using masks

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CPC
H01L21/32139

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Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/32139using masks

Industries

Patents Grantslast 30 patents

Information Patent Grant
Preparation method for semiconductor structure and same
- Patent number 12,341,010
- Issue date Jun 24, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Longyang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,341,020
- Issue date Jun 24, 2025
- Tokyo Electron Limited
- Ryutaro Suda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and manufacturing method thereof
- Patent number 12,336,161
- Issue date Jun 17, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Chih-Cheng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 12,336,253
- Issue date Jun 17, 2025
- United Microelectronics Corp.
- Chun-Hsien Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching tools and systems
- Patent number 12,334,356
- Issue date Jun 17, 2025
- Tokyo Electron Limited
- Minjoon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacture
- Patent number 12,334,350
- Issue date Jun 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Meng-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate structures for semiconductor devices
- Patent number 12,328,930
- Issue date Jun 10, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Liang Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating physically unclonable function device
- Patent number 12,322,645
- Issue date Jun 3, 2025
- United Microelectronics Corp.
- Ping-Chia Shih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming protective film, method for manufacturing patter...
- Patent number 12,312,487
- Issue date May 27, 2025
- JSR Corporation
- Kazunori Takanashi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Backside metal patterning die singulation systems and related methods
- Patent number 12,315,765
- Issue date May 27, 2025
- SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Michael J. Seddon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 12,315,726
- Issue date May 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ching-Yu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a semiconductor device
- Patent number 12,310,043
- Issue date May 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Chen Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin field-effect transistor device having contact plugs with re-ent...
- Patent number 12,310,051
- Issue date May 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Lien Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacture
- Patent number 12,308,248
- Issue date May 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jian-Jou Lian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of fabricating the same
- Patent number 12,302,556
- Issue date May 13, 2025
- Samsung Electronics Co., Ltd.
- Dong-Wan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interconnect conductive structure comprising two conductive materials
- Patent number 12,300,611
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Teng Dai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of organic films
- Patent number 12,300,505
- Issue date May 13, 2025
- ASM IP Holding B.V.
- Eva E. Tois
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photoresist and method of formation and use
- Patent number 12,287,575
- Issue date Apr 29, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Keng-Chu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film deposition apparatus for fine pattern forming
- Patent number 12,288,671
- Issue date Apr 29, 2025
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fabricating a device using a multilayer stack
- Patent number 12,288,687
- Issue date Apr 29, 2025
- Google LLC
- Anthony Edward Megrant
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extendible deposition mask and display apparatus provided using the...
- Patent number 12,279,512
- Issue date Apr 15, 2025
- Samsung Display Co., Ltd.
- Dongseob Jeong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing conductors for semiconductor device
- Patent number 12,278,230
- Issue date Apr 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kam-Tou Sio
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with helmet structure between two semiconducto...
- Patent number 12,278,236
- Issue date Apr 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kuo-Cheng Ching
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image pickup device and method of tracking subject thereof
- Patent number 12,276,899
- Issue date Apr 15, 2025
- MAXELL, LTD.
- Hiroshi Shimizu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods of forming semiconductor devices
- Patent number 12,272,555
- Issue date Apr 8, 2025
- Samsung Electronics Co., Ltd.
- Jinyoung Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tin oxide and tin carbide materials for semiconductor patterning ap...
- Patent number 12,272,564
- Issue date Apr 8, 2025
- Applied Materials, Inc.
- Yung-chen Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-layer photo etching mask including organic and inorganic mate...
- Patent number 12,272,553
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Ting Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preparing semiconductor structure
- Patent number 12,272,565
- Issue date Apr 8, 2025
- NANYA TECHNOLOGY CORPORATION
- Wei-Chuan Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure
- Patent number 12,274,088
- Issue date Apr 8, 2025
- NANYA TECHNOLOGY CORPORATION
- Chih-Wei Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective metal removal with flowable polymer
- Patent number 12,272,551
- Issue date Apr 8, 2025
- Applied Materials, Inc.
- Liqi Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHODS AND STRUCTURES FOR IMPROVING ETCH PROFILE OF METALLIC LAYER
- Publication number 20250210374
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Christopher CATANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH HELMET STRUCTURE BETWEEN TWO SEMICONDUCTO...
- Publication number 20250212505
- Publication date Jun 26, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Kuo-Cheng CHING
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250208506
- Publication date Jun 26, 2025
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTILAYER METAL-INSULATOR-METAL CAPACITORS FOR INCREASED CAPACITAN...
- Publication number 20250203888
- Publication date Jun 19, 2025
- Samsung Electronics Co., Ltd.
- Sunil Kumar SINGH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING PATTERNED MASK LAYER
- Publication number 20250201562
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chen CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-LAYER PHOTO ETCHING MASK INCLUDING ORGANIC AND INORGANIC MATE...
- Publication number 20250201556
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chung-Ting Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPLACEMENT FULLY ALIGNED VIA AND METAL LINE
- Publication number 20250201699
- Publication date Jun 19, 2025
- International Business Machines Corporation
- Ruilong Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FUSIBLE STRUCTURES
- Publication number 20250192034
- Publication date Jun 12, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shao-Ting WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOUBLE PATTERNING APPROACH BY DIRECT METAL ETCH
- Publication number 20250191973
- Publication date Jun 12, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsi-Wen TIEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCHING FOR SUBTRACTIVE METAL ETCH
- Publication number 20250191934
- Publication date Jun 12, 2025
- LAM RESEARCH CORPORATION
- Wenbing YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING STRUCTURE HAVING ELECTRODE AND ANODIZED PART
- Publication number 20250191923
- Publication date Jun 12, 2025
- MIKRO MESA TECHNOLOGY CO., LTD.
- Li-Yi CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING STRUCTURE HAVING ELECTRODE AND ANODIZED PART
- Publication number 20250191924
- Publication date Jun 12, 2025
- MIKRO MESA TECHNOLOGY CO., LTD.
- Li-Yi CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING STRUCTURE HAVING MULTI METAL LAYERS
- Publication number 20250191931
- Publication date Jun 12, 2025
- MIKRO MESA TECHNOLOGY CO., LTD.
- Li-Yi CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
- Publication number 20250194225
- Publication date Jun 12, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yao-Wen Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING INTERCONNECTION STRUCTURE
- Publication number 20250191932
- Publication date Jun 12, 2025
- MIKRO MESA TECHNOLOGY CO., LTD.
- Li-Yi CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THE SEMICONDUCTO...
- Publication number 20250191933
- Publication date Jun 12, 2025
- Samsung Electronics Co., Ltd.
- Do Young CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF SMOOTHENING PROFILE OF PHOTORESIST
- Publication number 20250183034
- Publication date Jun 5, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jia-Lin WEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FinFET Device and Method of Forming and Monitoring Quality of the Same
- Publication number 20250169101
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chang-Yin CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT VIA FORMATION
- Publication number 20250167117
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Lin-Yu HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING SEMICONDUCTOR DEVICES HAVING LINERS
- Publication number 20250159944
- Publication date May 15, 2025
- Micron Technology, Inc.
- Christopher J. Larsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CUTTING STRUCTURE, SEMICONDUCTOR DEVICE COMPRISING THE SAME, AND ME...
- Publication number 20250157923
- Publication date May 15, 2025
- NANYA TECHNOLOGY CORPORATION
- CHUN-YEN WEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CUTTING STRUCTURE, SEMICONDUCTOR DEVICE COMPRISING THE SAME, AND ME...
- Publication number 20250157924
- Publication date May 15, 2025
- NANYA TECHNOLOGY CORPORATION
- CHUN-YEN WEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICES INCLUDING A SLOT STRUCTURE EXTENDING THROUGH A STACK STRUCT...
- Publication number 20250159876
- Publication date May 15, 2025
- Lodestar Licensing Group LLC
- Rohit Kothari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES USING DIRECTIONAL PRO...
- Publication number 20250149343
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ya-Wen YEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRC...
- Publication number 20250149336
- Publication date May 8, 2025
- Samsung Electronics Co., Ltd.
- Yonghoon MOON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING A TRENCH FIELD ELECTRODE WITH A FIRST S...
- Publication number 20250151321
- Publication date May 8, 2025
- Infineon Technologies Austria AG
- Ashita Mirchandani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYSILICON GATE ETCH METHOD
- Publication number 20250140571
- Publication date May 1, 2025
- Shanghai Huali Integrated Circuit Corporation
- Jin XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING PATTERNS, SEMICONDUCTOR MEMORY DEVICE, AND METHOD...
- Publication number 20250140558
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- Yeongsup SOHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20250137777
- Publication date May 1, 2025
- Fuji Electric Co., Ltd.
- Shunya HAYASHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL OXIDE COMPOSITE AS ETCH STOP LAYER
- Publication number 20250132197
- Publication date Apr 24, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kai-Feng Cheng
- H01 - BASIC ELECTRIC ELEMENTS

using masks

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Preparation method for semiconductor structure and same

Substrate processing method and substrate processing apparatus

Semiconductor structure and manufacturing method thereof

Semiconductor device and method for fabricating the same

Plasma etching tools and systems

Semiconductor device and method of manufacture

Gate structures for semiconductor devices

Method for fabricating physically unclonable function device

Method for forming protective film, method for manufacturing patter...

Backside metal patterning die singulation systems and related methods

Semiconductor device and method

Method of fabricating a semiconductor device

Fin field-effect transistor device having contact plugs with re-ent...

Semiconductor device and method of manufacture

Semiconductor device and method of fabricating the same

Interconnect conductive structure comprising two conductive materials

Deposition of organic films

Photoresist and method of formation and use

Film deposition apparatus for fine pattern forming

Fabricating a device using a multilayer stack

Extendible deposition mask and display apparatus provided using the...

Method of manufacturing conductors for semiconductor device

Semiconductor device with helmet structure between two semiconducto...

Image pickup device and method of tracking subject thereof

Methods of forming semiconductor devices

Tin oxide and tin carbide materials for semiconductor patterning ap...

Multi-layer photo etching mask including organic and inorganic mate...

Method for preparing semiconductor structure

Semiconductor structure

Selective metal removal with flowable polymer

Patents Applicationslast 30 patents

METHODS AND STRUCTURES FOR IMPROVING ETCH PROFILE OF METALLIC LAYER

SEMICONDUCTOR DEVICE WITH HELMET STRUCTURE BETWEEN TWO SEMICONDUCTO...

Compound For Forming Metal-Containing Film, Composition For Forming...

MULTILAYER METAL-INSULATOR-METAL CAPACITORS FOR INCREASED CAPACITAN...

METHOD FOR FORMING PATTERNED MASK LAYER

MULTI-LAYER PHOTO ETCHING MASK INCLUDING ORGANIC AND INORGANIC MATE...

REPLACEMENT FULLY ALIGNED VIA AND METAL LINE

FUSIBLE STRUCTURES

DOUBLE PATTERNING APPROACH BY DIRECT METAL ETCH

ATOMIC LAYER ETCHING FOR SUBTRACTIVE METAL ETCH

METHOD OF MANUFACTURING STRUCTURE HAVING ELECTRODE AND ANODIZED PART

METHOD OF MANUFACTURING STRUCTURE HAVING ELECTRODE AND ANODIZED PART

METHOD OF MANUFACTURING STRUCTURE HAVING MULTI METAL LAYERS

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE

METHOD OF MANUFACTURING INTERCONNECTION STRUCTURE

SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THE SEMICONDUCTO...

METHOD OF SMOOTHENING PROFILE OF PHOTORESIST

FinFET Device and Method of Forming and Monitoring Quality of the Same

CONTACT VIA FORMATION

METHODS OF FORMING SEMICONDUCTOR DEVICES HAVING LINERS

CUTTING STRUCTURE, SEMICONDUCTOR DEVICE COMPRISING THE SAME, AND ME...

CUTTING STRUCTURE, SEMICONDUCTOR DEVICE COMPRISING THE SAME, AND ME...

DEVICES INCLUDING A SLOT STRUCTURE EXTENDING THROUGH A STACK STRUCT...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES USING DIRECTIONAL PRO...

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRC...

SEMICONDUCTOR DEVICE HAVING A TRENCH FIELD ELECTRODE WITH A FIRST S...

POLYSILICON GATE ETCH METHOD

METHOD OF FORMING PATTERNS, SEMICONDUCTOR MEMORY DEVICE, AND METHOD...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

METAL OXIDE COMPOSITE AS ETCH STOP LAYER