Wafer pattern monitoring

Industry

CPC
G03F7/70616

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70616Wafer pattern monitoring

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Metrology method and apparatus for of determining a complex-valued...
- Patent number 12,164,233
- Issue date Dec 10, 2024
- ASML Netherlands B.V.
- Alexander Prasetya Konijnenberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Illumination and detection apparatus for a metrology apparatus
- Patent number 12,158,435
- Issue date Dec 3, 2024
- ASML Netherlands B.V.
- Nitesh Pandey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining characteristic of patterning process based on...
- Patent number 12,092,963
- Issue date Sep 17, 2024
- ASML Netherlands B.V.
- Xingyue Peng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Detection apparatus for simultaneous acquisition of multiple divers...
- Patent number 12,086,973
- Issue date Sep 10, 2024
- ASML Netherlands B.V.
- Teunis Willem Tukker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Quantum-limited extreme ultraviolet coherent diffraction imaging
- Patent number 12,085,520
- Issue date Sep 10, 2024
- Regents of the Univ of Colorado
- Henry C. Kapteyn
- G01 - MEASURING TESTING
Information Patent Grant
Method of manufacturing semiconductor devices
- Patent number 12,062,582
- Issue date Aug 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Li-Chao Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to predict yield of a device manufacturing process
- Patent number 12,055,904
- Issue date Aug 6, 2024
- ASML Netherlands B.V.
- Youping Zhang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of manufacturing devices
- Patent number 12,044,980
- Issue date Jul 23, 2024
- ASML Netherlands B.V.
- Abraham Slachter
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method of manufacturing photo masks
- Patent number 12,038,693
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for lithography in semiconductor fabrication
- Patent number 12,025,918
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Kuan Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Detection using semiconductor detector
- Patent number 12,009,177
- Issue date Jun 11, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ya-Chin King
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology method and apparatus, computer program and lithographic s...
- Patent number 11,994,806
- Issue date May 28, 2024
- ASML Netherlands B.V.
- Alexandru Onose
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, metrology systems, phased array illuminatio...
- Patent number 11,994,808
- Issue date May 28, 2024
- ASML Holding N.V.
- Mohamed Swillam
- G01 - MEASURING TESTING
Information Patent Grant
Light sources and methods of controlling; devices and methods for u...
- Patent number 11,971,663
- Issue date Apr 30, 2024
- ASML Netherlands B.V.
- Marinus Petrus Reijnders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, metrology systems, phased array illuminatio...
- Patent number 11,966,169
- Issue date Apr 23, 2024
- ASML Holding N.V.
- Mohamed Swillam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process monitoring of deep structures with X-ray scatterometry
- Patent number 11,955,391
- Issue date Apr 9, 2024
- KLA-Tencor Corporation
- Antonio Arion Gellineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical phase measurement system and method
- Patent number 11,946,875
- Issue date Apr 2, 2024
- Nova Ltd.
- Gilad Barak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for obtaining diagnostic information relating...
- Patent number 11,940,740
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Alexander Ypma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Raman spectroscopy based measurement system
- Patent number 11,906,434
- Issue date Feb 20, 2024
- Nova Ltd.
- Yonatan Oren
- G01 - MEASURING TESTING
Information Patent Grant
Verification metrology targets and their design
- Patent number 11,874,605
- Issue date Jan 16, 2024
- KLA Corporation
- Michael E. Adel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and systems for inspecting integrated circuits based on X-rays
- Patent number 11,815,349
- Issue date Nov 14, 2023
- Bruker Nano, Inc.
- Brennan Lovelace Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wavefront sensor and associated metrology apparatus
- Patent number 11,815,402
- Issue date Nov 14, 2023
- ASML Netherlands B.V.
- Sietse Thijmen Van Der Post
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Measurement of overlay error using device inspection system
- Patent number 11,784,097
- Issue date Oct 10, 2023
- KLA-Tencor Corporation
- Choon Hoong Hoo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology and process control for semiconductor manufacturing
- Patent number 11,763,181
- Issue date Sep 19, 2023
- Nova Ltd.
- Eitan Rothstein
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for determining corrections for lithographic apparatus
- Patent number 11,754,931
- Issue date Sep 12, 2023
- ASML Netherlands B.V.
- Roy Werkman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical mode optimization for wafer inspection
- Patent number 11,748,551
- Issue date Sep 5, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Bing-Siang Chao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Prediction of out of specification based on a spatial characteristi...
- Patent number 11,733,613
- Issue date Aug 22, 2023
- ASML Netherlands B.V.
- Wenjin Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Frequency broadening apparatus and method
- Patent number 11,733,617
- Issue date Aug 22, 2023
- ASML Netherlands B.V.
- Patrick Sebastian Uebel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system to monitor a process apparatus
- Patent number 11,733,610
- Issue date Aug 22, 2023
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to characterize post-processing data in terms of individual...
- Patent number 11,709,432
- Issue date Jul 25, 2023
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF DETERMINING CHARACTERISTIC OF PATTERNING PROCESS BASED ON...
- Publication number 20240419086
- Publication date Dec 19, 2024
- ASML NETHERLANDS B.V.
- Xingyue PENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETECTION APPARATUS FOR SIMULTANEOUS ACQUISITION OF MULTIPLE DIVERS...
- Publication number 20240404036
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Teunis Willem TUKKER
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY METHOD AND APPARATUS, COMPUTER PROGRAM AND LITHOGRAPHIC S...
- Publication number 20240385531
- Publication date Nov 21, 2024
- ASML NETHERLANDS B.V.
- Alexandru ONOSE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DISSECTION METHOD FOR OPTICAL PROXIMITY CORRECTION AND PATTERNING M...
- Publication number 20240353747
- Publication date Oct 24, 2024
- United Microelectronics Corp.
- Pin Han Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING PHOTO MASKS
- Publication number 20240337951
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Cheng CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE EDGE PATTERNING TECHNIQUES
- Publication number 20240319615
- Publication date Sep 26, 2024
- ONTO INNOVATION INC.
- Keith F. Best
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RAMAN SPECTROSCOPY BASED MEASUREMENT SYSTEM
- Publication number 20240302284
- Publication date Sep 12, 2024
- NOVA LTD
- Yonatan OREN
- G01 - MEASURING TESTING
Information Patent Application
DETECTION USING SEMICONDUCTOR DETECTOR
- Publication number 20240290575
- Publication date Aug 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ya-Chin KING
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANALYSIS METHOD OF PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD OF...
- Publication number 20240280518
- Publication date Aug 22, 2024
- FUJIFILM CORPORATION
- Hideo NAGASAKI
- G01 - MEASURING TESTING
Information Patent Application
COMBINED DISPENSING AND STAMPING APPARATUS AND METHOD FOR APPLYING...
- Publication number 20240264524
- Publication date Aug 8, 2024
- ASMPT SINGAPORE PTE. LTD
- Kai Siu LAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY MEASUREMENT METHOD AND APPARATUS
- Publication number 20240255279
- Publication date Aug 1, 2024
- ASML NETHERLANDS B.V.
- Han-Kwang NIENHUYS
- G01 - MEASURING TESTING
Information Patent Application
LIGHT SOURCES AND METHODS OF CONTROLLING; DEVICES AND METHODS FOR U...
- Publication number 20240231243
- Publication date Jul 11, 2024
- ASML NETHERLANDS B.V.
- Marinus Petrus REIJNDERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ASYMMETRY EXTENDED GRID MODEL FOR WAFER ALIGNMENT
- Publication number 20240168397
- Publication date May 23, 2024
- ASML NETHERLANDS B.V.
- Joshua ADAMS
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF MANUFACTURING EXTREME ULTRAVIOLET (EUV) MASK FOR FORMING...
- Publication number 20240152043
- Publication date May 9, 2024
- Samsung Electronics Co., Ltd.
- Minseung SONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY AND PROCESS CONTROL FOR SEMICONDUCTOR MANUFACTURING
- Publication number 20240078450
- Publication date Mar 7, 2024
- NOVA LTD
- EITAN ROTHSTEIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MODULAR AUTOENCODER MODEL FOR MANUFACTURING PROCESS PARAMETER ESTIM...
- Publication number 20240061347
- Publication date Feb 22, 2024
- ASML NETHERLANDS B.V.
- Alexandru ONOSE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS AND APPARATUS FOR OBTAINING DIAGNOSTIC INFORMATION RELATING...
- Publication number 20240019788
- Publication date Jan 18, 2024
- ASML NETHERLANDS B.V.
- Alexander Ypma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM TO MONITOR A PROCESS APPARATUS
- Publication number 20240004299
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES
- Publication number 20230378003
- Publication date Nov 23, 2023
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Li-Chao YIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING AN ELECTRONIC COMPONENT ASSEMBLY ON THE FRONT...
- Publication number 20230378085
- Publication date Nov 23, 2023
- Exagan SAS
- Matthieu NONGAILLARD
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical Mode Optimization for Wafer Inspection
- Publication number 20230367951
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- Bing-Siang Chao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR DECISION MAKING IN A SEMICONDUCTOR MANUFACTURING PROCESS
- Publication number 20230333482
- Publication date Oct 19, 2023
- ASML NETHERLANDS B.V.
- Arnaud HUBAUX
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SELECTION OF MEASUREMENT LOCATIONS FOR PATTERNING PROCESSES
- Publication number 20230333481
- Publication date Oct 19, 2023
- ASML NETHERLANDS B.V.
- Hans VAN DER LAAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ILLUMINATION APPARATUS AND ASSOCIATED METROLOGY AND LITHOGRAPHIC AP...
- Publication number 20230229094
- Publication date Jul 20, 2023
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G02 - OPTICS
Information Patent Application
IMAGE-BASED SEMICONDUCTOR DEVICE PATTERNING METHOD USING DEEP NEURA...
- Publication number 20230197460
- Publication date Jun 22, 2023
- Samsung Electronics Co., Ltd.
- Jaewon YANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR CONTROLLING A MANUFACTURING PROCESS AND ASSOCIATED APPAR...
- Publication number 20230161265
- Publication date May 25, 2023
- ASML NETHERLANDS B.V.
- Pioter NIKOLSKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR LITHOGRAPHY IN SEMICONDUCTOR FABRICATION
- Publication number 20230152713
- Publication date May 18, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Kuan WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR PROCESS-WINDOW CHARACTERIZATION
- Publication number 20230133487
- Publication date May 4, 2023
- ASML NETHERLANDS B.V.
- Te-Sheng WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL PHASE MEASUREMENT SYSTEM AND METHOD
- Publication number 20230130231
- Publication date Apr 27, 2023
- NOVA LTD
- Gilad BARAK
- G01 - MEASURING TESTING
Information Patent Application
LITHOGRAPHY MEASUREMENT MACHINE AND OPERATING METHOD THEREOF
- Publication number 20230114246
- Publication date Apr 13, 2023
- HON HAI PRECISION INDUSTRY CO., LTD.
- Kuo-Kuei Fu
- G06 - COMPUTING CALCULATING COUNTING

Wafer pattern monitoring

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Metrology method and apparatus for of determining a complex-valued...

Illumination and detection apparatus for a metrology apparatus

Method of determining characteristic of patterning process based on...

Detection apparatus for simultaneous acquisition of multiple divers...

Quantum-limited extreme ultraviolet coherent diffraction imaging

Method of manufacturing semiconductor devices

Method to predict yield of a device manufacturing process

Method of manufacturing devices

Method of manufacturing photo masks

Method for lithography in semiconductor fabrication

Detection using semiconductor detector

Metrology method and apparatus, computer program and lithographic s...

Lithographic apparatus, metrology systems, phased array illuminatio...

Light sources and methods of controlling; devices and methods for u...

Lithographic apparatus, metrology systems, phased array illuminatio...

Process monitoring of deep structures with X-ray scatterometry

Optical phase measurement system and method

Methods and apparatus for obtaining diagnostic information relating...

Raman spectroscopy based measurement system

Verification metrology targets and their design

Methods and systems for inspecting integrated circuits based on X-rays

Wavefront sensor and associated metrology apparatus

Measurement of overlay error using device inspection system

Metrology and process control for semiconductor manufacturing

Method for determining corrections for lithographic apparatus

Optical mode optimization for wafer inspection

Prediction of out of specification based on a spatial characteristi...

Frequency broadening apparatus and method

Method and system to monitor a process apparatus

Method to characterize post-processing data in terms of individual...

Patents Applicationslast 30 patents

METHOD OF DETERMINING CHARACTERISTIC OF PATTERNING PROCESS BASED ON...

DETECTION APPARATUS FOR SIMULTANEOUS ACQUISITION OF MULTIPLE DIVERS...

METROLOGY METHOD AND APPARATUS, COMPUTER PROGRAM AND LITHOGRAPHIC S...

DISSECTION METHOD FOR OPTICAL PROXIMITY CORRECTION AND PATTERNING M...

METHOD OF MANUFACTURING PHOTO MASKS

SUBSTRATE EDGE PATTERNING TECHNIQUES

RAMAN SPECTROSCOPY BASED MEASUREMENT SYSTEM

DETECTION USING SEMICONDUCTOR DETECTOR

ANALYSIS METHOD OF PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD OF...

COMBINED DISPENSING AND STAMPING APPARATUS AND METHOD FOR APPLYING...

METROLOGY MEASUREMENT METHOD AND APPARATUS

LIGHT SOURCES AND METHODS OF CONTROLLING; DEVICES AND METHODS FOR U...

ASYMMETRY EXTENDED GRID MODEL FOR WAFER ALIGNMENT

METHOD OF MANUFACTURING EXTREME ULTRAVIOLET (EUV) MASK FOR FORMING...

METROLOGY AND PROCESS CONTROL FOR SEMICONDUCTOR MANUFACTURING

MODULAR AUTOENCODER MODEL FOR MANUFACTURING PROCESS PARAMETER ESTIM...

METHODS AND APPARATUS FOR OBTAINING DIAGNOSTIC INFORMATION RELATING...

METHOD AND SYSTEM TO MONITOR A PROCESS APPARATUS

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES

METHOD FOR PRODUCING AN ELECTRONIC COMPONENT ASSEMBLY ON THE FRONT...

Optical Mode Optimization for Wafer Inspection

METHOD FOR DECISION MAKING IN A SEMICONDUCTOR MANUFACTURING PROCESS

SELECTION OF MEASUREMENT LOCATIONS FOR PATTERNING PROCESSES

ILLUMINATION APPARATUS AND ASSOCIATED METROLOGY AND LITHOGRAPHIC AP...

IMAGE-BASED SEMICONDUCTOR DEVICE PATTERNING METHOD USING DEEP NEURA...

METHOD FOR CONTROLLING A MANUFACTURING PROCESS AND ASSOCIATED APPAR...

METHOD FOR LITHOGRAPHY IN SEMICONDUCTOR FABRICATION

APPARATUS AND METHOD FOR PROCESS-WINDOW CHARACTERIZATION

OPTICAL PHASE MEASUREMENT SYSTEM AND METHOD

LITHOGRAPHY MEASUREMENT MACHINE AND OPERATING METHOD THEREOF