Wafer resist monitoring

Industry

CPC
G03F7/70608

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70608Wafer resist monitoring

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Semiconductor manufacturing apparatus and method thereof
- Patent number 12,265,327
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ching-Hai Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Matching process controllers for improved matching of process
- Patent number 12,265,380
- Issue date Apr 1, 2025
- Applied Materials, Inc.
- James Robert Moyne
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selection of measurement locations for patterning processes
- Patent number 12,228,862
- Issue date Feb 18, 2025
- ASML Netherlands B.V.
- Hans Van Der Laan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
EUV microscope
- Patent number 12,203,874
- Issue date Jan 21, 2025
- EUV TECH, INC.
- Chami N Perera
- G01 - MEASURING TESTING
Information Patent Grant
EUV light generation apparatus, electronic device manufacturing met...
- Patent number 12,185,449
- Issue date Dec 31, 2024
- Gigaphoton Inc.
- Fumio Iwamoto
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for measuring critical dimension
- Patent number 12,130,559
- Issue date Oct 29, 2024
- NANYA TECHNOLOGY CORPORATION
- Chia-Chung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for measuring critical dimension
- Patent number 12,117,733
- Issue date Oct 15, 2024
- NANYA TECHNOLOGY CORPORATION
- Chia-Chung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask inspection method and apparatus thereof
- Patent number 12,072,621
- Issue date Aug 27, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Chih-Wei Wen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing photo masks
- Patent number 12,038,693
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement tool and method for lithography masks
- Patent number 12,032,298
- Issue date Jul 9, 2024
- Intel Corporation
- Yoshihiro Tezuka
- G01 - MEASURING TESTING
Information Patent Grant
High throughput and high position accurate method for particle insp...
- Patent number 12,013,646
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Jui Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, metrology systems, phased array illuminatio...
- Patent number 11,994,808
- Issue date May 28, 2024
- ASML Holding N.V.
- Mohamed Swillam
- G01 - MEASURING TESTING
Information Patent Grant
Methods for determining focus spot window and judging whether wafer...
- Patent number 11,988,612
- Issue date May 21, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Meng-Hsuan Tsai
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus, metrology systems, phased array illuminatio...
- Patent number 11,966,169
- Issue date Apr 23, 2024
- ASML Holding N.V.
- Mohamed Swillam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Advanced load port for photolithography mask inspection tool
- Patent number 11,921,431
- Issue date Mar 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tung-Jung Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical metrology tool equipped with modulated illumination sources
- Patent number 11,913,874
- Issue date Feb 27, 2024
- KLA Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Grant
Method for predicting resist deformation
- Patent number 11,914,942
- Issue date Feb 27, 2024
- ASML Netherlands B.V.
- Chrysostomos Batistakis
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for detecting an object structure and apparatus for carrying...
- Patent number 11,892,769
- Issue date Feb 6, 2024
- Carl Zeiss SMT GmbH
- Beat Marco Mout
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology apparatus and a method of determining a characteristic of...
- Patent number 11,822,254
- Issue date Nov 21, 2023
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composite overlay metrology target
- Patent number 11,809,090
- Issue date Nov 7, 2023
- KLA Corporation
- Anna Golotsvan
- G01 - MEASURING TESTING
Information Patent Grant
Method for predicting resist deformation
- Patent number 11,709,988
- Issue date Jul 25, 2023
- ASML Netherlands B.V.
- Chrysostomos Batistakis
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of manufacturing photo masks
- Patent number 11,687,006
- Issue date Jun 27, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selection of measurement locations for patterning processes
- Patent number 11,681,229
- Issue date Jun 20, 2023
- ASML Netherlands B.V.
- Hans Van Der Laan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Positioning method and apparatus for particles on reticle, storage...
- Patent number 11,675,275
- Issue date Jun 13, 2023
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Shuang Xia
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection tool and inspection method
- Patent number 11,668,661
- Issue date Jun 6, 2023
- ASML Netherlands B.V.
- Thomas Jarik Huisman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithography method using multiscale simulation, and method of manuf...
- Patent number 11,662,665
- Issue date May 30, 2023
- Samsung Electronics Co., Ltd.
- Byunghoon Lee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for EUV mask inspection
- Patent number 11,635,700
- Issue date Apr 25, 2023
- Erel Milshtein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask inspection method and apparatus thereof
- Patent number 11,614,684
- Issue date Mar 28, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Chih-Wei Wen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High throughput and high position accurate method for particle insp...
- Patent number 11,614,691
- Issue date Mar 28, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Jui Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Advanced load port for photolithography mask inspection tool
- Patent number 11,592,754
- Issue date Feb 28, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tung-Jung Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
EUV Microscope
- Publication number 20250116615
- Publication date Apr 10, 2025
- EUV TECH, INC.
- CHAMI N. PERERA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPATIALLY-VARYING SPECTRAL METROLOGY FOR LOCAL VARIATION DETECTION
- Publication number 20250053098
- Publication date Feb 13, 2025
- KLA Corporation
- Zhengquan Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
QUASI-DYNAMIC IN SITU ELLIPSOMETRY METHOD AND SYSTEM FOR MEASURING...
- Publication number 20240402614
- Publication date Dec 5, 2024
- HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY
- Hao Jiang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASURING METHOD, LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD,...
- Publication number 20240385534
- Publication date Nov 21, 2024
- Canon Kabushiki Kaisha
- SHINGO HANYUDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTEGRATED COUPON DESIGN FOR SURFACE COATING QUALITY
- Publication number 20240377759
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Wei HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK INSPECTION METHOD AND APPARATUS THEREOF
- Publication number 20240361684
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- CHIH-WEI WEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING PHOTO MASKS
- Publication number 20240337951
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Cheng CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PERFORMANCE MANAGEMENT OF SEMICONDUCTOR SUBSTRATE TOOLS
- Publication number 20240295829
- Publication date Sep 5, 2024
- ONTO INNOVATION INC.
- Xin Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH THROUGHPUT AND HIGH POSITION ACCURATE METHOD FOR PARTICLE INSP...
- Publication number 20240295826
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Jui HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR DETERMINING OPTICAL PROPERTIES OF DEPOSITI...
- Publication number 20240219844
- Publication date Jul 4, 2024
- Carl Zeiss SMT GMBH
- Nicole Auth
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LASER BEAM METROLOGY SYSTEM, LASER BEAM SYSTEM, EUV RADIATION SOURC...
- Publication number 20240210840
- Publication date Jun 27, 2024
- ASML NETHERLANDS B.V.
- Willem Paul BEEKER
- G01 - MEASURING TESTING
Information Patent Application
ADVANCED LOAD PORT FOR PHOTOLITHOGRAPHY MASK INSPECTION TOOL
- Publication number 20240168387
- Publication date May 23, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tung-Jung CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
State Transition Temperature of Resist Structures
- Publication number 20240125721
- Publication date Apr 18, 2024
- IMEC vzw
- Joren Severi
- G01 - MEASURING TESTING
Information Patent Application
Metrology Apparatus and a Method of Determining a Characteristic of...
- Publication number 20230393490
- Publication date Dec 7, 2023
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE WEIGHT MEASUREMENT APPARATUS, A SUBSTRATE PROCESSING APPA...
- Publication number 20230384681
- Publication date Nov 30, 2023
- Samsung Electronics Co., Ltd.
- Sangjine PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELECTION OF MEASUREMENT LOCATIONS FOR PATTERNING PROCESSES
- Publication number 20230333481
- Publication date Oct 19, 2023
- ASML NETHERLANDS B.V.
- Hans VAN DER LAAN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INSPECTION METHOD, METHOD FOR PRODUCING COMPOSITION, AND METHOD FOR...
- Publication number 20230266675
- Publication date Aug 24, 2023
- FUJIFILM CORPORATION
- Shinichi SUGIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH THROUGHPUT AND HIGH POSITION ACCURATE METHOD FOR PARTICLE INSP...
- Publication number 20230251581
- Publication date Aug 10, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Jui HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MEASURING CRITICAL DIMENSION
- Publication number 20230236513
- Publication date Jul 27, 2023
- NANYA TECHNOLOGY CORPORATION
- CHIA-CHUNG LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MEASURING CRITICAL DIMENSION
- Publication number 20230236514
- Publication date Jul 27, 2023
- NANYA TECHNOLOGY CORPORATION
- CHIA-CHUNG LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK INSPECTION METHOD AND APPARATUS THEREOF
- Publication number 20230213853
- Publication date Jul 6, 2023
- Taiwan Semiconductor Manufacturing company Ltd.
- CHIH-WEI WEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ADVANCED LOAD PORT FOR PHOTOLITHOGRAPHY MASK INSPECTION TOOL
- Publication number 20230176488
- Publication date Jun 8, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tung-Jung CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CORRECTING CRITICAL DIMENSION MEASUREMENTS OF LITHOGRAPH...
- Publication number 20230152714
- Publication date May 18, 2023
- United Microelectronics Corp.
- Hsin-Yu HSIEH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV LIGHT GENERATION APPARATUS, ELECTRONIC DEVICE MANUFACTURING MET...
- Publication number 20230142875
- Publication date May 11, 2023
- Gigaphoton Inc.
- Fumio IWAMOTO
- G01 - MEASURING TESTING
Information Patent Application
EUV MICROSCOPE
- Publication number 20230121350
- Publication date Apr 20, 2023
- EUV TECH, INC.
- CHAMI N. PERERA
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS FOR PARTICLE MONITORING IN THE CHEMICAL LIQUID AND THE ME...
- Publication number 20230096330
- Publication date Mar 30, 2023
- SEMICON TECH GLOBAL LIMITED
- Soon Suk HONG
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR PARTICLE BEAM-INDUCED PROCESSING OF A DEFECT OF A MICROL...
- Publication number 20230081844
- Publication date Mar 16, 2023
- Carl Zeiss SMT GMBH
- Thorsten Hofmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH THROUGHPUT AND HIGH POSITION ACCURATE METHOD FOR PARTICLE INSP...
- Publication number 20230049308
- Publication date Feb 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Jui HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EVALUATION METHOD, SUBSTRATE PROCESSING APPARATUS, MANUFACTURING ME...
- Publication number 20220364972
- Publication date Nov 17, 2022
- Canon Kabushiki Kaisha
- Masami Yonekawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY METHOD USING MULTISCALE SIMULATION, AND METHOD OF MANUF...
- Publication number 20220350256
- Publication date Nov 3, 2022
- Samsung Electronics Co., Ltd.
- Byunghoon LEE
- G06 - COMPUTING CALCULATING COUNTING

Wafer resist monitoring

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor manufacturing apparatus and method thereof

Matching process controllers for improved matching of process

Selection of measurement locations for patterning processes

EUV microscope

EUV light generation apparatus, electronic device manufacturing met...

Method for measuring critical dimension

Method for measuring critical dimension

Photomask inspection method and apparatus thereof

Method of manufacturing photo masks

Measurement tool and method for lithography masks

High throughput and high position accurate method for particle insp...

Lithographic apparatus, metrology systems, phased array illuminatio...

Methods for determining focus spot window and judging whether wafer...

Lithographic apparatus, metrology systems, phased array illuminatio...

Advanced load port for photolithography mask inspection tool

Optical metrology tool equipped with modulated illumination sources

Method for predicting resist deformation

Method for detecting an object structure and apparatus for carrying...

Metrology apparatus and a method of determining a characteristic of...

Composite overlay metrology target

Method for predicting resist deformation

Method of manufacturing photo masks

Selection of measurement locations for patterning processes

Positioning method and apparatus for particles on reticle, storage...

Inspection tool and inspection method

Lithography method using multiscale simulation, and method of manuf...

Method and apparatus for EUV mask inspection

Photomask inspection method and apparatus thereof

High throughput and high position accurate method for particle insp...

Advanced load port for photolithography mask inspection tool

Patents Applicationslast 30 patents

EUV Microscope

SPATIALLY-VARYING SPECTRAL METROLOGY FOR LOCAL VARIATION DETECTION

QUASI-DYNAMIC IN SITU ELLIPSOMETRY METHOD AND SYSTEM FOR MEASURING...

MEASURING METHOD, LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD,...

INTEGRATED COUPON DESIGN FOR SURFACE COATING QUALITY

PHOTOMASK INSPECTION METHOD AND APPARATUS THEREOF

METHOD OF MANUFACTURING PHOTO MASKS

PERFORMANCE MANAGEMENT OF SEMICONDUCTOR SUBSTRATE TOOLS

HIGH THROUGHPUT AND HIGH POSITION ACCURATE METHOD FOR PARTICLE INSP...

METHOD AND APPARATUS FOR DETERMINING OPTICAL PROPERTIES OF DEPOSITI...

LASER BEAM METROLOGY SYSTEM, LASER BEAM SYSTEM, EUV RADIATION SOURC...

ADVANCED LOAD PORT FOR PHOTOLITHOGRAPHY MASK INSPECTION TOOL

State Transition Temperature of Resist Structures

Metrology Apparatus and a Method of Determining a Characteristic of...

SUBSTRATE WEIGHT MEASUREMENT APPARATUS, A SUBSTRATE PROCESSING APPA...

SELECTION OF MEASUREMENT LOCATIONS FOR PATTERNING PROCESSES

INSPECTION METHOD, METHOD FOR PRODUCING COMPOSITION, AND METHOD FOR...

HIGH THROUGHPUT AND HIGH POSITION ACCURATE METHOD FOR PARTICLE INSP...

METHOD FOR MEASURING CRITICAL DIMENSION

METHOD FOR MEASURING CRITICAL DIMENSION

PHOTOMASK INSPECTION METHOD AND APPARATUS THEREOF

ADVANCED LOAD PORT FOR PHOTOLITHOGRAPHY MASK INSPECTION TOOL

METHOD FOR CORRECTING CRITICAL DIMENSION MEASUREMENTS OF LITHOGRAPH...

EUV LIGHT GENERATION APPARATUS, ELECTRONIC DEVICE MANUFACTURING MET...

EUV MICROSCOPE

APPARATUS FOR PARTICLE MONITORING IN THE CHEMICAL LIQUID AND THE ME...

METHOD FOR PARTICLE BEAM-INDUCED PROCESSING OF A DEFECT OF A MICROL...

HIGH THROUGHPUT AND HIGH POSITION ACCURATE METHOD FOR PARTICLE INSP...

EVALUATION METHOD, SUBSTRATE PROCESSING APPARATUS, MANUFACTURING ME...

LITHOGRAPHY METHOD USING MULTISCALE SIMULATION, AND METHOD OF MANUF...