with three or more diverse phases on the same PSM Preparation thereof

Industry

CPC
G03F1/28

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/28with three or more diverse phases on the same PSM Preparation thereof

Industries

Patents Grantslast 30 patents

Information Patent Grant
Phase shifter mask
- Patent number 10,852,634
- Issue date Dec 1, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Lang Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and methods for manufacturing and correcting photomask
- Patent number 10,634,990
- Issue date Apr 28, 2020
- Dai Nippon Printing Co., Ltd.
- Takaharu Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and methods for manufacturing and correcting photomask
- Patent number 10,394,118
- Issue date Aug 27, 2019
- Dai Nippon Printing Co., Ltd.
- Takaharu Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and a fabrication method therefor
- Patent number 10,345,692
- Issue date Jul 9, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Lang Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask including transfer patterns for reducing a thermal stress
- Patent number 10,338,464
- Issue date Jul 2, 2019
- SK Hynix Inc.
- Tae Joong Ha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and methods for manufacturing and correcting photomask
- Patent number 10,048,580
- Issue date Aug 14, 2018
- Dai Nippon Printing Co., Ltd.
- Takaharu Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for preparing halftone phase shift photomask blank
- Patent number 9,778,559
- Issue date Oct 3, 2017
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device resolution enhancement by etching multiple sid...
- Patent number 9,658,531
- Issue date May 23, 2017
- GLOBALFOUNDRIES, INC.
- Guoxiang Ning
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet lithography process and mask
- Patent number 9,529,249
- Issue date Dec 27, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and pattern forming method using photomask
- Patent number 9,507,252
- Issue date Nov 29, 2016
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask for photolithography, method for fabricating the same and meth...
- Patent number 9,470,972
- Issue date Oct 18, 2016
- Samsung Electronics Co., Ltd.
- Jong-Doo Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming impurity layer, exposure mask therefore and meth...
- Patent number 9,177,990
- Issue date Nov 3, 2015
- Kabushiki Kaisha Toshiba
- Ken Tomita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for printing high-resolution two-dimensional p...
- Patent number 8,904,316
- Issue date Dec 2, 2014
- Eulitha A.G.
- Harun H. Solak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and manufacturing method of a semiconductor device and a thin...
- Patent number 8,153,339
- Issue date Apr 10, 2012
- Samsung Electronics Co., Ltd.
- Jong-An Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask with two-phase clear feature
- Patent number 8,067,133
- Issue date Nov 29, 2011
- Micron Technology, Inc.
- Fei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase-shift mask and method for forming a pattern
- Patent number 7,811,723
- Issue date Oct 12, 2010
- Nanya Technology Corp.
- Kuo-Kuei Fu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Double exposure method and photomask for same
- Patent number 7,771,892
- Issue date Aug 10, 2010
- Hynix Semiconductor Inc.
- Jae Seung Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and manufacturing method of a semiconductor device and a thin...
- Patent number 7,767,506
- Issue date Aug 3, 2010
- Samsung Electronics Co. Ltd.
- Jong-An Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Phase-shift mask, manufacturing method thereof and manufacturing me...
- Patent number 7,754,397
- Issue date Jul 13, 2010
- Toppan Printing Co., Ltd.
- Toshio Konishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo mask having assist pattern and method of fabricating the same
- Patent number 7,754,398
- Issue date Jul 13, 2010
- Samsung Electronics Co., Ltd.
- Hee-bom Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for etching devices used in lithography
- Patent number 7,732,106
- Issue date Jun 8, 2010
- Intel Corporation
- Edita Tejnil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Continuous sloped phase edge architecture fabrication technique usi...
- Patent number 7,695,872
- Issue date Apr 13, 2010
- Intel Corporation
- Matt F. Vernon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask with two-phase clear feature
- Patent number 7,648,806
- Issue date Jan 19, 2010
- Micron Technology, Inc.
- Fei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of exposure and attenuated type phase shift mask
- Patent number 7,579,122
- Issue date Aug 25, 2009
- Kabushiki Kaisha Ekisho Sentan Gijutsu Kihatsu Center
- Yukio Taniguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask at frequency domain and method for preparing the same and expo...
- Patent number 7,541,116
- Issue date Jun 2, 2009
- ProMos Technologies Inc.
- Chun Yu Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure mask
- Patent number 7,524,593
- Issue date Apr 28, 2009
- Semiconductor Energy Laboratory Co., Ltd.
- Hideto Ohnuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Crystallization apparatus, crystallization method, and phase shifter
- Patent number 7,505,204
- Issue date Mar 17, 2009
- Advanced LCD Technologies Development Center Co., Ltd.
- Yukio Taniguchi
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Phase-shifting mask for equal line/space dense line patterns
- Patent number 7,504,184
- Issue date Mar 17, 2009
- Nanya Technology Corp.
- Yung-Long Hung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift photomask
- Patent number 7,498,104
- Issue date Mar 3, 2009
- United Microelectronics Corp.
- Yung-Feng Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and manufacturing method of a semiconductor device and a thin...
- Patent number 7,449,352
- Issue date Nov 11, 2008
- Samsung Electronics Co., Ltd.
- Jong-An Kim
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PHASE SHIFTER MASK
- Publication number 20190332003
- Publication date Oct 31, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Lang CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK
- Publication number 20190332006
- Publication date Oct 31, 2019
- DAI NIPPON PRINTING CO., LTD.
- Takaharu NAGAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK
- Publication number 20180321582
- Publication date Nov 8, 2018
- DAI NIPPON PRINTING CO., LTD.
- Takaharu NAGAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND PATTERN FORMING METHOD USING PHOTOMASK
- Publication number 20150316841
- Publication date Nov 5, 2015
- Panasonic Interllectual Property Management Co., Ltd.
- AKIO MISAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE RESOLUTION ENHANCEMENT BY ETCHING MULTIPLE SID...
- Publication number 20140370447
- Publication date Dec 18, 2014
- GLOBALFOUNDRIES, Inc.
- Guoxiang NING
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE RESOLUTION ENHANCEMENT BY ETCHING MULTIPLE SID...
- Publication number 20140162176
- Publication date Jun 12, 2014
- GLOBALFOUNDRIES, Inc.
- Guoxiang NING
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR PRINTING HIGH-RESOLUTION TWO-DIMENSIONAL P...
- Publication number 20130329203
- Publication date Dec 12, 2013
- EULITHA AG
- Harun H. Solak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANISOTROPIC PHASE SHIFTING MASK
- Publication number 20130293858
- Publication date Nov 7, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Burn Jeng Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING IMPURITY LAYER, EXPOSURE MASK THEREFORE AND METH...
- Publication number 20120077304
- Publication date Mar 29, 2012
- Kabushiki Kaisha Toshiba
- Ken TOMITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK AND MANUFACTURING METHOD OF A SEMICONDUCTOR DEVICE AND A THIN...
- Publication number 20100261102
- Publication date Oct 14, 2010
- Jong-An KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASK WITH TWO-PHASE CLEAR FEATURE
- Publication number 20100092878
- Publication date Apr 15, 2010
- Fei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE MASK
- Publication number 20090176073
- Publication date Jul 9, 2009
- SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Hideto Ohnuma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE-SHIFT MASK AND METHOD FOR FORMING A PATTERN
- Publication number 20090155699
- Publication date Jun 18, 2009
- Kuo-Kuei Fu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask and Manufacturing Method of a Semiconductor Device and a Thin...
- Publication number 20090053863
- Publication date Feb 26, 2009
- Samsung Electronics Co., Ltd.
- Jong-An Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING AND DEVICES IN LITHOGRAPHY
- Publication number 20090042111
- Publication date Feb 12, 2009
- Intel Corporation
- Edita Tejnil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASK WITH TWO-PHASE CLEAR FEATURE
- Publication number 20080187841
- Publication date Aug 7, 2008
- Micron Technology, Inc.
- Fei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photo mask having assist pattern and method of fabricating the same
- Publication number 20080090156
- Publication date Apr 17, 2008
- Samsung Electronics Co., Ltd.
- Hee-Bom Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Continuous sloped phase edge architecture fabrication technique usi...
- Publication number 20080044768
- Publication date Feb 21, 2008
- Intel Corporation
- Matt F. Vernon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask and manufacturing method of microlens using thereof
- Publication number 20080020299
- Publication date Jan 24, 2008
- Dongbu HiTek Co., Ltd.
- Jun Seok Lee
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
CRYSTALLIZATION APPARATUS, CRYSTALLIZATION METHOD, AND PHASE SHIFTER
- Publication number 20080019002
- Publication date Jan 24, 2008
- Advanced LCD Technologies Dev. Ctr. Co., Ltd
- Yukio TANIGUCHI
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Vortex mask and method for preparing the same and method for prepar...
- Publication number 20080020293
- Publication date Jan 24, 2008
- ProMOS Technologies Inc.
- Yee Kai Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase-shift mask, manufacturing method thereof and manufacturing me...
- Publication number 20070269726
- Publication date Nov 22, 2007
- Toppan Printing Co., Ltd.
- Toshio Konishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask at frequency domain and method for preparing the same and expo...
- Publication number 20070092806
- Publication date Apr 26, 2007
- ProMOS Technologies Inc.
- Chun Yu Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE MASK
- Publication number 20070037069
- Publication date Feb 15, 2007
- Semiconductor Energy Laboratory Co., Ltd.
- Hideto Ohnuma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Double exposure method and photomask for same
- Publication number 20070003841
- Publication date Jan 4, 2007
- Hynix Semiconductor Inc.
- Jae Seung Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of exposure and attenuated type phase shift mask
- Publication number 20060240337
- Publication date Oct 26, 2006
- Yukio Taniguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE-SHIFTING MASK FOR EQUAL LINE/SPACE DENSE LINE PATTERNS
- Publication number 20060240333
- Publication date Oct 26, 2006
- Yung-Long Hung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask, method for manufacturing the same, and method for measur...
- Publication number 20060204864
- Publication date Sep 14, 2006
- Tae-moon Jeong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase Shift Photomask and Method for Improving Printability of a St...
- Publication number 20060199109
- Publication date Sep 7, 2006
- Kent Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Adjustable Transmission Phase Shift Mask
- Publication number 20060188793
- Publication date Aug 24, 2006
- LSI Logic Corporation
- Kunal N. Taravade
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

with three or more diverse phases on the same PSM Preparation thereof

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Phase shifter mask

Photomask and methods for manufacturing and correcting photomask

Photomask and methods for manufacturing and correcting photomask

Photomask and a fabrication method therefor

Photomask including transfer patterns for reducing a thermal stress

Photomask and methods for manufacturing and correcting photomask

Method for preparing halftone phase shift photomask blank

Semiconductor device resolution enhancement by etching multiple sid...

Extreme ultraviolet lithography process and mask

Photomask and pattern forming method using photomask

Mask for photolithography, method for fabricating the same and meth...

Method for forming impurity layer, exposure mask therefore and meth...

Method and apparatus for printing high-resolution two-dimensional p...

Mask and manufacturing method of a semiconductor device and a thin...

Phase shift mask with two-phase clear feature

Phase-shift mask and method for forming a pattern

Double exposure method and photomask for same

Mask and manufacturing method of a semiconductor device and a thin...

Phase-shift mask, manufacturing method thereof and manufacturing me...

Photo mask having assist pattern and method of fabricating the same

Methods for etching devices used in lithography

Continuous sloped phase edge architecture fabrication technique usi...

Phase shift mask with two-phase clear feature

Method of exposure and attenuated type phase shift mask

Mask at frequency domain and method for preparing the same and expo...

Exposure mask

Crystallization apparatus, crystallization method, and phase shifter

Phase-shifting mask for equal line/space dense line patterns

Phase shift photomask

Mask and manufacturing method of a semiconductor device and a thin...

Patents Applicationslast 30 patents

PHASE SHIFTER MASK

PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK

PHOTOMASK AND METHODS FOR MANUFACTURING AND CORRECTING PHOTOMASK

PHOTOMASK AND PATTERN FORMING METHOD USING PHOTOMASK

SEMICONDUCTOR DEVICE RESOLUTION ENHANCEMENT BY ETCHING MULTIPLE SID...

SEMICONDUCTOR DEVICE RESOLUTION ENHANCEMENT BY ETCHING MULTIPLE SID...

METHOD AND APPARATUS FOR PRINTING HIGH-RESOLUTION TWO-DIMENSIONAL P...

ANISOTROPIC PHASE SHIFTING MASK

METHOD FOR FORMING IMPURITY LAYER, EXPOSURE MASK THEREFORE AND METH...

MASK AND MANUFACTURING METHOD OF A SEMICONDUCTOR DEVICE AND A THIN...

PHASE SHIFT MASK WITH TWO-PHASE CLEAR FEATURE

EXPOSURE MASK

PHASE-SHIFT MASK AND METHOD FOR FORMING A PATTERN

Mask and Manufacturing Method of a Semiconductor Device and a Thin...

IMAGING AND DEVICES IN LITHOGRAPHY

PHASE SHIFT MASK WITH TWO-PHASE CLEAR FEATURE

Photo mask having assist pattern and method of fabricating the same

Continuous sloped phase edge architecture fabrication technique usi...

Mask and manufacturing method of microlens using thereof

CRYSTALLIZATION APPARATUS, CRYSTALLIZATION METHOD, AND PHASE SHIFTER

Vortex mask and method for preparing the same and method for prepar...

Phase-shift mask, manufacturing method thereof and manufacturing me...

Mask at frequency domain and method for preparing the same and expo...

EXPOSURE MASK

Double exposure method and photomask for same

Method of exposure and attenuated type phase shift mask

PHASE-SHIFTING MASK FOR EQUAL LINE/SPACE DENSE LINE PATTERNS

Photomask, method for manufacturing the same, and method for measur...

Phase Shift Photomask and Method for Improving Printability of a St...

Adjustable Transmission Phase Shift Mask