using electric current

Industry

CPC
B24B37/046

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Parent Industries

BPERFORMING OPERATIONS TRANSPORTING B24Grinding technology B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS B24B37/00Lapping machines or devices Accessories

Current Industry

B24B37/046using electric current

Industries

Patents Grantslast 30 patents

Information Patent Grant
Electrical cleaning tool for wafer polishing tool system
- Patent number 12,128,455
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Wen Liu
- B08 - CLEANING
Information Patent Grant
Face-up wafer electrochemical planarization apparatus
- Patent number 12,090,600
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Kevin H. Song
- B24 - GRINDING POLISHING
Information Patent Grant
Electrochemical mechanical polishing and planarization equipment fo...
- Patent number 12,017,293
- Issue date Jun 25, 2024
- HANGZHOU SIZONE ELECTRONIC TECHNOLOGY INC.
- Yaomin Deng
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Chemical-mechanical polishing system with a potentiostat and pulsed...
- Patent number 12,011,800
- Issue date Jun 18, 2024
- BRUKER NANO INC.
- Vladimir Gulkov
- B24 - GRINDING POLISHING
Information Patent Grant
Electropolishing method
- Patent number 11,873,572
- Issue date Jan 16, 2024
- 3DM BIOMEDICAL PTY LTD
- Dean Klower
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Chemical mechanical polishing with applied magnetic field
- Patent number 11,787,008
- Issue date Oct 17, 2023
- Applied Materials, Inc.
- Xingfeng Wang
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical-mechanical polishing system with a potentiostat and pulsed...
- Patent number 11,389,923
- Issue date Jul 19, 2022
- BRUKER NANO, INC.
- Vladimir Gulkov
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus and polishing method
- Patent number 11,260,499
- Issue date Mar 1, 2022
- Ebara Corporation
- Taro Takahashi
- B24 - GRINDING POLISHING
Information Patent Grant
Method for manufacturing solid oxide and device therefor
- Patent number 11,220,757
- Issue date Jan 11, 2022
- OSAKA UIVERSITY
- Kazuto Yamauchi
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Methods and systems for providing electrical power to one or more h...
- Patent number 11,037,586
- Issue date Jun 15, 2021
- Seagate Technology LLC
- Andrew Sherve
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing apparatus and method
- Patent number 10,967,478
- Issue date Apr 6, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shich-Chang Suen
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing system and method
- Patent number 10,967,479
- Issue date Apr 6, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chin-Wei Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Planarization apparatus and planarization method thereof
- Patent number 10,879,077
- Issue date Dec 29, 2020
- Taiwan Semiconductor Manufacturing Company Ltd.
- Ming-Tung Wu
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
End point detection method, polishing apparatus, and polishing method
- Patent number 10,759,019
- Issue date Sep 1, 2020
- Ebara Corporation
- Taro Takahashi
- G01 - MEASURING TESTING
Information Patent Grant
Polishing endpoint detection method
- Patent number 10,744,617
- Issue date Aug 18, 2020
- Ebara Corporation
- Taro Takahashi
- B24 - GRINDING POLISHING
Information Patent Grant
One or more charging members used in the manufacture of a lapping p...
- Patent number 10,654,146
- Issue date May 19, 2020
- Seagate Technology LLC
- Mihaela Ruxandra Baurceanu
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing smart ring
- Patent number 10,513,008
- Issue date Dec 24, 2019
- Applied Materials, Inc.
- Zubin Huang
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing system and method
- Patent number 10,350,726
- Issue date Jul 16, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chin-Wei Liang
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus and method for plating and/or polishing wafer
- Patent number 10,227,705
- Issue date Mar 12, 2019
- ACM Research (Shanghai) Inc.
- Jian Wang
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Chemical mechanical planarization apparatus and methods
- Patent number 9,950,405
- Issue date Apr 24, 2018
- Semiconductor Manufacturing International (Beijing) Corporation
- Wufeng Deng
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Observation and photography apparatus
- Patent number 9,804,067
- Issue date Oct 31, 2017
- KAGOSHIMA UNIVERSITY, NATIONAL UNIVERSITY CORPORATION
- Yoshitaka Adachi
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Polishing device for removing polishing byproducts
- Patent number 9,511,475
- Issue date Dec 6, 2016
- Semiconductor Manufacturing International (Shanghai) Corporation
- Feng Chen
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing apparatus and polishing method using...
- Patent number 9,481,069
- Issue date Nov 1, 2016
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yuan-Hsuan Chen
- B24 - GRINDING POLISHING
Information Patent Grant
Electrically assisted chemical-mechanical planarization (EACMP) sys...
- Patent number 9,375,821
- Issue date Jun 28, 2016
- National Taiwan University of Science and Technology
- Chao-Chang Chen
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for removing polishing byproducts and polishing device
- Patent number 8,808,063
- Issue date Aug 19, 2014
- Semiconductor Manufacturing International (Shanghai) Corporation
- Feng Chen
- B24 - GRINDING POLISHING
Information Patent Grant
System, method and apparatus for enhanced cleaning and polishing of...
- Patent number 8,727,832
- Issue date May 20, 2014
- HGST Netherlands B.V.
- Xing-Cai Guo
- B24 - GRINDING POLISHING
Information Patent Grant
Surface treatment method and device thereof
- Patent number 8,470,159
- Issue date Jun 25, 2013
- NATIONAL TAIWAN UNIVERSITY
- Yao Yang Tsai
- B24 - GRINDING POLISHING
Information Patent Grant
System and method for cleaning a charging wafer surface
- Patent number 8,336,148
- Issue date Dec 25, 2012
- STMicroelectronics, Inc.
- John H. Zhang
- B24 - GRINDING POLISHING
Information Patent Grant
Methods and apparatuses for electrochemical-mechanical polishing
- Patent number 8,101,060
- Issue date Jan 24, 2012
- Round Rock Research, LLC
- Whonchee Lee
- B24 - GRINDING POLISHING
Information Patent Grant
Multi-layer polishing pad for low-pressure polishing
- Patent number 8,066,552
- Issue date Nov 29, 2011
- Applied Materials, Inc.
- Alain Duboust
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
FACE-UP WAFER ELECTROCHEMICAL PLANARIZATION APPARATUS
- Publication number 20250001547
- Publication date Jan 2, 2025
- Applied Materials, Inc.
- Kevin H. Song
- B24 - GRINDING POLISHING
Information Patent Application
ELECTRICAL CLEANING TOOL FOR WAFER POLISHING TOOL SYSTEM
- Publication number 20240367202
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Wen Liu
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL-MECHANICAL POLISHING SYSTEM WITH A POTENTIOSTAT AND PULSED...
- Publication number 20240286242
- Publication date Aug 29, 2024
- Bruker Nano Inc.
- Vladimir Gulkov
- B24 - GRINDING POLISHING
Information Patent Application
ELECTRICAL CLEANING TOOL FOR WAFER POLISHING TOOL SYSTEM
- Publication number 20240050995
- Publication date Feb 15, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Wen Liu
- B08 - CLEANING
Information Patent Application
FACE-UP WAFER ELECTROCHEMICAL PLANARIZATION APPARATUS
- Publication number 20230390887
- Publication date Dec 7, 2023
- Applied Materials, Inc.
- Kevin H. Song
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING APPARATUS AND METHOD USING THE SAME
- Publication number 20230191555
- Publication date Jun 22, 2023
- Samsung Electronics Co., Ltd.
- Chaelyoung Kim
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE POLISHING APPARATUS, SUBSTRATE POLISHING SYSTEM INCLUDING...
- Publication number 20230131040
- Publication date Apr 27, 2023
- Samsung Electronics Co., Ltd.
- Jaehyug LEE
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL-MECHANICAL POLISHING SYSTEM WITH A POTENTIOSTAT AND PULSED...
- Publication number 20220324080
- Publication date Oct 13, 2022
- Bruker Nano Inc.
- Vladimir Gulkov
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING WITH APPLIED MAGNETIC FIELD
- Publication number 20220193859
- Publication date Jun 23, 2022
- Applied Materials, Inc.
- Xingfeng WANG
- B24 - GRINDING POLISHING
Information Patent Application
ELECTROPOLISHING METHOD
- Publication number 20220178047
- Publication date Jun 9, 2022
- 3DM BIOMEDICAL PTY LTD
- Dean KLOWER
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
CHEMICAL-MECHANICAL POLISHING SYSTEM WITH A POTENTIOSTAT AND PULSED...
- Publication number 20210291313
- Publication date Sep 23, 2021
- Bruker Nano, Inc.
- Vladimir Gulkov
- B24 - GRINDING POLISHING
Information Patent Application
Chemical Mechanical Polishing Apparatus and Method
- Publication number 20210220962
- Publication date Jul 22, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shich-Chang Suen
- B24 - GRINDING POLISHING
Information Patent Application
END POINT DETECTION METHOD, POLISHING APPARATUS, AND POLISHING METHOD
- Publication number 20200346318
- Publication date Nov 5, 2020
- EBARA CORPORATION
- Taro TAKAHASHI
- G01 - MEASURING TESTING
Information Patent Application
POLISHING APPARATUS AND POLISHING METHOD
- Publication number 20200001428
- Publication date Jan 2, 2020
- EBARA CORPORATION
- Taro TAKAHASHI
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING SYSTEM AND METHOD
- Publication number 20190291236
- Publication date Sep 26, 2019
- Taiwan Semiconductor Manufacturing Co., LTD
- Chin-Wei Liang
- B24 - GRINDING POLISHING
Information Patent Application
ONE OR MORE CHARGING MEMBERS USED IN THE MANUFACTURE OF A LAPPING P...
- Publication number 20190224806
- Publication date Jul 25, 2019
- SEAGATE TECHNOLOGY LLC
- Mihaela Ruxandra Baurceanu
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING APPARATUS AND METHOD
- Publication number 20190099854
- Publication date Apr 4, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shich-Chang Suen
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING SYSTEM AND METHOD
- Publication number 20180361529
- Publication date Dec 20, 2018
- Taiwan Semiconductor Manufacturing Co., LTD
- Chin-Wei Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING SMART RING
- Publication number 20180071889
- Publication date Mar 15, 2018
- Applied Materials, Inc.
- Zubin HUANG
- G01 - MEASURING TESTING
Information Patent Application
Polishing System with Front Side Pressure Control
- Publication number 20150298284
- Publication date Oct 22, 2015
- Applied Materials, Inc.
- Jeffrey Drue David
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING APPARATUS AND POLISHING METHOD USING...
- Publication number 20150126095
- Publication date May 7, 2015
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yuan-Hsuan CHEN
- B24 - GRINDING POLISHING
Information Patent Application
METHOD FOR MANUFACTURING SOLID OXIDE AND DEVICE THEREFOR
- Publication number 20140326612
- Publication date Nov 6, 2014
- Kazuto Yamauchi
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
POLISHING DEVICE FOR REMOVING POLISHING BYPRODUCTS
- Publication number 20140323018
- Publication date Oct 30, 2014
- Semiconductor Manufacturing International (Shanghai) Corporation
- FENG CHEN
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ELECTRICALLY ASSISTED CHEMICAL-MECHANICAL PLANARIZATION (EACMP) SYS...
- Publication number 20130137263
- Publication date May 30, 2013
- NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY
- Chao-Chang Chen
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
SYSTEM, METHOD AND APPARATUS FOR ENHANCED CLEANING AND POLISHING OF...
- Publication number 20130078890
- Publication date Mar 28, 2013
- Hitachi Global Storage Technologies Netherlands B.V.
- Xing-Cai Guo
- B24 - GRINDING POLISHING
Information Patent Application
METHOD FOR REMOVING POLISHING BYPRODUCTS AND POLISHING DEVICE
- Publication number 20120309278
- Publication date Dec 6, 2012
- Semiconductor Manufacturing International (Shanghai) Corporation
- FENG CHEN
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Method for Adjusting Metal Polishing Rate and Reducing Defects Aris...
- Publication number 20120276820
- Publication date Nov 1, 2012
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Shoulong Zhang
- B24 - GRINDING POLISHING
Information Patent Application
System and method for cleaning a charging wafer surface
- Publication number 20120009693
- Publication date Jan 12, 2012
- STMicroelectronics, Inc.
- John H. Zhang
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF MANUFACTURING ELECTROPOLISHING PAD
- Publication number 20110048963
- Publication date Mar 3, 2011
- TOYO TRIE & RUBBER CO., LTD.
- Shinji Shimizu
- B24 - GRINDING POLISHING
Information Patent Application
METHOD AND APPARATUS FOR LOCAL POLISHING CONTROL
- Publication number 20110053465
- Publication date Mar 3, 2011
- STAN TSAI
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

using electric current

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Electrical cleaning tool for wafer polishing tool system

Face-up wafer electrochemical planarization apparatus

Electrochemical mechanical polishing and planarization equipment fo...

Chemical-mechanical polishing system with a potentiostat and pulsed...

Electropolishing method

Chemical mechanical polishing with applied magnetic field

Chemical-mechanical polishing system with a potentiostat and pulsed...

Polishing apparatus and polishing method

Method for manufacturing solid oxide and device therefor

Methods and systems for providing electrical power to one or more h...

Chemical mechanical polishing apparatus and method

Chemical mechanical polishing system and method

Planarization apparatus and planarization method thereof

End point detection method, polishing apparatus, and polishing method

Polishing endpoint detection method

One or more charging members used in the manufacture of a lapping p...

Chemical mechanical polishing smart ring

Chemical mechanical polishing system and method

Apparatus and method for plating and/or polishing wafer

Chemical mechanical planarization apparatus and methods

Observation and photography apparatus

Polishing device for removing polishing byproducts

Chemical mechanical polishing apparatus and polishing method using...

Electrically assisted chemical-mechanical planarization (EACMP) sys...

Method for removing polishing byproducts and polishing device

System, method and apparatus for enhanced cleaning and polishing of...

Surface treatment method and device thereof

System and method for cleaning a charging wafer surface

Methods and apparatuses for electrochemical-mechanical polishing

Multi-layer polishing pad for low-pressure polishing

Patents Applicationslast 30 patents

FACE-UP WAFER ELECTROCHEMICAL PLANARIZATION APPARATUS

ELECTRICAL CLEANING TOOL FOR WAFER POLISHING TOOL SYSTEM

CHEMICAL-MECHANICAL POLISHING SYSTEM WITH A POTENTIOSTAT AND PULSED...

ELECTRICAL CLEANING TOOL FOR WAFER POLISHING TOOL SYSTEM

FACE-UP WAFER ELECTROCHEMICAL PLANARIZATION APPARATUS

CHEMICAL MECHANICAL POLISHING APPARATUS AND METHOD USING THE SAME

SUBSTRATE POLISHING APPARATUS, SUBSTRATE POLISHING SYSTEM INCLUDING...

CHEMICAL-MECHANICAL POLISHING SYSTEM WITH A POTENTIOSTAT AND PULSED...

CHEMICAL MECHANICAL POLISHING WITH APPLIED MAGNETIC FIELD

ELECTROPOLISHING METHOD

CHEMICAL-MECHANICAL POLISHING SYSTEM WITH A POTENTIOSTAT AND PULSED...

Chemical Mechanical Polishing Apparatus and Method

END POINT DETECTION METHOD, POLISHING APPARATUS, AND POLISHING METHOD

POLISHING APPARATUS AND POLISHING METHOD

CHEMICAL MECHANICAL POLISHING SYSTEM AND METHOD

ONE OR MORE CHARGING MEMBERS USED IN THE MANUFACTURE OF A LAPPING P...

CHEMICAL MECHANICAL POLISHING APPARATUS AND METHOD

CHEMICAL MECHANICAL POLISHING SYSTEM AND METHOD

CHEMICAL MECHANICAL POLISHING SMART RING

Polishing System with Front Side Pressure Control

CHEMICAL MECHANICAL POLISHING APPARATUS AND POLISHING METHOD USING...

METHOD FOR MANUFACTURING SOLID OXIDE AND DEVICE THEREFOR

POLISHING DEVICE FOR REMOVING POLISHING BYPRODUCTS

ELECTRICALLY ASSISTED CHEMICAL-MECHANICAL PLANARIZATION (EACMP) SYS...

SYSTEM, METHOD AND APPARATUS FOR ENHANCED CLEANING AND POLISHING OF...

METHOD FOR REMOVING POLISHING BYPRODUCTS AND POLISHING DEVICE

Method for Adjusting Metal Polishing Rate and Reducing Defects Aris...

System and method for cleaning a charging wafer surface

METHOD OF MANUFACTURING ELECTROPOLISHING PAD

METHOD AND APPARATUS FOR LOCAL POLISHING CONTROL