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PHYSICS
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Photography
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PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES
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Photomechanical
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G03F7/70575
Wavelength control
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Patents Grants
last 30 patents
Information
Patent Grant
Lithographic apparatus, metrology systems, phased array illuminatio...
Patent number
11,966,169
Issue date
Apr 23, 2024
ASML Holding N.V.
Mohamed Swillam
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Optical diffraction component
Patent number
11,947,265
Issue date
Apr 2, 2024
Carl Zeiss SMT GmbH
Heiko Feldmann
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Energy correction module for an optical source apparatus
Patent number
11,947,268
Issue date
Apr 2, 2024
Cymer, LLC
Yingbo Zhao
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Controlling light source wavelengths for selectable phase shifts be...
Patent number
11,899,198
Issue date
Feb 13, 2024
Applied Materials, Inc.
Thomas L. Laidig
G02 - OPTICS
Information
Patent Grant
Photolithography system including selective light array
Patent number
11,880,139
Issue date
Jan 23, 2024
Honeywell Federal Manufacturing & Technologies, LLC
Barbara Diane Young
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Inspection device for masks for semiconductor lithography and method
Patent number
11,867,642
Issue date
Jan 9, 2024
Carl Zeiss SMT GmbH
Holger Seitz
G01 - MEASURING TESTING
Information
Patent Grant
Determination of measurement error in an etalon
Patent number
11,860,036
Issue date
Jan 2, 2024
Cymer, LLC
Russell Allen Burdt
G01 - MEASURING TESTING
Information
Patent Grant
Method of compensating wavelength error induced by repetition rate...
Patent number
11,803,126
Issue date
Oct 31, 2023
Cymer, LLC
Kuo-Tai Teng
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Radiation measurement system
Patent number
11,774,867
Issue date
Oct 3, 2023
ASML Netherlands B.V.
Herman Philip Godfried
G01 - MEASURING TESTING
Information
Patent Grant
Spectral feature selection and pulse timing control of a pulsed lig...
Patent number
11,768,438
Issue date
Sep 26, 2023
Cymer, LLC
Kevin Michael O'Brien
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Systems and methods for a narrow band high transmittance interferen...
Patent number
11,768,439
Issue date
Sep 26, 2023
Taiwan Semiconductor Manufacturing Company, Ltd
Wolf Hung
G02 - OPTICS
Information
Patent Grant
Lithography system bandwidth control
Patent number
11,769,982
Issue date
Sep 26, 2023
Cymer, LLC
Tanuj Aggarwal
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Membrane for EUV lithography
Patent number
11,762,281
Issue date
Sep 19, 2023
ASML Netherlands B.V.
Maxim Aleksandrovich Nasalevich
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Laser system and method for manufacturing electronic device
Patent number
11,764,541
Issue date
Sep 19, 2023
Gigaphoton Inc.
Taisuke Miura
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for imaging using narrowed bandwidth
Patent number
11,747,739
Issue date
Sep 5, 2023
ASML Netherlands
Willard Earl Conley
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Frequency broadening apparatus and method
Patent number
11,733,617
Issue date
Aug 22, 2023
ASML Netherlands B.V.
Patrick Sebastian Uebel
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Spectral feature control apparatus
Patent number
11,561,407
Issue date
Jan 24, 2023
Cymer, LLC
Eric Anders Mason
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Forming multiple aerial images in a single lithography exposure pass
Patent number
11,526,082
Issue date
Dec 13, 2022
Cymer, LLC
Willard Earl Conley
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Spectral feature selection and pulse timing control of a pulsed lig...
Patent number
11,526,083
Issue date
Dec 13, 2022
Cymer, LLC
Kevin Michael O'Brien
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Mask and method for manufacturing the same, lithography method, dis...
Patent number
11,474,434
Issue date
Oct 18, 2022
Hefei Xinsheng Optoelectronics Technology Co., Ltd.
Dengfeng Wang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Wavelength control method of laser apparatus and electronic device...
Patent number
11,467,502
Issue date
Oct 11, 2022
Gigaphoton Inc.
Takuma Yamanaka
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method to determine a patterning process parameter
Patent number
11,300,883
Issue date
Apr 12, 2022
ASML Netherlands B.V.
Martin Jacobus Johan Jak
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Frequency broadening apparatus and method
Patent number
11,262,665
Issue date
Mar 1, 2022
ASML Netherlands B.V.
Patrick Sebastian Uebel
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Projection system and mirror and radiation source for a lithographi...
Patent number
11,150,560
Issue date
Oct 19, 2021
ASML Netherlands B.V.
Marcus Adrianus Van De Kerkhof
G02 - OPTICS
Information
Patent Grant
Systems and methods for a narrow band high transmittance interferen...
Patent number
11,092,898
Issue date
Aug 17, 2021
Taiwan Semiconductor Manufacturing Co., Ltd
Wolf Hung
G02 - OPTICS
Information
Patent Grant
Excimer laser apparatus and electronic-device manufacturing method
Patent number
11,079,686
Issue date
Aug 3, 2021
Gigaphoton Inc.
Keisuke Ishida
G01 - MEASURING TESTING
Information
Patent Grant
Online calibration for repetition rate dependent performance variables
Patent number
11,050,213
Issue date
Jun 29, 2021
Cymer, LLC
Joshua Jon Thornes
G01 - MEASURING TESTING
Information
Patent Grant
Methods of aligning a diffractive optical system and diffracting be...
Patent number
10,983,361
Issue date
Apr 20, 2021
ASML Netherlands B.V.
Sander Bas Roobol
G02 - OPTICS
Information
Patent Grant
Control device for actuating an actuator unit of a lithography syst...
Patent number
10,983,443
Issue date
Apr 20, 2021
Carl Zeiss SMT GmbH
Stefan Krone
G02 - OPTICS
Information
Patent Grant
Optical detector
Patent number
10,976,265
Issue date
Apr 13, 2021
ASML Netherlands B.V.
Sander Bas Roobol
G01 - MEASURING TESTING
Patents Applications
last 30 patents
Information
Patent Application
BYPASS APPARATUS, LASER APPARATUS, AND ELECTRONIC DEVICE MANUFACTUR...
Publication number
20240128702
Publication date
Apr 18, 2024
Gigaphoton Inc.
Shinichi MATSUMOTO
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
WAVELENGTH CONTROL METHOD, LASER APPARATUS, AND METHOD FOR MANUFACT...
Publication number
20240111219
Publication date
Apr 4, 2024
Gigaphoton Inc.
Shigeto KISHIMOTO
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
OPTIMIZATION OF LITHOGRAPHIC PROCESS BASED ON BANDWIDTH AND SPECKLE
Publication number
20240045341
Publication date
Feb 8, 2024
ASML NETHERLANDS B.V.
Willard Earl CONLEY
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD OF COMPENSATING WAVELENGTH ERROR INDUCED BY REPETITION RATE...
Publication number
20240036475
Publication date
Feb 1, 2024
CYMER, LLC
Kuo-Tai Teng
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
LITHOGRAPHIC METHOD
Publication number
20240004307
Publication date
Jan 4, 2024
ASML NETHERLANDS B.V.
Pioter NIKOLSKI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MEMBRANE FOR EUV LITHOGRAPHY
Publication number
20240004283
Publication date
Jan 4, 2024
ASML NETHERLANDS B.V.
Maxim Aleksandrovich Nasalevich
G02 - OPTICS
Information
Patent Application
CONTROLLING LIGHT SOURCE WAVELENGTHS FOR SELECTABLE PHASE SHIFTS BE...
Publication number
20230408807
Publication date
Dec 21, 2023
Applied Materials, Inc.
Thomas L. Laidig
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PREDICTIVE CALIBRATION SCHEDULING APPARATUS AND METHOD
Publication number
20230266168
Publication date
Aug 24, 2023
CYMER, LLC
Mohammad Taghi Mohebbi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
ILLUMINATION APPARATUS AND ASSOCIATED METROLOGY AND LITHOGRAPHIC AP...
Publication number
20230229094
Publication date
Jul 20, 2023
ASML NETHERLANDS B.V.
Simon Reinald HUISMAN
G02 - OPTICS
Information
Patent Application
SYSTEMS AND METHODS FOR CONTROLLING A CENTER WAVELENGTH
Publication number
20230223734
Publication date
Jul 13, 2023
CYMER, LLC
Kuo-Tai Teng
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
OPTICAL COMPONENT
Publication number
20230221648
Publication date
Jul 13, 2023
Carl Zeiss SMT GMBH
Valentin Jonatan Bolsinger
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
FORMING MULTIPLE AERIAL IMAGES IN A SINGLE LITHOGRAPHY EXPOSURE PASS
Publication number
20230152707
Publication date
May 18, 2023
CYMER, LLC
Willard Earl Conley
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
DETERMINATION OF MEASUREMENT ERROR IN AN ETALON
Publication number
20230142333
Publication date
May 11, 2023
CYMER, LLC
Russell Allen Burdt
G01 - MEASURING TESTING
Information
Patent Application
SPECTRAL FEATURE CONTROL APPARATUS
Publication number
20230124587
Publication date
Apr 20, 2023
CYMER, LLC
Eric Anders Mason
G02 - OPTICS
Information
Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, AND MANUFACTURING METHOD FOR S...
Publication number
20230101647
Publication date
Mar 30, 2023
Canon Kabushiki Kaisha
Rika Hoshino
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
EXPOSURE SYSTEM, EXPOSURE METHOD, AND ELECTRONIC DEVICE MANUFACTURI...
Publication number
20230098685
Publication date
Mar 30, 2023
Gigaphoton Inc.
Koichi FUJII
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PHOTOLITHOGRAPHY SYSTEM INCLUDING SELECTIVE LIGHT ARRAY
Publication number
20230092166
Publication date
Mar 23, 2023
HONEYWELL FEDERAL MANUFACTURING & TECHNOLOGIES, LLC
Barbara Diane Young
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SPECTRAL FEATURE SELECTION AND PULSE TIMING CONTROL OF A PULSED LIG...
Publication number
20230040812
Publication date
Feb 9, 2023
CYMER, LLC
Kevin Michael O'Brien
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
ENERGY CORRECTION MODULE FOR AN OPTICAL SOURCE APPARATUS
Publication number
20230019832
Publication date
Jan 19, 2023
CYMER, LLC
Yingbo Zhao
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PACKED-BED FILTER FOR METAL FLUORIDE DUST TRAPPING IN LASER DISCHAR...
Publication number
20230008480
Publication date
Jan 12, 2023
CYMER, LLC
Ulrich Niemann
B03 - SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES O...
Information
Patent Application
A RADIATION SYSTEM FOR CONTROLLING BURSTS OF PULSES OF RADIATION
Publication number
20220390857
Publication date
Dec 8, 2022
CYMER, LLC
Yingbo Zhao
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
LITHOGRAPHY APPARATUS, PATTERNING SYSTEM, AND METHOD OF PATTERNING...
Publication number
20220373897
Publication date
Nov 24, 2022
Applied Materials, Inc.
Christopher Dennis BENCHER
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
WAVELENGTH SELECTION MODULE, ILLUMINATION SYSTEM AND METROLOGY SYSTEM
Publication number
20220299365
Publication date
Sep 22, 2022
ASML NETHERLANDS B.V.
Gerbrand VAN DER ZOUW
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD OF COMPENSATING WAVELENGTH ERROR INDUCED BY REPETITION RATE...
Publication number
20220269181
Publication date
Aug 25, 2022
CYMER, LLC
Kuo-Tai Teng
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
APPARATUS FOR AND METHOD OF GENERATING MULTIPLE LASER BEAMS
Publication number
20220255288
Publication date
Aug 11, 2022
CYMER, LLC
Walter Dale Gillespie
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
OPTICAL DIFFRACTION COMPONENT
Publication number
20220171292
Publication date
Jun 2, 2022
Carl Zeiss SMT GmbH
Heiko Feldmann
G02 - OPTICS
Information
Patent Application
METHOD AND APPARATUS FOR IMAGING USING NARROWED BANDWIDTH
Publication number
20220163899
Publication date
May 26, 2022
ASML Nethlands B. V.
Willard Earl CONLEY
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
OPTICAL ILLUMINATION SYSTEM FOR GUIDING EUV RADIATION
Publication number
20220163897
Publication date
May 26, 2022
Carl Zeiss SMT GMBH
Michael Patra
G02 - OPTICS
Information
Patent Application
PRESSURE-CONTROLLED SPECTRAL FEATURE ADJUSTER
Publication number
20220158401
Publication date
May 19, 2022
CYMER, LLC
Eric Anders Mason
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION MEASUREMENT SYSTEM
Publication number
20220146944
Publication date
May 12, 2022
ASML NETHERLANDS B.V.
Herman Philip GODFRIED
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY