using a scanning corpuscular radiation beam

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G03F7/2059

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/2059using a scanning corpuscular radiation beam

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Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam writing apparatus, charged particle beam writ...
- Patent number 12,198,891
- Issue date Jan 14, 2025
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern measurement device and pattern measurement method
- Patent number 12,174,551
- Issue date Dec 24, 2024
- Hitachi High-Technologies Corporation
- Takuma Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication method of holographic security label
- Patent number 11,846,888
- Issue date Dec 19, 2023
- KAUNAS UNIVERSITY OF TECHNOLOGY
- Viktoras Grigaliunas
- B42 - BOOKBINDING ALBUMS FILES SPECIAL PRINTED MATTER
Information Patent Grant
Resist underlayer film-forming composition containing indolocarbazo...
- Patent number 11,720,024
- Issue date Aug 8, 2023
- Nissan Chemical Industries, Ltd.
- Hikaru Tokunaga
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,709,425
- Issue date Jul 25, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Takaya Maehashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, and compound
- Patent number 11,635,686
- Issue date Apr 25, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Ikeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for measuring distance of diffusion of curing catalyst
- Patent number 11,592,287
- Issue date Feb 28, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,586,111
- Issue date Feb 21, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuhiro Yoshii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for measuring distance of diffusion of curing catalyst
- Patent number 11,555,697
- Issue date Jan 17, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Atomic-scale e-beam sculptor
- Patent number 11,518,674
- Issue date Dec 6, 2022
- UT-Battelle, LLC
- Sergei V. Kalinin
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Secondary electron generating composition
- Patent number 11,487,199
- Issue date Nov 1, 2022
- The University of Manchester
- Scott Lewis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabricating calcite nanofluidic channels
- Patent number 11,366,391
- Issue date Jun 21, 2022
- Saudi Arabian Oil Company
- Dong Kyu Cha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pattern measurement device and pattern measurement method
- Patent number 11,353,798
- Issue date Jun 7, 2022
- Hitachi High-Technologies Corporation
- Takuma Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multibeamlet charged particle device and method
- Patent number 11,309,163
- Issue date Apr 19, 2022
- Applied Materials, Inc.
- Mehdi Vaez-Iravani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,275,306
- Issue date Mar 15, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Kojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Nanomaterial ribbon patterning method and nanomaterial ribbon patte...
- Patent number 11,247,908
- Issue date Feb 15, 2022
- CENTER FOR ADVANCED META-MATERIALS
- Se Jeong Won
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Graphene-semiconductor based wavelength selective photodetector for...
- Patent number 11,222,756
- Issue date Jan 11, 2022
- The University of Hong Kong
- Jinyao Tang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive composition, pattern-forming method and radiati...
- Patent number 11,204,552
- Issue date Dec 21, 2021
- JSR Corporation
- Tomoki Nagai
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist underlayer film-forming composition containing naphthol aral...
- Patent number 11,199,775
- Issue date Dec 14, 2021
- NISSAN CHEMICAL CORPORATION
- Ryo Karasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition containing novolac polym...
- Patent number 11,199,777
- Issue date Dec 14, 2021
- Nissan Chemical Industries, Ltd.
- Hirokazu Nishimaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist composition and patterning process
- Patent number 11,175,580
- Issue date Nov 16, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive composition, method fo...
- Patent number 11,156,915
- Issue date Oct 26, 2021
- FUJIFILM Corporation
- Hideaki Tsubaki
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Fabricating unique chips using a charged particle multi-beamlet lit...
- Patent number 11,152,302
- Issue date Oct 19, 2021
- ASML Netherlands B.V.
- Marcel Nicolaas Jacobus van Kervinck
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Fabrication of micro/nanoscale barcodes using cantilever-free scann...
- Patent number 11,143,960
- Issue date Oct 12, 2021
- Tera-Print, LLC
- Andrey Ivankin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fabrication methods for nanodelivery systems for long term controll...
- Patent number 11,103,460
- Issue date Aug 31, 2021
- Board of Regents, The University of Texas System
- Paul S. Ho
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 11,099,479
- Issue date Aug 24, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Portion of layer removal at substrate edge
- Patent number 11,054,746
- Issue date Jul 6, 2021
- Applied Materials, Inc.
- Banqiu Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive compound, photoacid generator and resist composition...
- Patent number 11,048,166
- Issue date Jun 29, 2021
- Toyo Gosei Co., Ltd.
- Michiya Naito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical surface-scattering elements and metasurfaces
- Patent number 11,037,973
- Issue date Jun 15, 2021
- Elwha LLC
- Gleb M Akselrod
- B82 - NANO-TECHNOLOGY
Information Patent Grant
All water-based nanopatterning
- Patent number 11,009,792
- Issue date May 18, 2021
- Tufts University
- Fiorenzo G. Omenetto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SCANNING ELECTRON MICROSCOPIC DIRECT-WRITE LITHOGRAPHY SYSTEM BASED...
- Publication number 20250021014
- Publication date Jan 16, 2025
- TSINGHUA UNIVERSITY
- Zhen ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20250013152
- Publication date Jan 9, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20250004371
- Publication date Jan 2, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro FUKUSHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PRIMER FOR SEMICONDUCTOR SUBSTRATE AND METHOD FOR FORMING A PATTERN
- Publication number 20240385521
- Publication date Nov 21, 2024
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240377730
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240377741
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
- Publication number 20240369928
- Publication date Nov 7, 2024
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UNDERLAYER COMPOUND FOR PHOTOLITHOGRAPHY, MULTILAYERED STRUCTURE FO...
- Publication number 20240295818
- Publication date Sep 5, 2024
- Inha University Research and Business Foundation
- Jinkyun LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
- Publication number 20240242919
- Publication date Jul 18, 2024
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSULATING SELF-DEVELOPING RESIST FOR ELECTRONIC DEVICES AND QUANTU...
- Publication number 20240234206
- Publication date Jul 11, 2024
- California Institute of Technology
- Axel SCHERER
- B82 - NANO-TECHNOLOGY
Information Patent Application
CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND M...
- Publication number 20240199540
- Publication date Jun 20, 2024
- Samsung Electronics Co., Ltd.
- Hoyoon PARK
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240192591
- Publication date Jun 13, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRIT...
- Publication number 20240186100
- Publication date Jun 6, 2024
- NuFlare Technology, Inc.
- Shuji YOSHINO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING INDOLOCARBAZO...
- Publication number 20230324802
- Publication date Oct 12, 2023
- Nissan Chemical Industries, Ltd.
- Hikaru TOKUNAGA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SECONDARY ELECTRON GENERATING COMPOSITION
- Publication number 20230266665
- Publication date Aug 24, 2023
- The University of Manchester
- Scott LEWIS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...
- Publication number 20230187172
- Publication date Jun 15, 2023
- NuFlare Technology, Inc.
- Yasuo KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM MANIPULATOR IN CHARGED PARTICLE-BEAM EXPOSURE APPARATUS
- Publication number 20230124558
- Publication date Apr 20, 2023
- ASML NETHERLANDS B.V.
- Johannes Cornelis Jacobus DE LANGEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHADOW WALLS FOR USE IN FABRICATING DEVICES
- Publication number 20230106283
- Publication date Apr 6, 2023
- Microsoft Technology Licensing, LLC
- Elvedin MEMISEVIC
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRIT...
- Publication number 20230102923
- Publication date Mar 30, 2023
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING INDOLOCARBAZO...
- Publication number 20220404707
- Publication date Dec 22, 2022
- Nissan Chemical Industries, Ltd.
- Hikaru TOKUNAGA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRIT...
- Publication number 20220367143
- Publication date Nov 17, 2022
- NuFlare Technology, Inc.
- Taku YAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS FOR HYBRID SURFACE STRUCTURING BY PLASMA ETCHING
- Publication number 20220350252
- Publication date Nov 3, 2022
- Commissariat A L'Energie Atomique et Aux Energies Alternatives
- Hubert TEYSSEDRE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SCANNING ELECTRON MICROSCOPIC DIRECT-WRITE LITHOGRAPHY SYSTEM BASED...
- Publication number 20220291589
- Publication date Sep 15, 2022
- TSINGHUA UNIVERSITY
- Zhen ZHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern Measurement Device and Pattern Measurement Method
- Publication number 20220260930
- Publication date Aug 18, 2022
- HITACHI HIGH-TECH CORPORATION
- Takuma Yamamoto
- G01 - MEASURING TESTING
Information Patent Application
VACUUM APPARATUS
- Publication number 20220172922
- Publication date Jun 2, 2022
- NuFlare Technology, Inc.
- Yoshiaki SHINOHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PRODUCING MOLDED PRODUCT, RESIST FOR COLLECTIVE MOLDING W...
- Publication number 20210397097
- Publication date Dec 23, 2021
- TOKYO UNIVERSITY OF SCIENCE FOUNDATION
- Jun TANIGUCHI
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
FABRICATION METHOD OF HOLOGRAPHIC SECURITY LABEL
- Publication number 20210318621
- Publication date Oct 14, 2021
- Kaunas University of Technology
- Viktoras Grigaliunas
- B42 - BOOKBINDING ALBUMS FILES SPECIAL PRINTED MATTER
Information Patent Application
MASK-LESS LASER DIRECT IMAGING SYSTEM
- Publication number 20210063884
- Publication date Mar 4, 2021
- SHUZ TUNG MACHINERY INDUSTRIAL CO.,LTD.
- KUO-SHU HUNG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GRAPHENE-SEMICONDUCTOR BASED WAVELENGTH SELECTIVE PHOTODETECTOR FOR...
- Publication number 20210005398
- Publication date Jan 7, 2021
- The University of Hong Kong
- Jinyao Tang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING A PLANAR POLYMER STACK
- Publication number 20200371437
- Publication date Nov 26, 2020
- Arkema France
- Xavier CHEVALIER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

using a scanning corpuscular radiation beam

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Charged particle beam writing apparatus, charged particle beam writ...

Pattern measurement device and pattern measurement method

Fabrication method of holographic security label

Resist underlayer film-forming composition containing indolocarbazo...

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, and compound

Method for measuring distance of diffusion of curing catalyst

Resist composition and method of forming resist pattern

Method for measuring distance of diffusion of curing catalyst

Atomic-scale e-beam sculptor

Secondary electron generating composition

Fabricating calcite nanofluidic channels

Pattern measurement device and pattern measurement method

Multibeamlet charged particle device and method

Resist composition and method of forming resist pattern

Nanomaterial ribbon patterning method and nanomaterial ribbon patte...

Graphene-semiconductor based wavelength selective photodetector for...

Radiation-sensitive composition, pattern-forming method and radiati...

Resist underlayer film-forming composition containing naphthol aral...

Resist underlayer film-forming composition containing novolac polym...

Resist composition and patterning process

Actinic ray-sensitive or radiation-sensitive composition, method fo...

Fabricating unique chips using a charged particle multi-beamlet lit...

Fabrication of micro/nanoscale barcodes using cantilever-free scann...

Fabrication methods for nanodelivery systems for long term controll...

Resist composition, method of forming resist pattern, polymeric com...

Portion of layer removal at substrate edge

Photosensitive compound, photoacid generator and resist composition...

Optical surface-scattering elements and metasurfaces

All water-based nanopatterning

Patents Applicationslast 30 patents

SCANNING ELECTRON MICROSCOPIC DIRECT-WRITE LITHOGRAPHY SYSTEM BASED...

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

PRIMER FOR SEMICONDUCTOR SUBSTRATE AND METHOD FOR FORMING A PATTERN

RESIST COMPOSITION AND PATTERN FORMING PROCESS

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

UNDERLAYER COMPOUND FOR PHOTOLITHOGRAPHY, MULTILAYERED STRUCTURE FO...

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

INSULATING SELF-DEVELOPING RESIST FOR ELECTRONIC DEVICES AND QUANTU...

CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND M...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRIT...

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING INDOLOCARBAZO...

SECONDARY ELECTRON GENERATING COMPOSITION

MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PA...

BEAM MANIPULATOR IN CHARGED PARTICLE-BEAM EXPOSURE APPARATUS

SHADOW WALLS FOR USE IN FABRICATING DEVICES

CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRIT...

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING INDOLOCARBAZO...

CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRIT...

PROCESS FOR HYBRID SURFACE STRUCTURING BY PLASMA ETCHING

SCANNING ELECTRON MICROSCOPIC DIRECT-WRITE LITHOGRAPHY SYSTEM BASED...

Pattern Measurement Device and Pattern Measurement Method

VACUUM APPARATUS

METHOD OF PRODUCING MOLDED PRODUCT, RESIST FOR COLLECTIVE MOLDING W...

FABRICATION METHOD OF HOLOGRAPHIC SECURITY LABEL

MASK-LESS LASER DIRECT IMAGING SYSTEM

GRAPHENE-SEMICONDUCTOR BASED WAVELENGTH SELECTIVE PHOTODETECTOR FOR...

METHOD FOR PRODUCING A PLANAR POLYMER STACK