Wavelength control

Industry

CPC
G03F7/70575

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70575Wavelength control

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Exposure system and method for manufacturing electronic devices
- Patent number 12,197,132
- Issue date Jan 14, 2025
- Gigaphoton Inc.
- Koichi Fujii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation system for controlling bursts of pulses of radiation
- Patent number 12,130,558
- Issue date Oct 29, 2024
- Cymer, LLC
- Yingbo Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spectral feature control apparatus
- Patent number 12,124,053
- Issue date Oct 22, 2024
- Cymer, LLC
- Eric Anders Mason
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming multiple aerial images in a single lithography exposure pass
- Patent number 12,001,144
- Issue date Jun 4, 2024
- Cymer, LLC
- Willard Earl Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography apparatus, patterning system, and method of patterning...
- Patent number 11,994,804
- Issue date May 28, 2024
- Applied Materials, Inc.
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, metrology systems, phased array illuminatio...
- Patent number 11,994,808
- Issue date May 28, 2024
- ASML Holding N.V.
- Mohamed Swillam
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus, metrology systems, phased array illuminatio...
- Patent number 11,966,169
- Issue date Apr 23, 2024
- ASML Holding N.V.
- Mohamed Swillam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical diffraction component
- Patent number 11,947,265
- Issue date Apr 2, 2024
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Energy correction module for an optical source apparatus
- Patent number 11,947,268
- Issue date Apr 2, 2024
- Cymer, LLC
- Yingbo Zhao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Controlling light source wavelengths for selectable phase shifts be...
- Patent number 11,899,198
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Thomas L. Laidig
- G02 - OPTICS
Information Patent Grant
Photolithography system including selective light array
- Patent number 11,880,139
- Issue date Jan 23, 2024
- Honeywell Federal Manufacturing & Technologies, LLC
- Barbara Diane Young
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection device for masks for semiconductor lithography and method
- Patent number 11,867,642
- Issue date Jan 9, 2024
- Carl Zeiss SMT GmbH
- Holger Seitz
- G01 - MEASURING TESTING
Information Patent Grant
Determination of measurement error in an etalon
- Patent number 11,860,036
- Issue date Jan 2, 2024
- Cymer, LLC
- Russell Allen Burdt
- G01 - MEASURING TESTING
Information Patent Grant
Method of compensating wavelength error induced by repetition rate...
- Patent number 11,803,126
- Issue date Oct 31, 2023
- Cymer, LLC
- Kuo-Tai Teng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation measurement system
- Patent number 11,774,867
- Issue date Oct 3, 2023
- ASML Netherlands B.V.
- Herman Philip Godfried
- G01 - MEASURING TESTING
Information Patent Grant
Spectral feature selection and pulse timing control of a pulsed lig...
- Patent number 11,768,438
- Issue date Sep 26, 2023
- Cymer, LLC
- Kevin Michael O'Brien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for a narrow band high transmittance interferen...
- Patent number 11,768,439
- Issue date Sep 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wolf Hung
- G02 - OPTICS
Information Patent Grant
Lithography system bandwidth control
- Patent number 11,769,982
- Issue date Sep 26, 2023
- Cymer, LLC
- Tanuj Aggarwal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Membrane for EUV lithography
- Patent number 11,762,281
- Issue date Sep 19, 2023
- ASML Netherlands B.V.
- Maxim Aleksandrovich Nasalevich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Laser system and method for manufacturing electronic device
- Patent number 11,764,541
- Issue date Sep 19, 2023
- Gigaphoton Inc.
- Taisuke Miura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for imaging using narrowed bandwidth
- Patent number 11,747,739
- Issue date Sep 5, 2023
- ASML Netherlands
- Willard Earl Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Frequency broadening apparatus and method
- Patent number 11,733,617
- Issue date Aug 22, 2023
- ASML Netherlands B.V.
- Patrick Sebastian Uebel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Spectral feature control apparatus
- Patent number 11,561,407
- Issue date Jan 24, 2023
- Cymer, LLC
- Eric Anders Mason
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming multiple aerial images in a single lithography exposure pass
- Patent number 11,526,082
- Issue date Dec 13, 2022
- Cymer, LLC
- Willard Earl Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Spectral feature selection and pulse timing control of a pulsed lig...
- Patent number 11,526,083
- Issue date Dec 13, 2022
- Cymer, LLC
- Kevin Michael O'Brien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask and method for manufacturing the same, lithography method, dis...
- Patent number 11,474,434
- Issue date Oct 18, 2022
- Hefei Xinsheng Optoelectronics Technology Co., Ltd.
- Dengfeng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wavelength control method of laser apparatus and electronic device...
- Patent number 11,467,502
- Issue date Oct 11, 2022
- Gigaphoton Inc.
- Takuma Yamanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to determine a patterning process parameter
- Patent number 11,300,883
- Issue date Apr 12, 2022
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Frequency broadening apparatus and method
- Patent number 11,262,665
- Issue date Mar 1, 2022
- ASML Netherlands B.V.
- Patrick Sebastian Uebel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection system and mirror and radiation source for a lithographi...
- Patent number 11,150,560
- Issue date Oct 19, 2021
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
ASSEMBLY FOR A LITHOGRAPHIC APPARATUS
- Publication number 20250102902
- Publication date Mar 27, 2025
- ASML NETHERLANDS B.V.
- Tim Willem Johan VAN DE GOOR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOHARDENABLE COMPOSITIONS AND METHODS OF FORMING AN OBJECT
- Publication number 20250068071
- Publication date Feb 27, 2025
- QUADRATIC 3D, INC.
- SAMUEL N. SANDERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE SUBSTRATE DEVELOPING METHOD, PHOTOMASK CREATING METH...
- Publication number 20250060683
- Publication date Feb 20, 2025
- Gigaphoton Inc.
- Koichi FUJII
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPECTRAL FEATURE CONTROL APPARATUS
- Publication number 20250013066
- Publication date Jan 9, 2025
- CYMER, LLC
- Eric Anders Mason
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LASER APPARATUS AND METHOD FOR MANUFACTURING ELECTRONIC DEVICES
- Publication number 20240429672
- Publication date Dec 26, 2024
- Gigaphoton Inc.
- Seiji NOGIWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PREDICTION APPARATUS AND METHOD FOR OPTICAL SOURCE
- Publication number 20240319612
- Publication date Sep 26, 2024
- CYMER, LLC
- Russell Allen BURDT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTRONIC DEVICE MANUFACTURING METHOD, LASER DEVICE, AND WAVELENGT...
- Publication number 20240322521
- Publication date Sep 26, 2024
- Gigaphoton Inc.
- Koichi FUJII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING MULTIPLE AERIAL IMAGES IN A SINGLE LITHOGRAPHY EXPOSURE PASS
- Publication number 20240310736
- Publication date Sep 19, 2024
- CYMER, LLC
- Willard Earl Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LASER SYSTEM, PULSE LASER LIGHT GENERATING METHOD, AND ELECTRONIC D...
- Publication number 20240291220
- Publication date Aug 29, 2024
- Gigaphoton Inc.
- Seiji NOGIWA
- G02 - OPTICS
Information Patent Application
CONTROLLING LIGHT SOURCE WAVELENGTHS FOR SELECTABLE PHASE SHIFTS BE...
- Publication number 20240184097
- Publication date Jun 6, 2024
- Applied Materials, Inc.
- Thomas L. Laidig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR PREDICTING PROCESS INFORMATION WITH A PARAMET...
- Publication number 20240152060
- Publication date May 9, 2024
- ASML NETHERLANDS B.V.
- Patrick Philipp HELFENSTEIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BYPASS APPARATUS, LASER APPARATUS, AND ELECTRONIC DEVICE MANUFACTUR...
- Publication number 20240128702
- Publication date Apr 18, 2024
- Gigaphoton Inc.
- Shinichi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAVELENGTH CONTROL METHOD, LASER APPARATUS, AND METHOD FOR MANUFACT...
- Publication number 20240111219
- Publication date Apr 4, 2024
- Gigaphoton Inc.
- Shigeto KISHIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTIMIZATION OF LITHOGRAPHIC PROCESS BASED ON BANDWIDTH AND SPECKLE
- Publication number 20240045341
- Publication date Feb 8, 2024
- ASML NETHERLANDS B.V.
- Willard Earl CONLEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF COMPENSATING WAVELENGTH ERROR INDUCED BY REPETITION RATE...
- Publication number 20240036475
- Publication date Feb 1, 2024
- CYMER, LLC
- Kuo-Tai Teng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHIC METHOD
- Publication number 20240004307
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Pioter NIKOLSKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEMBRANE FOR EUV LITHOGRAPHY
- Publication number 20240004283
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Maxim Aleksandrovich Nasalevich
- G02 - OPTICS
Information Patent Application
CONTROLLING LIGHT SOURCE WAVELENGTHS FOR SELECTABLE PHASE SHIFTS BE...
- Publication number 20230408807
- Publication date Dec 21, 2023
- Applied Materials, Inc.
- Thomas L. Laidig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PREDICTIVE CALIBRATION SCHEDULING APPARATUS AND METHOD
- Publication number 20230266168
- Publication date Aug 24, 2023
- CYMER, LLC
- Mohammad Taghi Mohebbi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ILLUMINATION APPARATUS AND ASSOCIATED METROLOGY AND LITHOGRAPHIC AP...
- Publication number 20230229094
- Publication date Jul 20, 2023
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G02 - OPTICS
Information Patent Application
SYSTEMS AND METHODS FOR CONTROLLING A CENTER WAVELENGTH
- Publication number 20230223734
- Publication date Jul 13, 2023
- CYMER, LLC
- Kuo-Tai Teng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL COMPONENT
- Publication number 20230221648
- Publication date Jul 13, 2023
- Carl Zeiss SMT GMBH
- Valentin Jonatan Bolsinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FORMING MULTIPLE AERIAL IMAGES IN A SINGLE LITHOGRAPHY EXPOSURE PASS
- Publication number 20230152707
- Publication date May 18, 2023
- CYMER, LLC
- Willard Earl Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINATION OF MEASUREMENT ERROR IN AN ETALON
- Publication number 20230142333
- Publication date May 11, 2023
- CYMER, LLC
- Russell Allen Burdt
- G01 - MEASURING TESTING
Information Patent Application
SPECTRAL FEATURE CONTROL APPARATUS
- Publication number 20230124587
- Publication date Apr 20, 2023
- CYMER, LLC
- Eric Anders Mason
- G02 - OPTICS
Information Patent Application
EXPOSURE SYSTEM, EXPOSURE METHOD, AND ELECTRONIC DEVICE MANUFACTURI...
- Publication number 20230098685
- Publication date Mar 30, 2023
- Gigaphoton Inc.
- Koichi FUJII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, AND MANUFACTURING METHOD FOR S...
- Publication number 20230101647
- Publication date Mar 30, 2023
- Canon Kabushiki Kaisha
- Rika Hoshino
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY SYSTEM INCLUDING SELECTIVE LIGHT ARRAY
- Publication number 20230092166
- Publication date Mar 23, 2023
- HONEYWELL FEDERAL MANUFACTURING & TECHNOLOGIES, LLC
- Barbara Diane Young
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPECTRAL FEATURE SELECTION AND PULSE TIMING CONTROL OF A PULSED LIG...
- Publication number 20230040812
- Publication date Feb 9, 2023
- CYMER, LLC
- Kevin Michael O'Brien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENERGY CORRECTION MODULE FOR AN OPTICAL SOURCE APPARATUS
- Publication number 20230019832
- Publication date Jan 19, 2023
- CYMER, LLC
- Yingbo Zhao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Wavelength control

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Exposure system and method for manufacturing electronic devices

Radiation system for controlling bursts of pulses of radiation

Spectral feature control apparatus

Forming multiple aerial images in a single lithography exposure pass

Lithography apparatus, patterning system, and method of patterning...

Lithographic apparatus, metrology systems, phased array illuminatio...

Lithographic apparatus, metrology systems, phased array illuminatio...

Optical diffraction component

Energy correction module for an optical source apparatus

Controlling light source wavelengths for selectable phase shifts be...

Photolithography system including selective light array

Inspection device for masks for semiconductor lithography and method

Determination of measurement error in an etalon

Method of compensating wavelength error induced by repetition rate...

Radiation measurement system

Spectral feature selection and pulse timing control of a pulsed lig...

Systems and methods for a narrow band high transmittance interferen...

Lithography system bandwidth control

Membrane for EUV lithography

Laser system and method for manufacturing electronic device

Method and apparatus for imaging using narrowed bandwidth

Frequency broadening apparatus and method

Spectral feature control apparatus

Forming multiple aerial images in a single lithography exposure pass

Spectral feature selection and pulse timing control of a pulsed lig...

Mask and method for manufacturing the same, lithography method, dis...

Wavelength control method of laser apparatus and electronic device...

Method to determine a patterning process parameter

Frequency broadening apparatus and method

Projection system and mirror and radiation source for a lithographi...

Patents Applicationslast 30 patents

ASSEMBLY FOR A LITHOGRAPHIC APPARATUS

PHOTOHARDENABLE COMPOSITIONS AND METHODS OF FORMING AN OBJECT

PHOTOSENSITIVE SUBSTRATE DEVELOPING METHOD, PHOTOMASK CREATING METH...

SPECTRAL FEATURE CONTROL APPARATUS

LASER APPARATUS AND METHOD FOR MANUFACTURING ELECTRONIC DEVICES

PREDICTION APPARATUS AND METHOD FOR OPTICAL SOURCE

ELECTRONIC DEVICE MANUFACTURING METHOD, LASER DEVICE, AND WAVELENGT...

FORMING MULTIPLE AERIAL IMAGES IN A SINGLE LITHOGRAPHY EXPOSURE PASS

LASER SYSTEM, PULSE LASER LIGHT GENERATING METHOD, AND ELECTRONIC D...

CONTROLLING LIGHT SOURCE WAVELENGTHS FOR SELECTABLE PHASE SHIFTS BE...

METHOD AND SYSTEM FOR PREDICTING PROCESS INFORMATION WITH A PARAMET...

BYPASS APPARATUS, LASER APPARATUS, AND ELECTRONIC DEVICE MANUFACTUR...

WAVELENGTH CONTROL METHOD, LASER APPARATUS, AND METHOD FOR MANUFACT...

OPTIMIZATION OF LITHOGRAPHIC PROCESS BASED ON BANDWIDTH AND SPECKLE

METHOD OF COMPENSATING WAVELENGTH ERROR INDUCED BY REPETITION RATE...

LITHOGRAPHIC METHOD

MEMBRANE FOR EUV LITHOGRAPHY

CONTROLLING LIGHT SOURCE WAVELENGTHS FOR SELECTABLE PHASE SHIFTS BE...

PREDICTIVE CALIBRATION SCHEDULING APPARATUS AND METHOD

ILLUMINATION APPARATUS AND ASSOCIATED METROLOGY AND LITHOGRAPHIC AP...

SYSTEMS AND METHODS FOR CONTROLLING A CENTER WAVELENGTH

OPTICAL COMPONENT

FORMING MULTIPLE AERIAL IMAGES IN A SINGLE LITHOGRAPHY EXPOSURE PASS

DETERMINATION OF MEASUREMENT ERROR IN AN ETALON

SPECTRAL FEATURE CONTROL APPARATUS

EXPOSURE SYSTEM, EXPOSURE METHOD, AND ELECTRONIC DEVICE MANUFACTURI...

EXPOSURE APPARATUS, EXPOSURE METHOD, AND MANUFACTURING METHOD FOR S...

PHOTOLITHOGRAPHY SYSTEM INCLUDING SELECTIVE LIGHT ARRAY

SPECTRAL FEATURE SELECTION AND PULSE TIMING CONTROL OF A PULSED LIG...

ENERGY CORRECTION MODULE FOR AN OPTICAL SOURCE APPARATUS