using process control mark

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G03F7/70683

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/70683using process control mark

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Quantum meta-device for ultrasensitive displacement metrology
- Patent number 12,326,665
- Issue date Jun 10, 2025
- City University of Hong Kong
- Yubin Fan
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 12,322,660
- Issue date Jun 3, 2025
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology tool with position control of projection system
- Patent number 12,306,544
- Issue date May 20, 2025
- ASML Holding N.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment mark and method
- Patent number 12,292,694
- Issue date May 6, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Chung Chien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for obtaining diagnostic information relating...
- Patent number 12,287,584
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Alexander Ypma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for calculating a spatial map associated with...
- Patent number 12,276,918
- Issue date Apr 15, 2025
- ASML Netherlands B.V.
- Mauritius Gerardus Elisabeth Schneiders
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for avoiding damage to overlay metrology mark
- Patent number 12,276,920
- Issue date Apr 15, 2025
- Shanghai Huali Integrated Circuit Corporation
- Chengchang Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Matching process controllers for improved matching of process
- Patent number 12,265,380
- Issue date Apr 1, 2025
- Applied Materials, Inc.
- James Robert Moyne
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Alignment-overlay mark and method using the same
- Patent number 12,265,335
- Issue date Apr 1, 2025
- Micron Technology, Inc.
- Kazuko Yamashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay mark, overlay marking method and overlay measuring method
- Patent number 12,259,661
- Issue date Mar 25, 2025
- NEXCHIP SEMICONDUCTOR CORPORATION
- Kuotung Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for manufacturing semiconductor devices using MOIRÉ patterns
- Patent number 12,259,662
- Issue date Mar 25, 2025
- Samsung Electronics Co., Ltd.
- Woohyeok Jeong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scatterometry overlay metrology with orthogonal fine-pitch segmenta...
- Patent number 12,253,805
- Issue date Mar 18, 2025
- KLA Corporation
- Vladimir Levinski
- G01 - MEASURING TESTING
Information Patent Grant
Target for measuring a parameter of a lithographic process
- Patent number 12,242,203
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process window qualification modulation layouts
- Patent number 12,235,224
- Issue date Feb 25, 2025
- KLA Corporation
- Andrew Cross
- G01 - MEASURING TESTING
Information Patent Grant
Semiconductor marks and forming methods thereof
- Patent number 12,218,073
- Issue date Feb 4, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Shengan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for inspection and metrology
- Patent number 12,204,826
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Lotte Marloes Willems
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi-layered moiré targets and methods for using the same in measu...
- Patent number 12,204,254
- Issue date Jan 21, 2025
- KLA Corporation
- Yoel Feler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Machine learning on overlay management
- Patent number 12,197,138
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tzu-Cheng Lin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithography measurement machine and operating method thereof
- Patent number 12,197,124
- Issue date Jan 14, 2025
- Hon Hai Precision Industry Co., Ltd.
- Kuo-Kuei Fu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology method and associated metrology and lithographic apparatuses
- Patent number 12,189,314
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Computational metrology
- Patent number 12,189,302
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Voltage contrast metrology mark
- Patent number 12,169,366
- Issue date Dec 17, 2024
- ASML Netherlands B.V.
- Cyrus Emil Tabery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Overlay target design for improved target placement accuracy
- Patent number 12,140,859
- Issue date Nov 12, 2024
- KLA Corporation
- Vladimir Levinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus to determine a patterning process parameter us...
- Patent number 12,142,535
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology target design for tilted device designs
- Patent number 12,117,347
- Issue date Oct 15, 2024
- KLA Corporation
- Myungjun Lee
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology utilizing short-wave infrared wavelengths
- Patent number 12,111,580
- Issue date Oct 8, 2024
- KLA Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Overlay mark forming Moire pattern, overlay measurement method usin...
- Patent number 12,107,052
- Issue date Oct 1, 2024
- AUROS TECHNOLOGY, INC.
- Hyun Chul Lee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Targets for diffraction-based overlay error metrology
- Patent number 12,105,414
- Issue date Oct 1, 2024
- KLA Corporation
- Itay Gdor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Target and algorithm to measure overlay by modeling back scattering...
- Patent number 12,100,574
- Issue date Sep 24, 2024
- KLA Corporation
- Nadav Gutman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wavelet system and method for ameliorating misregistration and asym...
- Patent number 12,080,610
- Issue date Sep 3, 2024
- KLA Corporation
- Lilach Saltoun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
A METHOD FOR DETERMINING A VERTICAL POSITION OF A STRUCTURE ON A SU...
- Publication number 20250208520
- Publication date Jun 26, 2025
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G01 - MEASURING TESTING
Information Patent Application
ILLUMINATION MODULE AND ASSOCIATED METHODS AND METROLOGY APPARATUS
- Publication number 20250208522
- Publication date Jun 26, 2025
- ASML NETHERLANDS B.V.
- Patrick WARNAAR
- G01 - MEASURING TESTING
Information Patent Application
METHOD, LITHOGRAPHY MASK, USE OF A LITHOGRAPHY MASK, AND PROCESSING...
- Publication number 20250208499
- Publication date Jun 26, 2025
- Carl Zeiss SMT GMBH
- Daniel Rhinow
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATCHING PROCESS CONTROLLERS FOR IMPROVED MATCHING OF PROCESS
- Publication number 20250199521
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- James Robert Moyne
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MEASURING CONTRAST AND CRITICAL DIMENSION USING AN ALIGNMENT SENSOR
- Publication number 20250199418
- Publication date Jun 19, 2025
- ASML NETHERLANDS B.V.
- Edouard André Marie Louis DURIAU
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR CORRECTING MEASUREMENTS IN THE MANUFACTURE OF INTEGRATED...
- Publication number 20250189904
- Publication date Jun 12, 2025
- ASML NETHERLANDS B.V.
- Han-Kwang NIENHUYS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for evaluating at least one marker on a physical object for...
- Publication number 20250172882
- Publication date May 29, 2025
- ROBERT BOSCH GmbH
- Cedric Donie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETECTION DEVICE AND METHOD FOR OPERATING THE SAME
- Publication number 20250172520
- Publication date May 29, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ya-Chin KING
- G01 - MEASURING TESTING
Information Patent Application
DETERMINING A MEASUREMENT RECIPE IN A METROLOGY METHOD
- Publication number 20250147429
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND ASSOCIATED METROLOGY DEVICE
- Publication number 20250147437
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Armand Eugene Albert KOOLEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF METROLOGY
- Publication number 20250147436
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Chrysostomos BATISTAKIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY MARK DESIGN ENABLING LARGE OVERLAY MEASUREMENT
- Publication number 20250139814
- Publication date May 1, 2025
- KLA Corporation
- Mark Ghinovker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INTENSITY MEASUREMENTS USING OFF-AXIS ILLUMINATION
- Publication number 20250130512
- Publication date Apr 24, 2025
- ASML NETHERLANDS B.V.
- Mohamed SWILLAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MACHINE LEARNING ON OVERLAY MANAGEMENT
- Publication number 20250123572
- Publication date Apr 17, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tzu-Cheng LIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FULL-WAFER METROLOGY UP-SAMPLING
- Publication number 20250123571
- Publication date Apr 17, 2025
- NOVA LTD
- Eitan A. ROTHSTEIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SMALL IN-DIE TARGET DESIGN FOR OVERLAY MEASUREMENT
- Publication number 20250110412
- Publication date Apr 3, 2025
- KLA Corporation
- Vladimir Levinski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A FRAMEWORK FOR CONDITION TUNING AND IMAGE PROCESSING FOR METROLOGY...
- Publication number 20250102923
- Publication date Mar 27, 2025
- ASML NETHERLANDS B.V.
- Lingling PU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF GENERATING DRAWING DATA, DRAWING DATA GENERATION DEVICE,...
- Publication number 20250093785
- Publication date Mar 20, 2025
- Nikon Corporation
- Yuho KANAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR FOLDED ILLUMINATION FOR COMPACT OPTICAL METROLOGY SYSTEM
- Publication number 20250068087
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Yangyang SUN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GENERATING AN ALIGNMENT SIGNAL WITHOUT DEDICATED ALIGNMENT STRUCTURES
- Publication number 20250060680
- Publication date Feb 20, 2025
- ASML NETHERLANDS B.V.
- Aabid PATEL
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE COMPRISING A TARGET ARRANGEMENT, ASSOCIATED PATTERNING DE...
- Publication number 20250060661
- Publication date Feb 20, 2025
- ASML NETHERLANDS B.V.
- Hugo Augustinus Joseph CRAMER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Flexible Measurement Models For Model Based Measurements Of Semicon...
- Publication number 20250053096
- Publication date Feb 13, 2025
- KLA Corporation
- Houssam Chouaib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY METROLOGY TARGET FOR DIE-TO-WAFER OVERLAY METROLOGY
- Publication number 20250054872
- Publication date Feb 13, 2025
- KLA Corporation
- Shlomo Eisenbach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS TO DETERMINE OVERLAY
- Publication number 20250044709
- Publication date Feb 6, 2025
- ASML NETHERLANDS B.V.
- Willem Louis VAN MIERLO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OVERLAY METROLOGY BASED ON TEMPLATE MATCHING WITH ADAPTIVE WEIGHTING
- Publication number 20250044710
- Publication date Feb 6, 2025
- ASML NETHERLANDS B.V.
- Jiyou FU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TARGET ASYMMETRY MEASUREMENT FOR SUBSTRATE ALIGNMENT IN LITHOGRAPHY...
- Publication number 20250036031
- Publication date Jan 30, 2025
- ASML NETHERLANDS B.V.
- Aniruddha Ramakrishna SONDE
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY TARGET DESIGN FOR TILTED DEVICE DESIGNS
- Publication number 20250035489
- Publication date Jan 30, 2025
- KLA Corporation
- Myungjun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF DETERMINING A MECHANICAL PROPERTY OF A LAYER APPLIED TO...
- Publication number 20250028254
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Huaichen ZHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR OPTIMIZING LITHOGRAPHIC DESIGN VARIABLES US...
- Publication number 20250028255
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Chenxi LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...
- Publication number 20250021018
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Joost Cyrillus Lambert HAGEMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

using process control mark

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Quantum meta-device for ultrasensitive displacement metrology

Method and apparatus to determine a patterning process parameter

Metrology tool with position control of projection system

Alignment mark and method

Methods and apparatus for obtaining diagnostic information relating...

Method and apparatus for calculating a spatial map associated with...

Method for avoiding damage to overlay metrology mark

Matching process controllers for improved matching of process

Alignment-overlay mark and method using the same

Overlay mark, overlay marking method and overlay measuring method

Methods for manufacturing semiconductor devices using MOIRÉ patterns

Scatterometry overlay metrology with orthogonal fine-pitch segmenta...

Target for measuring a parameter of a lithographic process

Process window qualification modulation layouts

Semiconductor marks and forming methods thereof

Method and apparatus for inspection and metrology

Multi-layered moiré targets and methods for using the same in measu...

Machine learning on overlay management

Lithography measurement machine and operating method thereof

Metrology method and associated metrology and lithographic apparatuses

Computational metrology

Voltage contrast metrology mark

Overlay target design for improved target placement accuracy

Method and apparatus to determine a patterning process parameter us...

Metrology target design for tilted device designs

Optical metrology utilizing short-wave infrared wavelengths

Overlay mark forming Moire pattern, overlay measurement method usin...

Targets for diffraction-based overlay error metrology

Target and algorithm to measure overlay by modeling back scattering...

Wavelet system and method for ameliorating misregistration and asym...

Patents Applicationslast 30 patents

A METHOD FOR DETERMINING A VERTICAL POSITION OF A STRUCTURE ON A SU...

ILLUMINATION MODULE AND ASSOCIATED METHODS AND METROLOGY APPARATUS

METHOD, LITHOGRAPHY MASK, USE OF A LITHOGRAPHY MASK, AND PROCESSING...

MATCHING PROCESS CONTROLLERS FOR IMPROVED MATCHING OF PROCESS

MEASURING CONTRAST AND CRITICAL DIMENSION USING AN ALIGNMENT SENSOR

METHOD FOR CORRECTING MEASUREMENTS IN THE MANUFACTURE OF INTEGRATED...

Method for evaluating at least one marker on a physical object for...

DETECTION DEVICE AND METHOD FOR OPERATING THE SAME

DETERMINING A MEASUREMENT RECIPE IN A METROLOGY METHOD

METROLOGY METHOD AND ASSOCIATED METROLOGY DEVICE

METHODS OF METROLOGY

OVERLAY MARK DESIGN ENABLING LARGE OVERLAY MEASUREMENT

INTENSITY MEASUREMENTS USING OFF-AXIS ILLUMINATION

MACHINE LEARNING ON OVERLAY MANAGEMENT

FULL-WAFER METROLOGY UP-SAMPLING

SMALL IN-DIE TARGET DESIGN FOR OVERLAY MEASUREMENT

A FRAMEWORK FOR CONDITION TUNING AND IMAGE PROCESSING FOR METROLOGY...

METHOD OF GENERATING DRAWING DATA, DRAWING DATA GENERATION DEVICE,...

MIRROR FOLDED ILLUMINATION FOR COMPACT OPTICAL METROLOGY SYSTEM

GENERATING AN ALIGNMENT SIGNAL WITHOUT DEDICATED ALIGNMENT STRUCTURES

SUBSTRATE COMPRISING A TARGET ARRANGEMENT, ASSOCIATED PATTERNING DE...

Flexible Measurement Models For Model Based Measurements Of Semicon...

OVERLAY METROLOGY TARGET FOR DIE-TO-WAFER OVERLAY METROLOGY

METHOD AND APPARATUS TO DETERMINE OVERLAY

OVERLAY METROLOGY BASED ON TEMPLATE MATCHING WITH ADAPTIVE WEIGHTING

TARGET ASYMMETRY MEASUREMENT FOR SUBSTRATE ALIGNMENT IN LITHOGRAPHY...

METROLOGY TARGET DESIGN FOR TILTED DEVICE DESIGNS

METHODS OF DETERMINING A MECHANICAL PROPERTY OF A LAYER APPLIED TO...

SYSTEMS AND METHODS FOR OPTIMIZING LITHOGRAPHIC DESIGN VARIABLES US...

SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...