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H01J37/32715

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32715Workpiece holder

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Edge seal for lower electrode assembly
- Patent number 12,368,025
- Issue date Jul 22, 2025
- Lam Research Corporation
- David Schaefer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for improved high pressure plasma processing
- Patent number 12,368,028
- Issue date Jul 22, 2025
- Applied Materials, Inc.
- William R. Johanson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus
- Patent number 12,365,976
- Issue date Jul 22, 2025
- Shibaura Mechatronics Corporation
- Shigeki Matsunaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching apparatus and method
- Patent number 12,362,152
- Issue date Jul 15, 2025
- SPTS Technologies Limited
- Maxime Varvara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam etching chamber with etching by-product redistributor
- Patent number 12,362,154
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Te-Hsien Hsieh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,362,145
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Yuji Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film stress control for plasma enhanced chemical vapor deposition
- Patent number 12,362,149
- Issue date Jul 15, 2025
- Applied Materials, Inc.
- Chien-Teh Kao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pedestal setup using camera wafer
- Patent number 12,362,153
- Issue date Jul 15, 2025
- Lam Research Corporation
- Prasanna Kulkarni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and manufacturing method thereof
- Patent number 12,354,901
- Issue date Jul 8, 2025
- NHK Spring Co., Ltd.
- Hibiki Yokoyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing device, substrate processing system, control m...
- Patent number 12,354,841
- Issue date Jul 8, 2025
- Tokyo Electron Limited
- Hiroshi Tsujimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,354,849
- Issue date Jul 8, 2025
- Tokyo Electron Limited
- Gyeong min Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for processing substrate
- Patent number 12,354,850
- Issue date Jul 8, 2025
- Eugene Technology Co., Ltd.
- Woo Duck Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer placement table
- Patent number 12,354,851
- Issue date Jul 8, 2025
- NGK Insulators, Ltd.
- Yusuke Akai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, method...
- Patent number 12,354,848
- Issue date Jul 8, 2025
- Kokusai Electric Corporation
- Yasunori Ejiri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic material having high resistivity and high corrosion resista...
- Patent number 12,354,900
- Issue date Jul 8, 2025
- NGK Insulators, Ltd.
- Akiyoshi Hattori
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Plasma processing apparatus
- Patent number 12,347,654
- Issue date Jul 1, 2025
- Tokyo Electron Limited
- Hwajun Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 12,347,658
- Issue date Jul 1, 2025
- Tokyo Electron Limited
- Ryota Sakane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus, plasma etching method using the same, and...
- Patent number 12,347,657
- Issue date Jul 1, 2025
- Samsung Electronics Co., Ltd.
- Jongchul Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,347,646
- Issue date Jul 1, 2025
- Tokyo Electron Limited
- Bongseong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,340,985
- Issue date Jun 24, 2025
- Tokyo Electron Limited
- Tetsuji Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency power return path
- Patent number 12,340,984
- Issue date Jun 24, 2025
- Applied Materials, Inc.
- Luke Bonecutter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic edge ring mounting system for substrate processing
- Patent number 12,340,989
- Issue date Jun 24, 2025
- Lam Research Corporation
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Porous plug for electrostatic chuck gas delivery
- Patent number 12,341,048
- Issue date Jun 24, 2025
- Applied Materials, Inc.
- Alexander Sulyman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck
- Patent number 12,341,050
- Issue date Jun 24, 2025
- Toto Ltd.
- Akihito Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Batch-type apparatus for atomic layer etching (ALE), and ALE method...
- Patent number 12,334,308
- Issue date Jun 17, 2025
- Samsung Electronics Co., Ltd.
- Hanjin Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote plasma ultraviolet enhanced deposition
- Patent number 12,334,317
- Issue date Jun 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hai-Dang Trinh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 12,334,305
- Issue date Jun 17, 2025
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Circuits for edge ring control in shaped dc pulsed plasma process d...
- Patent number 12,334,311
- Issue date Jun 17, 2025
- Applied Materials, Inc.
- Linying Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated showerhead with thermal control for delivering radical a...
- Patent number 12,331,402
- Issue date Jun 17, 2025
- Lam Research Corporation
- Rachel E. Batzer
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
High voltage power supply apparatus and plasma etching equipment ha...
- Patent number 12,327,712
- Issue date Jun 10, 2025
- Samsung Electronics Co., Ltd.
- Jihwan Kim
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ION BEAM PROCESSING SYSTEM
- Publication number 20250239432
- Publication date Jul 24, 2025
- Samsung Electronics Co., Ltd.
- Backkyu Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND MOUNTING TABLE THEREOF
- Publication number 20250233008
- Publication date Jul 17, 2025
- TOKYO ELECTRON LIMITED
- Yohei UCHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION TOOL WITH DIELECTRIC COATED CHAMBER SIDEWALLS TO IMPROVE...
- Publication number 20250232959
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Liang LIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FOCUS RING, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND...
- Publication number 20250232960
- Publication date Jul 17, 2025
- Samsung Electronics Co., Ltd.
- Hyungsik KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK
- Publication number 20250233001
- Publication date Jul 17, 2025
- TOTO LTD.
- Yuki SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF FILTER TOPOLOGY FOR SUBSTRATE SUPPORT ASSEMBLY
- Publication number 20250233571
- Publication date Jul 17, 2025
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM
- Publication number 20250232965
- Publication date Jul 17, 2025
- TOKYO ELECTRON LIMITED
- Tatsuru OKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK
- Publication number 20250226256
- Publication date Jul 10, 2025
- Tomoegawa Corporation
- Ryouji Shikata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHER WITH EDGE RING AND METHOD OF PROCESSING SEMICONDUCTOR...
- Publication number 20250226188
- Publication date Jul 10, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ting-Jung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS FOR ETCHING A SUBSTRATE BY USING PLASMA
- Publication number 20250226187
- Publication date Jul 10, 2025
- Samsung Electronics Co., Ltd.
- Heewon MIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250226259
- Publication date Jul 10, 2025
- Samsung Electronics Co., Ltd.
- Woojin Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EFFICIENT DECHUCKING AND PARTICLE MANAGEMENT IN PROCESS CHAMBERS
- Publication number 20250226255
- Publication date Jul 10, 2025
- Applied Materials, Inc.
- Arvinder Manmohan Singh Chadha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAMPLE HOLDER
- Publication number 20250218845
- Publication date Jul 3, 2025
- KYOCERA CORPORATION
- Tomoya TAKASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAMPLE HOLDER
- Publication number 20250218858
- Publication date Jul 3, 2025
- KYOCERA CORPORATION
- Musashi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SPRAYING APPARATUS AND SUBSTRATE TREATING APPARATUS INCLUDING T...
- Publication number 20250218735
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Si Young JO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AIR-CORE COIL IN ANALOG CIRCUIT FILTERS FOR PLASMA PROCESSING
- Publication number 20250218748
- Publication date Jul 3, 2025
- Applied Materials, Inc.
- Yue Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE AND METHOD OF CONTROLLING PLASMA CHARACTERISTIC, AND SYSTEM...
- Publication number 20250218730
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Dong Hun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR AND METHOD OF PROCESSING SUBSTRATE
- Publication number 20250218746
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- In Hee KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND MA...
- Publication number 20250218739
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Joon Hee LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20250210308
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Takamitsu TAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PLACEMENT TABLE
- Publication number 20250210324
- Publication date Jun 26, 2025
- NGK Insulators, Ltd.
- Tomohiro HARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORTING PLATE, THIN FILM DEPOSITION APPARATUS INCLUDIN...
- Publication number 20250207287
- Publication date Jun 26, 2025
- ASM IP HOLDING B.V.
- Yong Min Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CERAMIC SUSCEPTOR
- Publication number 20250210323
- Publication date Jun 26, 2025
- MICO CERAMICS LTD.
- Ji-Sook Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250210330
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250210331
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Takumi IMAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250210322
- Publication date Jun 26, 2025
- Samsung Electronics Co., Ltd.
- HYUNJAE LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA INJECTION CONFIGURATIONS FOR PROCESSING CHAMBERS, AND RELATE...
- Publication number 20250210314
- Publication date Jun 26, 2025
- Applied Materials, Inc.
- Ala MORADIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK AND METHOD FOR MANUFACTURING ELECTROSTATIC CHUCK
- Publication number 20250210325
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Atsushi KAWABATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT
- Publication number 20250210393
- Publication date Jun 26, 2025
- NGK Insulators, Ltd.
- Masaki ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPEDANCE MEASUREMENT METHOD OF SUBSTRATE PROCESSING APPARATUS
- Publication number 20250201515
- Publication date Jun 19, 2025
- SEMES CO., LTD.
- Sang Moon YOO
- H01 - BASIC ELECTRIC ELEMENTS

Workpiece holder

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Edge seal for lower electrode assembly

Apparatus for improved high pressure plasma processing

Film forming apparatus

Plasma etching apparatus and method

Ion beam etching chamber with etching by-product redistributor

Plasma processing apparatus and plasma processing method

Film stress control for plasma enhanced chemical vapor deposition

Pedestal setup using camera wafer

Stage and manufacturing method thereof

Substrate processing device, substrate processing system, control m...

Plasma processing apparatus

Apparatus and method for processing substrate

Wafer placement table

Substrate processing apparatus, substrate processing method, method...

Ceramic material having high resistivity and high corrosion resista...

Plasma processing apparatus

Stage and plasma processing apparatus

Plasma etching apparatus, plasma etching method using the same, and...

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Radio frequency power return path

Electrostatic edge ring mounting system for substrate processing

Porous plug for electrostatic chuck gas delivery

Electrostatic chuck

Batch-type apparatus for atomic layer etching (ALE), and ALE method...

Remote plasma ultraviolet enhanced deposition

Plasma processing apparatus

Circuits for edge ring control in shaped dc pulsed plasma process d...

Integrated showerhead with thermal control for delivering radical a...

High voltage power supply apparatus and plasma etching equipment ha...

Patents Applicationslast 30 patents

ION BEAM PROCESSING SYSTEM

PLASMA PROCESSING APPARATUS AND MOUNTING TABLE THEREOF

DEPOSITION TOOL WITH DIELECTRIC COATED CHAMBER SIDEWALLS TO IMPROVE...

FOCUS RING, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND...

ELECTROSTATIC CHUCK

RF FILTER TOPOLOGY FOR SUBSTRATE SUPPORT ASSEMBLY

SUBSTRATE PROCESSING SYSTEM

ELECTROSTATIC CHUCK

PLASMA ETCHER WITH EDGE RING AND METHOD OF PROCESSING SEMICONDUCTOR...

SUBSTRATE PROCESSING APPARATUS FOR ETCHING A SUBSTRATE BY USING PLASMA

SUBSTRATE PROCESSING APPARATUS

EFFICIENT DECHUCKING AND PARTICLE MANAGEMENT IN PROCESS CHAMBERS

SAMPLE HOLDER

SAMPLE HOLDER

GAS SPRAYING APPARATUS AND SUBSTRATE TREATING APPARATUS INCLUDING T...

AIR-CORE COIL IN ANALOG CIRCUIT FILTERS FOR PLASMA PROCESSING

DEVICE AND METHOD OF CONTROLLING PLASMA CHARACTERISTIC, AND SYSTEM...

APPARATUS FOR AND METHOD OF PROCESSING SUBSTRATE

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND MA...

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

WAFER PLACEMENT TABLE

SUBSTRATE SUPPORTING PLATE, THIN FILM DEPOSITION APPARATUS INCLUDIN...

CERAMIC SUSCEPTOR

PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING SYSTEM

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

PLASMA INJECTION CONFIGURATIONS FOR PROCESSING CHAMBERS, AND RELATE...

ELECTROSTATIC CHUCK AND METHOD FOR MANUFACTURING ELECTROSTATIC CHUCK

MEMBER FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT

IMPEDANCE MEASUREMENT METHOD OF SUBSTRATE PROCESSING APPARATUS