using process control mark

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G03F7/70683

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/70683using process control mark

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Patents Grantslast 30 patents

Information Patent Grant
Voltage contrast metrology mark
- Patent number 12,169,366
- Issue date Dec 17, 2024
- ASML Netherlands B.V.
- Cyrus Emil Tabery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Overlay target design for improved target placement accuracy
- Patent number 12,140,859
- Issue date Nov 12, 2024
- KLA Corporation
- Vladimir Levinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus to determine a patterning process parameter us...
- Patent number 12,142,535
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology target design for tilted device designs
- Patent number 12,117,347
- Issue date Oct 15, 2024
- KLA Corporation
- Myungjun Lee
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology utilizing short-wave infrared wavelengths
- Patent number 12,111,580
- Issue date Oct 8, 2024
- KLA Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Overlay mark forming Moire pattern, overlay measurement method usin...
- Patent number 12,107,052
- Issue date Oct 1, 2024
- AUROS TECHNOLOGY, INC.
- Hyun Chul Lee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Targets for diffraction-based overlay error metrology
- Patent number 12,105,414
- Issue date Oct 1, 2024
- KLA Corporation
- Itay Gdor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Target and algorithm to measure overlay by modeling back scattering...
- Patent number 12,100,574
- Issue date Sep 24, 2024
- KLA Corporation
- Nadav Gutman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wavelet system and method for ameliorating misregistration and asym...
- Patent number 12,080,610
- Issue date Sep 3, 2024
- KLA Corporation
- Lilach Saltoun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology apparatus and method for determining a characteristic of...
- Patent number 12,066,764
- Issue date Aug 20, 2024
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Method to predict yield of a device manufacturing process
- Patent number 12,055,904
- Issue date Aug 6, 2024
- ASML Netherlands B.V.
- Youping Zhang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Overlay mark design for electron beam overlay
- Patent number 12,055,859
- Issue date Aug 6, 2024
- Inna Steely-Tarshish
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatuses and methods for diffraction base overlay measurements
- Patent number 12,044,982
- Issue date Jul 23, 2024
- Micron Technology, Inc.
- Masazumi Matsunobu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology method and associated metrology and lithographic apparatuses
- Patent number 12,032,299
- Issue date Jul 9, 2024
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging overlay with mutually coherent oblique illumination
- Patent number 12,032,300
- Issue date Jul 9, 2024
- KLA Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Grant
Target for measuring a parameter of a lithographic process
- Patent number 12,019,377
- Issue date Jun 25, 2024
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay mark forming Moire pattern, overlay measurement method usin...
- Patent number 12,021,040
- Issue date Jun 25, 2024
- AUROS TECHNOLOGY, INC.
- Hyun Chul Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduction or elimination of pattern placement error in metrology me...
- Patent number 12,013,634
- Issue date Jun 18, 2024
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Determining a mark layout across a patterning device or substrate
- Patent number 12,007,701
- Issue date Jun 11, 2024
- ASML Netherlands B.V.
- Pavel Smal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor structure and method for manufacturing same
- Patent number 11,984,406
- Issue date May 14, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Yunsheng Xia
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Defocus measurement method, correction method, and method of manufa...
- Patent number 11,977,338
- Issue date May 7, 2024
- Samsung Electronics Co., Ltd.
- Jieun Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for improving a process for a patterning process
- Patent number 11,977,336
- Issue date May 7, 2024
- ASML Netherlands B.V.
- Jen-Shiang Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reducing device overlay errors
- Patent number 11,971,664
- Issue date Apr 30, 2024
- KLA-Tencor Corporation
- Liran Yerushalmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement apparatus and a method for determining a substrate grid
- Patent number 11,966,166
- Issue date Apr 23, 2024
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for producing overlay results with absolute reference for se...
- Patent number 11,966,171
- Issue date Apr 23, 2024
- Tokyo Electron Limited
- Anton J. deVilliers
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Systems and methods for reducing resist model prediction errors
- Patent number 11,966,167
- Issue date Apr 23, 2024
- ASML Netherlands B.V.
- Marleen Kooiman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
On-product overlay targets
- Patent number 11,967,535
- Issue date Apr 23, 2024
- KLA Corporation
- Amnon Manassen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,947,269
- Issue date Apr 2, 2024
- ASML Netherlands B.V.
- Anagnostis Tsiatmas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and apparatus for obtaining diagnostic information relating...
- Patent number 11,940,740
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Alexander Ypma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical metrology in machine learning to characterize features
- Patent number 11,921,433
- Issue date Mar 5, 2024
- Lam Research Corporation
- Ye Feng
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
METROLOGY APPARATUS AND METROLOGY METHODS BASED ON HIGH HARMONIC GE...
- Publication number 20240410827
- Publication date Dec 12, 2024
- ASML NETHERLANDS B.V.
- Diederik Jan MAAS
- G01 - MEASURING TESTING
Information Patent Application
SINGLE GRAB PUPIL LANDSCAPE VIA BROADBAND ILLUMINATION
- Publication number 20240402615
- Publication date Dec 5, 2024
- KLA Corporation
- Yaniv Weiss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
QUANTUM META-DEVICE FOR ULTRASENSITIVE DISPLACEMENT METROLOGY
- Publication number 20240402616
- Publication date Dec 5, 2024
- City University of Hong Kong
- Yubin Fan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING A PERFORMANCE PARAMETER DISTRIBUTION
- Publication number 20240402618
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Vahid BASTANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
QUASI-DYNAMIC IN SITU ELLIPSOMETRY METHOD AND SYSTEM FOR MEASURING...
- Publication number 20240402614
- Publication date Dec 5, 2024
- HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY
- Hao Jiang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SOURCE SELECTION MODULE AND ASSOCIATED METROLOGY AND LITHOGRAPHIC A...
- Publication number 20240402620
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Paul Corné Henri DE WIT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASURING METHOD, LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD,...
- Publication number 20240385534
- Publication date Nov 21, 2024
- Canon Kabushiki Kaisha
- SHINGO HANYUDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTER IMPLEMENTED METHOD AND SYSTEM FOR SIMULATING AN AERIAL IMA...
- Publication number 20240377723
- Publication date Nov 14, 2024
- Carl Zeiss SMT GMBH
- Niklas Georg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE AND METHOD FOR OVERLAY MEASUREMENT WHICH CONTROL FOCUS MOVEMENT
- Publication number 20240377757
- Publication date Nov 14, 2024
- Samsung Electronics Co., Ltd.
- Jun Yeob KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20240361702
- Publication date Oct 31, 2024
- ASML NETHERLANDS B.V.
- Anagnostis Tsiatmas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Full Wafer Measurement Based On A Trained Full Wafer Measurement Model
- Publication number 20240353759
- Publication date Oct 24, 2024
- KLA Corporation
- Stilian Ivanov Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TRACKING AND/OR PREDICTING SUBSTRATE YIELD DURING FABRICATION
- Publication number 20240354485
- Publication date Oct 24, 2024
- ONTO INNOVATION INC.
- Keith Frank Best
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR EVALUATING REFERENCE MARK FORMED ON EUV MASK BLANK
- Publication number 20240345474
- Publication date Oct 17, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takahiro KISHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR TRACKING REAL-TIME POSITION FOR SCANNING OVER...
- Publication number 20240337953
- Publication date Oct 10, 2024
- KLA Corporation
- Itay Gdor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING OVERLAY WITH MUTUALLY COHERENT OBLIQUE ILLUMINATION
- Publication number 20240329543
- Publication date Oct 3, 2024
- KLA Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY SYSTEMS WITH PHASED ARRAYS FOR CONTAMINANT DETECTION AND...
- Publication number 20240319617
- Publication date Sep 26, 2024
- ASML Holding N.V.
- Mohamed SWILLAM
- G01 - MEASURING TESTING
Information Patent Application
MATCH THE ABERRATION SENSITIVITY OF THE METROLOGY MARK AND THE DEVI...
- Publication number 20240319581
- Publication date Sep 26, 2024
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASURING METHOD FOR MEASURING OVERLAY SHIFT AND NON-TRANSIENT COMP...
- Publication number 20240319616
- Publication date Sep 26, 2024
- NANYA TECHNOLOGY CORPORATION
- Chun Yen WEI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING A CORRECTION FOR AT LEAST ONE CONTROL PARAMET...
- Publication number 20240310738
- Publication date Sep 19, 2024
- ASML NETHERLANDS B.V.
- Roy WERKMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND ASSOCIATED METROLOGY TOOL
- Publication number 20240288782
- Publication date Aug 29, 2024
- ASML NETHERLANDS B.V.
- Zili ZHOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INFORMATION PROCESSING APPARATUS AND STORAGE MEDIUM
- Publication number 20240288845
- Publication date Aug 29, 2024
- Canon Kabushiki Kaisha
- TOMOHIRO MASE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR TESTING PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUC...
- Publication number 20240280915
- Publication date Aug 22, 2024
- FUJIFILM CORPORATION
- Kei YAMAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY MEASUREMENT APPARATUS AND OVERLAY MEASUREMENT METHOD
- Publication number 20240272560
- Publication date Aug 15, 2024
- AUROS Technology, Inc.
- Seong Yun CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANAGING SEMICONDUCTOR PROCESSING APPARATUS
- Publication number 20240272561
- Publication date Aug 15, 2024
- Samsung Electronics Co., Ltd.
- Junho SHIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
A METHOD FOR MODELING MEASUREMENT DATA OVER A SUBSTRATE AREA AND AS...
- Publication number 20240264537
- Publication date Aug 8, 2024
- ASML NETHERLANDS B.V.
- Gijs TEN HAAF
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INSPECTION DATA FILTERING SYSTEMS AND METHODS
- Publication number 20240264539
- Publication date Aug 8, 2024
- ASML NETHERLANDS B.V.
- Lingling LU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY MEASUREMENT METHOD AND APPARATUS
- Publication number 20240255279
- Publication date Aug 1, 2024
- ASML NETHERLANDS B.V.
- Han-Kwang NIENHUYS
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS
- Publication number 20240248413
- Publication date Jul 25, 2024
- TOKYO ELECTRON LIMITED
- Takeshi SHIMOAOKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MEASURING OVERLAY AND SEMICONDUCTOR DEVICE MANUFACTURED U...
- Publication number 20240241451
- Publication date Jul 18, 2024
- Samsung Electronics Co., Ltd.
- Daehee LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRONIC DEVICE
- Publication number 20240241455
- Publication date Jul 18, 2024
- InnoLux Corporation
- Kuang-Ming FAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

using process control mark

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Voltage contrast metrology mark

Overlay target design for improved target placement accuracy

Method and apparatus to determine a patterning process parameter us...

Metrology target design for tilted device designs

Optical metrology utilizing short-wave infrared wavelengths

Overlay mark forming Moire pattern, overlay measurement method usin...

Targets for diffraction-based overlay error metrology

Target and algorithm to measure overlay by modeling back scattering...

Wavelet system and method for ameliorating misregistration and asym...

Metrology apparatus and method for determining a characteristic of...

Method to predict yield of a device manufacturing process

Overlay mark design for electron beam overlay

Apparatuses and methods for diffraction base overlay measurements

Metrology method and associated metrology and lithographic apparatuses

Imaging overlay with mutually coherent oblique illumination

Target for measuring a parameter of a lithographic process

Overlay mark forming Moire pattern, overlay measurement method usin...

Reduction or elimination of pattern placement error in metrology me...

Determining a mark layout across a patterning device or substrate

Semiconductor structure and method for manufacturing same

Defocus measurement method, correction method, and method of manufa...

Method for improving a process for a patterning process

Reducing device overlay errors

Measurement apparatus and a method for determining a substrate grid

Method for producing overlay results with absolute reference for se...

Systems and methods for reducing resist model prediction errors

On-product overlay targets

Method and apparatus to determine a patterning process parameter

Methods and apparatus for obtaining diagnostic information relating...

Optical metrology in machine learning to characterize features

Patents Applicationslast 30 patents

METROLOGY APPARATUS AND METROLOGY METHODS BASED ON HIGH HARMONIC GE...

SINGLE GRAB PUPIL LANDSCAPE VIA BROADBAND ILLUMINATION

QUANTUM META-DEVICE FOR ULTRASENSITIVE DISPLACEMENT METROLOGY

METHOD OF DETERMINING A PERFORMANCE PARAMETER DISTRIBUTION

QUASI-DYNAMIC IN SITU ELLIPSOMETRY METHOD AND SYSTEM FOR MEASURING...

SOURCE SELECTION MODULE AND ASSOCIATED METROLOGY AND LITHOGRAPHIC A...

MEASURING METHOD, LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD,...

COMPUTER IMPLEMENTED METHOD AND SYSTEM FOR SIMULATING AN AERIAL IMA...

DEVICE AND METHOD FOR OVERLAY MEASUREMENT WHICH CONTROL FOCUS MOVEMENT

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

Full Wafer Measurement Based On A Trained Full Wafer Measurement Model

TRACKING AND/OR PREDICTING SUBSTRATE YIELD DURING FABRICATION

METHOD FOR EVALUATING REFERENCE MARK FORMED ON EUV MASK BLANK

SYSTEM AND METHOD FOR TRACKING REAL-TIME POSITION FOR SCANNING OVER...

IMAGING OVERLAY WITH MUTUALLY COHERENT OBLIQUE ILLUMINATION

METROLOGY SYSTEMS WITH PHASED ARRAYS FOR CONTAMINANT DETECTION AND...

MATCH THE ABERRATION SENSITIVITY OF THE METROLOGY MARK AND THE DEVI...

MEASURING METHOD FOR MEASURING OVERLAY SHIFT AND NON-TRANSIENT COMP...

METHOD OF DETERMINING A CORRECTION FOR AT LEAST ONE CONTROL PARAMET...

METROLOGY METHOD AND ASSOCIATED METROLOGY TOOL

INFORMATION PROCESSING APPARATUS AND STORAGE MEDIUM

METHOD FOR TESTING PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUC...

OVERLAY MEASUREMENT APPARATUS AND OVERLAY MEASUREMENT METHOD

METHOD OF MANAGING SEMICONDUCTOR PROCESSING APPARATUS

A METHOD FOR MODELING MEASUREMENT DATA OVER A SUBSTRATE AREA AND AS...

INSPECTION DATA FILTERING SYSTEMS AND METHODS

METROLOGY MEASUREMENT METHOD AND APPARATUS

SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS

METHOD OF MEASURING OVERLAY AND SEMICONDUCTOR DEVICE MANUFACTURED U...

ELECTRONIC DEVICE