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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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Patents Grantslast 30 patents

Information Patent Grant
Resist underlayer film material, patterning process, and method for...
- Patent number 12,147,160
- Issue date Nov 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonium salt, photoacid generator, curable composition and resist...
- Patent number 12,129,240
- Issue date Oct 29, 2024
- San-Apro Ltd.
- Takuto Nakao
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Negative resist formulation for producing undercut pattern profiles
- Patent number 12,124,166
- Issue date Oct 22, 2024
- Merck Patent GmbH
- Anupama Mukherjee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Carboxylate, resist composition and method for producing resist pat...
- Patent number 12,124,167
- Issue date Oct 22, 2024
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing integrated circuit device using a metal-con...
- Patent number 12,112,948
- Issue date Oct 8, 2024
- Samsung Electronics Co., Ltd.
- Chawon Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet photolithography method with infiltration for e...
- Patent number 12,111,576
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Christine Y Ouyang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt, quencher, resist composition and method for producing resist...
- Patent number 12,105,419
- Issue date Oct 1, 2024
- Sumitomo Chemical Company, Limited
- Katsuhiro Komuro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,085,857
- Issue date Sep 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoresist patterning process
- Patent number 12,085,858
- Issue date Sep 10, 2024
- Applied Materials, Inc.
- Huixiong Dai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laminate, optical filter, solid image pickup element, image display...
- Patent number 12,078,828
- Issue date Sep 3, 2024
- FUJIFILM Corporation
- Shunsuke Kitajima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist with polar-acid-labile-group
- Patent number 12,050,404
- Issue date Jul 30, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist structure, patterned deposition layer, semiconductor ch...
- Patent number 12,040,188
- Issue date Jul 16, 2024
- Tencent Technology (Shenzhen) Company Limited
- Wenlong Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,038,689
- Issue date Jul 16, 2024
- FUJIFILM Corporation
- Akihiro Kaneko
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for producing substrate with patterned film
- Patent number 12,038,691
- Issue date Jul 16, 2024
- Central Glass Company, Limited
- Yuzuru Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing substrate with patterned film and fluorine-con...
- Patent number 12,038,692
- Issue date Jul 16, 2024
- Central Glass Company, Limited
- Yuzuru Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for lithography in semiconductor fabrication
- Patent number 12,025,918
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Kuan Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of storing photoresist coated substrates and semiconductor s...
- Patent number 12,025,919
- Issue date Jul 2, 2024
- Chun-Wei Liao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt, acid generator, resist composition and method for producing r...
- Patent number 12,013,636
- Issue date Jun 18, 2024
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of reducing undesired light influence in extreme ultraviolet...
- Patent number 12,013,641
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition and method of manufacturing a semiconductor...
- Patent number 11,966,162
- Issue date Apr 23, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Yang Lin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photoresist composition, coated substrate including the photoresist...
- Patent number 11,960,206
- Issue date Apr 16, 2024
- Rohm and Hass Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 11,953,829
- Issue date Apr 9, 2024
- FUJIFILM Corporation
- Kazunari Yagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Two-stage bake photoresist with releasable quencher
- Patent number 11,955,343
- Issue date Apr 9, 2024
- Intel Corporation
- Robert L. Bristol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 11,953,832
- Issue date Apr 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process environment for inorganic resist patterning
- Patent number 11,947,262
- Issue date Apr 2, 2024
- Inpria Corporation
- Alan J. Telecky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 11,940,730
- Issue date Mar 26, 2024
- Rohm and Haas Electronic Materials LLC
- Mitsuru Haga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist topcoat compositions and methods of processing photores...
- Patent number 11,940,731
- Issue date Mar 26, 2024
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monomers, polymers and lithographic compositions comprising same
- Patent number 11,932,713
- Issue date Mar 19, 2024
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 11,934,100
- Issue date Mar 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for post exposure bake of photoresist
- Patent number 11,934,103
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Douglas A Buchberger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD TO REDUCE DEFECTS POST-SEQUENTIAL INFILTRATION SYNTHESIS
- Publication number 20240419081
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Lin ZHOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS
- Publication number 20240419069
- Publication date Dec 19, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PREPARING PIXEL DEFINE LAYER
- Publication number 20240419070
- Publication date Dec 19, 2024
- DUK SAN NEOLUX CO., LTD.
- Jun Ki KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20240402600
- Publication date Dec 5, 2024
- Sumitomo Chemical Company, Limited
- Saki KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST PATTERNING PROCESS
- Publication number 20240393695
- Publication date Nov 28, 2024
- Applied Materials, Inc.
- Huixiong DAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS, SYSTEM AND METHOD
- Publication number 20240385525
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Po-Han Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...
- Publication number 20240377737
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Gentaro Hida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BOTTOM ANTIREFLECTIVE COATING MATERIALS
- Publication number 20240377743
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Chih Chen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...
- Publication number 20240355644
- Publication date Oct 24, 2024
- TOKYO ELECTRON LIMITED
- Shinsuke TAKAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADDITIVE FOR LITHOGRAPHY
- Publication number 20240345485
- Publication date Oct 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ching-Yu CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEAT-TREATING METHOD, HEAT-TREATING APPARATUS, AND STORAGE MEDIUM
- Publication number 20240347354
- Publication date Oct 17, 2024
- TOKYO ELECTRON LIMITED
- Ryouichirou NAITOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...
- Publication number 20240345479
- Publication date Oct 17, 2024
- Sumitomo Chemical Company, Limited
- Yukako ANRYU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20240337947
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yuan Chih LO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STEP POST-EXPOSURE TREATMENT TO IMPROVE DRY DEVELOPMENT PERFO...
- Publication number 20240329539
- Publication date Oct 3, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa TAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM
- Publication number 20240319606
- Publication date Sep 26, 2024
- Central Glass Company, Limited
- Yuzuru KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM AND FLUORINE-CON...
- Publication number 20240319607
- Publication date Sep 26, 2024
- Central Glass Company, Limited
- Yuzuru KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TRANSFER METHOD AND SUBSTRATE TRANSFER APPARATUS
- Publication number 20240310740
- Publication date Sep 19, 2024
- TOKYO ELECTRON LIMITED
- Kenichirou MATSUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF REDUCING UNDESIRED LIGHT INFLUENCE IN EXTREME ULTRAVIOLET...
- Publication number 20240295820
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung SHIH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...
- Publication number 20240280903
- Publication date Aug 22, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tzu-Yang LIN
- B82 - NANO-TECHNOLOGY
Information Patent Application
PROCESS ENVIRONMENT FOR INORGANIC RESIST PATTERNING
- Publication number 20240272557
- Publication date Aug 15, 2024
- INPRIA CORPORATION
- Alan J. Telecky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20240255848
- Publication date Aug 1, 2024
- Samsung Electronics Co., Ltd.
- Chawon KOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...
- Publication number 20240255846
- Publication date Aug 1, 2024
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST AND FORMATION METHOD THEREOF
- Publication number 20240242966
- Publication date Jul 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hui-Chun LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...
- Publication number 20240231226
- Publication date Jul 11, 2024
- Sumitomo Chemical Company, Limited
- Shohei TERAHIGASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BIASABLE ELECTROSTATIC CHUCK
- Publication number 20240234108
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Paneendra Prakash Bhat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SEMICONDUCTOR MANUFACTURING EQUI...
- Publication number 20240222163
- Publication date Jul 4, 2024
- SEMES CO., LTD.
- Ju Won KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METH...
- Publication number 20240210823
- Publication date Jun 27, 2024
- Sumitomo Chemical Company, Limited
- Shohei TERAHIGASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USI...
- Publication number 20240210832
- Publication date Jun 27, 2024
- Samsung Electronics Co., Ltd.
- Chawon KOH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE SURFACE TREATMENT AGENT, LAMINATE, TRANSISTOR, METHO...
- Publication number 20240201575
- Publication date Jun 20, 2024
- Nikon Corporation
- Yusuke KAWAKAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRECURSORS AND METHODS FOR PRODUCING TIN-BASED PHOTORESIST
- Publication number 20240201586
- Publication date Jun 20, 2024
- Intel Corporation
- James Blackwell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Treatment before imagewise removal

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Resist underlayer film material, patterning process, and method for...

Sulfonium salt, photoacid generator, curable composition and resist...

Negative resist formulation for producing undercut pattern profiles

Carboxylate, resist composition and method for producing resist pat...

Method of manufacturing integrated circuit device using a metal-con...

Extreme ultraviolet photolithography method with infiltration for e...

Salt, quencher, resist composition and method for producing resist...

Composition for forming silicon-containing resist underlayer film a...

Photoresist patterning process

Laminate, optical filter, solid image pickup element, image display...

Photoresist with polar-acid-labile-group

Photoresist structure, patterned deposition layer, semiconductor ch...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Method for producing substrate with patterned film

Method for producing substrate with patterned film and fluorine-con...

Method for lithography in semiconductor fabrication

Method of storing photoresist coated substrates and semiconductor s...

Salt, acid generator, resist composition and method for producing r...

Method of reducing undesired light influence in extreme ultraviolet...

Photoresist composition and method of manufacturing a semiconductor...

Photoresist composition, coated substrate including the photoresist...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Two-stage bake photoresist with releasable quencher

Positive resist composition and pattern forming process

Process environment for inorganic resist patterning

Photoresist compositions and pattern formation methods

Photoresist topcoat compositions and methods of processing photores...

Monomers, polymers and lithographic compositions comprising same

Composition for forming silicon-containing resist underlayer film a...

Apparatus for post exposure bake of photoresist

Patents Applicationslast 30 patents

METHOD TO REDUCE DEFECTS POST-SEQUENTIAL INFILTRATION SYNTHESIS

PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS

METHOD FOR PREPARING PIXEL DEFINE LAYER

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

PHOTORESIST PATTERNING PROCESS

APPARATUS, SYSTEM AND METHOD

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...

BOTTOM ANTIREFLECTIVE COATING MATERIALS

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...

ADDITIVE FOR LITHOGRAPHY

HEAT-TREATING METHOD, HEAT-TREATING APPARATUS, AND STORAGE MEDIUM

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

MULTI-STEP POST-EXPOSURE TREATMENT TO IMPROVE DRY DEVELOPMENT PERFO...

METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM

METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM AND FLUORINE-CON...

SUBSTRATE TRANSFER METHOD AND SUBSTRATE TRANSFER APPARATUS

METHOD OF REDUCING UNDESIRED LIGHT INFLUENCE IN EXTREME ULTRAVIOLET...

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...

PROCESS ENVIRONMENT FOR INORGANIC RESIST PATTERNING

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...

PHOTORESIST AND FORMATION METHOD THEREOF

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...

BIASABLE ELECTROSTATIC CHUCK

SUBSTRATE PROCESSING APPARATUS AND SEMICONDUCTOR MANUFACTURING EQUI...

CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METH...

PHOTORESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USI...

PHOTOSENSITIVE SURFACE TREATMENT AGENT, LAMINATE, TRANSISTOR, METHO...

PRECURSORS AND METHODS FOR PRODUCING TIN-BASED PHOTORESIST