Workpiece holder

Industry

CPC
H01J37/32715

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32715Workpiece holder

Industries

Patents Grantslast 30 patents

Information Patent Grant
Wafer bonding apparatus and method
- Patent number 12,211,820
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng-I Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing chamber deposition confinement
- Patent number 12,211,673
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Sarah Michelle Bobek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Joining techniques for composite ceramic bodies
- Patent number 12,211,685
- Issue date Jan 28, 2025
- Lam Research Corporation
- Karl Frederick Leeser
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rating substrate support assemblies based on impedance circuit elec...
- Patent number 12,205,791
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Arvind Shankar Raman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,205,801
- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Toshiaki Saijo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support designs for a deposition chamber
- Patent number 12,198,967
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Kaushik Rao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
HTCC antenna for generation of microplasma
- Patent number 12,198,897
- Issue date Jan 14, 2025
- Inficon, Inc.
- Shawn Briglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin-film-deposition equipment
- Patent number 12,198,904
- Issue date Jan 14, 2025
- SKY TECH INC.
- Jing-Cheng Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support and plasma processing apparatus
- Patent number 12,198,906
- Issue date Jan 14, 2025
- Tokyo Electron Limited
- Hajime Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Member for semiconductor manufacturing apparatus, method for manufa...
- Patent number 12,198,965
- Issue date Jan 14, 2025
- NGK Insulators, Ltd.
- Kazuhiro Nobori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma resistant arc preventative coatings for manufacturing equipm...
- Patent number 12,198,903
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Joseph Frederick Sommers
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Electrostatic chuck and substrate fixing device
- Patent number 12,198,968
- Issue date Jan 14, 2025
- Shinko Electric Industries Co., Ltd.
- Kentaro Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measuring device and optical fiber strain measuring jig thereof
- Patent number 12,196,629
- Issue date Jan 14, 2025
- Tokyo Electron Limited
- Tong Wu
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing apparatus
- Patent number 12,191,121
- Issue date Jan 7, 2025
- HITACHI HIGH-TECH CORPORATION
- Kazuyuki Ikenaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for controlling ion energy distribution
- Patent number 12,183,557
- Issue date Dec 31, 2024
- Applied Materials, Inc.
- Linying Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer treatment system and method of treating wafer
- Patent number 12,183,550
- Issue date Dec 31, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Po Hsun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for inspecting electrostatic chuck
- Patent number 12,181,504
- Issue date Dec 31, 2024
- Semes Co., Ltd.
- Su Hyung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method and plasma processing apparatus
- Patent number 12,176,187
- Issue date Dec 24, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning ion beam deposition and etch
- Patent number 12,176,178
- Issue date Dec 24, 2024
- Plasma-Therm NES LLC
- Sarpangala Hariharakeshava Hegde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition system and method
- Patent number 12,176,253
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wen-Hao Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treatment apparatus, a method of monitoring a process of man...
- Patent number 12,170,233
- Issue date Dec 17, 2024
- Samsung Electronics Co., Ltd.
- Meehyun Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating apparatus and coating method
- Patent number 12,170,189
- Issue date Dec 17, 2024
- Jiangsu Favored Nanotechnology Co., LTD
- Jian Zong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ceramic sintered body and member for plasma processing apparatus
- Patent number 12,165,853
- Issue date Dec 10, 2024
- Kyocera Corporation
- Manpei Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support and substrate processing apparatus
- Patent number 12,165,854
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Nobutaka Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for advanced ion control for etching processes
- Patent number 12,165,872
- Issue date Dec 10, 2024
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample holder
- Patent number 12,162,110
- Issue date Dec 10, 2024
- Kyocera Corporation
- Hiromasa Takemori
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Substrate support and substrate processing apparatus
- Patent number 12,165,896
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Akira Nagayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system and transfer method
- Patent number 12,165,893
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Norihiko Amikura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Screwless semiconductor processing chambers
- Patent number 12,165,909
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Bo-Ru Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer adaptor for adapting different sized wafers
- Patent number 12,165,921
- Issue date Dec 10, 2024
- UTAC HEADQUARTERS PTD. LTD.
- Enrique Sarile
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR WAFER PROCESSING METHOD
- Publication number 20250038033
- Publication date Jan 30, 2025
- Hitachi High-Tech Corporation
- Nozomu YOSHIOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR RADIO FREQUENCY GRID DESIGN IN AN ESC TO R...
- Publication number 20250038034
- Publication date Jan 30, 2025
- LAM RESEARCH CORPORATION
- Stephen Topping
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBER FOR SUBSTRATE BACKSIDE AND BEVEL DEPOSITION
- Publication number 20250037974
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Dmitry LUBOMIRSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS STACK FOR CVD PLASMA TREATMENT
- Publication number 20250037976
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Anirudh K. Alewoor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR PLASMA PROCESSING
- Publication number 20250037977
- Publication date Jan 30, 2025
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250029817
- Publication date Jan 23, 2025
- JUSUNG ENGINEERING CO., LTD.
- WOONG KYO OH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE
- Publication number 20250029818
- Publication date Jan 23, 2025
- Hitachi High-Tech Corporation
- Andre AMEND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK DEVICE AND SUBSTRATE PROCESSING APPARATUS INCLU...
- Publication number 20250022692
- Publication date Jan 16, 2025
- ASM IP HOLDING B.V.
- Koji Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WIDE-COVERAGE EDGE RING FOR ENHANCED SHIELDING IN SUBSTRATE PROCESS...
- Publication number 20250022691
- Publication date Jan 16, 2025
- LAM RESEARCH CORPORATION
- Shang-I CHOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK AND PLASMA PROCESSING APPARATUS
- Publication number 20250014874
- Publication date Jan 9, 2025
- TOKYO ELECTRON LIMITED
- Takahiko SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING PLASMA PROCESSING APPARATUS INCLUDING CONSUMABLE METAL MEMBER
- Publication number 20250014868
- Publication date Jan 9, 2025
- Research & Business Foundation Sungkyunkwan University
- Geun Young YEOM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GASBOX FOR SEMICONDUCTOR PROCESSING CHAMBER
- Publication number 20250014914
- Publication date Jan 9, 2025
- Applied Materials, Inc.
- Rahul Rajeev
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BIPOLAR ELECTROSTATIC CHUCK TO LIMIT DC DISCHARGE
- Publication number 20250014934
- Publication date Jan 9, 2025
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING APPARATUS USING PLASMA
- Publication number 20250014871
- Publication date Jan 9, 2025
- Samsung Electronics Co., Ltd.
- Sungwon CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARRIER WITH VERTICAL GRID FOR SUPPORTING SUBSTRATES IN COATER
- Publication number 20250014873
- Publication date Jan 9, 2025
- View, Inc.
- Bo Neilan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LAMINATE MANUFACTURING APPARATUS AND SELF-ASSEMBLED MONOLAYER FORMA...
- Publication number 20250011933
- Publication date Jan 9, 2025
- TORAY ENGINEERING CO., LTD.
- Naoto SUGANUMA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
ELECTROSTATIC CHUCK DEVICE
- Publication number 20250014933
- Publication date Jan 9, 2025
- Sumitomo Osaka Cement Co., Ltd.
- Keisuke MAEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIAMOND FORMATION DEVICE AND DIAMOND-COATED SUBSTRATE
- Publication number 20250011922
- Publication date Jan 9, 2025
- NATIONAL UNIVERSITY CORPORATION EHIME UNIVERSITY
- Hiromichi TOYOTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250006473
- Publication date Jan 2, 2025
- TOKYO ELECTRON LIMITED
- Yuki ONODERA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE PROCESSING EQUIPMENT
- Publication number 20250006475
- Publication date Jan 2, 2025
- Industrial Technology Research Institute
- Chih-Chieh Chen
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
TREATMENT APPARATUS
- Publication number 20250006472
- Publication date Jan 2, 2025
- Ushio Denki Kabushiki Kaisha
- Takashi SAWADA
- B08 - CLEANING
Information Patent Application
PLASMA DIAGNOSTIC APPARATUS, AND APPARATUS FOR FABRICATING SEMICOND...
- Publication number 20250006477
- Publication date Jan 2, 2025
- Samsung Electronics Co., Ltd.
- Haewook PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVE GAS GENERATION APPARATUS
- Publication number 20240429028
- Publication date Dec 26, 2024
- TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
- Kensuke WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALUMINA CERAMIC MEMBER, METHOD FOR MANUFACTURING ALUMINA CERAMIC ME...
- Publication number 20240429031
- Publication date Dec 26, 2024
- TOKYO ELECTRON LIMITED
- Masanori SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT APPARATUS
- Publication number 20240429030
- Publication date Dec 26, 2024
- KIOXIA Corporation
- Kazuya EMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS HAVING A MIDDLE ELECTRODE
- Publication number 20240429070
- Publication date Dec 26, 2024
- SK HYNIX INC.
- Jin Ho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER EDGE RING LIFTING SOLUTION
- Publication number 20240429088
- Publication date Dec 26, 2024
- Applied Materials, Inc.
- Michael R. RICE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ROTATING SUBSTRATE SUPPORT
- Publication number 20240420931
- Publication date Dec 19, 2024
- ASM IP HOLDING B.V.
- Yukihiro Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATING METHOD
- Publication number 20240420914
- Publication date Dec 19, 2024
- Jiangsu Favored Nanotechnology Co., Ltd.
- Jian ZONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240420930
- Publication date Dec 19, 2024
- Pusan National University Industry-University Cooperation Foundation
- Changho Kim
- H01 - BASIC ELECTRIC ELEMENTS

Workpiece holder

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Wafer bonding apparatus and method

Processing chamber deposition confinement

Joining techniques for composite ceramic bodies

Rating substrate support assemblies based on impedance circuit elec...

Plasma processing apparatus and plasma processing method

Substrate support designs for a deposition chamber

HTCC antenna for generation of microplasma

Thin-film-deposition equipment

Substrate support and plasma processing apparatus

Member for semiconductor manufacturing apparatus, method for manufa...

Plasma resistant arc preventative coatings for manufacturing equipm...

Electrostatic chuck and substrate fixing device

Measuring device and optical fiber strain measuring jig thereof

Plasma processing apparatus

Apparatus and methods for controlling ion energy distribution

Wafer treatment system and method of treating wafer

Apparatus and method for inspecting electrostatic chuck

Cleaning method and plasma processing apparatus

Scanning ion beam deposition and etch

Deposition system and method

Plasma treatment apparatus, a method of monitoring a process of man...

Coating apparatus and coating method

Ceramic sintered body and member for plasma processing apparatus

Substrate support and substrate processing apparatus

Methods and systems for advanced ion control for etching processes

Sample holder

Substrate support and substrate processing apparatus

Substrate processing system and transfer method

Screwless semiconductor processing chambers

Wafer adaptor for adapting different sized wafers

Patents Applicationslast 30 patents

SEMICONDUCTOR WAFER PROCESSING METHOD

METHOD AND APPARATUS FOR RADIO FREQUENCY GRID DESIGN IN AN ESC TO R...

CHAMBER FOR SUBSTRATE BACKSIDE AND BEVEL DEPOSITION

PROCESS STACK FOR CVD PLASMA TREATMENT

APPARATUS AND METHOD FOR PLASMA PROCESSING

SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE

ELECTROSTATIC CHUCK DEVICE AND SUBSTRATE PROCESSING APPARATUS INCLU...

WIDE-COVERAGE EDGE RING FOR ENHANCED SHIELDING IN SUBSTRATE PROCESS...

ELECTROSTATIC CHUCK AND PLASMA PROCESSING APPARATUS

ETCHING PLASMA PROCESSING APPARATUS INCLUDING CONSUMABLE METAL MEMBER

GASBOX FOR SEMICONDUCTOR PROCESSING CHAMBER

BIPOLAR ELECTROSTATIC CHUCK TO LIMIT DC DISCHARGE

SEMICONDUCTOR PROCESSING APPARATUS USING PLASMA

CARRIER WITH VERTICAL GRID FOR SUPPORTING SUBSTRATES IN COATER

LAMINATE MANUFACTURING APPARATUS AND SELF-ASSEMBLED MONOLAYER FORMA...

ELECTROSTATIC CHUCK DEVICE

DIAMOND FORMATION DEVICE AND DIAMOND-COATED SUBSTRATE

PLASMA PROCESSING APPARATUS

SURFACE PROCESSING EQUIPMENT

TREATMENT APPARATUS

PLASMA DIAGNOSTIC APPARATUS, AND APPARATUS FOR FABRICATING SEMICOND...

ACTIVE GAS GENERATION APPARATUS

ALUMINA CERAMIC MEMBER, METHOD FOR MANUFACTURING ALUMINA CERAMIC ME...

PLASMA TREATMENT APPARATUS

SUBSTRATE PROCESSING APPARATUS HAVING A MIDDLE ELECTRODE

WAFER EDGE RING LIFTING SOLUTION

ROTATING SUBSTRATE SUPPORT

COATING METHOD

SUBSTRATE PROCESSING APPARATUS