3323954

Information

• Patent Grant
• 3323954

• References
• Source

• Patent Number

  3,323,954

• Date Filed

  Not available

• Date Issued

  Tuesday, June 6, 1967
  59 years ago

• CPC

  • C01B33/02 - Silicon
  • B01J4/008 - Feed or outlet regulating or controlling devices
  • B01J19/088 - giving rise to electric discharges
  • C01B6/00 - Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond
  • C23C8/00 - Solid state diffusion of only non-metal elements into metallic material surfaces Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating
  • C23C14/32 - by explosion by evaporation and subsequent ionisation of the vapours
  • C23C16/452 - by activating reactive gas streams before their introduction into the reaction chamber
  • C30B13/12 - in the gaseous or vapour state
  • C30B31/165 - Diffusion sources
  • H01L21/00 - Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • Y10S148/129 - Pulse doping
  • Y10S148/169 - Vacuum deposition
  • Y10S252/951 - for vapor transport
  • Y10S438/925 - Fluid growth doping control

• US Classifications

  • 117 - Single-crystal, oriented-crystal, and epitaxy growth processes
  • 148 - Metal treatment
  • 204 - Chemistry: electrical and wave energy
  • 252 - Compositions
  • 427 - Coating processes
  • 438 - Semiconductor device manufacturing: process