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using a combination of a phenolic resin and a polyoxyethylene resin

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  • CPC
  • G03F7/0381
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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/0381using a combination of a phenolic resin and a polyoxyethylene resin
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Patents Grantslast 30 patents

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    Compound, resin and photoresist composition
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    • Patent number 4,251,619
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    3869292
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    3657383
    • Patent number 3,657,383
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    3651170
    • Patent number 3,651,170
    • Issue date Mar 21, 1972
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    3615532
    • Patent number 3,615,532
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    3556952
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    3514288
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    3350202
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    3342606
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    3309202
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    3285745
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    3231377
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    3231378
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    3231381
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Patents Applicationslast 30 patents