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CPC
H01J37/32715

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32715Workpiece holder

Industries

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,340,985
- Issue date Jun 24, 2025
- Tokyo Electron Limited
- Tetsuji Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency power return path
- Patent number 12,340,984
- Issue date Jun 24, 2025
- Applied Materials, Inc.
- Luke Bonecutter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic edge ring mounting system for substrate processing
- Patent number 12,340,989
- Issue date Jun 24, 2025
- Lam Research Corporation
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Porous plug for electrostatic chuck gas delivery
- Patent number 12,341,048
- Issue date Jun 24, 2025
- Applied Materials, Inc.
- Alexander Sulyman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck
- Patent number 12,341,050
- Issue date Jun 24, 2025
- Toto Ltd.
- Akihito Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Batch-type apparatus for atomic layer etching (ALE), and ALE method...
- Patent number 12,334,308
- Issue date Jun 17, 2025
- Samsung Electronics Co., Ltd.
- Hanjin Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote plasma ultraviolet enhanced deposition
- Patent number 12,334,317
- Issue date Jun 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hai-Dang Trinh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 12,334,305
- Issue date Jun 17, 2025
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Circuits for edge ring control in shaped dc pulsed plasma process d...
- Patent number 12,334,311
- Issue date Jun 17, 2025
- Applied Materials, Inc.
- Linying Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated showerhead with thermal control for delivering radical a...
- Patent number 12,331,402
- Issue date Jun 17, 2025
- Lam Research Corporation
- Rachel E. Batzer
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
High voltage power supply apparatus and plasma etching equipment ha...
- Patent number 12,327,712
- Issue date Jun 10, 2025
- Samsung Electronics Co., Ltd.
- Jihwan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for processing substrate
- Patent number 12,325,919
- Issue date Jun 10, 2025
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing apparatus and method
- Patent number 12,327,748
- Issue date Jun 10, 2025
- PIOTECH INC.
- Zhuo Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,315,698
- Issue date May 27, 2025
- Tokyo Electron Limited
- Cedric Thomas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Distortion of pulses for wafer biasing
- Patent number 12,315,705
- Issue date May 27, 2025
- Lam Research Corporation
- Karl Frederick Leeser
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carrier device, semiconductor apparatus, and residual charge detect...
- Patent number 12,315,706
- Issue date May 27, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Jian Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and methods of manufacturing semiconduc...
- Patent number 12,315,703
- Issue date May 27, 2025
- Samsung Electronics Co., Ltd.
- Kyoungchon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of performing maintenance on substrate processing apparatus
- Patent number 12,315,709
- Issue date May 27, 2025
- Tokyo Electron Limited
- Yuya Minoura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thermal shield for processing chamber
- Patent number 12,308,218
- Issue date May 20, 2025
- Applied Materials, Inc.
- Youngki Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system and method for installing edge ring
- Patent number 12,308,221
- Issue date May 20, 2025
- Tokyo Electron Limited
- Takashi Aramaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage, plasma processing apparatus, and cleaning method
- Patent number 12,300,471
- Issue date May 13, 2025
- Tokyo Electron Limited
- Takahiro Senda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 12,300,472
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Pei-Yu Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Placement stage and substrate processing apparatus
- Patent number 12,300,530
- Issue date May 13, 2025
- Tokyo Electron Limited
- Daisuke Satake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,300,465
- Issue date May 13, 2025
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support and plasma processing apparatus
- Patent number 12,293,903
- Issue date May 6, 2025
- Tokyo Electron Limited
- Hajime Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and mounting table thereof
- Patent number 12,293,937
- Issue date May 6, 2025
- Tokyo Electron Limited
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process kit for a substrate support
- Patent number 12,293,902
- Issue date May 6, 2025
- Applied Materials, Inc.
- Muhannad Mustafa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus including shower head and edge ring...
- Patent number 12,293,901
- Issue date May 6, 2025
- Samsung Electronics Co., Ltd.
- Woorim Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mounting table and plasma processing apparatus
- Patent number 12,288,713
- Issue date Apr 29, 2025
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modifying hydrophobicity of a wafer surface using an organosilicon...
- Patent number 12,288,685
- Issue date Apr 29, 2025
- Lam Research Corporation
- Jeremy D. Fields
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20250210308
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Takamitsu TAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PLACEMENT TABLE
- Publication number 20250210324
- Publication date Jun 26, 2025
- NGK Insulators, Ltd.
- Tomohiro HARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250210322
- Publication date Jun 26, 2025
- Samsung Electronics Co., Ltd.
- HYUNJAE LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CERAMIC SUSCEPTOR
- Publication number 20250210323
- Publication date Jun 26, 2025
- MICO CERAMICS LTD.
- Ji-Sook Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250210330
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250210331
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Takumi IMAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORTING PLATE, THIN FILM DEPOSITION APPARATUS INCLUDIN...
- Publication number 20250207287
- Publication date Jun 26, 2025
- ASM IP HOLDING B.V.
- Yong Min Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA INJECTION CONFIGURATIONS FOR PROCESSING CHAMBERS, AND RELATE...
- Publication number 20250210314
- Publication date Jun 26, 2025
- Applied Materials, Inc.
- Ala MORADIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK AND METHOD FOR MANUFACTURING ELECTROSTATIC CHUCK
- Publication number 20250210325
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Atsushi KAWABATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT
- Publication number 20250210393
- Publication date Jun 26, 2025
- NGK Insulators, Ltd.
- Masaki ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPEDANCE MEASUREMENT METHOD OF SUBSTRATE PROCESSING APPARATUS
- Publication number 20250201515
- Publication date Jun 19, 2025
- SEMES CO., LTD.
- Sang Moon YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT ASSEMBLY, PLASMA CONTROL METHOD, AND PLASMA PROCE...
- Publication number 20250201521
- Publication date Jun 19, 2025
- SEMES CO., LTD.
- Dae Hyun YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPONENT TO BE USED FOR PLASMA PROCESSING DEVICE, METHOD FOR MANUF...
- Publication number 20250201537
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Taisei SEGUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HEATING DEVICE AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME
- Publication number 20250201531
- Publication date Jun 19, 2025
- SEMES CO., LTD.
- Chan Young CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250201535
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Sho OIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250201551
- Publication date Jun 19, 2025
- Kokusai Electric Corporation
- Kazuyuki OKUDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250191960
- Publication date Jun 12, 2025
- Samsung Electronics Co., Ltd.
- Hyun Sun CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND MANUFACTURING METHOD THEREOF
- Publication number 20250191894
- Publication date Jun 12, 2025
- SEMES CO., LTD.
- Jin Il SUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SENSOR DEVICE FOR SEMICONDUCTOR EQUIPMENT, METHOD OF OPERATING A SE...
- Publication number 20250189347
- Publication date Jun 12, 2025
- Samsung Electronics Co., Ltd.
- Gyoseon Choo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSTALLATION, METHOD, AND CARRIER FOR COATING EYEGLASS LENSES
- Publication number 20250191900
- Publication date Jun 12, 2025
- SCHNEIDER GMBH & CO. KG
- Gunter SCHNEIDER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF ADDITIVELY MANUFACTURING HIGH-PURITY SILICON, METHOD OF A...
- Publication number 20250178234
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Takayuki ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID SEAL FOR SEMICONDUCTOR PROCESSING CHAMBERS
- Publication number 20250183093
- Publication date Jun 5, 2025
- Applied Materials, Inc.
- Suresh GUPTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND ELECTROSTATIC CHUCK
- Publication number 20250183012
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Takashi ARAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250183086
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR IMPROVING FUSION BONDING
- Publication number 20250174595
- Publication date May 29, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hong-Ta Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE CHARGE AND POWER FEEDBACK AND CONTROL USING A SWITCH MODE B...
- Publication number 20250166965
- Publication date May 22, 2025
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250166975
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Lifu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND SUBSTRATE SUPPORT UNIT
- Publication number 20250166977
- Publication date May 22, 2025
- SEMES CO., LTD.
- HYOUNGKYU SON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIFT PIN INTERFACE IN A SUBSTRATE SUPPORT
- Publication number 20250167030
- Publication date May 22, 2025
- Applied Materials, Inc.
- Alexander SULYMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CERAMIC SUBSTRATE, ELECTROSTATIC CHUCK AND SUBSTRATE FIXING DEVICE
- Publication number 20250157844
- Publication date May 15, 2025
- Shinko Electric Industries Co., Ltd.
- Ryosuke Hori
- H01 - BASIC ELECTRIC ELEMENTS

Workpiece holder

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Radio frequency power return path

Electrostatic edge ring mounting system for substrate processing

Porous plug for electrostatic chuck gas delivery

Electrostatic chuck

Batch-type apparatus for atomic layer etching (ALE), and ALE method...

Remote plasma ultraviolet enhanced deposition

Plasma processing apparatus

Circuits for edge ring control in shaped dc pulsed plasma process d...

Integrated showerhead with thermal control for delivering radical a...

High voltage power supply apparatus and plasma etching equipment ha...

Apparatus for processing substrate

Semiconductor processing apparatus and method

Plasma processing method and plasma processing apparatus

Distortion of pulses for wafer biasing

Carrier device, semiconductor apparatus, and residual charge detect...

Plasma processing apparatus and methods of manufacturing semiconduc...

Method of performing maintenance on substrate processing apparatus

Thermal shield for processing chamber

Substrate processing system and method for installing edge ring

Stage, plasma processing apparatus, and cleaning method

Plasma processing apparatus and method

Placement stage and substrate processing apparatus

Plasma processing apparatus

Substrate support and plasma processing apparatus

Plasma processing apparatus and mounting table thereof

Process kit for a substrate support

Substrate processing apparatus including shower head and edge ring...

Mounting table and plasma processing apparatus

Modifying hydrophobicity of a wafer surface using an organosilicon...

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

WAFER PLACEMENT TABLE

SUBSTRATE PROCESSING APPARATUS

CERAMIC SUSCEPTOR

PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING SYSTEM

PLASMA PROCESSING APPARATUS

SUBSTRATE SUPPORTING PLATE, THIN FILM DEPOSITION APPARATUS INCLUDIN...

PLASMA INJECTION CONFIGURATIONS FOR PROCESSING CHAMBERS, AND RELATE...

ELECTROSTATIC CHUCK AND METHOD FOR MANUFACTURING ELECTROSTATIC CHUCK

MEMBER FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT

IMPEDANCE MEASUREMENT METHOD OF SUBSTRATE PROCESSING APPARATUS

SUBSTRATE SUPPORT ASSEMBLY, PLASMA CONTROL METHOD, AND PLASMA PROCE...

COMPONENT TO BE USED FOR PLASMA PROCESSING DEVICE, METHOD FOR MANUF...

HEATING DEVICE AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE TREATING APPARATUS AND MANUFACTURING METHOD THEREOF

SENSOR DEVICE FOR SEMICONDUCTOR EQUIPMENT, METHOD OF OPERATING A SE...

INSTALLATION, METHOD, AND CARRIER FOR COATING EYEGLASS LENSES

METHOD OF ADDITIVELY MANUFACTURING HIGH-PURITY SILICON, METHOD OF A...

HYBRID SEAL FOR SEMICONDUCTOR PROCESSING CHAMBERS

PLASMA PROCESSING APPARATUS AND ELECTROSTATIC CHUCK

ELECTROSTATIC CHUCK AND SUBSTRATE PROCESSING APPARATUS

METHODS AND SYSTEMS FOR IMPROVING FUSION BONDING

SURFACE CHARGE AND POWER FEEDBACK AND CONTROL USING A SWITCH MODE B...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE TREATING APPARATUS AND SUBSTRATE SUPPORT UNIT

LIFT PIN INTERFACE IN A SUBSTRATE SUPPORT

CERAMIC SUBSTRATE, ELECTROSTATIC CHUCK AND SUBSTRATE FIXING DEVICE