using process control mark

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G03F7/70683

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70683using process control mark

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Matching process controllers for improved matching of process
- Patent number 12,265,380
- Issue date Apr 1, 2025
- Applied Materials, Inc.
- James Robert Moyne
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Alignment-overlay mark and method using the same
- Patent number 12,265,335
- Issue date Apr 1, 2025
- Micron Technology, Inc.
- Kazuko Yamashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay mark, overlay marking method and overlay measuring method
- Patent number 12,259,661
- Issue date Mar 25, 2025
- NEXCHIP SEMICONDUCTOR CORPORATION
- Kuotung Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for manufacturing semiconductor devices using MOIRÉ patterns
- Patent number 12,259,662
- Issue date Mar 25, 2025
- Samsung Electronics Co., Ltd.
- Woohyeok Jeong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scatterometry overlay metrology with orthogonal fine-pitch segmenta...
- Patent number 12,253,805
- Issue date Mar 18, 2025
- KLA Corporation
- Vladimir Levinski
- G01 - MEASURING TESTING
Information Patent Grant
Target for measuring a parameter of a lithographic process
- Patent number 12,242,203
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process window qualification modulation layouts
- Patent number 12,235,224
- Issue date Feb 25, 2025
- KLA Corporation
- Andrew Cross
- G01 - MEASURING TESTING
Information Patent Grant
Semiconductor marks and forming methods thereof
- Patent number 12,218,073
- Issue date Feb 4, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Shengan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for inspection and metrology
- Patent number 12,204,826
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Lotte Marloes Willems
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi-layered moiré targets and methods for using the same in measu...
- Patent number 12,204,254
- Issue date Jan 21, 2025
- KLA Corporation
- Yoel Feler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Machine learning on overlay management
- Patent number 12,197,138
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tzu-Cheng Lin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithography measurement machine and operating method thereof
- Patent number 12,197,124
- Issue date Jan 14, 2025
- Hon Hai Precision Industry Co., Ltd.
- Kuo-Kuei Fu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology method and associated metrology and lithographic apparatuses
- Patent number 12,189,314
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Computational metrology
- Patent number 12,189,302
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Voltage contrast metrology mark
- Patent number 12,169,366
- Issue date Dec 17, 2024
- ASML Netherlands B.V.
- Cyrus Emil Tabery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Overlay target design for improved target placement accuracy
- Patent number 12,140,859
- Issue date Nov 12, 2024
- KLA Corporation
- Vladimir Levinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus to determine a patterning process parameter us...
- Patent number 12,142,535
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology target design for tilted device designs
- Patent number 12,117,347
- Issue date Oct 15, 2024
- KLA Corporation
- Myungjun Lee
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology utilizing short-wave infrared wavelengths
- Patent number 12,111,580
- Issue date Oct 8, 2024
- KLA Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Overlay mark forming Moire pattern, overlay measurement method usin...
- Patent number 12,107,052
- Issue date Oct 1, 2024
- AUROS TECHNOLOGY, INC.
- Hyun Chul Lee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Targets for diffraction-based overlay error metrology
- Patent number 12,105,414
- Issue date Oct 1, 2024
- KLA Corporation
- Itay Gdor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Target and algorithm to measure overlay by modeling back scattering...
- Patent number 12,100,574
- Issue date Sep 24, 2024
- KLA Corporation
- Nadav Gutman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wavelet system and method for ameliorating misregistration and asym...
- Patent number 12,080,610
- Issue date Sep 3, 2024
- KLA Corporation
- Lilach Saltoun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology apparatus and method for determining a characteristic of...
- Patent number 12,066,764
- Issue date Aug 20, 2024
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Method to predict yield of a device manufacturing process
- Patent number 12,055,904
- Issue date Aug 6, 2024
- ASML Netherlands B.V.
- Youping Zhang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Overlay mark design for electron beam overlay
- Patent number 12,055,859
- Issue date Aug 6, 2024
- Inna Steely-Tarshish
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatuses and methods for diffraction base overlay measurements
- Patent number 12,044,982
- Issue date Jul 23, 2024
- Micron Technology, Inc.
- Masazumi Matsunobu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology method and associated metrology and lithographic apparatuses
- Patent number 12,032,299
- Issue date Jul 9, 2024
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging overlay with mutually coherent oblique illumination
- Patent number 12,032,300
- Issue date Jul 9, 2024
- KLA Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Grant
Target for measuring a parameter of a lithographic process
- Patent number 12,019,377
- Issue date Jun 25, 2024
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SMALL IN-DIE TARGET DESIGN FOR OVERLAY MEASUREMENT
- Publication number 20250110412
- Publication date Apr 3, 2025
- KLA Corporation
- Vladimir Levinski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A FRAMEWORK FOR CONDITION TUNING AND IMAGE PROCESSING FOR METROLOGY...
- Publication number 20250102923
- Publication date Mar 27, 2025
- ASML NETHERLANDS B.V.
- Lingling PU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF GENERATING DRAWING DATA, DRAWING DATA GENERATION DEVICE,...
- Publication number 20250093785
- Publication date Mar 20, 2025
- Nikon Corporation
- Yuho KANAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR FOLDED ILLUMINATION FOR COMPACT OPTICAL METROLOGY SYSTEM
- Publication number 20250068087
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Yangyang SUN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GENERATING AN ALIGNMENT SIGNAL WITHOUT DEDICATED ALIGNMENT STRUCTURES
- Publication number 20250060680
- Publication date Feb 20, 2025
- ASML NETHERLANDS B.V.
- Aabid PATEL
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE COMPRISING A TARGET ARRANGEMENT, ASSOCIATED PATTERNING DE...
- Publication number 20250060661
- Publication date Feb 20, 2025
- ASML NETHERLANDS B.V.
- Hugo Augustinus Joseph CRAMER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Flexible Measurement Models For Model Based Measurements Of Semicon...
- Publication number 20250053096
- Publication date Feb 13, 2025
- KLA Corporation
- Houssam Chouaib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY METROLOGY TARGET FOR DIE-TO-WAFER OVERLAY METROLOGY
- Publication number 20250054872
- Publication date Feb 13, 2025
- KLA Corporation
- Shlomo Eisenbach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS TO DETERMINE OVERLAY
- Publication number 20250044709
- Publication date Feb 6, 2025
- ASML NETHERLANDS B.V.
- Willem Louis VAN MIERLO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OVERLAY METROLOGY BASED ON TEMPLATE MATCHING WITH ADAPTIVE WEIGHTING
- Publication number 20250044710
- Publication date Feb 6, 2025
- ASML NETHERLANDS B.V.
- Jiyou FU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TARGET ASYMMETRY MEASUREMENT FOR SUBSTRATE ALIGNMENT IN LITHOGRAPHY...
- Publication number 20250036031
- Publication date Jan 30, 2025
- ASML NETHERLANDS B.V.
- Aniruddha Ramakrishna SONDE
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY TARGET DESIGN FOR TILTED DEVICE DESIGNS
- Publication number 20250035489
- Publication date Jan 30, 2025
- KLA Corporation
- Myungjun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF DETERMINING A MECHANICAL PROPERTY OF A LAYER APPLIED TO...
- Publication number 20250028254
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Huaichen ZHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR OPTIMIZING LITHOGRAPHIC DESIGN VARIABLES US...
- Publication number 20250028255
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Chenxi LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...
- Publication number 20250021018
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Joost Cyrillus Lambert HAGEMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY CALIBRATION METHOD
- Publication number 20250021021
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Giulio BOTTEGAL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SURROUNDING PATTERN AND PROCESS AWARE METROLOGY
- Publication number 20250013158
- Publication date Jan 9, 2025
- ASML NETHERLANDS B.V.
- Huaichen ZHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SOURCE SEPARATION FROM METROLOGY DATA
- Publication number 20250004385
- Publication date Jan 2, 2025
- ASML NETHERLANDS B.V.
- Marc Johannes NOOT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MACHINE LEARNING BASED METROLOGY FOR SEMICONDUCTOR SPECIMENS
- Publication number 20250004386
- Publication date Jan 2, 2025
- APPLIED MATERIALS ISRAEL LTD.
- Ilan BEN-HARUSH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY MEASUREMENT USING BALANCED CAPACITY TARGETS
- Publication number 20240427253
- Publication date Dec 26, 2024
- ASML NETHERLANDS B.V.
- Henricus Petrus Maria PELLEMANS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Determination of Imaging Transfer Function of a Charged-Particle Ex...
- Publication number 20240427254
- Publication date Dec 26, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY APPARATUS AND METROLOGY METHODS BASED ON HIGH HARMONIC GE...
- Publication number 20240410827
- Publication date Dec 12, 2024
- ASML NETHERLANDS B.V.
- Diederik Jan MAAS
- G01 - MEASURING TESTING
Information Patent Application
SINGLE GRAB PUPIL LANDSCAPE VIA BROADBAND ILLUMINATION
- Publication number 20240402615
- Publication date Dec 5, 2024
- KLA Corporation
- Yaniv Weiss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
QUANTUM META-DEVICE FOR ULTRASENSITIVE DISPLACEMENT METROLOGY
- Publication number 20240402616
- Publication date Dec 5, 2024
- City University of Hong Kong
- Yubin Fan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING A PERFORMANCE PARAMETER DISTRIBUTION
- Publication number 20240402618
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Vahid BASTANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
QUASI-DYNAMIC IN SITU ELLIPSOMETRY METHOD AND SYSTEM FOR MEASURING...
- Publication number 20240402614
- Publication date Dec 5, 2024
- HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY
- Hao Jiang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SOURCE SELECTION MODULE AND ASSOCIATED METROLOGY AND LITHOGRAPHIC A...
- Publication number 20240402620
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Paul Corné Henri DE WIT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASURING METHOD, LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD,...
- Publication number 20240385534
- Publication date Nov 21, 2024
- Canon Kabushiki Kaisha
- SHINGO HANYUDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTER IMPLEMENTED METHOD AND SYSTEM FOR SIMULATING AN AERIAL IMA...
- Publication number 20240377723
- Publication date Nov 14, 2024
- Carl Zeiss SMT GMBH
- Niklas Georg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE AND METHOD FOR OVERLAY MEASUREMENT WHICH CONTROL FOCUS MOVEMENT
- Publication number 20240377757
- Publication date Nov 14, 2024
- Samsung Electronics Co., Ltd.
- Jun Yeob KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

using process control mark

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Matching process controllers for improved matching of process

Alignment-overlay mark and method using the same

Overlay mark, overlay marking method and overlay measuring method

Methods for manufacturing semiconductor devices using MOIRÉ patterns

Scatterometry overlay metrology with orthogonal fine-pitch segmenta...

Target for measuring a parameter of a lithographic process

Process window qualification modulation layouts

Semiconductor marks and forming methods thereof

Method and apparatus for inspection and metrology

Multi-layered moiré targets and methods for using the same in measu...

Machine learning on overlay management

Lithography measurement machine and operating method thereof

Metrology method and associated metrology and lithographic apparatuses

Computational metrology

Voltage contrast metrology mark

Overlay target design for improved target placement accuracy

Method and apparatus to determine a patterning process parameter us...

Metrology target design for tilted device designs

Optical metrology utilizing short-wave infrared wavelengths

Overlay mark forming Moire pattern, overlay measurement method usin...

Targets for diffraction-based overlay error metrology

Target and algorithm to measure overlay by modeling back scattering...

Wavelet system and method for ameliorating misregistration and asym...

Metrology apparatus and method for determining a characteristic of...

Method to predict yield of a device manufacturing process

Overlay mark design for electron beam overlay

Apparatuses and methods for diffraction base overlay measurements

Metrology method and associated metrology and lithographic apparatuses

Imaging overlay with mutually coherent oblique illumination

Target for measuring a parameter of a lithographic process

Patents Applicationslast 30 patents

SMALL IN-DIE TARGET DESIGN FOR OVERLAY MEASUREMENT

A FRAMEWORK FOR CONDITION TUNING AND IMAGE PROCESSING FOR METROLOGY...

METHOD OF GENERATING DRAWING DATA, DRAWING DATA GENERATION DEVICE,...

MIRROR FOLDED ILLUMINATION FOR COMPACT OPTICAL METROLOGY SYSTEM

GENERATING AN ALIGNMENT SIGNAL WITHOUT DEDICATED ALIGNMENT STRUCTURES

SUBSTRATE COMPRISING A TARGET ARRANGEMENT, ASSOCIATED PATTERNING DE...

Flexible Measurement Models For Model Based Measurements Of Semicon...

OVERLAY METROLOGY TARGET FOR DIE-TO-WAFER OVERLAY METROLOGY

METHOD AND APPARATUS TO DETERMINE OVERLAY

OVERLAY METROLOGY BASED ON TEMPLATE MATCHING WITH ADAPTIVE WEIGHTING

TARGET ASYMMETRY MEASUREMENT FOR SUBSTRATE ALIGNMENT IN LITHOGRAPHY...

METROLOGY TARGET DESIGN FOR TILTED DEVICE DESIGNS

METHODS OF DETERMINING A MECHANICAL PROPERTY OF A LAYER APPLIED TO...

SYSTEMS AND METHODS FOR OPTIMIZING LITHOGRAPHIC DESIGN VARIABLES US...

SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...

METROLOGY CALIBRATION METHOD

SURROUNDING PATTERN AND PROCESS AWARE METROLOGY

SOURCE SEPARATION FROM METROLOGY DATA

MACHINE LEARNING BASED METROLOGY FOR SEMICONDUCTOR SPECIMENS

OVERLAY MEASUREMENT USING BALANCED CAPACITY TARGETS

Determination of Imaging Transfer Function of a Charged-Particle Ex...

METROLOGY APPARATUS AND METROLOGY METHODS BASED ON HIGH HARMONIC GE...

SINGLE GRAB PUPIL LANDSCAPE VIA BROADBAND ILLUMINATION

QUANTUM META-DEVICE FOR ULTRASENSITIVE DISPLACEMENT METROLOGY

METHOD OF DETERMINING A PERFORMANCE PARAMETER DISTRIBUTION

QUASI-DYNAMIC IN SITU ELLIPSOMETRY METHOD AND SYSTEM FOR MEASURING...

SOURCE SELECTION MODULE AND ASSOCIATED METROLOGY AND LITHOGRAPHIC A...

MEASURING METHOD, LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD,...

COMPUTER IMPLEMENTED METHOD AND SYSTEM FOR SIMULATING AN AERIAL IMA...

DEVICE AND METHOD FOR OVERLAY MEASUREMENT WHICH CONTROL FOCUS MOVEMENT