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H01J37/32715
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H
ELECTRICITY
H01
Electric elements
H01J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
H01J37/00
Discharge tubes with provision for introducing objects or material to be exposed to the discharge
Current Industry
H01J37/32715
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Patents Grants
last 30 patents
Information
Patent Grant
Void free low stress fill
Patent number
11,978,666
Issue date
May 7, 2024
Lam Research Corporation
Anand Chandrashekar
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Temperature measurement system, temperature measurement method, and...
Patent number
11,972,921
Issue date
Apr 30, 2024
Tokyo Electron Limited
Takeshi Kobayashi
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma processing apparatus and substrate support of plasma process...
Patent number
11,972,933
Issue date
Apr 30, 2024
Tokyo Electron Limited
Masahiro Dogome
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Gas flow accelerator to prevent buildup of processing byproduct in...
Patent number
11,972,957
Issue date
Apr 30, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Sheng-chun Yang
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Substrate supporting plate, thin film deposition apparatus includin...
Patent number
11,965,262
Issue date
Apr 23, 2024
ASM IP Holding B.V.
Yong Min Yoo
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Substrate support for chucking of mask for deposition processes
Patent number
11,967,516
Issue date
Apr 23, 2024
Applied Materials, Inc.
Jrjyan Jerry Chen
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Electrostatic chuck with ceramic monolithic body
Patent number
11,967,517
Issue date
Apr 23, 2024
Lam Research Corporation
Feng Wang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for controlling stress variation in a material...
Patent number
11,961,722
Issue date
Apr 16, 2024
SPTS Technologies Limited
Anthony Wilby
B81 - MICRO-STRUCTURAL TECHNOLOGY
Information
Patent Grant
Plasma processing apparatus
Patent number
11,961,710
Issue date
Apr 16, 2024
Canon Anelva Corporation
Tadashi Inoue
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Substrate processing apparatus, substrate retainer and method of ma...
Patent number
11,961,715
Issue date
Apr 16, 2024
Kokusai Electric Corporation
Daisuke Hara
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Isolated volume seals and method of forming an isolated volume with...
Patent number
11,955,355
Issue date
Apr 9, 2024
Applied Materials, Inc.
Kirankumar Neelasandra Savandaiah
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma processing apparatus
Patent number
11,955,314
Issue date
Apr 9, 2024
Tokyo Electron Limited
Chishio Koshimizu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Electrostatic chuck and processing apparatus
Patent number
11,955,360
Issue date
Apr 9, 2024
Tocalo Co., Ltd.
Takeshi Takabatake
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for handling an implant
Patent number
11,955,321
Issue date
Apr 9, 2024
NOVA PLASMA LTD.
Amnon Lam
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Electrostatic chuck with mesas
Patent number
11,955,361
Issue date
Apr 9, 2024
Applied Materials, Inc.
Vijay D. Parkhe
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Dynamic phased array plasma source for complete plasma coverage of...
Patent number
11,948,783
Issue date
Apr 2, 2024
Applied Materials, Inc.
Hari Ponnekanti
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Automatic electrostatic chuck bias compensation during plasma proce...
Patent number
11,948,780
Issue date
Apr 2, 2024
Applied Materials, Inc.
Linying Cui
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Heater support kit for bevel etch chamber
Patent number
11,948,790
Issue date
Apr 2, 2024
Applied Materials, Inc.
Tuan Anh Nguyen
B08 - CLEANING
Information
Patent Grant
Method of making a semiconductor manufacturing apparatus member
Patent number
11,939,678
Issue date
Mar 26, 2024
Toto Ltd.
Yasutaka Nitta
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Electrostatic chuck and substrate holding device
Patent number
11,942,350
Issue date
Mar 26, 2024
Shinko Electric Industries Co., Ltd.
Masakuni Miyazawa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Apparatus and method for treating substrate
Patent number
11,942,337
Issue date
Mar 26, 2024
Semes Co., Ltd.
Eui Sang Lim
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Workpiece placement apparatus and processing apparatus
Patent number
11,942,357
Issue date
Mar 26, 2024
Tokyo Electron Limited
Yohei Uchida
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Symmetric VHF source for a plasma reactor
Patent number
11,935,724
Issue date
Mar 19, 2024
Applied Materials, Inc.
Kartik Ramaswamy
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Substrate support and plasma processing apparatus
Patent number
11,935,729
Issue date
Mar 19, 2024
Tokyo Electron Limited
Hajime Tamura
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Systems and methods for cleaning an edge ring pocket
Patent number
11,935,730
Issue date
Mar 19, 2024
Lam Research Corporation
Eric Hudson
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Temperature measurement for substrate carrier using a heater elemen...
Patent number
11,929,241
Issue date
Mar 12, 2024
Applied Materials, Inc.
Phillip Criminale
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Substrate processing apparatus having electrostatic chuck and subst...
Patent number
11,929,251
Issue date
Mar 12, 2024
ASM IP Holding B.V.
Toshihisa Nozawa
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma processing apparatus and semiconductor device manufacturing...
Patent number
11,929,239
Issue date
Mar 12, 2024
Samsung Electronics Co., Ltd.
Sejin Oh
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Paired dynamic parallel plate capacitively coupled plasmas
Patent number
11,923,172
Issue date
Mar 5, 2024
Applied Materials, Inc.
Hari Ponnekanti
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma processing apparatus and plasma processing method
Patent number
11,923,171
Issue date
Mar 5, 2024
Tokyo Electron Limited
Junichi Sasaki
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
CONTROL METHOD OF SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROC...
Publication number
20240153748
Publication date
May 9, 2024
TOKYO ELECTRON LIMITED
Morihito INAGAKI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
CHAMBER LINER FOR SUBSTRATE PROCESSING APPARATUS
Publication number
20240150898
Publication date
May 9, 2024
ASM IP HOLDING B.V.
Yoshiyuki Kikuchi
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
STAGE AND PLASMA PROCESSING APPARATUS
Publication number
20240153749
Publication date
May 9, 2024
TOKYO ELECTRON LIMITED
Yasuharu SASAKI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
Publication number
20240153744
Publication date
May 9, 2024
TOKYO ELECTRON LIMITED
Atsushi TAKAHASHI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SUBSTRATE SUPPORTING UNIT, APPARATUS FOR TREATING SUBSTRATE INCLUDI...
Publication number
20240153747
Publication date
May 9, 2024
SEMES CO., LTD.
Jae-Won SHIN
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
Publication number
20240153760
Publication date
May 9, 2024
Kokusai Electric Corporation
Kazuyuki OKUDA
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
APPARATUS AND METHOD FOR TREATING SUBSTRATE
Publication number
20240145261
Publication date
May 2, 2024
SEMES CO., LTD.
Eui Sang LIM
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
Publication number
20240145218
Publication date
May 2, 2024
TOKYO ELECTRON LIMITED
Koichi Nagami
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
LONG-LIFE EXTENDED TEMPERATURE RANGE EMBEDDED DIODE DESIGN FOR ELEC...
Publication number
20240136214
Publication date
Apr 25, 2024
LAM RESEARCH CORPORATION
Siyuan TIAN
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
NANOSECOND PULSER ADC SYSTEM
Publication number
20240136152
Publication date
Apr 25, 2024
Eagle Harbor Technologies, Inc.
Kenneth Miller
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Metallic Shield For Stable Tape-Frame Substrate Processing
Publication number
20240136159
Publication date
Apr 25, 2024
Harish Varma PENMETHSA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
TRIPOLAR ELECTRODE ARRANGEMENT FOR ELECTROSTATIC CHUCKS
Publication number
20240136161
Publication date
Apr 25, 2024
LAM RESEARCH CORPORATION
Karl Frederick LEESER
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...
Publication number
20240136160
Publication date
Apr 25, 2024
Applied Materials, Inc.
Zheng John YE
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
PLASMA PROCESSING SYSTEM AND EDGE RING REPLACEMENT METHOD
Publication number
20240136158
Publication date
Apr 25, 2024
TOKYO ELECTRON LIMITED
Shin MATSUURA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA CONTROL APPARATUS AND METHOD USING THE SAME
Publication number
20240128054
Publication date
Apr 18, 2024
Samsung Electronics Co., Ltd.
Changho Kim
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
CAPACITANCE SENSING SYSTEMS AND METHODS
Publication number
20240125832
Publication date
Apr 18, 2024
Advanced Energy Industries, Inc.
Donald Enzinna
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
CONSUMABLE MEMBER, PLASMA PROCESSING APPARATUS, AND METHOD OF MANUF...
Publication number
20240128057
Publication date
Apr 18, 2024
TOKYO ELECTRON LIMITED
Kazuki MOYAMA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
APPARATUS DESIGN FOR FILM REMOVAL FROM THE BEVEL AND EDGE OF THE SU...
Publication number
20240128061
Publication date
Apr 18, 2024
Applied Materials, Inc.
FARZAD HOUSHMAND
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Apparatus and Method for Reducing Substrate Thickness and Surface R...
Publication number
20240128066
Publication date
Apr 18, 2024
SPTS TECHNOLOGIES LIMITED
Roland Mumford
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
POLYMERIC COATING FOR SEMICONDUCTOR PROCESSING CHAMBER COMPONENTS
Publication number
20240120180
Publication date
Apr 11, 2024
LAM RESEARCH CORPORATION
Yuanping SONG
B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information
Patent Application
System and Method for Plasma Process Uniformity Control
Publication number
20240120181
Publication date
Apr 11, 2024
TOKYO ELECTRON LIMITED
Sergey Voronin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA HYPERMODEL INTEGRATED WITH FEATURE-SCALE PROFILE MODEL FOR A...
Publication number
20240120186
Publication date
Apr 11, 2024
KLA Corporation
Chad HUARD
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
MULTI-PLATE ELECTROSTATIC CHUCKS WITH CERAMIC BASEPLATES
Publication number
20240112893
Publication date
Apr 4, 2024
LAM RESEARCH CORPORATION
Feng WANG
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
LARGE DIAMETER POROUS PLUG FOR ARGON DELIVERY
Publication number
20240112889
Publication date
Apr 4, 2024
Applied Materials, Inc.
Tony Jefferson GNANAPRAKASA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
Publication number
20240112892
Publication date
Apr 4, 2024
Panasonic Intellectual Property Management Co., Ltd.
Pei YE
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SOFT-CHUCKING SCHEME FOR IMPROVED BACKSIDE PARTICLE PERFORMANCE
Publication number
20240112939
Publication date
Apr 4, 2024
Applied Materials, Inc.
Tony Jefferson GNANAPRAKASA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
VACUUM SEALING INTEGRITY OF CRYOGENIC ELECTROSTATIC CHUCKS USING NO...
Publication number
20240110836
Publication date
Apr 4, 2024
Applied Materials, Inc.
Sankaranarayanan RAVI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
FILM STRESS CONTROL FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION
Publication number
20240105427
Publication date
Mar 28, 2024
Applied Materials, Inc.
Chien-Teh KAO
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD OF PROCESSING SUBSTRATE B...
Publication number
20240105425
Publication date
Mar 28, 2024
Samsung Electronics Co., Ltd.
Seungwan Yoo
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING DEVICE
Publication number
20240096599
Publication date
Mar 21, 2024
Hitachi High-Tech Corporation
Koichi Takasaki
H01 - BASIC ELECTRIC ELEMENTS