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Patents Grants
last 30 patents
Information
Patent Grant
Method and apparatus to determine a patterning process parameter
Patent number
12,322,660
Issue date
Jun 3, 2025
ASML Netherlands B.V.
Adriaan Johan Van Leest
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Metrology tool with position control of projection system
Patent number
12,306,544
Issue date
May 20, 2025
ASML Holding N.V.
Hans Butler
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Alignment mark and method
Patent number
12,292,694
Issue date
May 6, 2025
Taiwan Semiconductor Manufacturing Co., Ltd
Hung-Chung Chien
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Methods and apparatus for obtaining diagnostic information relating...
Patent number
12,287,584
Issue date
Apr 29, 2025
ASML Netherlands B.V.
Alexander Ypma
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Method and apparatus for calculating a spatial map associated with...
Patent number
12,276,918
Issue date
Apr 15, 2025
ASML Netherlands B.V.
Mauritius Gerardus Elisabeth Schneiders
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Method for avoiding damage to overlay metrology mark
Patent number
12,276,920
Issue date
Apr 15, 2025
Shanghai Huali Integrated Circuit Corporation
Chengchang Wei
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Matching process controllers for improved matching of process
Patent number
12,265,380
Issue date
Apr 1, 2025
Applied Materials, Inc.
James Robert Moyne
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Alignment-overlay mark and method using the same
Patent number
12,265,335
Issue date
Apr 1, 2025
Micron Technology, Inc.
Kazuko Yamashita
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Overlay mark, overlay marking method and overlay measuring method
Patent number
12,259,661
Issue date
Mar 25, 2025
NEXCHIP SEMICONDUCTOR CORPORATION
Kuotung Yang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Methods for manufacturing semiconductor devices using MOIRÉ patterns
Patent number
12,259,662
Issue date
Mar 25, 2025
Samsung Electronics Co., Ltd.
Woohyeok Jeong
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Scatterometry overlay metrology with orthogonal fine-pitch segmenta...
Patent number
12,253,805
Issue date
Mar 18, 2025
KLA Corporation
Vladimir Levinski
G01 - MEASURING TESTING
Information
Patent Grant
Target for measuring a parameter of a lithographic process
Patent number
12,242,203
Issue date
Mar 4, 2025
ASML Netherlands B.V.
Maurits Van Der Schaar
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Process window qualification modulation layouts
Patent number
12,235,224
Issue date
Feb 25, 2025
KLA Corporation
Andrew Cross
G01 - MEASURING TESTING
Information
Patent Grant
Semiconductor marks and forming methods thereof
Patent number
12,218,073
Issue date
Feb 4, 2025
CHANGXIN MEMORY TECHNOLOGIES, INC.
Shengan Zhang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for inspection and metrology
Patent number
12,204,826
Issue date
Jan 21, 2025
ASML Netherlands B.V.
Lotte Marloes Willems
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Multi-layered moiré targets and methods for using the same in measu...
Patent number
12,204,254
Issue date
Jan 21, 2025
KLA Corporation
Yoel Feler
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Machine learning on overlay management
Patent number
12,197,138
Issue date
Jan 14, 2025
Taiwan Semiconductor Manufacturing Co., Ltd
Tzu-Cheng Lin
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Lithography measurement machine and operating method thereof
Patent number
12,197,124
Issue date
Jan 14, 2025
Hon Hai Precision Industry Co., Ltd.
Kuo-Kuei Fu
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Metrology method and associated metrology and lithographic apparatuses
Patent number
12,189,314
Issue date
Jan 7, 2025
ASML Netherlands B.V.
Sebastianus Adrianus Goorden
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Computational metrology
Patent number
12,189,302
Issue date
Jan 7, 2025
ASML Netherlands B.V.
Wim Tjibbo Tel
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Voltage contrast metrology mark
Patent number
12,169,366
Issue date
Dec 17, 2024
ASML Netherlands B.V.
Cyrus Emil Tabery
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Overlay target design for improved target placement accuracy
Patent number
12,140,859
Issue date
Nov 12, 2024
KLA Corporation
Vladimir Levinski
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus to determine a patterning process parameter us...
Patent number
12,142,535
Issue date
Nov 12, 2024
ASML Netherlands B.V.
Adriaan Johan Van Leest
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Metrology target design for tilted device designs
Patent number
12,117,347
Issue date
Oct 15, 2024
KLA Corporation
Myungjun Lee
G01 - MEASURING TESTING
Information
Patent Grant
Optical metrology utilizing short-wave infrared wavelengths
Patent number
12,111,580
Issue date
Oct 8, 2024
KLA Corporation
Amnon Manassen
G01 - MEASURING TESTING
Information
Patent Grant
Overlay mark forming Moire pattern, overlay measurement method usin...
Patent number
12,107,052
Issue date
Oct 1, 2024
AUROS TECHNOLOGY, INC.
Hyun Chul Lee
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Targets for diffraction-based overlay error metrology
Patent number
12,105,414
Issue date
Oct 1, 2024
KLA Corporation
Itay Gdor
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Target and algorithm to measure overlay by modeling back scattering...
Patent number
12,100,574
Issue date
Sep 24, 2024
KLA Corporation
Nadav Gutman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Wavelet system and method for ameliorating misregistration and asym...
Patent number
12,080,610
Issue date
Sep 3, 2024
KLA Corporation
Lilach Saltoun
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Metrology apparatus and method for determining a characteristic of...
Patent number
12,066,764
Issue date
Aug 20, 2024
ASML Netherlands B.V.
Patricius Aloysius Jacobus Tinnemans
G01 - MEASURING TESTING
Patents Applications
last 30 patents
Information
Patent Application
Method for evaluating at least one marker on a physical object for...
Publication number
20250172882
Publication date
May 29, 2025
ROBERT BOSCH GmbH
Cedric Donie
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
DETECTION DEVICE AND METHOD FOR OPERATING THE SAME
Publication number
20250172520
Publication date
May 29, 2025
Taiwan Semiconductor Manufacturing Company, Ltd.
Ya-Chin KING
G01 - MEASURING TESTING
Information
Patent Application
DETERMINING A MEASUREMENT RECIPE IN A METROLOGY METHOD
Publication number
20250147429
Publication date
May 8, 2025
ASML NETHERLANDS B.V.
Sebastianus Adrianus GOORDEN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METROLOGY METHOD AND ASSOCIATED METROLOGY DEVICE
Publication number
20250147437
Publication date
May 8, 2025
ASML NETHERLANDS B.V.
Armand Eugene Albert KOOLEN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHODS OF METROLOGY
Publication number
20250147436
Publication date
May 8, 2025
ASML NETHERLANDS B.V.
Chrysostomos BATISTAKIS
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
OVERLAY MARK DESIGN ENABLING LARGE OVERLAY MEASUREMENT
Publication number
20250139814
Publication date
May 1, 2025
KLA Corporation
Mark Ghinovker
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
INTENSITY MEASUREMENTS USING OFF-AXIS ILLUMINATION
Publication number
20250130512
Publication date
Apr 24, 2025
ASML NETHERLANDS B.V.
Mohamed SWILLAM
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MACHINE LEARNING ON OVERLAY MANAGEMENT
Publication number
20250123572
Publication date
Apr 17, 2025
Taiwan Semiconductor Manufacturing Co., Ltd.
Tzu-Cheng LIN
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
FULL-WAFER METROLOGY UP-SAMPLING
Publication number
20250123571
Publication date
Apr 17, 2025
NOVA LTD
Eitan A. ROTHSTEIN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SMALL IN-DIE TARGET DESIGN FOR OVERLAY MEASUREMENT
Publication number
20250110412
Publication date
Apr 3, 2025
KLA Corporation
Vladimir Levinski
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
A FRAMEWORK FOR CONDITION TUNING AND IMAGE PROCESSING FOR METROLOGY...
Publication number
20250102923
Publication date
Mar 27, 2025
ASML NETHERLANDS B.V.
Lingling PU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD OF GENERATING DRAWING DATA, DRAWING DATA GENERATION DEVICE,...
Publication number
20250093785
Publication date
Mar 20, 2025
Nikon Corporation
Yuho KANAYA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MIRROR FOLDED ILLUMINATION FOR COMPACT OPTICAL METROLOGY SYSTEM
Publication number
20250068087
Publication date
Feb 27, 2025
Applied Materials, Inc.
Yangyang SUN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
GENERATING AN ALIGNMENT SIGNAL WITHOUT DEDICATED ALIGNMENT STRUCTURES
Publication number
20250060680
Publication date
Feb 20, 2025
ASML NETHERLANDS B.V.
Aabid PATEL
G01 - MEASURING TESTING
Information
Patent Application
SUBSTRATE COMPRISING A TARGET ARRANGEMENT, ASSOCIATED PATTERNING DE...
Publication number
20250060661
Publication date
Feb 20, 2025
ASML NETHERLANDS B.V.
Hugo Augustinus Joseph CRAMER
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Flexible Measurement Models For Model Based Measurements Of Semicon...
Publication number
20250053096
Publication date
Feb 13, 2025
KLA Corporation
Houssam Chouaib
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
OVERLAY METROLOGY TARGET FOR DIE-TO-WAFER OVERLAY METROLOGY
Publication number
20250054872
Publication date
Feb 13, 2025
KLA Corporation
Shlomo Eisenbach
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD AND APPARATUS TO DETERMINE OVERLAY
Publication number
20250044709
Publication date
Feb 6, 2025
ASML NETHERLANDS B.V.
Willem Louis VAN MIERLO
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
OVERLAY METROLOGY BASED ON TEMPLATE MATCHING WITH ADAPTIVE WEIGHTING
Publication number
20250044710
Publication date
Feb 6, 2025
ASML NETHERLANDS B.V.
Jiyou FU
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
TARGET ASYMMETRY MEASUREMENT FOR SUBSTRATE ALIGNMENT IN LITHOGRAPHY...
Publication number
20250036031
Publication date
Jan 30, 2025
ASML NETHERLANDS B.V.
Aniruddha Ramakrishna SONDE
G01 - MEASURING TESTING
Information
Patent Application
METROLOGY TARGET DESIGN FOR TILTED DEVICE DESIGNS
Publication number
20250035489
Publication date
Jan 30, 2025
KLA Corporation
Myungjun Lee
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHODS OF DETERMINING A MECHANICAL PROPERTY OF A LAYER APPLIED TO...
Publication number
20250028254
Publication date
Jan 23, 2025
ASML NETHERLANDS B.V.
Huaichen ZHANG
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SYSTEMS AND METHODS FOR OPTIMIZING LITHOGRAPHIC DESIGN VARIABLES US...
Publication number
20250028255
Publication date
Jan 23, 2025
ASML NETHERLANDS B.V.
Chenxi LIN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...
Publication number
20250021018
Publication date
Jan 16, 2025
ASML NETHERLANDS B.V.
Joost Cyrillus Lambert HAGEMAN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METROLOGY CALIBRATION METHOD
Publication number
20250021021
Publication date
Jan 16, 2025
ASML NETHERLANDS B.V.
Giulio BOTTEGAL
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SURROUNDING PATTERN AND PROCESS AWARE METROLOGY
Publication number
20250013158
Publication date
Jan 9, 2025
ASML NETHERLANDS B.V.
Huaichen ZHANG
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SOURCE SEPARATION FROM METROLOGY DATA
Publication number
20250004385
Publication date
Jan 2, 2025
ASML NETHERLANDS B.V.
Marc Johannes NOOT
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
MACHINE LEARNING BASED METROLOGY FOR SEMICONDUCTOR SPECIMENS
Publication number
20250004386
Publication date
Jan 2, 2025
APPLIED MATERIALS ISRAEL LTD.
Ilan BEN-HARUSH
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
OVERLAY MEASUREMENT USING BALANCED CAPACITY TARGETS
Publication number
20240427253
Publication date
Dec 26, 2024
ASML NETHERLANDS B.V.
Henricus Petrus Maria PELLEMANS
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Determination of Imaging Transfer Function of a Charged-Particle Ex...
Publication number
20240427254
Publication date
Dec 26, 2024
IMS Nanofabrication GmbH
Christoph Spengler
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY