using plasma means only

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CPC
G03F7/427

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/427using plasma means only

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Gas distribution plate with UV blocker
- Patent number 12,130,561
- Issue date Oct 29, 2024
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for cleaning a process chamber
- Patent number 12,087,555
- Issue date Sep 10, 2024
- Applied Materials, Inc.
- Kalyanjit Ghosh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Advanced temperature monitoring system with expandable modular layo...
- Patent number 12,013,291
- Issue date Jun 18, 2024
- Applied Materials, Inc.
- Shuran Sheng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for removing resist layer, method of forming a pattern and m...
- Patent number 12,013,645
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Christine Y Ouyang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods of manufacturing
- Patent number 11,977,333
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ash rate recovery method in plasma strip chamber
- Patent number 11,955,318
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Yongkwan Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 11,948,778
- Issue date Apr 2, 2024
- Kokusai Electric Corporation
- Hidehiro Yanai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor devices and methods of manufacturing
- Patent number 11,842,896
- Issue date Dec 12, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Touch sensor and manufacturing method thereof
- Patent number 11,829,539
- Issue date Nov 28, 2023
- TPK Advanced Solutions Inc.
- Shao Jie Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Touch sensor and manufacturing method thereof
- Patent number 11,762,498
- Issue date Sep 19, 2023
- TPK Advanced Solutions Inc.
- Shao Jie Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma ashing method using residue gas analyzer
- Patent number 11,654,461
- Issue date May 23, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Jen Hsiao
- B08 - CLEANING
Information Patent Grant
Method of manufacturing metal wire and metal wire grid, wire grid p...
- Patent number 11,619,773
- Issue date Apr 4, 2023
- BOE Technology Group Co., Ltd.
- Shuilang Dong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for cleaning a process chamber
- Patent number 11,532,462
- Issue date Dec 20, 2022
- Applied Materials, Inc.
- Kalyanjit Ghosh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma treatment method to improve photo resist roughness and remov...
- Patent number 11,372,332
- Issue date Jun 28, 2022
- Tokyo Electron Limited
- Wan Jae Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist removing method and resist removing apparatus
- Patent number 11,342,162
- Issue date May 24, 2022
- SCREEN Holdings Co., Ltd.
- Kota Sotoku
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for removing photoresistor layer, method of forming a patter...
- Patent number 11,307,500
- Issue date Apr 19, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Christine Y Ouyang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for processing a workpiece using fluorine radicals
- Patent number 11,257,680
- Issue date Feb 22, 2022
- Mattson Technology, Inc.
- Qi Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,251,052
- Issue date Feb 15, 2022
- Tokyo Electron Limited
- Naotsugu Hoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for high aspect ratio photoresist removal in pure reducing p...
- Patent number 11,107,693
- Issue date Aug 31, 2021
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Li Diao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 11,101,111
- Issue date Aug 24, 2021
- Kokusai Electric Corporation
- Hidehiro Yanai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface treatment of substrates using passivation layers
- Patent number 11,094,528
- Issue date Aug 17, 2021
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Tongchuan Gao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing chamber with substrate edge enhancement processing
- Patent number 11,094,511
- Issue date Aug 17, 2021
- Applied Materials, Inc.
- Changhun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing device
- Patent number 11,036,142
- Issue date Jun 15, 2021
- SCREEN Holdings Co., Ltd.
- Kota Sotoku
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist removal method using residue gas analyzer
- Patent number 11,020,778
- Issue date Jun 1, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Jen Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating device
- Patent number 10,980,101
- Issue date Apr 13, 2021
- FUJI CORPORATION
- Akihiro Niwa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate treating apparatus and substrate treating method
- Patent number 10,915,026
- Issue date Feb 9, 2021
- Semes Co., Ltd.
- Hae-Won Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Strip process for high aspect ratio structure
- Patent number 10,901,321
- Issue date Jan 26, 2021
- Mattson Technology, Inc.
- Vijay M. Vaniapura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic mask layer
- Patent number 10,824,078
- Issue date Nov 3, 2020
- Imec VZW
- Roel Gronheid
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Back-side friction reduction of a substrate
- Patent number 10,784,100
- Issue date Sep 22, 2020
- Tokyo Electron Limited
- Hoyoung Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 10,763,084
- Issue date Sep 1, 2020
- Kokusai Electric Corporation
- Hidehiro Yanai
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
REWORK OF METAL-CONTAINING PHOTORESIST
- Publication number 20250093781
- Publication date Mar 20, 2025
- LAM RESEARCH CORPORATION
- Daniel PETER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REMOVING RESIST LAYER, METHOD OF FORMING A PATTERN AND M...
- Publication number 20240288776
- Publication date Aug 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Christine Y. Ouyang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SEMICON...
- Publication number 20240212989
- Publication date Jun 27, 2024
- Kokusai Electric Corporation
- Hidehiro YANAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING
- Publication number 20240079235
- Publication date Mar 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA-ACTIVATED LIQUIDS
- Publication number 20230408926
- Publication date Dec 21, 2023
- THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS
- David RUZIC
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TOUCH SENSOR AND MANUFACTURING METHOD THEREOF
- Publication number 20230367406
- Publication date Nov 16, 2023
- TPK ADVANCED SOLUTIONS INC.
- Shao Jie Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Composite Hard Masks For Ultra-Thin Magnetic Sensors
- Publication number 20230258747
- Publication date Aug 17, 2023
- HEADWAY TECHNOLOGIES, INC.
- Tom Zhong
- B24 - GRINDING POLISHING
Information Patent Application
SEMICONDUCTOR MACHINE SYSTEM AND MANUFACTURING METHOD USING THEREOF
- Publication number 20230229133
- Publication date Jul 20, 2023
- TENGXI TECHNOLOGY CO. LTD.
- WEI-HAN LO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR CLEANING A PROCESS CHAMBER
- Publication number 20230128297
- Publication date Apr 27, 2023
- Applied Materials, Inc.
- Kalyanjit GHOSH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Devices and Methods of Manufacturing
- Publication number 20220367177
- Publication date Nov 17, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR LOCALLY REMOVING AND/OR MODIFYING A POLYMER M...
- Publication number 20220306461
- Publication date Sep 29, 2022
- ROBERT BOSCH GmbH
- Barbara Will
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
ASH RATE RECOVERY METHOD IN PLASMA STRIP CHAMBER
- Publication number 20220293395
- Publication date Sep 15, 2022
- Applied Materials, Inc.
- Yongkwan KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR REMOVING RESIST LAYER, METHOD OF FORMING A PATTERN AND M...
- Publication number 20220229369
- Publication date Jul 21, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Christine Y. Ouyang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST UNDERLAYER COMPOSITIONS AND PATTERNING METHODS
- Publication number 20220197142
- Publication date Jun 23, 2022
- Rohm and Haas Electronic Materials L.L.C.
- Joshua Kaitz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING HOLE INJECTION LAYER, HOLE INJECTION LAYER INK CO...
- Publication number 20220162467
- Publication date May 26, 2022
- SAMSUNG DISPLAY CO., LTD.
- Juyon Lee
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ADVANCED TEMPERATURE MONITORING SYSTEM WITH EXPANDABLE MODULAR LAYO...
- Publication number 20220113198
- Publication date Apr 14, 2022
- Applied Materials, Inc.
- Shuran SHENG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Plasma Strip Tool with Multiple Gas Injection
- Publication number 20210398775
- Publication date Dec 23, 2021
- Mattson Technology, Inc.
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS
- Publication number 20210358720
- Publication date Nov 18, 2021
- SEMES CO., LTD.
- HANGLIM LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20210343507
- Publication date Nov 4, 2021
- Kokusai Electric Corporation
- Hidehiro YANAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING METAL WIRE AND METAL WIRE GRID, WIRE GRID P...
- Publication number 20210333457
- Publication date Oct 28, 2021
- BOE TECHNOLOGY GROUP CO., LTD.
- Shuilang DONG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ASHING METHOD USING RESIDUE GAS ANALYZER
- Publication number 20210268555
- Publication date Sep 2, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Jen HSIAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sensor Apparatus and Plasma Ashing System
- Publication number 20210134631
- Publication date May 6, 2021
- HZO, Inc.
- Benjamin Lawrence
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods For Processing a Workpiece Using Fluorine Radicals
- Publication number 20210066085
- Publication date Mar 4, 2021
- Mattson Technology, Inc.
- Qi Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor Devices and Methods of Manufacturing
- Publication number 20210035797
- Publication date Feb 4, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hung-Jui Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20200381221
- Publication date Dec 3, 2020
- Kokusai Electric Corporation
- Hidehiro YANAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING A PLANAR POLYMER STACK
- Publication number 20200371437
- Publication date Nov 26, 2020
- Arkema France
- Xavier CHEVALIER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST REMOVING METHOD AND RESIST REMOVING APPARATUS
- Publication number 20200272057
- Publication date Aug 27, 2020
- SCREEN Holdings Co., Ltd.
- Kota SOTOKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR CLEANING A PROCESS CHAMBER
- Publication number 20200251311
- Publication date Aug 6, 2020
- Applied Materials, Inc.
- Kalyanjit GHOSH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PLASMA PROCESSING METHOD FOR PROCESSING SUBSTRATE
- Publication number 20200218157
- Publication date Jul 9, 2020
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- SEUNG-BONG CHOI
- B08 - CLEANING
Information Patent Application
Strip Process for High Aspect Ratio Structure
- Publication number 20200218158
- Publication date Jul 9, 2020
- Mattson Technology, Inc.
- Vijay M. Vaniapura
- B08 - CLEANING

using plasma means only

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Gas distribution plate with UV blocker

Method and system for cleaning a process chamber

Advanced temperature monitoring system with expandable modular layo...

Method for removing resist layer, method of forming a pattern and m...

Semiconductor devices and methods of manufacturing

Ash rate recovery method in plasma strip chamber

Substrate processing apparatus, method of manufacturing semiconduct...

Semiconductor devices and methods of manufacturing

Touch sensor and manufacturing method thereof

Touch sensor and manufacturing method thereof

Plasma ashing method using residue gas analyzer

Method of manufacturing metal wire and metal wire grid, wire grid p...

Method and system for cleaning a process chamber

Plasma treatment method to improve photo resist roughness and remov...

Resist removing method and resist removing apparatus

Method for removing photoresistor layer, method of forming a patter...

Methods for processing a workpiece using fluorine radicals

Plasma processing method and plasma processing apparatus

Method for high aspect ratio photoresist removal in pure reducing p...

Substrate processing apparatus, method of manufacturing semiconduct...

Surface treatment of substrates using passivation layers

Processing chamber with substrate edge enhancement processing

Substrate processing method and substrate processing device

Photoresist removal method using residue gas analyzer

Plasma generating device

Substrate treating apparatus and substrate treating method

Strip process for high aspect ratio structure

Lithographic mask layer

Back-side friction reduction of a substrate

Substrate processing apparatus, method of manufacturing semiconduct...

Patents Applicationslast 30 patents

REWORK OF METAL-CONTAINING PHOTORESIST

METHOD FOR REMOVING RESIST LAYER, METHOD OF FORMING A PATTERN AND M...

SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SEMICON...

SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING

PLASMA-ACTIVATED LIQUIDS

TOUCH SENSOR AND MANUFACTURING METHOD THEREOF

Composite Hard Masks For Ultra-Thin Magnetic Sensors

SEMICONDUCTOR MACHINE SYSTEM AND MANUFACTURING METHOD USING THEREOF

METHOD AND SYSTEM FOR CLEANING A PROCESS CHAMBER

Semiconductor Devices and Methods of Manufacturing

METHOD AND DEVICE FOR LOCALLY REMOVING AND/OR MODIFYING A POLYMER M...

ASH RATE RECOVERY METHOD IN PLASMA STRIP CHAMBER

METHOD FOR REMOVING RESIST LAYER, METHOD OF FORMING A PATTERN AND M...

PHOTORESIST UNDERLAYER COMPOSITIONS AND PATTERNING METHODS

METHOD OF FORMING HOLE INJECTION LAYER, HOLE INJECTION LAYER INK CO...

ADVANCED TEMPERATURE MONITORING SYSTEM WITH EXPANDABLE MODULAR LAYO...

Plasma Strip Tool with Multiple Gas Injection

SUBSTRATE TREATING APPARATUS

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

METHOD OF MANUFACTURING METAL WIRE AND METAL WIRE GRID, WIRE GRID P...

PLASMA ASHING METHOD USING RESIDUE GAS ANALYZER

Sensor Apparatus and Plasma Ashing System

Methods For Processing a Workpiece Using Fluorine Radicals

Semiconductor Devices and Methods of Manufacturing

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

METHOD FOR PRODUCING A PLANAR POLYMER STACK

RESIST REMOVING METHOD AND RESIST REMOVING APPARATUS

METHOD AND SYSTEM FOR CLEANING A PROCESS CHAMBER

PLASMA PROCESSING METHOD FOR PROCESSING SUBSTRATE

Strip Process for High Aspect Ratio Structure