using masks

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CPC
H01L21/31144

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/31144using masks

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Manufacturing method of memory device using mask patterns
- Patent number 12,249,516
- Issue date Mar 11, 2025
- SK hynix Inc.
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective patterning with wet-dry bilayer resist
- Patent number 12,249,508
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical edge blocking (VEB) technique for increasing patterning pr...
- Patent number 12,249,541
- Issue date Mar 11, 2025
- Intel Corporation
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition of carbon on photoresist layer for lithography...
- Patent number 12,249,509
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device structure with stacked conductive plugs and me...
- Patent number 12,249,576
- Issue date Mar 11, 2025
- NANYA TECHNOLOGY CORPORATION
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure having buried word lines and method of manu...
- Patent number 12,245,416
- Issue date Mar 4, 2025
- NANYA TECHNOLOGY CORPORATION
- Min-Chung Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hard mask removal without damaging top epitaxial layer
- Patent number 12,243,770
- Issue date Mar 4, 2025
- International Business Machines Corporation
- Chanro Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming semiconductor structure
- Patent number 12,243,744
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Chen Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 12,237,329
- Issue date Feb 25, 2025
- United Microelectronics Corp.
- Chun-Hao Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device structure with stacked conductive plugs and me...
- Patent number 12,237,260
- Issue date Feb 25, 2025
- NANYA TECHNOLOGY CORPORATION
- Yi-Hsien Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a semiconductor device
- Patent number 12,237,214
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Nien Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polymerization protective liner for reactive ion etch in patterning
- Patent number 12,237,175
- Issue date Feb 25, 2025
- Lam Research Corporation
- Bhaskar Nagabhirava
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming semiconductor devices
- Patent number 12,237,402
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shu-Wei Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming a staircase structure
- Patent number 12,232,314
- Issue date Feb 18, 2025
- Lodestar Licensing Group LLC
- Rohit Kothari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacture
- Patent number 12,230,534
- Issue date Feb 18, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Tai-I Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Word line structure of three-dimensional memory device
- Patent number 12,232,320
- Issue date Feb 18, 2025
- Yangtze Memory Technologies Co., Ltd.
- Qiang Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compound, polymer, pattern forming material, pattern forming method...
- Patent number 12,228,860
- Issue date Feb 18, 2025
- Kioxia Corporation
- Norikatsu Sasao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching apparatus
- Patent number 12,230,505
- Issue date Feb 18, 2025
- Tokyo Electron Limited
- Akihiro Tsuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal-insulator-metal structure
- Patent number 12,230,566
- Issue date Feb 18, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yuan-Yang Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and manufacturing method thereof
- Patent number 12,230,567
- Issue date Feb 18, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-Ren Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 12,230,504
- Issue date Feb 18, 2025
- Kioxia Corporation
- Junji Kataoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate structuring method
- Patent number 12,230,508
- Issue date Feb 18, 2025
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Pierre Montmeat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High voltage device
- Patent number 12,224,213
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sung-Hsin Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of running an etch process in higher selectivity to mask and...
- Patent number 12,224,177
- Issue date Feb 11, 2025
- American Air Liquide, Inc.
- Xiangyu Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a semiconductor device
- Patent number 12,224,214
- Issue date Feb 11, 2025
- Samsung Electronics Co., Ltd.
- Seongkeun Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing vias with pulsing plasma
- Patent number 12,224,178
- Issue date Feb 11, 2025
- NANYA TECHNOLOGY CORPORATION
- Zhi-Xuan Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual metal silicide structures for advanced integrated circuit stru...
- Patent number 12,225,740
- Issue date Feb 11, 2025
- Intel Corporation
- Jeffrey S. Leib
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 12,224,325
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Li-Zhen Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a via and a metal wiring for a semiconducto...
- Patent number 12,224,237
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Ming Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing system, method of manufacturing a semic...
- Patent number 12,217,962
- Issue date Feb 4, 2025
- Kioxia Corporation
- Shingo Honda
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METAL HARD MASKS FOR REDUCING LINE BENDING
- Publication number 20250079172
- Publication date Mar 6, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Kai Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE DIELECTRIC FEATURES IN HIGH-VOLTAGE IC DEVICES AND METHODS OF...
- Publication number 20250081509
- Publication date Mar 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jhu-Min Song
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3D SPACER NANOSHEET FORMATION
- Publication number 20250081552
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- H. Jim Fulford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM
- Publication number 20250079173
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Daisuke YOSHIKOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CRYOGENIC PLASMA ETCHING USING C2H2F2
- Publication number 20250079183
- Publication date Mar 6, 2025
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Nathan STAFFORD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THREE-DIMENSIONAL MEMORY DEVICE WITH PILLAR SHAPED TRENCH BRIDGE ST...
- Publication number 20250081453
- Publication date Mar 6, 2025
- WESTERN DIGITAL TECHNOLOGIES, INC.,
- Yuya SANADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20250071969
- Publication date Feb 27, 2025
- Samsung Electronics Co., Ltd.
- Yun Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCED RESIDUE AT ETCHED STRUCTURE SIDEWALLS
- Publication number 20250072099
- Publication date Feb 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuei-Yu Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE PASSIVATION AND SELECTIVE DEPOSITION
- Publication number 20250069885
- Publication date Feb 27, 2025
- ASM IP HOLDING B.V.
- Eva E. Tois
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HETEROGENEOUS METAL LINE COMPOSITIONS FOR ADVANCED INTEGRATED CIRCU...
- Publication number 20250072078
- Publication date Feb 27, 2025
- Intel Corporation
- Andrew W. YEOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENTS FOR THIN FILMS USED IN PHOTOLITHOGRAPHY
- Publication number 20250062123
- Publication date Feb 20, 2025
- Applied Materials, Inc.
- SHASHANK SHARMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE STRUCTURING METHOD
- Publication number 20250062135
- Publication date Feb 20, 2025
- Commissariat A L'Energie Atomique et Aux Energies Alternatives
- Pierre Montmeat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND STRUCTURES FOR IMPROVING ETCH PROFILE OF UNDERLYING LAYERS
- Publication number 20250062124
- Publication date Feb 20, 2025
- TOKYO ELECTRON LIMITED
- Yen-Tien LU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF ALIGNED PATTERN FORMATION POST SPACER ETCHBACK IN TIGHT PITCH...
- Publication number 20250062126
- Publication date Feb 20, 2025
- TESSERA LLC
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REDUCING VARIATIONS IN MASK TOPOGRAPHY
- Publication number 20250054769
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Hsu-Cheng HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20250054758
- Publication date Feb 13, 2025
- Samsung SDI Co., Ltd.
- Dong Wan RYU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING A POWER FINFET, AND POWER FINFET
- Publication number 20250048670
- Publication date Feb 6, 2025
- ROBERT BOSCH GmbH
- Daniel Krebs
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH CONDUCTIVE PASSIVATION LAYERS AND METHOD OF FORMING THE SAME D...
- Publication number 20250046618
- Publication date Feb 6, 2025
- Xiangyu GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR APPARATUS
- Publication number 20250046619
- Publication date Feb 6, 2025
- Samsung Electronics Co., Ltd.
- Guifu Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED PATTERNING WITH COLORED BLOCKING AND STRUCTURES RESULT...
- Publication number 20250046713
- Publication date Feb 6, 2025
- Intel Corporation
- Mohit K. HARAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOPED DIAMOND-LIKE CARBON
- Publication number 20250046610
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Jialiang WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NEUTRAL STRESS DIAMOND-LIKE CARBON
- Publication number 20250046611
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Jialiang WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR LATERAL ETCH WITH BOTTOM PASSIVATION
- Publication number 20250046617
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Adam Pranda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL-RESISTANT PROTECTIVE FILM-FORMING COMPOSITION HAVING CATEC...
- Publication number 20250034427
- Publication date Jan 30, 2025
- NISSAN CHEMICAL CORPORATION
- Shun KUBODERA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
INTEGRATED CIRCUIT, SYSTEM AND METHOD OF FORMING SAME
- Publication number 20250040224
- Publication date Jan 30, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Wei PENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20250031375
- Publication date Jan 23, 2025
- SK HYNIX INC.
- Sung-Lae OH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAIRCASE STRUCTURE FOR MEMORY DEVICE
- Publication number 20250031366
- Publication date Jan 23, 2025
- Yangtze Memory Technologies Co., Ltd.
- Zhenyu LU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3D NAND MEMORY DEVICE AND METHOD OF FORMING THE SAME
- Publication number 20250024679
- Publication date Jan 16, 2025
- Yangtze Memory Technologies Co., Ltd.
- Yali SONG
- G11 - INFORMATION STORAGE
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CI...
- Publication number 20250020998
- Publication date Jan 16, 2025
- Samsung Electronics Co., Ltd.
- Kyungoh Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS CLUSTER ASSISTED PLASMA PROCESSING
- Publication number 20250022689
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS

using masks

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Manufacturing method of memory device using mask patterns

Selective patterning with wet-dry bilayer resist

Vertical edge blocking (VEB) technique for increasing patterning pr...

Selective deposition of carbon on photoresist layer for lithography...

Semiconductor device structure with stacked conductive plugs and me...

Semiconductor structure having buried word lines and method of manu...

Hard mask removal without damaging top epitaxial layer

Method for forming semiconductor structure

Semiconductor device and method for fabricating the same

Semiconductor device structure with stacked conductive plugs and me...

Method of forming a semiconductor device

Polymerization protective liner for reactive ion etch in patterning

Methods of forming semiconductor devices

Methods of forming a staircase structure

Semiconductor device and method of manufacture

Word line structure of three-dimensional memory device

Compound, polymer, pattern forming material, pattern forming method...

Etching apparatus

Metal-insulator-metal structure

Semiconductor structure and manufacturing method thereof

Plasma etching method and plasma etching apparatus

Substrate structuring method

High voltage device

Method of running an etch process in higher selectivity to mask and...

Method of fabricating a semiconductor device

Method of manufacturing vias with pulsing plasma

Dual metal silicide structures for advanced integrated circuit stru...

Semiconductor device and manufacturing method thereof

Method of manufacturing a via and a metal wiring for a semiconducto...

Semiconductor manufacturing system, method of manufacturing a semic...

Patents Applicationslast 30 patents

METAL HARD MASKS FOR REDUCING LINE BENDING

GATE DIELECTRIC FEATURES IN HIGH-VOLTAGE IC DEVICES AND METHODS OF...

3D SPACER NANOSHEET FORMATION

PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM

CRYOGENIC PLASMA ETCHING USING C2H2F2

THREE-DIMENSIONAL MEMORY DEVICE WITH PILLAR SHAPED TRENCH BRIDGE ST...

SEMICONDUCTOR DEVICE

REDUCED RESIDUE AT ETCHED STRUCTURE SIDEWALLS

SELECTIVE PASSIVATION AND SELECTIVE DEPOSITION

HETEROGENEOUS METAL LINE COMPOSITIONS FOR ADVANCED INTEGRATED CIRCU...

TREATMENTS FOR THIN FILMS USED IN PHOTOLITHOGRAPHY

SUBSTRATE STRUCTURING METHOD

METHODS AND STRUCTURES FOR IMPROVING ETCH PROFILE OF UNDERLYING LAYERS

SELF ALIGNED PATTERN FORMATION POST SPACER ETCHBACK IN TIGHT PITCH...

METHOD FOR REDUCING VARIATIONS IN MASK TOPOGRAPHY

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

METHOD FOR PRODUCING A POWER FINFET, AND POWER FINFET

HIGH CONDUCTIVE PASSIVATION LAYERS AND METHOD OF FORMING THE SAME D...

METHOD OF MANUFACTURING SEMICONDUCTOR APPARATUS

SELF-ALIGNED PATTERNING WITH COLORED BLOCKING AND STRUCTURES RESULT...

DOPED DIAMOND-LIKE CARBON

NEUTRAL STRESS DIAMOND-LIKE CARBON

METHOD FOR LATERAL ETCH WITH BOTTOM PASSIVATION

CHEMICAL-RESISTANT PROTECTIVE FILM-FORMING COMPOSITION HAVING CATEC...

INTEGRATED CIRCUIT, SYSTEM AND METHOD OF FORMING SAME

SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREOF

STAIRCASE STRUCTURE FOR MEMORY DEVICE

3D NAND MEMORY DEVICE AND METHOD OF FORMING THE SAME

PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CI...

GAS CLUSTER ASSISTED PLASMA PROCESSING