with visible light or UV light, through an original having an opaque pattern on a transparent support

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/2002with visible light or UV light, through an original having an opaque pattern on a transparent support

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Patents Grantslast 30 patents

Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 12,189,286
- Issue date Jan 7, 2025
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabricating and servicing a photomask
- Patent number 12,169,357
- Issue date Dec 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Fu Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, pattern forming method, cured fil...
- Patent number 12,078,929
- Issue date Sep 3, 2024
- FUJIFILM Corporation
- Toshihide Aoshima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal mask
- Patent number 12,078,931
- Issue date Sep 3, 2024
- Samsung Display Co., Ltd.
- Seil Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a pattern
- Patent number 12,051,590
- Issue date Jul 30, 2024
- Samsung Electronics Co., Ltd.
- Yongchul Jeong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
UV patternable polymer blends for organic thin-film transistors
- Patent number 12,048,236
- Issue date Jul 23, 2024
- Corning Incorporated
- Mingqian He
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of manufacturing photo masks
- Patent number 12,038,693
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Directly photo-patternable, stretchable, electrically conductive po...
- Patent number 12,019,372
- Issue date Jun 25, 2024
- The Board of Trustees of the Leland Stanford Junior University
- Zhenan Bao
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Pellicle for flat panel display photomask
- Patent number 12,013,642
- Issue date Jun 18, 2024
- Photronics, Inc.
- Bryan S. Kasprowicz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 11,988,958
- Issue date May 21, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 11,988,960
- Issue date May 21, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of lithography process and transferring a reticle
- Patent number 11,982,944
- Issue date May 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsiao-Lun Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask orientation
- Patent number 11,977,246
- Issue date May 7, 2024
- Applied Materials, Inc.
- Yongan Xu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition and method for forming pattern
- Patent number 11,966,160
- Issue date Apr 23, 2024
- JSR Corporation
- Ryuichi Nemoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 11,966,159
- Issue date Apr 23, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Frame member for electron beam lithography device and electron beam...
- Patent number 11,934,096
- Issue date Mar 19, 2024
- Kyocera Corporation
- Shigenobu Furukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sulfonium salt, photoacid generator, curable composition, and resis...
- Patent number 11,926,581
- Issue date Mar 12, 2024
- SAN-APRO LIMITED
- Takuto Nakao
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Quantum dot-polymer composite pattern, production method thereof, a...
- Patent number 11,912,913
- Issue date Feb 27, 2024
- Samsung Display Co., Ltd.
- Shang Hyeun Park
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods for fabricating appliances from polymerizable compositions
- Patent number 11,884,758
- Issue date Jan 30, 2024
- Align Technology, Inc.
- Michael Christopher Cole
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Imprinted substrates
- Patent number 11,878,299
- Issue date Jan 23, 2024
- Illumina, Inc.
- Hui Han
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method of creating a design on a helmet
- Patent number 11,874,604
- Issue date Jan 16, 2024
- Simon Mather-Neill
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method for manufacturing a part comprising at least one three-dimen...
- Patent number 11,857,035
- Issue date Jan 2, 2024
- Comadur S.A.
- Jan Lintymer
- A44 - HABERDASHERY JEWELLERY
Information Patent Grant
Method of forming a narrow trench
- Patent number 11,841,617
- Issue date Dec 12, 2023
- Tokyo Electron Limited
- Anton J. Devilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative-type photosensitive resin composition, cured film, element...
- Patent number 11,822,243
- Issue date Nov 21, 2023
- Toray Industries, Inc.
- Yugo Tanigaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition, polyimide production method, and...
- Patent number 11,809,079
- Issue date Nov 7, 2023
- Asahi Kasei Kabushiki Kaisha
- Tomohiro Yorisue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method and template manufacturing method
- Patent number 11,809,082
- Issue date Nov 7, 2023
- Kioxia Corporation
- Mitsuru Kondo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical wavelength dispersion device and manufacturing method therefor
- Patent number 11,808,947
- Issue date Nov 7, 2023
- Cheng-Hao Ko
- G02 - OPTICS
Information Patent Grant
Methods and apparatus for creating a large area imprint without a seam
- Patent number 11,774,851
- Issue date Oct 3, 2023
- Applied Materials, Inc.
- Kevin Laughton Cunningham
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Composition including quantum dot, manufacturing method quantum dot...
- Patent number 11,762,289
- Issue date Sep 19, 2023
- Samsung SDI Co., Ltd.
- Jinsuop Youn
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of making semiconductor device and semiconductor device
- Patent number 11,763,061
- Issue date Sep 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Jen Chen
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
MICROFLUIDIC POROUS MEMBRANE ELECTRICAL CELL-SUBSTRATE IMPEDANCE SE...
- Publication number 20250013155
- Publication date Jan 9, 2025
- The Governing Council of the University of Toronto
- Oleg CHEBOTAREV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PRINTED CIRCUIT BOARD MANUFACTURING PROCESS AND PRINTED CIRCUIT BOARD
- Publication number 20240431034
- Publication date Dec 26, 2024
- Gebr. Schmid GmbH
- Christian Schmid
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IMAGING SYSTEM
- Publication number 20240361698
- Publication date Oct 31, 2024
- ASML NETHERLANDS B.V.
- Albertus HARTGERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING PRINTING PLATE AND PRINTING METHOD
- Publication number 20240361700
- Publication date Oct 31, 2024
- Asahi Kasei Kabushiki Kaisha
- Yuka YOSHIDA
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
METHOD OF MANUFACTURING PHOTO MASKS
- Publication number 20240337951
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Cheng CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Tissue Scaffold with Patterned Microstructure
- Publication number 20240325605
- Publication date Oct 3, 2024
- Lukas Bluecher
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
FLEXOGRAPHIC PRINTING PLATE PRECURSOR AND MANUFACTURING METHOD OF F...
- Publication number 20240316977
- Publication date Sep 26, 2024
- FUJIFILM CORPORATION
- Masato SHIRAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV SENSITIVE METAL OXIDE MATERIAL AS UNDERLAYER FOR THIN CAR TO IM...
- Publication number 20240319603
- Publication date Sep 26, 2024
- Applied Materials, Inc.
- ZHENXING HAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST PROCESS
- Publication number 20240310726
- Publication date Sep 19, 2024
- HELIO DISPLAY MATERIALS LIMITED
- Gerardus Keyzer DE KEYZER
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTOLITHOGRAPHY METHOD BASED ON BILAYER PHOTORESIST
- Publication number 20240295817
- Publication date Sep 5, 2024
- SHANGHAI MICROSTART PHOTOELECTRIC TECHNOLOGY CO., LTD.
- Yijiao GAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LASER SYSTEM, PULSE LASER LIGHT GENERATING METHOD, AND ELECTRONIC D...
- Publication number 20240291220
- Publication date Aug 29, 2024
- Gigaphoton Inc.
- Seiji NOGIWA
- G02 - OPTICS
Information Patent Application
RADIATIVE COOLING FILM WITH SURFACE PERIODIC MICRO-NANO STRUCTURE A...
- Publication number 20240287272
- Publication date Aug 29, 2024
- Innofocus Photonics Technology Pty Ltd
- Baohua JIA
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
PELLICLE FOR FLAT PANEL DISPLAY PHOTOMASK
- Publication number 20240280908
- Publication date Aug 22, 2024
- PHOTRONICS, INC.
- Bryan S. Kasprowicz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND ARRANGEMENT FOR DETERMINING THERMALLY-INDUCED DEFORMATIONS
- Publication number 20240280907
- Publication date Aug 22, 2024
- ASML Netherlands B.V.
- Hasret ERCISLI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN CARBOXYLATE PRECURSORS FOR METAL OXIDE RESIST LAYERS AND RELATE...
- Publication number 20240272547
- Publication date Aug 15, 2024
- Intel Corporation
- Charles Cameron Mokhtarzadeh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EXPOSURE APPARATUS
- Publication number 20240264541
- Publication date Aug 8, 2024
- CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED
- Xiaosong LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD, EXPOSURE DEVICE, AND METHOD OF MANUFACTURING OPTIC...
- Publication number 20240248405
- Publication date Jul 25, 2024
- FUJIFILM CORPORATION
- Hirotoshi ANDO
- G02 - OPTICS
Information Patent Application
DIELECTRIC FILM FORMING COMPOSITION CONTAINING ACYL GERMANIUM COMPOUND
- Publication number 20240248400
- Publication date Jul 25, 2024
- Fujifilm Electronic Materials U.S.A., Inc.
- Binod B. De
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS
- Publication number 20240248413
- Publication date Jul 25, 2024
- TOKYO ELECTRON LIMITED
- Takeshi SHIMOAOKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTO-DEFINABLE HYDROPHOBIC COMPOSITIONS
- Publication number 20240192599
- Publication date Jun 13, 2024
- Hewlett-Packard Development Company, L.P.
- Bo Song
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
SYSTEMS FOR FABRICATING APPLIANCES FROM POLYMERIZABLE COMPOSITIONS
- Publication number 20240182616
- Publication date Jun 6, 2024
- Align Technology, Inc.
- Michael Christopher Cole
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Polymer, Resist Composition, And Patterning Process
- Publication number 20240118617
- Publication date Apr 11, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro FUKUSHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEPOSITION DEVICE AND METHOD FOR MANUFACTURING DISPLAY DEVICE USING...
- Publication number 20240057463
- Publication date Feb 15, 2024
- SAMSUNG DISPLAY CO., LTD.
- Young Min MOON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CRITICAL DIMENSION INSPECTION METHOD AND SEMICONDUCTOR DEVICE MANUF...
- Publication number 20240045342
- Publication date Feb 8, 2024
- Samsung Electronics Co., Ltd.
- Su Bin KONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST HAVING STRENGTHENING MATERIAL
- Publication number 20240047208
- Publication date Feb 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yuan Chih LO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION INCLUDING QUANTUM DOT, MANUFACTURING METHOD QUANTUM DOT...
- Publication number 20240027906
- Publication date Jan 25, 2024
- Samsung SDI Co., Ltd.
- Jinsuop YOUN
- B82 - NANO-TECHNOLOGY
Information Patent Application
IMPRINT APPARATUS, IMPRINT METHOD AND ARTICLE MANUFACTURING METHOD
- Publication number 20230400761
- Publication date Dec 14, 2023
- Canon Kabushiki Kaisha
- Toshihiko Nishida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST UNDER-LAYER AND METHOD OF FORMING PHOTORESIST PATTERN
- Publication number 20230384679
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV PHOTOMASK AND RELATED METHODS
- Publication number 20230386838
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Hung LIAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLOCK COPOLYMER FOR LITHOGRAPHY AND LITHOGRAPHY METHOD USING THE SAME
- Publication number 20230367215
- Publication date Nov 16, 2023
- Industry-Academic Cooperation Foundation, Yonsei University
- Du Yeol RYU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

with visible light or UV light, through an original having an opaque pattern on a transparent support

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Organometallic solution based high resolution patterning compositions

Method of fabricating and servicing a photomask

Photosensitive resin composition, pattern forming method, cured fil...

Metal mask

Method of forming a pattern

UV patternable polymer blends for organic thin-film transistors

Method of manufacturing photo masks

Directly photo-patternable, stretchable, electrically conductive po...

Pellicle for flat panel display photomask

Organometallic solution based high resolution patterning compositions

Organometallic solution based high resolution patterning compositions

Method of lithography process and transferring a reticle

Mask orientation

Radiation-sensitive resin composition and method for forming pattern

Organometallic solution based high resolution patterning compositions

Frame member for electron beam lithography device and electron beam...

Sulfonium salt, photoacid generator, curable composition, and resis...

Quantum dot-polymer composite pattern, production method thereof, a...

Methods for fabricating appliances from polymerizable compositions

Imprinted substrates

Method of creating a design on a helmet

Method for manufacturing a part comprising at least one three-dimen...

Method of forming a narrow trench

Negative-type photosensitive resin composition, cured film, element...

Photosensitive resin composition, polyimide production method, and...

Pattern forming method and template manufacturing method

Optical wavelength dispersion device and manufacturing method therefor

Methods and apparatus for creating a large area imprint without a seam

Composition including quantum dot, manufacturing method quantum dot...

Method of making semiconductor device and semiconductor device

Patents Applicationslast 30 patents

MICROFLUIDIC POROUS MEMBRANE ELECTRICAL CELL-SUBSTRATE IMPEDANCE SE...

PRINTED CIRCUIT BOARD MANUFACTURING PROCESS AND PRINTED CIRCUIT BOARD

IMAGING SYSTEM

METHOD FOR PRODUCING PRINTING PLATE AND PRINTING METHOD

METHOD OF MANUFACTURING PHOTO MASKS

Tissue Scaffold with Patterned Microstructure

FLEXOGRAPHIC PRINTING PLATE PRECURSOR AND MANUFACTURING METHOD OF F...

EUV SENSITIVE METAL OXIDE MATERIAL AS UNDERLAYER FOR THIN CAR TO IM...

PHOTORESIST PROCESS

PHOTOLITHOGRAPHY METHOD BASED ON BILAYER PHOTORESIST

LASER SYSTEM, PULSE LASER LIGHT GENERATING METHOD, AND ELECTRONIC D...

RADIATIVE COOLING FILM WITH SURFACE PERIODIC MICRO-NANO STRUCTURE A...

PELLICLE FOR FLAT PANEL DISPLAY PHOTOMASK

METHOD AND ARRANGEMENT FOR DETERMINING THERMALLY-INDUCED DEFORMATIONS

TIN CARBOXYLATE PRECURSORS FOR METAL OXIDE RESIST LAYERS AND RELATE...

EXPOSURE APPARATUS

EXPOSURE METHOD, EXPOSURE DEVICE, AND METHOD OF MANUFACTURING OPTIC...

DIELECTRIC FILM FORMING COMPOSITION CONTAINING ACYL GERMANIUM COMPOUND

SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS

PHOTO-DEFINABLE HYDROPHOBIC COMPOSITIONS

SYSTEMS FOR FABRICATING APPLIANCES FROM POLYMERIZABLE COMPOSITIONS

Polymer, Resist Composition, And Patterning Process

DEPOSITION DEVICE AND METHOD FOR MANUFACTURING DISPLAY DEVICE USING...

CRITICAL DIMENSION INSPECTION METHOD AND SEMICONDUCTOR DEVICE MANUF...

PHOTORESIST HAVING STRENGTHENING MATERIAL

COMPOSITION INCLUDING QUANTUM DOT, MANUFACTURING METHOD QUANTUM DOT...

IMPRINT APPARATUS, IMPRINT METHOD AND ARTICLE MANUFACTURING METHOD

PHOTORESIST UNDER-LAYER AND METHOD OF FORMING PHOTORESIST PATTERN

EUV PHOTOMASK AND RELATED METHODS

BLOCK COPOLYMER FOR LITHOGRAPHY AND LITHOGRAPHY METHOD USING THE SAME