication date Oct 17, 2024
- Sumitomo Chemical Company, Limited
- Yukako ANRYU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20240337947
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yuan Chih LO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STEP POST-EXPOSURE TREATMENT TO IMPROVE DRY DEVELOPMENT PERFO...
- Publication number 20240329539
- Publication date Oct 3, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa TAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM
- Publication number 20240319606
- Publication date Sep 26, 2024
- Central Glass Company, Limited
- Yuzuru KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM AND FLUORINE-CON...
- Publication number 20240319607
- Publication date Sep 26, 2024
- Central Glass Company, Limited
- Yuzuru KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TRANSFER METHOD AND SUBSTRATE TRANSFER APPARATUS
- Publication number 20240310740
- Publication date Sep 19, 2024
- TOKYO ELECTRON LIMITED
- Kenichirou MATSUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF REDUCING UNDESIRED LIGHT INFLUENCE IN EXTREME ULTRAVIOLET...
- Publication number 20240295820
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung SHIH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...
- Publication number 20240280903
- Publication date Aug 22, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tzu-Yang LIN
- B82 - NANO-TECHNOLOGY
Information Patent Application
PROCESS ENVIRONMENT FOR INORGANIC RESIST PATTERNING
- Publication number 20240272557
- Publication date Aug 15, 2024
- INPRIA CORPORATION
- Alan J. Telecky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20240255848
- Publication date Aug 1, 2024
- Samsung Electronics Co., Ltd.
- Chawon KOH
- H01 - BASIC ELECTRIC ELEMENTS

Treatment before imagewise removal

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method of manufacturing a semiconductor device and pattern formatio...

Positive resist composition and pattern forming process

Metal-compound-removing solvent and method in lithography

Method for preparing pixel define layer

Metal oxide resist patterning with electrical field guided post-exp...

Surface charge release in lithography developing process

Positive photosensitive resin composition, positive photosensitive...

Photoresist composition and method of forming photoresist pattern

Methods of producing three-dimensional objects with apparatus havin...

Chamber and methods of treating a substrate after exposure to radia...

Integrated dry processes for patterning radiation photoresist patte...

Methods for producing three-dimensional objects

Composition for forming silicon-containing resist underlayer film a...

Support unit, bake apparatus and substrate treating apparatus inclu...

Resist underlayer film material, patterning process, and method for...

Sulfonium salt, photoacid generator, curable composition and resist...

Negative resist formulation for producing undercut pattern profiles

Carboxylate, resist composition and method for producing resist pat...

Method of manufacturing integrated circuit device using a metal-con...

Extreme ultraviolet photolithography method with infiltration for e...

Salt, quencher, resist composition and method for producing resist...

Composition for forming silicon-containing resist underlayer film a...

Photoresist patterning process

Laminate, optical filter, solid image pickup element, image display...

Photoresist with polar-acid-labile-group

Photoresist structure, patterned deposition layer, semiconductor ch...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Method for producing substrate with patterned film

Method for producing substrate with patterned film and fluorine-con...

Method for lithography in semiconductor fabrication

Patents Applicationslast 30 patents

AQUEOUS ACID DEVELOPMENT OR TREATMENT OF ORGANOMETALLIC PHOTORESIST

DRY DEVELOPMENT FOR METAL-OXIDE PHOTORESISTS

ORGANOTIN PHOTORESISTS AND METHOD OF DEVELOPING PHOTOLITHOGRAPHY PA...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

On-site Growth of Halide Perovskite Micro and Nanocrystals

METHOD OF FORMING PHOTORESIST PATTERNS AND BAKING EQUIPMENT

PHOTORESIST AND FORMATION METHOD THEREOF

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

METHOD TO REDUCE DEFECTS POST-SEQUENTIAL INFILTRATION SYNTHESIS

PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS

METHOD FOR PREPARING PIXEL DEFINE LAYER

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

PHOTORESIST PATTERNING PROCESS

APPARATUS, SYSTEM AND METHOD

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...

BOTTOM ANTIREFLECTIVE COATING MATERIALS

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...

ADDITIVE FOR LITHOGRAPHY

HEAT-TREATING METHOD, HEAT-TREATING APPARATUS, AND STORAGE MEDIUM

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

MULTI-STEP POST-EXPOSURE TREATMENT TO IMPROVE DRY DEVELOPMENT PERFO...

METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM

METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM AND FLUORINE-CON...

SUBSTRATE TRANSFER METHOD AND SUBSTRATE TRANSFER APPARATUS

METHOD OF REDUCING UNDESIRED LIGHT INFLUENCE IN EXTREME ULTRAVIOLET...

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...

PROCESS ENVIRONMENT FOR INORGANIC RESIST PATTERNING

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...