using corpuscular radiation other than electron beams

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CPC
G03F7/2065

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/2065using corpuscular radiation other than electron beams

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Fabrication methods for nanodelivery systems for long term controll...
- Patent number 11,103,460
- Issue date Aug 31, 2021
- Board of Regents, The University of Texas System
- Paul S. Ho
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Device and method of manufacturing a structure made of a curable ma...
- Patent number 11,014,269
- Issue date May 25, 2021
- Fraunhofer-Gesellschaft zur Foerderung der angewandten Forschung e.V.
- Frank Wippermann
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Pattern formation method, active light-sensitive or radiation-sensi...
- Patent number 10,444,627
- Issue date Oct 15, 2019
- FUJIFILM Corporation
- Hiroo Takizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 9,904,168
- Issue date Feb 27, 2018
- Fujifilm Corporation
- Natsumi Yokokawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabricating reflective photomask
- Patent number 9,726,970
- Issue date Aug 8, 2017
- SK Hynix Inc.
- Choong Han Ryu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for improving critical dimension uniformity using...
- Patent number 9,104,109
- Issue date Aug 11, 2015
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 9,076,564
- Issue date Jul 7, 2015
- Nuflare Technology, Inc.
- Ryoichi Yoshikawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Developer for photosensitive resist material and patterning process
- Patent number 9,057,959
- Issue date Jun 16, 2015
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developer for photosensitive resist material and patterning process
- Patent number 9,052,602
- Issue date Jun 9, 2015
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developer and patterning process
- Patent number 8,911,929
- Issue date Dec 16, 2014
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 8,741,547
- Issue date Jun 3, 2014
- Nuflare Technology, Inc.
- Ryoichi Yoshikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Self-powered lithography method and apparatus using radioactive thi...
- Patent number 8,658,993
- Issue date Feb 25, 2014
- Cornell University
- Amit Lal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Accelerator on a chip having a cold ion source
- Patent number 8,541,757
- Issue date Sep 24, 2013
- Transmute, Inc.
- Kim L. Hailey
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for forming etching mask, method for fabricating three-dimen...
- Patent number 8,337,712
- Issue date Dec 25, 2012
- Canon Kabushiki Kaisha
- Kenji Tamamori
- G02 - OPTICS
Information Patent Grant
Resistless lithography method for fabricating fine structures
- Patent number 7,318,993
- Issue date Jan 15, 2008
- Infineon Technologies AG
- Rodger Fehlhaber
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Structured organic materials and devices using low-energy particle...
- Patent number 6,943,359
- Issue date Sep 13, 2005
- University of Utah
- Z. Valy Vardeny
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nano-lithography using squeezed atomic and molecular states
- Patent number 6,891,152
- Issue date May 10, 2005
- Yeda Research and Development Co. Ltd.
- Eliyahu Averbukh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic lithography of two dimensional nanostructures
- Patent number 6,787,759
- Issue date Sep 7, 2004
- Wisconsin Alumni Research Foundation
- Mark E. Saffman
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Nanometric scale coherently controlled molecular deposition
- Patent number 6,548,124
- Issue date Apr 15, 2003
- Yeda Research and Development Co. Ltd.
- Paul Brumer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Micromachining using high energy light ions
- Patent number 6,455,233
- Issue date Sep 24, 2002
- National University of Singapore
- Frank Watt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a pattern by making use of hybrid exposure
- Patent number 6,337,163
- Issue date Jan 8, 2002
- Kabushiki Kaisha Toshiba
- Yasuhiko Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of molecular-scale pattern imprinting at surfaces
- Patent number 6,319,566
- Issue date Nov 20, 2001
- John C. Polanyi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of molecular-scale pattern imprinting at surfaces
- Patent number 6,156,393
- Issue date Dec 5, 2000
- Polanyi; John C.
- John C. Polanyi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and apparatus for direct writing of semiconductor die using...
- Patent number 6,145,438
- Issue date Nov 14, 2000
- C. Neil Berglund
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for manufacturing low work function surfaces
- Patent number 6,117,344
- Issue date Sep 12, 2000
- Borealis Technical Limited
- Isaiah Watas Cox
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Ultra-fine microfabrication method using an energy beam
- Patent number 6,048,671
- Issue date Apr 11, 2000
- Ebara Corporation
- Masahiro Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for patterning film and method for exposing resist film
- Patent number 6,048,668
- Issue date Apr 11, 2000
- Fujitsu Limited
- Tsunehiro Hato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for charged particle beam exposure
- Patent number 6,046,459
- Issue date Apr 4, 2000
- Fujitsu Limited
- Nobuyuki Yasutake
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and apparatus for charged particle beam exposure
- Patent number 6,015,975
- Issue date Jan 18, 2000
- Fujitsu Limited
- Kenichi Kawakami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fabrication apparatus employing energy beam
- Patent number 6,015,976
- Issue date Jan 18, 2000
- Ebara Corporation
- Masahiro Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...
- Publication number 20190196328
- Publication date Jun 27, 2019
- FUJIFILM CORPORATION
- Fumihiro YOSHINO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMATION METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSI...
- Publication number 20160147154
- Publication date May 26, 2016
- FUJIFILM CORPORATION
- Hiroo TAKIZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING METHOD, AND TEMPLATE FOR NANOIMPRINT AND PRODUCING METHO...
- Publication number 20160077436
- Publication date Mar 17, 2016
- Kabushiki Kaisha Toshiba
- Hideaki SAKURAI
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
DEVELOPER FOR PHOTOSENSITIVE RESIST MATERIAL AND PATTERNING PROCESS
- Publication number 20140377706
- Publication date Dec 25, 2014
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVELOPER FOR PHOTOSENSITIVE RESIST MATERIAL AND PATTERNING PROCESS
- Publication number 20140370441
- Publication date Dec 18, 2014
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20140225008
- Publication date Aug 14, 2014
- NuFlare Technology, Inc.
- Ryoichi YOSHIKAWA
- B82 - NANO-TECHNOLOGY
Information Patent Application
DEVELOPER AND PATTERNING PROCESS
- Publication number 20140141377
- Publication date May 22, 2014
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
METHOD AND SYSTEM FOR IMPROVING CRITICAL DIMENSION UNIFORMITY USING...
- Publication number 20140127628
- Publication date May 8, 2014
- D2S, INC.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithographic Pattern Development Process For Amorphous Fluoropolymer
- Publication number 20140065551
- Publication date Mar 6, 2014
- ALDO JESORKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20130157198
- Publication date Jun 20, 2013
- NuFlare Technology, Inc.
- Ryoichi YOSHIKAWA
- B82 - NANO-TECHNOLOGY
Information Patent Application
Switchable Neutral Beam Source
- Publication number 20110177694
- Publication date Jul 21, 2011
- Lee Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELF-POWERED LITHOGRAPHY METHOD AND APPARATUS USING RADIOACTIVE THI...
- Publication number 20110014572
- Publication date Jan 20, 2011
- Cornell Research Foundation, Inc.
- Amit Lal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Image Producing Methods and Image Producing Devices
- Publication number 20080298542
- Publication date Dec 4, 2008
- Natalia Viktorovna Ivanova
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING ETCHING MASK, METHOD FOR FABRICATING THREE-DIMEN...
- Publication number 20080283493
- Publication date Nov 20, 2008
- Canon Kabushiki Kaisha
- Kenji Tamamori
- G02 - OPTICS
Information Patent Application
Resistless lithography method for fabricating fine structures
- Publication number 20050106861
- Publication date May 19, 2005
- Rodger Fehlhaber
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Structured organic materials and devices using low-energy particle...
- Publication number 20040113098
- Publication date Jun 17, 2004
- Z Valy Vardeny
- G02 - OPTICS
Information Patent Application
Nano-lithography using squeezed atomic and molecular states
- Publication number 20030152841
- Publication date Aug 14, 2003
- Yeda Research and Development Co. Ltd.
- Eliyahu Averbukh
- B82 - NANO-TECHNOLOGY
Information Patent Application
Photoresists for imaging with high energy radiation
- Publication number 20020051932
- Publication date May 2, 2002
- Shipley Company, L.L.C.
- Robert L. Brainard
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

using corpuscular radiation other than electron beams

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Fabrication methods for nanodelivery systems for long term controll...

Device and method of manufacturing a structure made of a curable ma...

Pattern formation method, active light-sensitive or radiation-sensi...

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Method of fabricating reflective photomask

Method and system for improving critical dimension uniformity using...

Multi charged particle beam writing apparatus and multi charged par...

Developer for photosensitive resist material and patterning process

Developer for photosensitive resist material and patterning process

Developer and patterning process

Multi charged particle beam writing apparatus and multi charged par...

Self-powered lithography method and apparatus using radioactive thi...

Accelerator on a chip having a cold ion source

Method for forming etching mask, method for fabricating three-dimen...

Resistless lithography method for fabricating fine structures

Structured organic materials and devices using low-energy particle...

Nano-lithography using squeezed atomic and molecular states

Atomic lithography of two dimensional nanostructures

Nanometric scale coherently controlled molecular deposition

Micromachining using high energy light ions

Method of forming a pattern by making use of hybrid exposure

Method of molecular-scale pattern imprinting at surfaces

Method of molecular-scale pattern imprinting at surfaces

Method and apparatus for direct writing of semiconductor die using...

Method for manufacturing low work function surfaces

Ultra-fine microfabrication method using an energy beam

Method for patterning film and method for exposing resist film

Method and system for charged particle beam exposure

Method and apparatus for charged particle beam exposure

Fabrication apparatus employing energy beam

Patents Applicationslast 30 patents

PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...

PATTERN FORMATION METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSI...

PATTERNING METHOD, AND TEMPLATE FOR NANOIMPRINT AND PRODUCING METHO...

DEVELOPER FOR PHOTOSENSITIVE RESIST MATERIAL AND PATTERNING PROCESS

DEVELOPER FOR PHOTOSENSITIVE RESIST MATERIAL AND PATTERNING PROCESS

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

DEVELOPER AND PATTERNING PROCESS

METHOD AND SYSTEM FOR IMPROVING CRITICAL DIMENSION UNIFORMITY USING...

Lithographic Pattern Development Process For Amorphous Fluoropolymer

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

Switchable Neutral Beam Source

SELF-POWERED LITHOGRAPHY METHOD AND APPARATUS USING RADIOACTIVE THI...

Image Producing Methods and Image Producing Devices

METHOD FOR FORMING ETCHING MASK, METHOD FOR FABRICATING THREE-DIMEN...

Resistless lithography method for fabricating fine structures

Structured organic materials and devices using low-energy particle...

Nano-lithography using squeezed atomic and molecular states

Photoresists for imaging with high energy radiation