Z movement or adjustment

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CPC
H01J2237/20235

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/20235Z movement or adjustment

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Systems and methods of hysteresis compensation
- Patent number 12,183,537
- Issue date Dec 31, 2024
- FEI Company
- Edwin Verschueren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support and substrate processing apparatus
- Patent number 12,165,854
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Nobutaka Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and method
- Patent number 12,112,927
- Issue date Oct 8, 2024
- Picosun Oy
- Väinö Kilpi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition ring for thin substrate handling via edge clamping
- Patent number 12,100,579
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Abhishek Chowdhury
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of cleaning stage in plasma processing apparatus, and the pl...
- Patent number 12,090,529
- Issue date Sep 17, 2024
- Tokyo Electron Limited
- Takamitsu Takayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,094,694
- Issue date Sep 17, 2024
- Tokyo Electron Limited
- Sumi Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Stage device and substrate processing apparatus
- Patent number 12,094,753
- Issue date Sep 17, 2024
- Tokyo Electron Limited
- Melvin Verbaas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection apparatus and method
- Patent number 12,072,181
- Issue date Aug 27, 2024
- ASML Netherlands B.V.
- Yan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Support unit, and apparatus for treating substrate with the same
- Patent number 12,062,525
- Issue date Aug 13, 2024
- PSK, Inc.
- Jong Chan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate positioning device with remote temperature sensor
- Patent number 12,051,607
- Issue date Jul 30, 2024
- ASML Netherlands B.V.
- Patriek Adrianus Alphonsus Maria Bruurs
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for adjusting contact position of lift pins, method for dete...
- Patent number 12,020,968
- Issue date Jun 25, 2024
- Tokyo Electron Limited
- Takahiro Kawawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing apparatus
- Patent number 12,014,908
- Issue date Jun 18, 2024
- HITACHI HIGH-TECH CORPORATION
- Shengnan Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single process volume to perform high-pressure and low-pressure pro...
- Patent number 12,012,652
- Issue date Jun 18, 2024
- Applied Materials, Inc.
- Kelvin Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,961,710
- Issue date Apr 16, 2024
- Canon Anelva Corporation
- Tadashi Inoue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus having electrostatic chuck and subst...
- Patent number 11,929,251
- Issue date Mar 12, 2024
- ASM IP Holding B.V.
- Toshihisa Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer supporting device
- Patent number 11,929,266
- Issue date Mar 12, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Takashi Sakamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for poling polymer thin films
- Patent number 11,910,715
- Issue date Feb 20, 2024
- CREESENSE MICROSYSTEMS INC.
- Albert Ting
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing chambers for deposition and etch
- Patent number 11,887,811
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Khokan Chandra Paul
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pre-loaded bowl mechanism for providing a symmetric radio frequency...
- Patent number 11,887,884
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Ravikumar Patil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of cleaning stage in plasma processing apparatus, and the pl...
- Patent number 11,865,591
- Issue date Jan 9, 2024
- Tokyo Electron Limited
- Takamitsu Takayama
- B08 - CLEANING
Information Patent Grant
Modular reactor for microwave plasma-assisted deposition
- Patent number 11,859,279
- Issue date Jan 2, 2024
- DIAM CONCEPT
- Alix Gicquel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,854,772
- Issue date Dec 26, 2023
- Tokyo Electron Limited
- Masaki Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Replaceable and/or collapsible edge ring assemblies for plasma shea...
- Patent number 11,798,789
- Issue date Oct 24, 2023
- Lam Research Corporation
- Alejandro Sanchez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holding device
- Patent number 11,776,839
- Issue date Oct 3, 2023
- NISSIN ION EQUIPMENT CO., LTD.
- Ippei Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coaxial lift device with dynamic leveling
- Patent number 11,742,235
- Issue date Aug 29, 2023
- Applied Materials, Inc.
- Jason M. Schaller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Direct lift cathode for lithography mask chamber
- Patent number 11,710,621
- Issue date Jul 25, 2023
- Applied Materials, Inc.
- Khiem Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertically adjustable plasma source
- Patent number 11,705,312
- Issue date Jul 18, 2023
- Applied Materials, Inc.
- Tsutomu Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing chambers for deposition and etch
- Patent number 11,699,571
- Issue date Jul 11, 2023
- Applied Materials, Inc.
- Khokan Chandra Paul
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Lift thimble system, reaction chamber, and semiconductor processing...
- Patent number 11,694,880
- Issue date Jul 4, 2023
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Xingfei Mao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam cutting calibration system and method
- Patent number 11,658,001
- Issue date May 23, 2023
- INSTITUTE OF GEOLOGY AND GEOPHYSICS, CHINESE ACADEMY OF SCIENCES
- Zhongming Du
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS AND METHOD FOR MANIPULATING A MICROSCOPIC SAMPLE
- Publication number 20250022677
- Publication date Jan 16, 2025
- FEI Company
- Joseph M. Lebow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATER PLATES WITH DISTRIBUTED PURGE CHANNELS, RF MESHES AND GROUND...
- Publication number 20250022694
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Pranav Vijay Gadre
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER EDGE INSPECTION OF CHARGED PARTICLE INSPECTION SYSTEM
- Publication number 20240420916
- Publication date Dec 19, 2024
- ASML NETHERLANDS B.V.
- Xiaoyu JI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20240412958
- Publication date Dec 12, 2024
- Samsung Electronics Co., Ltd.
- Jeongil MUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR RPS-RF PLASMA CLEAN AND ACTIVATION FOR AD...
- Publication number 20240412948
- Publication date Dec 12, 2024
- Applied Materials, Inc.
- Shuran SHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL PROCESSING APPARATUS, THERMAL PROCESSING METHOD, AND SUBSTR...
- Publication number 20240412989
- Publication date Dec 12, 2024
- SEMES CO., LTD.
- Young Eun JEON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Workpiece Processing Apparatus and Methods for the Treatment of Wor...
- Publication number 20240404797
- Publication date Dec 5, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DETERMINING AN ENERGY SPECTRUM OR ENERGY WIDTH OF A CHARG...
- Publication number 20240371600
- Publication date Nov 7, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- John Breuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTION APPARATUS AND METHOD
- Publication number 20240369356
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Yan WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE DE-CHUCKING VOLTAGE
- Publication number 20240363315
- Publication date Oct 31, 2024
- Applied Materials, Inc.
- Andrew NGUYEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLATFORM FOR CHARGED PARTICLE APPARATUS AND COMPONENTS WITHIN A CHA...
- Publication number 20240312756
- Publication date Sep 19, 2024
- ASML NETHERLANDS B.V.
- Jasper Hendrik GRASMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOVEABLE SUPPORT TO SECURE ELECTRICALLY CONDUCTIVE AND NONCONDUCTIV...
- Publication number 20240290572
- Publication date Aug 29, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Ofer Dudovitch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR ALIGNING DIELECTRIC...
- Publication number 20240274411
- Publication date Aug 15, 2024
- PSK INC.
- Kwang Sung YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Stage Device, Charged Particle Beam Device, and Vacuum Device
- Publication number 20240258063
- Publication date Aug 1, 2024
- Hitachi High-Tech Corporation
- Motohiro TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...
- Publication number 20240234105
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ENHANCED DRY DESMEAR EQUIPMENT WITH PROTECTIVE FILM PEELING CAPABIL...
- Publication number 20240222089
- Publication date Jul 4, 2024
- Intel Corporation
- Ala OMER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS, PLUG, AND METHOD...
- Publication number 20240213082
- Publication date Jun 27, 2024
- NGK Insulators, Ltd.
- Hideaki HASHIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION EXTRACTION OPTICS HAVING NOVEL BLOCKER CONFIGURATION
- Publication number 20240194438
- Publication date Jun 13, 2024
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAMPLE HOLDER FOR TRANSMISSION ELECTRON MICROSCOPE, SAMPLE ANALYSIS...
- Publication number 20240153734
- Publication date May 9, 2024
- Samsung Electronics Co., Ltd.
- Yeoseon Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...
- Publication number 20240136160
- Publication date Apr 25, 2024
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD
- Publication number 20240096601
- Publication date Mar 21, 2024
- KIOXIA Corporation
- Takeharu MOTOKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
- Publication number 20240087854
- Publication date Mar 14, 2024
- PSK INC.
- Kwang Sung YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL FOCUS SOLUTON FOR SEM METROLOGY TOOLS
- Publication number 20240071713
- Publication date Feb 29, 2024
- ASML NETHERLANDS B.V.
- Niels Johannes Maria BOSCH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPLACEABLE AND/OR COLLAPSIBLE EDGE RING ASSEMBLIES FOR PLASMA SHEA...
- Publication number 20240038504
- Publication date Feb 1, 2024
- LAM RESEARCH CORPORATION
- Alejandro SANCHEZ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH SELECTIVITY, LOW STRESS, AND LOW HYDROGEN CARBON HARDMASKS IN...
- Publication number 20240030028
- Publication date Jan 25, 2024
- LAM RESEARCH CORPORATION
- Abbin Antony
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240021419
- Publication date Jan 18, 2024
- TOKYO ELECTRON LIMITED
- Tatsuya YAMAGUCHI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230420294
- Publication date Dec 28, 2023
- Tokyo Electron Limited
- Makoto WADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA CHAMBER WITH GAS CROSS-FLOW, MICROWAVE RESONATORS AND A ROTA...
- Publication number 20230395356
- Publication date Dec 7, 2023
- Applied Materials, Inc.
- Anantha Subramani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COOLING PLATE
- Publication number 20230377854
- Publication date Nov 23, 2023
- TOKYO ELECTRON LIMITED
- Yoichi YAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COAXIAL LIFT DEVICE WITH DYNAMIC LEVELING
- Publication number 20230360956
- Publication date Nov 9, 2023
- Applied Materials, Inc.
- Jason M. SCHALLER
- H01 - BASIC ELECTRIC ELEMENTS

Z movement or adjustment

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Systems and methods of hysteresis compensation

Substrate support and substrate processing apparatus

Substrate processing apparatus and method

Deposition ring for thin substrate handling via edge clamping

Method of cleaning stage in plasma processing apparatus, and the pl...

Substrate processing apparatus and substrate processing method

Stage device and substrate processing apparatus

Inspection apparatus and method

Support unit, and apparatus for treating substrate with the same

Substrate positioning device with remote temperature sensor

Method for adjusting contact position of lift pins, method for dete...

Vacuum processing apparatus

Single process volume to perform high-pressure and low-pressure pro...

Plasma processing apparatus

Substrate processing apparatus having electrostatic chuck and subst...

Wafer supporting device

Method and apparatus for poling polymer thin films

Semiconductor processing chambers for deposition and etch

Pre-loaded bowl mechanism for providing a symmetric radio frequency...

Method of cleaning stage in plasma processing apparatus, and the pl...

Modular reactor for microwave plasma-assisted deposition

Plasma processing apparatus and plasma processing method

Replaceable and/or collapsible edge ring assemblies for plasma shea...

Substrate holding device

Coaxial lift device with dynamic leveling

Direct lift cathode for lithography mask chamber

Vertically adjustable plasma source

Semiconductor processing chambers for deposition and etch

Lift thimble system, reaction chamber, and semiconductor processing...

Ion beam cutting calibration system and method

Patents Applicationslast 30 patents

APPARATUS AND METHOD FOR MANIPULATING A MICROSCOPIC SAMPLE

HEATER PLATES WITH DISTRIBUTED PURGE CHANNELS, RF MESHES AND GROUND...

WAFER EDGE INSPECTION OF CHARGED PARTICLE INSPECTION SYSTEM

PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCT...

METHODS AND APPARATUS FOR RPS-RF PLASMA CLEAN AND ACTIVATION FOR AD...

THERMAL PROCESSING APPARATUS, THERMAL PROCESSING METHOD, AND SUBSTR...

Workpiece Processing Apparatus and Methods for the Treatment of Wor...

METHOD OF DETERMINING AN ENERGY SPECTRUM OR ENERGY WIDTH OF A CHARG...

INSPECTION APPARATUS AND METHOD

ADJUSTABLE DE-CHUCKING VOLTAGE

PLATFORM FOR CHARGED PARTICLE APPARATUS AND COMPONENTS WITHIN A CHA...

MOVEABLE SUPPORT TO SECURE ELECTRICALLY CONDUCTIVE AND NONCONDUCTIV...

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR ALIGNING DIELECTRIC...

Stage Device, Charged Particle Beam Device, and Vacuum Device

IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...

ENHANCED DRY DESMEAR EQUIPMENT WITH PROTECTIVE FILM PEELING CAPABIL...

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS, PLUG, AND METHOD...

ION EXTRACTION OPTICS HAVING NOVEL BLOCKER CONFIGURATION

SAMPLE HOLDER FOR TRANSMISSION ELECTRON MICROSCOPE, SAMPLE ANALYSIS...

IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...

TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE

DUAL FOCUS SOLUTON FOR SEM METROLOGY TOOLS

REPLACEABLE AND/OR COLLAPSIBLE EDGE RING ASSEMBLIES FOR PLASMA SHEA...

HIGH SELECTIVITY, LOW STRESS, AND LOW HYDROGEN CARBON HARDMASKS IN...

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

PLASMA CHAMBER WITH GAS CROSS-FLOW, MICROWAVE RESONATORS AND A ROTA...

COOLING PLATE

COAXIAL LIFT DEVICE WITH DYNAMIC LEVELING